KR101082630B1 - 잠재성 경화제 - Google Patents
잠재성 경화제 Download PDFInfo
- Publication number
- KR101082630B1 KR101082630B1 KR1020097006419A KR20097006419A KR101082630B1 KR 101082630 B1 KR101082630 B1 KR 101082630B1 KR 1020097006419 A KR1020097006419 A KR 1020097006419A KR 20097006419 A KR20097006419 A KR 20097006419A KR 101082630 B1 KR101082630 B1 KR 101082630B1
- Authority
- KR
- South Korea
- Prior art keywords
- aluminum
- compound
- curing agent
- latent curing
- agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 126
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 126
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 84
- 239000013522 chelant Substances 0.000 claims abstract description 75
- -1 imidazole compound Chemical class 0.000 claims abstract description 57
- 150000001875 compounds Chemical class 0.000 claims abstract description 56
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 51
- 239000000203 mixture Substances 0.000 claims abstract description 46
- 239000004593 Epoxy Substances 0.000 claims abstract description 41
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 41
- 239000002738 chelating agent Substances 0.000 claims abstract description 40
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 34
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 28
- 239000007870 radical polymerization initiator Substances 0.000 claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 150000002921 oxetanes Chemical class 0.000 claims description 31
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 25
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims description 21
- 239000002904 solvent Substances 0.000 claims description 20
- 239000002245 particle Substances 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 16
- YNCDEEFMDXHURQ-UHFFFAOYSA-N aluminum;ethyl 3-oxobutanoate Chemical group [Al].CCOC(=O)CC(C)=O YNCDEEFMDXHURQ-UHFFFAOYSA-N 0.000 claims description 7
- NIYNIOYNNFXGFN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol;7-oxabicyclo[4.1.0]heptane-4-carboxylic acid Chemical compound OCC1CCC(CO)CC1.C1C(C(=O)O)CCC2OC21.C1C(C(=O)O)CCC2OC21 NIYNIOYNNFXGFN-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000002244 precipitate Substances 0.000 claims description 5
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 2
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 2
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 claims description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical group C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 2
- 239000001856 Ethyl cellulose Substances 0.000 claims 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 claims 2
- 229920001249 ethyl cellulose Polymers 0.000 claims 2
- 235000019325 ethyl cellulose Nutrition 0.000 claims 2
- WIFJFQLSBXPWQQ-UHFFFAOYSA-N oxetane silane Chemical group [SiH4].O1CCC1 WIFJFQLSBXPWQQ-UHFFFAOYSA-N 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 abstract description 25
- 239000003822 epoxy resin Substances 0.000 abstract description 24
- 239000004849 latent hardener Substances 0.000 abstract description 9
- 239000007791 liquid phase Substances 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 69
- 239000000243 solution Substances 0.000 description 21
- 239000000843 powder Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 14
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 239000003094 microcapsule Substances 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 7
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000009257 reactivity Effects 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- MQQXUGFEQSCYIA-OAWHIZORSA-M aluminum;(z)-4-ethoxy-4-oxobut-2-en-2-olate;propan-2-olate Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CCOC(=O)\C=C(\C)[O-] MQQXUGFEQSCYIA-OAWHIZORSA-M 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000003566 oxetanyl group Chemical group 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229940106691 bisphenol a Drugs 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000003350 kerosene Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 238000010538 cationic polymerization reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000009396 hybridization Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000004455 differential thermal analysis Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000011163 secondary particle Substances 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- ZAXXZBQODQDCOW-UHFFFAOYSA-N 1-methoxypropyl acetate Chemical compound CCC(OC)OC(C)=O ZAXXZBQODQDCOW-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- SVNWKKJQEFIURY-UHFFFAOYSA-N 2-methyl-1-(2-methylpropyl)imidazole Chemical compound CC(C)CN1C=CN=C1C SVNWKKJQEFIURY-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 1
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 206010068516 Encapsulation reaction Diseases 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- IKHOZNOYZQPPCK-UHFFFAOYSA-K aluminum;4,4-diethyl-3-oxohexanoate Chemical compound [Al+3].CCC(CC)(CC)C(=O)CC([O-])=O.CCC(CC)(CC)C(=O)CC([O-])=O.CCC(CC)(CC)C(=O)CC([O-])=O IKHOZNOYZQPPCK-UHFFFAOYSA-K 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000012656 cationic ring opening polymerization Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002779 inactivation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/70—Chelates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
- H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Polyethers (AREA)
Abstract
Description
Claims (19)
- 알루미늄 킬레이트제에 실세스퀴옥산형 옥세탄 유도체를 지환식 에폭시 화합물의 존재하에서 반응시킨 후, 추가로 액상 에폭시 수지와 이미다졸 화합물을 반응시켜 잠재화 또는 방향족 비닐 화합물과 라디칼 중합 개시제를 반응시켜 잠재화시킨, 에틸셀룰로오스를 사용하지 않은 알루미늄 킬레이트계 잠재성 경화제.
- 제1항에 있어서, 알루미늄 킬레이트제는 3개의 β-케토에놀레이트 음이온이 알루미늄에 배위한 착체 화합물인 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 알루미늄 킬레이트제는 알루미늄에틸아세토아세테이트ㆍ디이소프로필레이트, 알루미늄트리스에틸아세토아세테이트, 알루미늄알킬아세토아세테이트ㆍ디이소프로필레이트, 알루미늄비스에틸아세토아세테이트ㆍ모노아세틸아세토네이트 또는 알루미늄트리스아세틸아세토네이트인 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 알루미늄 킬레이트제는 알루미늄에틸아세토아세테이트ㆍ디이소프로필레이트인 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 지환식 에폭시 화합물이 3',4'-에폭시시클로헥실메틸 3,4-에폭시시클로헥산카르복실레이트인 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 알루미늄 킬레이트제 100 중량부에 대하여 실세스퀴옥산형 옥세탄 유도체를 0.1 내지 500 중량부, 알루미늄 킬레이트제 및 실세스퀴옥산형 옥세탄 유도체의 합계 100 중량부에 대하여 지환식 에폭시 화합물 0.1 내지 1000 중량부를 갖는 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 액상 에폭시 수지를 알루미늄 킬레이트제 1 중량부에 대하여 0.1 내지 200 중량부의 비율로 함유하고, 액상 에폭시 수지 1 중량부에 대하여 이미다졸 화합물을 0.01 내지 1 중량부의 비율로 함유하는 알루미늄 킬레이트계 잠재성 경화제.
- 제1항 또는 제2항에 있어서, 방향족 비닐 화합물을 알루미늄 킬레이트제 1 중량부에 대하여 0.1 내지 200 중량부의 비율로 함유하고, 방향족 비닐 화합물 1 중량부에 대하여 라디칼 중합 개시제를 0.01 내지 1 중량부의 비율로 함유하는 알루미늄 킬레이트계 잠재성 경화제.
- 알루미늄 킬레이트제와 실세스퀴옥산형 옥세탄 유도체를 지환식 에폭시 화합물의 존재하에 비수용매 중에서 가열함으로써 반응시킨 후, 추가로 액상 에폭시 수지와 이미다졸 화합물을 반응시키거나 또는 방향족 비닐 화합물과 라디칼 중합 개시제를 반응시켜, 침전물로서 알루미늄 킬레이트계 잠재성 경화제를 얻는 것을 특징으로 하는, 에틸셀룰로오스를 사용하지 않은 알루미늄 킬레이트계 잠재성 경화제의 제조 방법.
- 제10항에 있어서, 가열 온도가 80 내지 200 ℃인 제조 방법.
- 제10항 또는 제11항에 있어서, 반응을 질소 분위기하에서 행하는 제조 방법.
- 제1항 또는 제2항에 기재된 알루미늄 킬레이트계 잠재성 경화제와 실란 커플링제와 열경화형 화합물을 함유하는 것을 특징으로 하는 열경화형 조성물.
- 제13항에 있어서, 열경화형 화합물이 지환식 에폭시 화합물인 열경화형 조성물.
- 제13항에 있어서, 열경화형 화합물이 옥세탄 화합물인 열경화형 조성물.
- 제13항에 있어서, 실란 커플링제가 옥세탄계 실란 커플링제 및/또는 지환식 에폭시계 실란 커플링제인 열경화형 조성물.
- 제13항에 기재된 열경화형 조성물에 도전 입자가 분산되어 이루어지는 이방성 도전 조성물.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2007-014252 | 2007-01-24 | ||
JP2007014252A JP5298431B2 (ja) | 2007-01-24 | 2007-01-24 | 潜在性硬化剤 |
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KR20090082351A KR20090082351A (ko) | 2009-07-30 |
KR101082630B1 true KR101082630B1 (ko) | 2011-11-10 |
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KR1020097006419A Active KR101082630B1 (ko) | 2007-01-24 | 2008-01-17 | 잠재성 경화제 |
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US (1) | US20090230360A1 (ko) |
JP (1) | JP5298431B2 (ko) |
KR (1) | KR101082630B1 (ko) |
CN (1) | CN101583648B (ko) |
TW (1) | TW200835711A (ko) |
WO (1) | WO2008090792A1 (ko) |
Families Citing this family (11)
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JP5321082B2 (ja) * | 2009-01-21 | 2013-10-23 | デクセリアルズ株式会社 | アルミニウムキレート系潜在性硬化剤及びその製造方法 |
JP5481995B2 (ja) * | 2009-07-24 | 2014-04-23 | デクセリアルズ株式会社 | アルミニウムキレート系潜在性硬化剤及びそれらの製造方法 |
JP5365811B2 (ja) * | 2010-06-28 | 2013-12-11 | デクセリアルズ株式会社 | アルミニウムキレート系潜在性硬化剤 |
CN102268126B (zh) * | 2011-06-01 | 2012-08-08 | 上海大学 | 有机硅潜伏性环氧树脂固化剂的制备方法 |
JP2016060761A (ja) * | 2014-09-16 | 2016-04-25 | デクセリアルズ株式会社 | 異方性導電接着剤、及び接続構造体の製造方法 |
DE102014219844A1 (de) | 2014-09-30 | 2016-03-31 | Siemens Aktiengesellschaft | Isolationssystem für elektrische Maschinen |
DE102014221715A1 (de) * | 2014-10-24 | 2016-04-28 | Siemens Aktiengesellschaft | Tränkharz, Leiteranordnung, elektrische Spule und elektrische Maschine |
JP6670688B2 (ja) * | 2016-06-15 | 2020-03-25 | デクセリアルズ株式会社 | 潜在性硬化剤、及びその製造方法、並びに熱硬化型エポキシ樹脂組成物 |
JP6948114B2 (ja) * | 2016-06-15 | 2021-10-13 | デクセリアルズ株式会社 | 熱硬化型エポキシ樹脂組成物、及びその製造方法 |
CN113248714B (zh) * | 2021-06-25 | 2022-06-10 | 山东大学 | 一种含POSS的α-胺基三乙氧基硅烷及其制备方法与应用 |
CN118580755B (zh) * | 2024-06-18 | 2025-02-14 | 安徽永昌新材料科技股份有限公司 | 一种超低温固化聚酯材料制备工艺及应用 |
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WO2006132133A1 (ja) * | 2005-06-06 | 2006-12-14 | Sony Chemical & Information Device Corporation | 潜在性硬化剤 |
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JPS5817537B2 (ja) * | 1979-06-25 | 1983-04-07 | 株式会社東芝 | エポキシ樹脂系組成物 |
JPS5817536B2 (ja) * | 1979-06-21 | 1983-04-07 | 株式会社東芝 | エポキシ樹脂系組成物 |
US5733954A (en) * | 1995-12-14 | 1998-03-31 | Minnesota Mining And Manufacturing Company | Epoxy resin curing agent made via aqueous dispersion of an epoxide and an imidazole |
JP3565797B2 (ja) * | 2001-06-06 | 2004-09-15 | ソニーケミカル株式会社 | 潜在性硬化剤、潜在性硬化剤の製造方法及び接着剤 |
JP3875859B2 (ja) * | 2001-06-27 | 2007-01-31 | ソニーケミカル&インフォメーションデバイス株式会社 | 硬化剤粒子、硬化剤粒子の製造方法及び接着剤 |
JP2006131849A (ja) * | 2004-11-09 | 2006-05-25 | Toagosei Co Ltd | 二液型硬化性組成物 |
JP2006131848A (ja) * | 2004-11-09 | 2006-05-25 | Toagosei Co Ltd | ポリオルガノシロキサン及びその製造方法、並びにポリオルガノシロキサンを含有する硬化性組成物 |
US7557230B2 (en) * | 2005-06-06 | 2009-07-07 | Sony Corporation | Latent curing agent |
JP5267757B2 (ja) * | 2006-02-07 | 2013-08-21 | デクセリアルズ株式会社 | 潜在性硬化剤 |
US8147720B2 (en) * | 2007-01-24 | 2012-04-03 | Sony Corporation | Latent curing agent |
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JP2008179701A (ja) | 2008-08-07 |
WO2008090792A1 (ja) | 2008-07-31 |
TW200835711A (en) | 2008-09-01 |
JP5298431B2 (ja) | 2013-09-25 |
KR20090082351A (ko) | 2009-07-30 |
US20090230360A1 (en) | 2009-09-17 |
CN101583648A (zh) | 2009-11-18 |
CN101583648B (zh) | 2012-01-11 |
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