KR101074858B1 - Adhesive Composition for Halogen-Free Coverlay Film and Coverlay Film Using the Same - Google Patents
Adhesive Composition for Halogen-Free Coverlay Film and Coverlay Film Using the Same Download PDFInfo
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- KR101074858B1 KR101074858B1 KR1020090011807A KR20090011807A KR101074858B1 KR 101074858 B1 KR101074858 B1 KR 101074858B1 KR 1020090011807 A KR1020090011807 A KR 1020090011807A KR 20090011807 A KR20090011807 A KR 20090011807A KR 101074858 B1 KR101074858 B1 KR 101074858B1
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- South Korea
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- halogen
- weight
- coverlay film
- epoxy resin
- adhesive composition
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- 239000012787 coverlay film Substances 0.000 title claims abstract description 55
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 50
- 239000000853 adhesive Substances 0.000 title claims abstract description 49
- 239000003822 epoxy resin Substances 0.000 claims abstract description 29
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 29
- 229920000459 Nitrile rubber Polymers 0.000 claims abstract description 22
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 22
- 239000003063 flame retardant Substances 0.000 claims abstract description 19
- 150000002367 halogens Chemical class 0.000 claims abstract description 18
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 14
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010954 inorganic particle Substances 0.000 claims abstract description 11
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 11
- 239000011574 phosphorus Substances 0.000 claims abstract description 11
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 10
- 239000007787 solid Substances 0.000 claims abstract description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 8
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims abstract description 8
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims abstract description 6
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims abstract description 5
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 4
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims abstract description 4
- 239000000347 magnesium hydroxide Substances 0.000 claims abstract description 4
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims abstract description 4
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 4
- 239000011787 zinc oxide Substances 0.000 claims abstract description 4
- 239000004593 Epoxy Substances 0.000 claims description 8
- 239000010408 film Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 239000004642 Polyimide Substances 0.000 claims description 2
- 239000004848 polyfunctional curative Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000001723 curing Methods 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000012776 electronic material Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- -1 tetraphenylborate Chemical compound 0.000 description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J125/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
- C09J125/02—Homopolymers or copolymers of hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/35—Heat-activated
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Adhesive Tapes (AREA)
Abstract
본 발명은 연성 인쇄회로 기판의 회로 보호용 커버레이 필름의 제조에 사용되는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름에 관한 것으로서, 보다 상세하게는 커버레이 필름에서 요구되는 난연성, 접착력, 내열성, 및 흐름성 등의 특성을 모두 충족하는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름에 관한 것이다. 이를 위해 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물은 (1) 카르복실기를 포함하고, 중량평균분자량이 10,000 ~ 200,000 사이이며, 아크릴로니트릴 함유량이 20 ~ 40 중량%이고 카르복실기 함유율이 3~15 중량%인 니트릴부타디엔 고무(NBR), (2) 1분자 당 2개 이상의 에폭시기를 가지고, EEW(g/eq)가 100 ~ 1,000 인 비할로겐 다관능성 고상 에폭시 수지와 액상 에폭시 수지, (3) 경화제, (4) 경화 촉진제, (5) 비할로겐 인 계 난연제 및 (6) 수산화 알루미늄, 수산화 마그네슘, 산화 아연, 산화 마그네슘, 삼산화 안티몬 또는 실리카 등의 무기 입자를 포함하는 것을 특징으로 한다.The present invention relates to an adhesive composition for a halogen-free coverlay film used in the manufacture of a coverlay film for circuit protection of a flexible printed circuit board, and a coverlay film having the same. More specifically, the flame retardancy and adhesion required in a coverlay film The present invention relates to an adhesive composition for a halogen-free coverlay film that satisfies all properties such as heat resistance, flowability, and the like, and a coverlay film having the same. To this end, the adhesive composition for halogen-free coverlay film according to the present invention comprises (1) a carboxyl group, a weight average molecular weight of 10,000 to 200,000, an acrylonitrile content of 20 to 40% by weight and a carboxyl group content of 3 to 15 Nitrile-butadiene rubber (NBR) in weight%, (2) Non-halogen polyfunctional solid epoxy resin and liquid epoxy resin having two or more epoxy groups per molecule and having an EEW (g / eq) of 100 to 1,000, (3) a curing agent And inorganic particles such as (4) a curing accelerator, (5) a non-halogen phosphorus flame retardant, and (6) aluminum hydroxide, magnesium hydroxide, zinc oxide, magnesium oxide, antimony trioxide or silica.
니트릴부타디엔 고무, 비할로겐 다관능성 에폭시 수지, 경화제, 비할로겐 인 계 난연제, 무기 입자 Nitrile Butadiene Rubber, Non-Halogen Polyfunctional Epoxy Resin, Hardener, Non-Halogen Phosphorus Flame Retardant, Inorganic Particles
Description
본 발명은 연성 인쇄회로 기판의 회로 보호용 커버레이 필름의 제조에 사용되는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름에 관한 것으로서, 보다 상세하게는 커버레이 필름에서 요구되는 난연성, 접착력, 내열성, 및 흐름성 등의 특성을 모두 충족하는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름에 관한 것이다.The present invention relates to an adhesive composition for a halogen-free coverlay film used in the manufacture of a coverlay film for circuit protection of a flexible printed circuit board, and a coverlay film having the same. More specifically, the flame retardancy and adhesion required in a coverlay film The present invention relates to an adhesive composition for a halogen-free coverlay film that satisfies all properties such as heat resistance, flowability, and the like, and a coverlay film having the same.
최근 전자 제품의 소형화, 박형화, 고집적화 등의 경향에 따라 연성 회로 기판의 적용이 폭발적으로 증가하고 있으며, 이에 따라 회로 보호용 커버레이 필름의 사용도 증가하고 있으며 접착성, 내열성, 난연성, 흐름성 등의 성능 향상이 절실히 요구되고 있는 실정이다.Recently, the application of flexible circuit boards has exploded with the trend of miniaturization, thinning, and high integration of electronic products. Accordingly, the use of coverlay films for circuit protection is also increasing, and the adhesion, heat resistance, flame retardancy, flowability, etc. There is an urgent need for improved performance.
또한 최근에는 유럽의 WEEE-와 RoHS 등에 의해 친환경적인 재료의 개발이 요구되고 있다. 그러나 종래의 커버레이 필름이나 반도체 밀봉재료 등의 전자재료에 사용되는 접착제는 난연제로 브롬 등의 할로겐 원소를 포함하는 화합물로 이를 연 소시킬 경우에는 다이옥신 계 화합물 등의 독성 가스가 발생하는 문제점을 가지고 있어 최근의 전자재료용 접착제에는 할로겐 프리(Halogen Free)가 절실히 요구되고 있다.In recent years, development of environment-friendly materials has been required by WEEE- and RoHS of Europe. However, conventional adhesives used in electronic materials such as coverlay films and semiconductor sealing materials are flame retardants and compounds containing halogen elements such as bromine have the problem of generating toxic gases such as dioxins based compounds. In recent years, halogen-free (Halogen Free) is urgently required for adhesives for electronic materials.
일반적으로 커버레이 필름은 도 1과 내열성 필름의 한 면에 반경화 상태의 접착제 층이 코팅되어 있고 이 접착제를 보호하기 위한 이형지로 구성된다. 이러한 커버레이 필름은 인쇄된 회로를 보호하기 위해 연성 인쇄 회로 기판에 접착이 되기 때문에 내열성, 접착성, 난연성, 흐름성 등이 중요한 요구 물성이며 이와 같은 모든 특성이 모두 갖추어져야 하는 것이며 또한 환경 문제로 인해 할로겐 프리까지 요구되고 있는 것이다.In general, the coverlay film is coated with a semi-cured adhesive layer on one side of the heat-resistant film of Figure 1 and consists of a release paper for protecting the adhesive. Since the coverlay film is adhered to the flexible printed circuit board to protect the printed circuit, heat resistance, adhesion, flame retardancy, flowability, etc. are important required properties, and all of these characteristics must be provided. Therefore, even halogen-free is required.
종래의 커버레이용 접착제는 에폭시 계, 아크릴 수지 계, 페놀 수지 계, 폴리에스테르 계 등이 널리 사용되어 왔으나 이들 모두 브롬 등의 할로겐 계 난연제를 사용하고 있어 환경 문제에 취약하다. 때문에 최근에는 할로겐 계 난연제를 배제하고 여러 가지 할로겐 프리 난연제를 적용한 커버레이 필름이 개발되고 있지만 모든 물성을 만족 시키지는 못하고 있는 실정이다.Conventional coverlay adhesives have been widely used in epoxy, acrylic resin, phenolic resin, polyester, and the like, but all of them use halogen flame retardants such as bromine, which is vulnerable to environmental problems. Therefore, in recent years, a coverlay film using various halogen-free flame retardants without halogen-based flame retardants has been developed, but does not satisfy all physical properties.
본 발명은 상기와 같은 모든 요구특성을 만족하는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름을 제공하기 위해 안출한 것으로서, 본 발명의 목적은 커버레이 필름에서 요구되는 난연성, 접착력, 및 내열성 등의 특성을 모두 충족하며, 특히 최근의 전자재료의 박형화, 고밀도화에 따라 배선 패턴이 파인화 되어 더욱 중요시 되고 있는 흐름성을 충족시키는 할로겐프리 커버레이 필름용 접착제 조성물 및 이를 구비하는 커버레이 필름을 제공하고자 하는 것이다.The present invention has been made in order to provide an adhesive composition for a halogen-free coverlay film and a coverlay film having the same, which satisfies all the above-described characteristics, and an object of the present invention is flame retardancy, adhesive strength, And an adhesive composition for a halogen-free coverlay film that satisfies all characteristics such as heat resistance, and particularly, flow patterns are becoming more important due to the thinning and high density of electronic materials in recent years, and coverlays having the same. It is to provide a film.
본 발명의 상기 및 다른 목적과 이점은 바람직한 실시예를 설명한 하기의 설명으로부터 보다 분명해 질 것이다.These and other objects and advantages of the present invention will become more apparent from the following description of a preferred embodiment thereof.
상기 목적은, (1) 카르복실기를 포함하고, 중량평균분자량이 10,000 ~ 200,000 사이이며, 아크릴로니트릴 함유량이 20 ~ 40 중량%이고 카르복실기 함유율이 3~15 중량%인 니트릴부타디엔 고무(NBR), (2) 1분자 당 2개 이상의 에폭시기를 가지고, EEW(g/eq)가 100 ~ 1,000 인 비할로겐 다관능성 고상 에폭시 수지와 액상 에폭시 수지, (3) 경화제, (4) 경화 촉진제, (5) 비할로겐 인 계 난연제 및 (6) 수산화 알루미늄, 수산화 마그네슘, 산화 아연, 산화 마그네슘, 삼산화 안티몬 또는 실리카 등의 무기 입자를 포함하는 것을 특징으로 하는 할로겐프리 커버레이 필름용 접착제 조성물에 의해 달성된다.The purpose is (1) nitrile-butadiene rubber (NBR) containing a carboxyl group, having a weight average molecular weight of 10,000 to 200,000, an acrylonitrile content of 20 to 40% by weight and a carboxyl group content of 3 to 15% by weight. 2) Non-halogen multifunctional solid epoxy resin and liquid epoxy resin having two or more epoxy groups per molecule and having an EEW (g / eq) of 100 to 1,000, (3) curing agent, (4) curing accelerator, (5) ratio It is achieved by an adhesive composition for halogen-free coverlay films comprising a halogen phosphorus flame retardant and (6) inorganic particles such as aluminum hydroxide, magnesium hydroxide, zinc oxide, magnesium oxide, antimony trioxide or silica.
여기서, 상기 접착제 조성물의 성분 중 상기 비할로겐 다관능성 에폭시 수지의 혼합 비가 고상 에폭시 수지 100중량 대비 액상 에폭시 수지 10 ~ 40중량인 것을 특징으로 한다.Here, the mixing ratio of the non-halogen multifunctional epoxy resin among the components of the adhesive composition is characterized in that 10 to 40 weight of the liquid epoxy resin to 100 weight of the solid epoxy resin.
바람직하게는, 상기 니트릴부타디엔 고무 100 중량 대비 상기 에폭시 수지 50 ~ 200 중량부, 상기 비할로겐 인 계 난연제 7 ~ 50 중량부 및 상기 무기입자 20 ~ 60 중량부를 포함하고, 상기 에폭시 수지 100 중량 대비 상기 경화제 1 ~ 20 중량부 및 상기 경화 촉진제 0.1 ~ 5 중량부를 포함하는 것을 특징으로 한다.Preferably, 50 to 200 parts by weight of the epoxy resin, 100 to 7 parts by weight of the non-halogen phosphorus flame retardant and 20 to 60 parts by weight of the inorganic particles, and 100 to the weight of the epoxy resin, based on 100 parts by weight of the nitrile butadiene rubber. It is characterized by including 1 to 20 parts by weight of a curing agent and 0.1 to 5 parts by weight of the curing accelerator.
또한 상기 목적은 상기 할로겐프리 커버레이 필름용 접착제 조성물이 접착제 층으로서 폴리이미드(polyimide) 기재필름 상에 도포된 것을 특징으로 하는 할로겐프리 커버레이 필름용 접착제 조성물을 구비하는 커버레이 필름에 의해 달성된다.The above object is also achieved by a coverlay film comprising an adhesive composition for a halogen-free coverlay film, wherein the adhesive composition for a halogen-free coverlay film is applied on a polyimide base film as an adhesive layer. .
본 발명에 따르면, 커버레이 필름에서 요구되는 난연성, 접착력, 내열성, 및 흐름성 등의 특성을 모두 충족하는 등의 효과를 가진다.According to the present invention, it has the effect of satisfying all properties such as flame retardancy, adhesion, heat resistance, and flowability required in the coverlay film.
이하, 본 발명의 실시예와 도면을 참조하여 본 발명을 상세히 설명한다. 이들 실시예는 오로지 본 발명을 보다 구체적으로 설명하기 위해 예시적으로 제시한 것일 뿐, 본 발명의 범위가 이들 실시예에 의해 제한되지 않는다는 것은 당업계에서 통상의 지식을 가지는 자에 있어서 자명할 것이다.Hereinafter, the present invention will be described in detail with reference to embodiments and drawings of the present invention. These examples are only presented by way of example only to more specifically describe the present invention, it will be apparent to those skilled in the art that the scope of the present invention is not limited by these examples. .
본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물은 니트릴부타디 엔 고무(이하 “NBR”이라고도 함), 비할로겐 다관능성 고상 에폭시 수지와 액상 에폭시 수지, 경화제, 경화 촉진제, 비할로겐 인 계 난연제 및 무기 입자를 포함하는 것을 특징으로 한다.Adhesive composition for halogen-free coverlay film according to the present invention is a nitrile butadiene rubber (hereinafter also referred to as "NBR"), non-halogen multifunctional solid epoxy resin and liquid epoxy resin, curing agent, curing accelerator, non-halogen phosphorus flame retardant and It is characterized by including inorganic particles.
본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 니트릴부타디엔 고무는 카르복실기 함유 니트릴부타디엔 고무로서 중량평균분자량이 2,000~200,000이며, 바람직하게는 10,000~200,000의 분자량을 가진 것으로, 아크릴로니트릴 함유율이 10~60 중량%, 바람직하게는 20~40 중량%이며, 카르복실기 함유율이 3~15 중량%인 것으로 한다. 여기서, 중량평균분자량이 10,000 보다 낮으면 열 안정성이 불량해지고, 200,000 보다 높아지면 용매에 대한 용해성이 나빠지며 용액 제조 시 점도가 증가하여 작업성이 불량해지고, 접착력 또한 저하된다. 또한 아크릴로니트릴 함량이 20 중량% 보다 낮은 경우 용매 용해성이 낮아지며, 40 중량% 보다 높아지면 전기 절연성이 불량해진다. 그리고 카르복실기의 함유율이 3~15 중량%인 경우 NBR과 다른 수지, 그리고 접착 기재와의 결합이 용이하게 되므로 접착력이 증가한다.The nitrile butadiene rubber of the adhesive composition for halogen-free coverlay film according to the present invention is a carboxyl group-containing nitrile butadiene rubber having a weight average molecular weight of 2,000 to 200,000, preferably a molecular weight of 10,000 to 200,000, and the acrylonitrile content is It is 10-60 weight%, Preferably it is 20-40 weight%, and a carboxyl group content rate shall be 3-15 weight%. Here, when the weight average molecular weight is lower than 10,000, the thermal stability is poor, and when the weight average molecular weight is higher than 200,000, the solubility in the solvent is deteriorated, the viscosity increases during solution preparation, and the workability is poor, and the adhesion is also lowered. In addition, when the acrylonitrile content is lower than 20% by weight, the solvent solubility is lowered, and when higher than 40% by weight, the electrical insulation is poor. And when the content rate of the carboxyl group is 3 to 15% by weight, the adhesion between NBR and other resins, and the adhesive substrate is easy to facilitate the adhesion.
또한, 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 에폭시 수지는 1분자 당 2개 이상의 에폭시기를 가지는 다관능성 비할로겐 에폭시 수지가 사용이 되는데 예를 들면 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 페놀 노블락형 에폭시 수지, 크레졸형 에폭시 수지 등이 있으며, 상기 에폭시 수지는 고상의 에폭시 수지와 액상의 에폭시 수지를 혼합하여 사용한다. 고상 에폭시 수지만을 사용할 때에는 피착재에 대한 웨팅(wetting)성이 떨어져 접착력 및 흐름성이 떨어지게 되며 반대로 액상 에폭시 만을 사용할 때에는 접착제의 웨팅성이 너무 높아 가공성이 떨어지기 때문이다. 바람직한 혼합 비로는 고상 에폭시 수지 100 중량 대비 액상 에폭시 수지 10~40중량이다. 그리고 상기 에폭시 수지의 EEW(g/eq)는 100 ~ 1,000인 것이 바람직하며 NBR 100 중량 대비 50 ~ 200 중량부를 사용 할 수 있다.In addition, the epoxy resin of the adhesive composition for halogen-free coverlay film according to the present invention may be a multifunctional non-halogen epoxy resin having two or more epoxy groups per molecule, for example bisphenol A epoxy resin, bisphenol F type Epoxy resins, phenol noblock type epoxy resins, cresol type epoxy resins, and the like, and the epoxy resin is used by mixing a solid epoxy resin and a liquid epoxy resin. This is because when the solid epoxy resin is used, the wettability to the adherend is poor, and thus the adhesion and flow are inferior. On the contrary, when the liquid epoxy is used only, the wettability of the adhesive is too high and the workability is inferior. The preferred mixing ratio is 10 to 40 weight of liquid epoxy resin to 100 weight of solid epoxy resin. And EEW (g / eq) of the epoxy resin is preferably 100 to 1,000, it can be used 50 to 200 parts by weight compared to the NBR 100 weight.
또한, 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 경화제로는 에폭시 수지 경화제로 통상 사용되는 것이면 특별히 제한 되지 않는다. 대표적인 예를 들면 아민 계 경화제, 산무수물 계 경화제, 페놀수지 계 경화제 등을 들 수 있으며 이를 단독 혹은 2종 이상 함께 사용할 수 있다. 상기 경화제는 에폭시 수지 100 중량 대비 1 ~ 20 중량부를 사용할 수 있다. 또한, 고무 가교제로 유, 무기 과산화물을 사용할 수 있으며 NBR 100 중량 대비 1~5 중량부를 첨가하여 사용할 수 있다.In addition, the curing agent of the adhesive composition for halogen-free coverlay film according to the present invention is not particularly limited as long as it is commonly used as an epoxy resin curing agent. Typical examples include an amine curing agent, an acid anhydride curing agent, a phenol resin curing agent, and the like, which may be used alone or in combination of two or more thereof. The curing agent may be used 1 to 20 parts by weight based on 100 parts by weight of the epoxy resin. In addition, an oil and an inorganic peroxide may be used as the rubber crosslinking agent, and may be used by adding 1 to 5 parts by weight based on the NBR 100 weight.
또한, 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 경화 촉진제로는 상기의 에폭시 수지와 경화제의 반응을 촉진시킬 수 있는 것이라면 특별히 제한되지 않는다. 대표적인 예를 들면 2-메틸이미다졸, 2-에틸 4-메틸이미다졸 등의 이미다졸 계 화합물과 트리페닐포스핀, 테트라페닐포스핀, 테트라페닐보레이트 등의 포스핀 계 등을 사용할 수 있다. 이들 역시 단독 혹은 2종 이상 함께 사용할 수 있으며 상기 에폭시 수지 100 중량 대비 0.1 ~ 5 중량부를 사용할 수 있다.In addition, the curing accelerator of the adhesive composition for halogen-free coverlay film according to the present invention is not particularly limited as long as it can promote the reaction between the epoxy resin and the curing agent. Typical examples include imidazole compounds such as 2-methylimidazole and 2-ethyl 4-methylimidazole, and phosphine compounds such as triphenylphosphine, tetraphenylphosphine, and tetraphenylborate. . These may also be used alone or in combination of two or more and 0.1 to 5 parts by weight based on 100 parts by weight of the epoxy resin.
또한 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 비 할로겐 계 난연제로는 할로겐 원자를 포함하지 않는 난연제로 인 계 화합물이 사용되며, 요구 특성으로는 인 함유율이 10질량% 이상이며, 열분해 온도는 300℃ 이상이고 물이나 통상의 유기 용매 즉 아세톤, 메틸에틸케톤, 톨루엔 등의 용매에 용해되지 않는 것이 바람직하다. 이런 특성들은 만족하는 시판품으로는, 예를 들면 유기 포스핀산염 화합물인 “Exolit OP935(클라리안트사 제조, 인 함유량 23질량%)”를 들 수 있다. 또한 상기 NBR 100중량 대비 7~50 중량부를 적용하여야 UL-94 V-0등급을 기대할 수 있으며, 또한 커버레이 접착제의 물성 저하를 방지할 수 있다. In addition, as the non-halogen flame retardant of the adhesive composition for halogen-free coverlay film according to the present invention, a phosphorus-based compound is used as a flame retardant that does not contain a halogen atom, and as a required characteristic, phosphorus content is 10 mass% or more, and thermal decomposition It is preferable that temperature is 300 degreeC or more, and it does not melt | dissolve in water or a normal organic solvent, ie, acetone, methyl ethyl ketone, toluene, etc. solvent. As a commercial item which satisfy | fills such characteristics, the organic phosphinate compound "Exolit OP935 (made by Clariant, phosphorus content 23 mass%)" is mentioned, for example. In addition, 7 to 50 parts by weight with respect to the NBR 100 weight may be applied to expect the UL-94 V-0 grade, it can also prevent the degradation of the coverlay adhesive properties .
또한 본 발명에 따른 할로겐프리 커버레이 필름용 접착제 조성물의 상기 무기 입자는 주로 접착제에 내열성, 난연성을 부여하기 위해 사용되며 부가 기능으로 펀칭성이 향상된다. 적용 가능한 예로는 수산화 알루미늄, 수산화 마그네슘, 산화 아연, 산화 마그네슘, 삼산화 안티몬, 실리카 등이 있다. 바람직한 적용 양으로는 NBR 100 중량 대비 20 ~ 60 중량부이다. 적용 양이 20 중량부 이하일 경우에는 접착제의 난연성, 내열성 및 펀칭성이 저하되며 60 중량부 이상의 경우에는 접착제 흐름성의 감소, 접착력 감소 등의 물성 저하를 발생시킨다.In addition, the inorganic particles of the adhesive composition for halogen-free coverlay film according to the present invention are mainly used to impart heat resistance and flame retardancy to the adhesive, and the punching property is improved by an additional function. Applicable examples include aluminum hydroxide, magnesium hydroxide, zinc oxide, magnesium oxide, antimony trioxide, silica and the like. Preferred application amounts are 20 to 60 parts by weight relative to NBR 100 weight. If the application amount is 20 parts by weight or less, the flame retardancy, heat resistance and punching properties of the adhesive is lowered, and when 60 parts by weight or more, the physical properties such as decrease in adhesive flow property, decrease in adhesive strength occurs.
이상의 조성으로 이루어지는 접착제 조성물은 메칠에틸케톤, 메탄올, 벤질알코올, 톨루엔, 테트라하이드로퓨란, 클로로벤젠 등의 유기 용매를 이용해 균일하게 혼합하며 이때의 점도가 100~2,000CPS, 바람직하게는 200~800CPS 이고, 내열성 필름 위에 건조 후의 두께가 25㎛가 되도록 도포하고 50~170℃에서 1~10분 동안 경화한 후에 이형지 혹은 이형 처리된 필름을 붙이는 과정(라미네이션)을 거쳐 커버레이 필름을 얻는다.Adhesive composition consisting of the above composition is uniformly mixed using an organic solvent such as methyl ethyl ketone, methanol, benzyl alcohol, toluene, tetrahydrofuran, chlorobenzene, the viscosity is 100 ~ 2,000CPS, preferably 200 ~ 800CPS After coating on the heat-resistant film so that the thickness after drying is 25㎛ and cured for 1 to 10 minutes at 50 ~ 170 ℃ through a process of laminating a release paper or a release-treated film (lamination) to obtain a coverlay film.
이하, 실시예 및 비교예를 통해 본 발명을 좀더 구체화하여 설명한다. 그러나 이들에 의해 본 발명이 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples. However, the present invention is not limited by these.
(1) NBR(1) NBR
A: 상품명: PNR 1H, 수평균분자량 : 80,000, 아크릴로니트릴 27 중량%, 카르복실기 4.1 중량%, JSR사A: Product name: PNR 1H, number average molecular weight: 80,000, acrylonitrile 27 wt%, carboxyl group 4.1 wt%, JSR
(2) 에폭시 수지(2) epoxy resin
A: 상품명: YD-011, 에폭시 당량 : 475, 타입: 고상, 국도화학사A: Product name: YD-011, Epoxy equivalent: 475, Type: Solid phase, Kukdo Chemical Co., Ltd.
B: 상품명: EOCN-103, 에폭시 당량 : 209, 타입: 고상, 일본화약사 B: Product name: EOCN-103, Epoxy equivalent: 209, Type: Solid phase, Nippon Chemical Industries
C: 상품명: YD-128M, 에폭시 당량 : 184, 타입: 액상, 국도화학사C: Product name: YD-128M, Epoxy equivalent: 184, Type: Liquid phase, Kukdo Chemical Co., Ltd.
(3) 경화제(3) curing agent
A: DDS(디아미노디페닐설폰)A: DDS (diaminodiphenylsulfone)
B: 상품명: HF-3M, OH 당량: 107, 메이화사B: Product name: HF-3M, OH equivalents: 107
(4) 경화 촉진제(4) curing accelerator
A: 2MI(메틸이미다졸)A: 2MI (methylimidazole)
(5) 비할로겐 난연제(5) non-halogen flame retardant
A: 상품명: OP-935, 인 함유량: 23중량%, 포스핀산염 화합물, 클라리안트사A: Brand name: OP-935, Phosphorus content: 23% by weight, phosphinate compound, Clariant
(6) 무기 입자(6) inorganic particles
A: 수산화 알루미늄 (평균 입자 지름: 1㎛)A: aluminum hydroxide (average particle diameter: 1 mu m)
<실시예 1>≪ Example 1 >
하기 표 1과 같이 각각의 성분들과 메틸에틸케톤 용제를 고형분 30%로 혼합 한 후 호모지나이져(homogenizer)를 이용해 고루 혼합, 분산시킨다. 두께가 12.5㎛인 폴리이미드 필름 위에 건조 후의 두께가 25㎛이 되도록 도포하고, 50℃ Oven에서 10분, 160℃의 Oven에서 3분 정도 건조, 열 경화한 후, 이형지를 라미네이트(laminate)하여, 커버레이 필름을 제조하였다.As shown in Table 1, after mixing the respective components and the methyl ethyl ketone solvent in a solid content of 30%, using a homogenizer (homogenizer) is uniformly mixed and dispersed. After coating on a polyimide film having a thickness of 12.5 μm so as to have a thickness of 25 μm, drying for 10 minutes at 50 ° C. oven and 3 minutes at 160 ° C. oven, thermal curing, and then laminating a release paper, A coverlay film was prepared.
<실시예 2 내지 5><Examples 2 to 5>
하기 표 1의 실시예 2 내지 5와 같이 각각 접착제 성분을 혼합한 것 이외에는 실시예 1과 같은 방법으로 커버레이 필름을 제조하였다.A coverlay film was prepared in the same manner as in Example 1, except that the adhesive components were mixed as in Examples 2 to 5 of Table 1, respectively.
[표 1] 실시예 조성표Table 1 Example Composition Table
<비교예 1 내지 9><Comparative Examples 1 to 9>
하기 표 2의 비교예 1 내지 9과 같이 각각 접착제 성분을 혼합한 것 이외에는 실시예 1과 같은 방법으로 커버레이 필름을 제조하였다.A coverlay film was manufactured in the same manner as in Example 1, except that the adhesive components were respectively mixed as in Comparative Examples 1 to 9 of Table 2 below.
[표 2] 비교예 조성표Table 2 Comparative Example Composition Table
수지Epoxy
촉진제Hardening
accelerant
상기와 같은 조성, 방법으로 얻은 커버레이 필름의 특성을 아래의 방법과 같이 평가하여 그 결과를 아래의 표 3, 4에 나타내었다.The properties of the coverlay film obtained by the composition and method as described above were evaluated in the following manner, and the results are shown in Tables 3 and 4 below.
[특성 평가 방법][Characteristic Evaluation Method]
1. 접착력1. Adhesion
실시예 및 비교예와 같이 제조된 각각의 커버레이 필름을 160℃ / 40kgf / 40min의 조건으로 핫 프레스(hot press)를 이용해 두께 35㎛ 전해 동박에 부착 이후 폭 1cm, 길이 10cm로 자른 후, 폴리이미드 필름을 고정시키고, 동박을 90도 각도의 방향으로 50mm/min의 속도로 당기며 그 때의 힘을 측정하여 그 평균값을 접착력으로 나타낸다(JIS C6481).Each coverlay film prepared as in Example and Comparative Example was cut to 1 cm in width and 10 cm in length after attachment to a 35 μm thick electrolytic copper foil using a hot press under conditions of 160 ° C./40 kg f / 40 min. The polyimide film is fixed, the copper foil is pulled at a speed of 50 mm / min in the direction of an angle of 90 degrees, the force at that time is measured, and the average value is expressed as the adhesive force (JIS C6481).
2. 납땜 내열성2. soldering heat resistance
접착력을 측정하는 방법과 동일한 방법으로 전해 동박과 커버레이 필름을 부착한 후, 이를 5cm X 5cm로 자른 후 이를 설정된 온도의 납땜조에 10초간 띄운 후 꺼내어 박리, 변색 등의 외관의 변화를 살펴 변화가 발생하지 않는 최고의 온도를 측정하였다. 측정은 260 ~ 340℃까지 10℃씩 증가 시키며 진행하였다.After attaching the electrolytic copper foil and coverlay film in the same way as measuring the adhesive force, cut it into 5cm X 5cm, float it for 10 seconds in the solder bath of the set temperature, take it out and look for changes in appearance such as peeling and discoloration. The highest temperature not occurring was measured. Measurement was carried out in 10 ℃ increments up to 260 ~ 340 ℃.
3. 난연성3. Flame retardant
각각의 제조된 커버레이 필름을 실시예 1의 방법으로 제조된 커버레이 필름과 160℃ / 40kgf / 40min의 조건으로 핫 프레스(hot press)를 이용해 접착제 면이 서로 붙게 하여 샘플을 제조하고 UL94 V-0의 규격으로 난연성을 평가하여 그 결과가 합격일 경우 “○”으로 표시 하였고, 불합격의 경우에는 “X”로 표시하였다.Each prepared coverlay film was prepared using a coverlay film prepared by the method of Example 1 and adhesive surfaces were adhered to each other using a hot press under a condition of 160 ° C / 40kg f / 40min. The flame retardancy was evaluated by the standard of -0, and when the result was passed, it was marked as "○", and in case of rejection, it was marked as "X".
4. 흐름성4. Flowability
가요성 동박 적층판(동박 두께 35㎛)을 0.5mm 패턴의 폭으로 도 2와 같이 회로를 형성한 후 이 위에 각각의 커버레이 필름을 160℃ / 40kgf / 40min의 조건으로 핫프레스(hot press)를 이용해 접착한 후 회로 패턴 사이를 커버레이 필름의 접착제가 100% 충진시켰는지를 현미경을 통해 관찰하여 100% 충전 시 “○”로 표시 하였고, 미 충진 부분이 있을 시에는 “X”로 표시하였다.The flexible copper foil laminate (copper foil thickness 35㎛) was formed in a circuit with a width of 0.5mm pattern as shown in Fig. 2, and then each coverlay film was hot pressed under the conditions of 160 ° C / 40kg f / 40min. After bonding with the circuit pattern, the cover pattern of the adhesive film of the coverlay film was 100% filled by observing through a microscope and marked with "○" when 100% filled, "X" when there is an unfilled part.
5. 가공성5. Processability
가요성 동박 적층판(동박 두께 35㎛)을 0.5mm 패턴의 폭으로 도 2와 같이 회로를 형성한 후 이 위에 10cm X 10cm 크기로 자른 각각의 커버레이 필름을 접착제가 패턴 쪽으로 향하게 올려 놓고 손으로 움직여 커버레이 필름이 주름이 생기지 않고 잘 움직이면 “○” 주름이 생기거나 움직이지 않으면 “X”로 표시 하였다.The flexible copper foil laminate (copper foil thickness 35㎛) was formed in a circuit with a width of 0.5mm pattern as shown in Fig. 2, and then each coverlay film cut into a size of 10cm x 10cm was placed on the patterned side with the adhesive facing the pattern and moved by hand. If the coverlay film does not wrinkle and move well, “○” wrinkles or if it does not move, it is marked with “X”.
[표 3] 실시예 결과Table 3 Example Results
[표 4] 비교예 결과Table 4 Comparative Example
예 1compare
Example 1
예 2compare
Example 2
예 3compare
Example 3
예 4compare
Example 4
예 5compare
Example 5
예 6compare
Example 6
예 7compare
Example 7
예 8compare
Example 8
예 9compare
Example 9
내열성(℃)soldering
Heat resistance (℃)
(V-0)Flame retardant
(V-0)
실용상의 적합한 커버레이 필름의 특성으로는 UL 94 V-0를 무조건 만족해야 하며 접착력은 할로겐 원소를 포함하는 일반 커버레이에 비해 완화된 조건으로 6 N/cm 이상이어야 하며, 가공성 특성의 경우에는 실제 업체에서 작업 시 동박 적층판과 커버레이의 가로 세로를 정확히 맞추기 위해 실제로 행하여지는 작업이므로 모두 합격(○) 수준이어야 한다. 또한 흐름성 특성의 경우 커버레이의 접착제가 회로 패턴의 미충전 시 패턴의 단선, 기포의 의한 들뜸 문제 등을 야기하기 때문에 반드시 100% 충전된(합격) 상태이어야 한다.For practical coverlay film characteristics, UL 94 V-0 must be satisfied unconditionally, and the adhesive force should be 6 N / cm or more under milder conditions than general coverlays containing halogen elements. When working in a company, the work is actually done to accurately match the width and length of the copper clad laminate and the coverlay. In addition, in case of the flow characteristic, the coverlay adhesive must be 100% filled (passed) because it causes a disconnection of the pattern and a problem of lifting due to bubbles when the circuit pattern is not filled.
상기 표 3의 본 발명에 의한 실시예 결과를 보면 모두UL 94 V-0를 만족하고, 접착력은 6 N/cm 이상이며, 가공성 특성의 경우도 모두 합격 수준이고, 또한 흐름성 특성의 경우도 100% 충전된 상태이므로 회로 패턴의 미충전 시 패턴의 단선, 기포의 의한 들뜸 문제 등을 야기하지 않게 되지만, 비교예들에서는 상기 조건을 모두 만족하지는 못하는 것을 알 수 있다.According to the results of the present invention according to the present invention of Table 3, all satisfy the UL 94 V-0, the adhesive force is 6 N / cm or more, all of the workability characteristics pass level, and also flowability characteristics 100 Since it is in the state of being charged in%, the circuit pattern does not cause disconnection of the pattern, the problem of lifting due to bubbles, etc., but in the comparative examples, all of the above conditions are not satisfied.
도 1은 종래의 커버레이 필름의 단면도.1 is a cross-sectional view of a conventional coverlay film.
도 2는 패턴이 형성된 가요성 동박 적층판의 모식도.It is a schematic diagram of the flexible copper foil laminated board with a pattern formed.
<도면의 주요부분에 대한 부호의 간단한 설명>BRIEF DESCRIPTION OF THE DRAWINGS FIG.
10: 폴리이미드 필름 20: 접착제10: polyimide film 20: adhesive
30: 이형지 40 : 구리(동) 패턴30: release paper 40: copper (copper) pattern
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---|---|---|---|---|
JP2000219854A (en) | 1999-02-01 | 2000-08-08 | Toray Ind Inc | Cover-lay film and its production |
JP2002053833A (en) | 2000-08-07 | 2002-02-19 | Toray Ind Inc | Adhesive composition for semiconductor device, coverlay film and adhesive sheet using the same, and flexible printed circuit board |
JP2002188065A (en) | 2000-08-07 | 2002-07-05 | Toray Ind Inc | Adhesive composition for semiconductor device and adhesive sheet and cover lay film for semiconductor devices |
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KR20100092608A (en) | 2010-08-23 |
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