KR101048295B1 - 기판 처리 장치 - Google Patents
기판 처리 장치 Download PDFInfo
- Publication number
- KR101048295B1 KR101048295B1 KR1020090100976A KR20090100976A KR101048295B1 KR 101048295 B1 KR101048295 B1 KR 101048295B1 KR 1020090100976 A KR1020090100976 A KR 1020090100976A KR 20090100976 A KR20090100976 A KR 20090100976A KR 101048295 B1 KR101048295 B1 KR 101048295B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- rotating shaft
- temperature
- temperature measuring
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- 반응 공간을 갖는 챔버;상기 반응 공간에 위치하여 기판을 안치하는 기판 안치부;상기 기판 안치부를 지지하고, 회전시키는 회전축부;상기 회전축부 내측에 위치하여 상기 기판의 온도를 측정하는 온도 측정 수단; 및상기 온도 측정 수단이 위치한 상기 회전축부의 표면 영역을 캐핑하는 보온 캡을 포함하는 기판 처리 장치.
- 청구항 1에 있어서,상기 회전축부는, 상기 기판 안치부의 하부 중심 영역에 인접 배치된 회전축과, 상기 회전축의 상측에서 상기 기판 안치부의 가장자리 영역으로 연장되어 상기 기판 안치부를 지지하는 다수의 지지축을 포함하는 기판 처리 장치.
- 청구항 2에 있어서,상기 회전축은 내부가 비어 있는 관 형태로 제작되고, 상기 회전축의 상측 단이 상기 기판 안치부에 인접 배치되며,상기 온도 측정 수단은, 온도를 측정하는 온도 측정 센서를 포함하며,상기 회전축의 상측 단 영역의 내측에 상기 온도 측정 센서가 배치되고,상기 보온 캡은 상기 회전축의 상측 단 영역을 감싸는 기판 처리 장치.
- 청구항 2에 있어서,상기 보온 캡은 상기 회전축의 상측 끝단에 접속된 상부벽과, 상기 회전축의 상측 단 영역의 표면 영역에 접속된 측벽을 포함하고,상기 상부벽이 상기 기판 안치부에 밀착된 기판 처리 장치.
- 청구항 4에 있어서,상기 상부벽에는 상기 기판 안치부를 노출시키는 개구가 마련되고,상기 측벽은 상기 회전축의 외측 표면에 접속된 외측벽과, 상기 회전축의 내측 표면에 접속된 내측벽을 포함하는 기판 처리 장치.
- 청구항 4에 있어서,상기 회전축과 상기 보온 캡의 접속면에는 각기 대응되는 나사산 패턴이 형성된 기판 처리 장치.
- 청구항 2에 있어서,상기 회전축은 쿼츠 재질로 제작되고, 상기 보온 캡은 SiC 및 세라믹 중 적어도 어느 하나의 재질로 제작된 기판 처리 장치.
- 청구항 1에 있어서,상기 회전축부에 회전력을 인가하는 구동 수단; 및상기 챔버 하부에 위치하여 상기 반응 공간을 가열하는 가열 수단을 포함하는 기판 처리 장치.
- 기판을 안치하는 기판 안치부;상기 기판 안치부의 하부 중심 영역에 인접 배치된 회전축과, 상기 회전축의 상측에서 상기 기판 안치부의 가장자리 영역으로 연장되어 상기 기판 안치부를 지지하는 다수의 지지축을 포함하는 회전축부;상기 회전축 내에 위치하여 상기 기판의 온도를 측정하는 온도 측정 수단; 및상기 온도 측정 수단이 위치한 상기 회전축의 표면 영역을 캐핑하는 보온 캡을 포함하는 기판 지지 장치.
- 청구항 9에 있어서,상기 보온 캡은 상기 회전축의 상측 끝단에 접속된 상부벽과,상기 회전축의 상측 단 영역의 표면 영역에 접속된 측벽을 포함하고,상기 상부벽에는 상기 기판 안치부를 노출시키는 개구가 마련되고,상기 측벽은 상기 회전축의 외측 표면에 접속된 외측벽과, 상기 회전축의 내측 표면에 접속된 내측벽을 포함하는 기판 지지 장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090100976A KR101048295B1 (ko) | 2009-10-23 | 2009-10-23 | 기판 처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090100976A KR101048295B1 (ko) | 2009-10-23 | 2009-10-23 | 기판 처리 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20110044354A KR20110044354A (ko) | 2011-04-29 |
KR101048295B1 true KR101048295B1 (ko) | 2011-07-15 |
Family
ID=44049092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090100976A Active KR101048295B1 (ko) | 2009-10-23 | 2009-10-23 | 기판 처리 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101048295B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170138003A (ko) * | 2016-06-03 | 2017-12-14 | 삼성전자주식회사 | 웨이퍼 처리 장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015047639A1 (en) * | 2013-09-30 | 2015-04-02 | Applied Materials, Inc. | Support ring with encapsulated light barrier |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5348395A (en) | 1992-12-11 | 1994-09-20 | General Electric Company | Aspirating pyrometer with platinum thermocouple and radiation shields |
US6164819A (en) | 1995-08-31 | 2000-12-26 | Matsushita Electric Industrial Co., Ltd. | Temperature sensor and a method of manufacturing the same |
KR20020087486A (ko) * | 2000-04-06 | 2002-11-22 | 에이에스엠 아메리카, 인코포레이티드 | 유리재질용 장벽코팅 |
JP2006153706A (ja) | 2004-11-30 | 2006-06-15 | Taiyo Nippon Sanso Corp | 測温体および気相成長装置 |
-
2009
- 2009-10-23 KR KR1020090100976A patent/KR101048295B1/ko active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5348395A (en) | 1992-12-11 | 1994-09-20 | General Electric Company | Aspirating pyrometer with platinum thermocouple and radiation shields |
US6164819A (en) | 1995-08-31 | 2000-12-26 | Matsushita Electric Industrial Co., Ltd. | Temperature sensor and a method of manufacturing the same |
KR20020087486A (ko) * | 2000-04-06 | 2002-11-22 | 에이에스엠 아메리카, 인코포레이티드 | 유리재질용 장벽코팅 |
JP2006153706A (ja) | 2004-11-30 | 2006-06-15 | Taiyo Nippon Sanso Corp | 測温体および気相成長装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170138003A (ko) * | 2016-06-03 | 2017-12-14 | 삼성전자주식회사 | 웨이퍼 처리 장치 |
KR102612193B1 (ko) | 2016-06-03 | 2023-12-12 | 삼성전자주식회사 | 웨이퍼 처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20110044354A (ko) | 2011-04-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11842907B2 (en) | Spot heating by moving a beam with horizontal rotary motion | |
KR100194267B1 (ko) | 반도체 웨이퍼 또는 기판 가열장치 및 방법 | |
US20190206706A1 (en) | Temperature measurement in multi-zone heater | |
JP6258334B2 (ja) | 改善されたエッジリングリップ | |
TWI805498B (zh) | 用於半導體製程腔室的表面塗層的襯套組件 | |
JP4912463B2 (ja) | 炉のためのマルチゾーンヒータ | |
KR20080098386A (ko) | 플라즈마 처리 장치 및 그것에 이용하는 기판 가열 기구 | |
TWI510767B (zh) | 一種熱偶固定裝置及溫度測量裝置 | |
JP6000676B2 (ja) | 成膜装置および成膜方法 | |
WO2011075563A2 (en) | Substrate processing apparatus having a radiant cavity | |
JP2019511841A (ja) | サセプタ支持体 | |
KR100402299B1 (ko) | 기판웨이퍼처리장치및이장치의작동방법 | |
CN105556646B (zh) | 具有封装的光阻隔件的支撑环 | |
KR20100028990A (ko) | 기판 처리 장치 | |
KR101048295B1 (ko) | 기판 처리 장치 | |
TWI802617B (zh) | 基板處理設備以及處理基板及製造經處理工件的方法 | |
TWI497593B (zh) | 膜形成設備 | |
JP2013098340A (ja) | 成膜装置および成膜方法 | |
KR20040022278A (ko) | 반도체를 제조하기 위한 장치 | |
KR101136733B1 (ko) | 기판 처리 장치 | |
KR20130128859A (ko) | 히터블록 및 기판처리장치 | |
KR101125507B1 (ko) | 기판 처리 장치 | |
KR101149333B1 (ko) | 기판 처리 장치 | |
KR101803513B1 (ko) | 기판 처리 장치 | |
JP2008218698A (ja) | 熱処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20091023 |
|
PA0201 | Request for examination | ||
PG1501 | Laying open of application | ||
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20110628 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20110705 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20110705 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
FPAY | Annual fee payment |
Payment date: 20140603 Year of fee payment: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20140603 Start annual number: 4 End annual number: 4 |
|
FPAY | Annual fee payment |
Payment date: 20150603 Year of fee payment: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20150603 Start annual number: 5 End annual number: 5 |
|
FPAY | Annual fee payment |
Payment date: 20160701 Year of fee payment: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20160701 Start annual number: 6 End annual number: 6 |
|
FPAY | Annual fee payment |
Payment date: 20170925 Year of fee payment: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20170925 Start annual number: 7 End annual number: 7 |
|
FPAY | Annual fee payment |
Payment date: 20180702 Year of fee payment: 8 |
|
PR1001 | Payment of annual fee |
Payment date: 20180702 Start annual number: 8 End annual number: 8 |
|
FPAY | Annual fee payment |
Payment date: 20190701 Year of fee payment: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20190701 Start annual number: 9 End annual number: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20210701 Start annual number: 11 End annual number: 11 |
|
PR1001 | Payment of annual fee |
Payment date: 20220621 Start annual number: 12 End annual number: 12 |
|
PR1001 | Payment of annual fee |
Payment date: 20230619 Start annual number: 13 End annual number: 13 |
|
PR1001 | Payment of annual fee |
Payment date: 20240619 Start annual number: 14 End annual number: 14 |
|
PR1001 | Payment of annual fee |
Payment date: 20250619 Start annual number: 15 End annual number: 15 |