KR100987596B1 - Unit cell of nonvolatile memory device and nonvolatile memory device having same - Google Patents

Abstract

The present invention provides a unit cell of a nonvolatile memory device capable of improving operation reliability by improving a data sensing margin during a read operation, and a nonvolatile memory device having the same. A non-fusing memory connected between the antifuse connected to the output terminal, the first switching means transferring a write voltage to the output terminal, and the second switching means connected to the output terminal transferring a read voltage to the output terminal. It provides a unit cell of the device.

Nonvolatile Memory Devices, Unit Cells

Description

Unit cell of a nonvolatile memory device and a nonvolatile memory device having the same TECHNICAL FIELD

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to semiconductor design techniques, and more particularly to unit cells of nonvolatile memory devices, more specifically, one time programmable unit cells (OTPs), and nonvolatile devices having the same. It relates to a memory device.

OTP is a device that can replace memory sticks, universal serial bus drivers, and hard disks because of its non-volatile nature, which does not erase data stored in cells even when the power is cut off. It is widening.

1 is an equivalent circuit diagram illustrating an OTP unit cell according to the prior art.

Referring to FIG. 1, an OTP unit cell according to the related art includes an antifuse ANT_FS connected between a first input terminal A and a node B, and a node B and an output terminal E (data during a read operation). Is composed of transistors NM1 and NM2 having n-channels connected in series between the output terminals).

Hereinafter, the write and read operations of the OTP unit cell according to the prior art will be described.

Mode / stage (node) A C D Write operation VPP L L Read action VDD H H

Write operation

First, node B is grounded. A high voltage VPP is applied to the first input terminal A, and a logic level L corresponding to the ground voltage is applied to the second and third input terminals C and D, respectively. As a result, a high electric field is formed between the gate and the substrate of the anti-fuse ANT_FS formed of the MOS transistor to breakdown the gate insulating film formed between the gate and the substrate. Thus, the gate and the substrate of the antifuse ANT_FS are electrically shorted.

Read action

After the write operation is completed, a power supply voltage VDD is applied to the first input terminal A, and a logic level H corresponding to the power supply voltage VDD is applied to the second and third input terminals C and D, respectively. do. As a result, a current path is formed to the first input terminal A, the antifuse ANT_FS, the first and second transistors NM1 and NM2, and the output terminal E. FIG. Therefore, the power supply voltage VDD applied to the first input terminal A is transmitted to the output terminal E and detected.

However, the following problem occurs in the OTP unit cell according to the prior art shown in FIG.

As described above, the current path (data path) from the first input terminal A to the output terminal E in the read operation necessarily includes the first and second transistors NM1 and NM2 connected in series. Accordingly, the final data detected through the output terminal E is voltage-dropped by the sum of the threshold voltages of the first and second transistors NM1 and NM2 (VDD-2Vt, where 'Vt' is NM1 and NM2). Threshold voltage). Therefore, a sensing margin of data sensed through the output terminal E is reduced by a voltage drop, thereby causing a malfunction. This malfunction acts as a deterioration factor in the read operation reliability of the OTP unit cell.

Accordingly, the present invention is proposed to solve the problem according to the prior art, a unit cell of a nonvolatile memory device that can improve the operation reliability by improving the data sensing margin during a read operation and a nonvolatile memory device having the same The purpose is to provide.

According to an aspect of the present invention, there is provided an antifuse connected between an output terminal and a ground voltage terminal, first switching means connected with the output terminal to transfer a write voltage to the output terminal, and the output terminal; A unit cell of a nonvolatile memory device including a second switching means connected to transfer a read voltage to the output terminal.

In addition, the present invention according to another aspect for achieving the above object, the anti-fuse connected between the node and the ground voltage terminal, the first switching means connected to the node and transfers the write voltage to the node, and A unit cell of a nonvolatile memory device includes a second switching means connected between a node and an output terminal, and a third switching means connected to the output terminal and transmitting a read voltage to the output terminal.

According to still another aspect of the present invention, there is provided a cell array in which a plurality of unit cells are arranged in a matrix form, a plurality of data lines commonly connected to output terminals of the plurality of unit cells, A nonvolatile memory device including a plurality of sensing units including an inverter for inverting and outputting voltages of the plurality of data lines, respectively.

According to still another aspect of the present invention, there is provided a cell array in which a plurality of unit cells of the nonvolatile memory device are arranged in a matrix form, and selection control of first switching means of the unit cells. A plurality of write drive lines, a plurality of first read drive lines for selectively controlling the second switching means of the unit cell, a plurality of data lines connected to an output terminal of the unit cell, and the read voltage as the data lines It provides a non-volatile memory device comprising a plurality of third switching means for transmitting a second, a second read drive line for the common selective control of the third switching means, and a plurality of sensing unit for sensing the voltage of the data line. .

According to still another aspect of the present invention, there is provided a cell array in which a plurality of unit cells of the nonvolatile memory device are arranged in a matrix form, and selection control of first switching means of the unit cells. A plurality of write drive lines, a plurality of first read drive lines for selectively controlling the second switching means of the unit cell, a plurality of data lines connected to an output terminal of the unit cell, and a third switching of the unit cell A nonvolatile memory device includes a second read driving line for commonly controlling and controlling a means, and a plurality of sensing units configured to sense a voltage of the data line.

According to the present invention including the above-described configuration, the following effects can be obtained.

First, according to the present invention, the first and second switching elements connected to the anti-fuse are connected in parallel to transfer the write voltage and the read voltage to the anti-fuse through different paths, so that the loss of the read voltage during the read operation can be reduced. Compared with this, it is possible to improve operation reliability by improving the detection margin of data sensed through the output terminal of the unit cell.

Second, according to the present invention, the circuit can be simplified by improving the area and power consumption by configuring the sensing unit for sensing the data output from the unit cell as an inverter.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the technical idea of the present invention. In addition, the term 'transistor' described throughout the specification includes all elements that operate as switching elements by a control signal input to a gate. For example, a junction field effect transistor (JFET) and a metal-oxide-semiconductor type field effect transistor (MOSFET). In addition, the parts denoted by the same reference numerals (or reference numerals) throughout the specification represent the same elements.

Example 1

FIG. 2 is an equivalent circuit diagram illustrating a unit cell of a nonvolatile memory device according to Embodiment 1 of the present invention.

Referring to FIG. 2, a unit cell of a nonvolatile memory device according to Embodiment 1 of the present invention may include an antifuse connected between an output terminal C (a terminal for outputting data during a read operation) and a ground voltage terminal D. ANT_FS, the first switching means SW1 connected between the first input terminal A and the output terminal C, and the second switching means SW2 connected between the second input terminal B and the output terminal C. FIG. It includes.

As shown in FIG. 3, the first switching means SW1 may be formed of a transistor which is an active element to transfer a write voltage input to the first input terminal A to the output terminal C. Referring to FIG. Here, the transistor may be a low voltage transistor or a high voltage transistor. In addition, the transistor may be a transistor having a p-channel or n-channel. Preferably, the first switching means SW1 is composed of a transistor having a p-channel with superior driving capability compared to the n-channel. At this time, the drain of the transistor is connected to the first input terminal (A), the source is connected to the output terminal (C), the gate is connected to the third input terminal (E).

As shown in FIG. 4, the second switching means SW2 is connected in parallel with the first switching means SW1 based on the output terminal C. As shown in FIG. In addition, the second switching means SW2 may be formed of a transistor which is an active element to transfer the read voltage input to the second input terminal B to the output terminal C. Here, the transistor may have a channel of the same type or a different type from the first switching means SW1. In addition, the drain of the transistor is connected to the second input terminal B, the source is connected to the output terminal C, and the gate is connected to the fourth input terminal F.

As illustrated in FIG. 5, the antifuse ANT_FS may be formed of a transistor that is an active element or a capacitor that is a passive element. Here, the transistor may have a p-channel or n-channel. In addition, the gate of the transistor is connected to the output terminal C, and the drain and the source are connected to the ground voltage terminal D in a state of being connected to each other (or integrated). The first end (upper electrode) of the capacitor is connected to the output terminal C, and the second end (lower electrode) is connected to the ground voltage terminal D.

Hereinafter, the write and read operations of the unit cell of the nonvolatile memory device according to the first embodiment of the present invention will be described. Here, as an example, the first switching means SW1 is formed of a transistor having a p-channel, the second switching means SW2 is formed of a transistor having an n-channel, and the antifuse ANT_FS has an n-channel. It consists of a transistor.

Mode / stage A B C D E F Write operation VPP - - VSS L L Read action - VDD - VSS H H

It demonstrates with reference to Table 2 and FIG. 6A is an equivalent circuit diagram showing a current path in a write operation, and (b) is an equivalent circuit diagram showing a current path in a read operation.

Write operation

First, the ground voltage terminal D is grounded. A high voltage VPP is applied to the first input terminal A, and a logic level L (hereinafter referred to as a low) corresponding to the ground voltage is applied to the third and fourth input terminals E and F, respectively. . Under this condition, only the first switching means SW1 made of a transistor having a p-channel is turned on so that the first input terminal A and the output terminal C are electrically connected, and the second input terminal B ) And the output terminal (C) are electrically disconnected. Accordingly, the high voltage VPP is transferred to the antifuse ANT_FS through the first switching means SW1 to destroy the gate insulating layer formed between the gate of the antifuse ANT_FS and the substrate.

Read action

After the write operation is completed, the power supply voltage VDD corresponding to the read voltage is applied to the second input terminal B, and the logic level corresponding to the power supply voltage VDD to the third and fourth input terminals E and F, respectively. (H) (hereinafter referred to as high) is applied. Under these conditions, only the second switching means SW2 made of transistors having n-channels is turned on so that the second input terminal B and the output terminal C are electrically connected, and the first input terminal A and the output terminal C are ) Is electrically disconnected. Accordingly, a current path leading to the second input terminal B, the second switching means SW2 and the antifuse ANT_FS is formed. At this time, since the gate insulating film of the anti-fuse ANT_FS is in a destroyed state, the output terminal C is electrically connected to the ground voltage terminal D through the anti-fuse ANT_FS, and the output terminal C corresponds to the ground voltage. Data is output and sensed through the detector.

Example 2

7 is an equivalent circuit diagram illustrating a unit cell of a nonvolatile memory device according to Embodiment 2 of the present invention.

Referring to FIG. 7, the unit cell of the nonvolatile memory device according to the second exemplary embodiment of the present invention has the same basic configuration as that of the first exemplary embodiment of the first and second switching means SW1 and SW2 and the antifuse ANT_FS. Include. In addition, the unit cell according to the second embodiment further includes a third switching means SW3 connected in series with the second switching means SW2. Accordingly, the first switching means SW1 is connected in parallel with the second and third switching means SW2 and SW3 connected in series with each other.

The first switching means SW1 may be formed of a transistor which is an active element to transfer a write voltage to an input terminal of the antifuse ANT_FS connected to the node H. Here, the transistor may have a p-channel or n-channel. At this time, the drain of the transistor is connected to the first input terminal (A), the source is connected to the node (H), the gate is connected to the third input terminal (E).

The second switching means SW2 is connected between the output terminal C and the node H. Like the first switching means SW1, the second switching means SW2 may be formed of a transistor that is an active element. Here, the transistor may have a p-channel or n-channel. At this time, the drain of the transistor is connected to the output terminal (C), the source is connected to the node (H), the gate is connected to the fourth input terminal (F).

The third switching means SW3 may be formed of a transistor which is an active element like the second switching means SW2 to transfer the read voltage to the output terminal C. Here, the transistor may have a p-channel or n-channel. At this time, the drain of the transistor is connected to the second input terminal (B), the source is connected to the output terminal (C), the gate is connected to the fifth input terminal (G).

On the other hand, the first to third switching means (SW1, SW2, SW3) may have the same type of channel or may have different types of channels. Preferably, the first and third switching means SW1 and SW3 each have a p-channel, and the second switching means SW2 are formed to have an n-channel.

Hereinafter, the write and read operations of the unit cell of the nonvolatile memory device according to the second embodiment of the present invention will be described. Herein, for example, the first and third switching means SW1 and SW3 are formed of a transistor having a p-channel, the second switching means SW2 are formed of a transistor having an n-channel, and the antifuse ANT_FS is It consists of a transistor with n-channels.

Mode / stage (node) A B C D E F G Write operation VPP - - VSS L L H Read action - VDD VSS VSS H H L

It demonstrates with reference to Table 3 and FIG. 8A is an equivalent circuit diagram showing a current path in a write operation, and (b) is an equivalent circuit diagram showing a current path in a read operation.

Write operation

First, the ground voltage terminal D is grounded. The high voltage VPP is applied to the first input terminal A, and 'low' is applied to the third and fourth input terminals E and F, respectively. In addition, 'high' is applied to the fifth input terminal (G). Under this condition, only the first switching means SW1 is turned on so that the first input terminal A and the node H are electrically connected, and the second input terminal B and the node H are electrically disconnected. Accordingly, the high voltage VPP is transferred to the antifuse ANT_FS through the first switching means SW1 to destroy the gate insulating layer formed between the gate of the antifuse ANT_FS and the substrate. That is, the gate and the substrate are in an electrically shorted state.

Read action

After the write operation is completed, the power supply voltage VDD corresponding to the read voltage is applied to the second input terminal B, and 'high' is applied to the third and fourth input terminals E and F, respectively. In addition, 'low' is applied to the fifth input terminal G. Under these conditions, the second and third switching means SW2 and SW3 are turned on so that the second input terminal B and the node H are electrically connected, and the first input terminal A and the node H are electrically connected. Is blocked. Accordingly, a current path leading to the second input terminal B, the second and third switching means SW2 and SW3, and the antifuse ANT_FS is formed. At this time, since the gate insulating film of the anti-fuse ANT_FS is in a destroyed state, the output terminal C is electrically connected to the ground voltage terminal D through the second switching means SW2 and the anti-fuse ANT_FS, thereby outputting the output terminal C. ), The data corresponding to the ground voltage is output and sensed through the detector.

Example 3

9 is an equivalent circuit diagram illustrating a unit cell of a nonvolatile memory device according to Embodiment 3 of the present invention.

Referring to FIG. 9, the unit cell of the nonvolatile memory device according to the third exemplary embodiment of the present invention has the same configuration and operation characteristics as those of the second exemplary embodiment except for the sensing unit SA connected to the output terminal C. Configuration and operation characteristics for the above will be replaced by the above description.

The sensing unit SA includes an inverter for inverting and outputting the voltage output to the output terminal C during a read operation. Here, the inverter is composed of a CMOS transistor in which a transistor having a p-channel and a transistor having an n-channel are complementarily coupled. More specifically, the source of the transistor having the p-channel and the drain of the transistor having the n-channel are interconnected. In addition, the gates are interconnected. Further, the drain having the p-channel is connected to the power supply voltage VDD, and the source of the transistor having the n-channel is connected to the ground voltage VSS.

Hereinafter, a memory cell array of a nonvolatile memory device including unit cells according to the first to third embodiments of the present invention having the above-described configuration will be described.

Example 4

10 is an equivalent circuit diagram illustrating a nonvolatile memory device according to Embodiment 4 of the present invention.

Referring to FIG. 10, the memory cell array of the nonvolatile memory device according to the fourth exemplary embodiment includes a plurality of unit cells UC arranged in a matrix type. At this time, the unit cell UC includes two switching means SW1 and SW2 and one anti-fuse ANT_FS connected in series with the unit cells according to the first embodiment. In one example, in the unit cell UC, the first switching means SW1 is made of a transistor having a p-channel, and the second switching means SW2 is made of a transistor having an n-channel.

In addition, the memory cell array of the nonvolatile memory device according to the fourth exemplary embodiment may include a plurality of write driving lines WR_CT0 to WR_CTn for selecting the first switching means SW1 of the unit cell UC (where n Is a natural number) and a plurality of read driving lines RD_CT0 to RD_CTm (where m is a natural number) for selecting the second switching means SW2 of the unit cell UC.

The write drive lines WR_CT0 to WR_CTn extend in the row direction and are connected to the first switching means SW1 of the unit cells UC arranged in the row direction, that is, the gate of the transistor having the p-channel. The read driving lines RD_CT0 to RD_CTm extend in the column direction so as to be orthogonal to the write drive lines WR_CT0 to WR_CTn, and each second switching means SW2 of the unit cells UC arranged in the column direction, that is, n It is connected to the gate of a transistor having a channel.

In addition, the memory cell array of the nonvolatile memory device according to the fourth exemplary embodiment of the present invention transfers a read voltage to each unit cell UC in a read operation, and senses data output from each unit cell UC in a read operation. Supply of data lines DL0 to DLn (where n is a natural number) to the negative SA0 to SAn (where n is a natural number) and a write voltage to transfer the write voltage to each unit cell (UC) during a write operation. It includes lines WRL0 to WRLm, where m is a natural number.

The data lines DL0 to DLn extend in the row direction and connect the output terminals of the unit cells UC arranged in the row direction and the input terminals of the sensing units SA0 to SAn. That is, the drain of the second switching means SW2, preferably the n-channel transistor, and the input terminal of the sensing units SA0 to SAn are connected. The data lines DL0 to DLn transfer the read voltage, ie, the power supply voltage VDD, transferred through the third switching means SW3 to the second switching means SW2 during the read operation, and the second switching means SW2. Delivers the data output from the detection unit (SA0 ~ SAn). The write voltage supply lines WRL0 to WRLn extend in the column direction and are connected to the first switching means SW1 of the unit cells UC arranged in the column direction, that is, the drain of the transistor having the p-channel. The write voltage supply lines WRL0 to WRLn transfer the write voltage, that is, the high voltage VPP, to the first switching means SW1 of all the unit cells UC arranged in the column direction during the write operation.

In addition, the memory cell array of the nonvolatile memory device according to the fourth exemplary embodiment of the present invention is disposed in each of the data lines DL0 to DLn to detect data output through the corresponding data lines DL0 to DLn. The part SA0-SAn is included. The sensing units SA0 to SAn may include an inverter or a differential amplifier (see FIG. 11). Preferably an inverter is used which is simple in circuit and advantageous in terms of area and power consumption.

In addition, the memory cell array of the nonvolatile memory device according to the fourth exemplary embodiment of the present invention transmits a read voltage, that is, a power supply voltage VDD to corresponding data lines DL0 to DLn in response to a read operation signal RD_EN during a read operation. And a third switching means SW3 for transmitting. In this case, the third switching means SW3 may be formed of a transistor having an n-channel or a p-channel. It is preferably made of a transistor having a p-channel relatively superior in driving capability compared to the n-channel.

Hereinafter, the write and read operations of the nonvolatile memory device according to Embodiment 4 of the present invention will be described. As an example, the write and read operations of the unit cell UC connected to both the write driving line WR_CT0 and the read driving line RD_CT0 will be described.

mode/
line
(signal) WR_CT0 WR_CT1
WR_CTn RD_CT0 RD_CT1-RD_CTn DL0 DL1-DLn RD_EN DA-OUT0 DA-OUT1 ~
DA-OUTn WRL0 ~
WRLn Write operation L H L L - - H L - VPP Read action H H H L - - L H - VPP

It demonstrates with reference to Table 4.

Write operation

First, one end of the antifuse ANT_FS is grounded. A write voltage, that is, a high voltage VPP is applied to the write voltage supply lines WRL0 to WRLn, respectively. In addition, 'low' is applied to the write driving line WL_CTO, and 'high' is applied to the remaining write driving lines WL_CT1 to WL_CTn. In addition, 'low' is applied to the read driving lines RD_CT0 to RD_CTm. In addition, the read operation signal RD_EN is applied in a 'high' state. Under this condition, only the first switching means SW1 is turned on so that the write voltage supply line WRL0 and the antifuse ANT_FS are electrically connected. Accordingly, the high voltage VPP applied through the write voltage supply line WRL0 is transferred to the antifuse ANT_FS through the first switching means SW1. Therefore, the gate insulating film formed between the gate of the antifuse ANT_FS and the substrate is destroyed by the high electric field.

Read action

After the write operation is completed, 'high' is applied to the write driving line WL_CTO. In addition, 'high' is applied to the read driving line RD_CT0 and 'low' is applied to the remaining read driving lines RD_CT1 to RD_CTm. In addition, the read operation signal RD_EN is applied in a 'low' state. Under these conditions, the second and third switching means SW2 and SW3 are turned on, and the read voltage, that is, the power supply voltage VDD is transferred to the corresponding data line DL0 through the third switching means SW3. Accordingly, a current path leading to the data line DL0, the second switching means SW2, and the antifuse ANT_FS is formed. At this time, since the gate insulating layer of the antifuse ANT_FS is in a destroyed state, the data line DL0 is electrically connected to the ground voltage terminal through the second switching means SW2 and the antifuse ANT_FS. Accordingly, the detector SA0 senses data corresponding to the ground voltage from the data line DL0.

Example 5

11 is an equivalent circuit diagram illustrating a nonvolatile memory device according to Embodiment 5 of the present invention.

Referring to FIG. 11, the memory cell array of the nonvolatile memory device according to the fifth embodiment of the present invention has the same configuration as that of the fourth embodiment. However, the sensing units SA0 to SAn are formed of differential amplifiers, not of inverters. In this case, the differential amplifier includes transistors PM1 and PM2 having p-channels and transistors NM1, NM2 and NM3 having n-channels. The differential amplifier is operated by a bias signal BIAS to compare and amplify the data of the corresponding unit cell output from the corresponding data line and the reference voltage VREF.

The rest of the components except for the sensing units SA0 to SAn are the same as those of the fourth embodiment, and thus detailed configuration and operation description thereof will be replaced with the contents described through the fourth embodiment.

Example 6

12 is an equivalent circuit diagram illustrating a nonvolatile memory device according to Embodiment 6 of the present invention.

Referring to FIG. 12, in the memory cell array of the nonvolatile memory device according to the sixth embodiment of the present invention, the unit cell UC includes the third switching means SW3 unlike the fourth embodiment. That is, in the fourth embodiment, the third switching means SW3 is connected to the ends of the corresponding data lines DL0 to DLn, that is, to the input terminals of the sensing units SA0 to SAn. In the sixth embodiment, the third switching means SW3 is configured inside the unit cell.

The rest of the components except for the unit cell UC are the same as those of the fourth embodiment, and thus detailed configuration and operation description thereof will be replaced with the contents described through the fourth embodiment.

Example 7

13 is an equivalent circuit diagram illustrating a nonvolatile memory device according to Embodiment 7 of the present invention.

Referring to FIG. 13, in the memory cell array of the nonvolatile memory device according to the seventh embodiment of the present invention, unlike the sixth embodiment, the unit cell UC is not only the third switching means SW3 but also the sensing units SA0 to SAn. It further includes. That is, in the sixth embodiment, the sensing units SA0 to SAn are disposed at the ends of the corresponding data lines DL0 to DLn, but in the seventh embodiment, the sensing units SA0 to SAn are configured inside the unit cell.

Accordingly, in the seventh embodiment, as in the sixth embodiment, the plurality of data lines DL0 to DLn for connecting the output terminals of the plurality of unit cells UC arranged in the row direction to the sensing units SA0 to SAn in common. This is not necessary. Therefore, data loss that can occur in the memory cell array structures according to the fifth and sixth embodiment including the data line, that is, data loss due to the resistance value of the data line, may be minimized to improve the data sensing margin.

The rest of the components except for the unit cell UC are the same as those of the fourth embodiment, and thus detailed configuration and operation description thereof will be replaced with the contents described through the fourth embodiment.

Example 8

14 is an equivalent circuit diagram showing a nonvolatile memory device according to Embodiment 8 of the present invention.

Referring to FIG. 14, in the memory cell array of the nonvolatile memory device according to the eighth embodiment of the present invention, the unit cell UC includes one switching means SW1 and one antifuse ANT_FS. In one example, in the unit cell UC, the first switching means SW1 is formed of a transistor having a p-channel, and the antifuse ANT_FS is formed of a transistor having an n-channel.

In addition, a plurality of second switching means (for each memory cell array of the nonvolatile memory device according to the eighth embodiment of the present invention) are disposed for each row to transfer a write voltage, that is, a high voltage VPP to the first switching means SW1 ( SW2). In this case, the second switching means SW2 may be formed of a transistor having an n-channel or a p-channel, and transmits the high voltage VPP to the first switching means SW1 in response to the write operation signals WR_EN0 to WR_ENn. do.

In addition, the memory cell array of the nonvolatile memory device according to the eighth embodiment of the present invention includes a plurality of read driving lines RD_CT0 to RD_CTm for selecting the first switching means SW1 of the unit cell UC (where m Is a natural number). The read driving lines RD_CT0 to RD_CTm are electrically connected to the first switching means SW1 of the unit cells UC arranged in the column direction, that is, extending in the column direction, that is, the gate of the transistor having the p-channel.

In addition, the memory cell array of the nonvolatile memory device according to the eighth embodiment of the present invention transmits a read voltage to an output terminal (connection part of the first and second switching) N of each unit cell UC during a read operation, It includes a plurality of data lines DL0 to DLn (where n is a natural number) for transferring data output from each unit cell UC to the sensing units SA0 to SAn (where n is a natural number).

The data lines DL0 to DLn extend in the row direction and connect the output terminals of the unit cells UC arranged in the row direction and the input terminals of the sensing units SA0 to SAn. That is, the drain of the transistor having the first switching means SW1, preferably the p-channel, and the input terminal of the sensing units SA0 to SAn are connected. The data lines DL0 to DLn transfer the read voltage, ie, the power supply voltage VDD, transmitted through the third switching means SW3 to the first switching means SW1 during the read operation, and the first switching means SW1. Delivers the data output from the detection unit (SA0 ~ SAn).

In addition, the memory cell arrays of the nonvolatile memory device according to the eighth embodiment of the present invention are arranged in each of the data lines DL0 to DLn to detect data output through the corresponding data lines. SAn). In this case, the sensing units SA0 to SAn include inverters having input terminals respectively connected to ends of the data lines DL0 to DLn.

In addition, the memory cell array of the nonvolatile memory device according to the eighth embodiment of the present invention transfers a read voltage, that is, a power supply voltage VDD to corresponding data lines DL0 to DLn in response to a read operation signal RD_EN. 3 switching means SW3. In this case, the third switching means SW3 may be formed of a transistor having an n-channel or a p-channel. It is preferably made of a transistor having a p-channel relatively superior in driving capability compared to the n-channel.

Hereinafter, the write and read operations of the nonvolatile memory device according to the eighth embodiment of the present invention will be described. As an example, the write and read operations of the unit cell UC selected by the write operation signal WR_EN0 and the read driving line RD_CT0 will be described.

mode/
Line (signal) WR_EN0 WR_EN1
WR_ENn RD_CT0 RD_CT1 ~
RD_CTn DL0 DL1-DLn RD_EN DA_OUT0 DA_OUT1 ~
DA-OUTn
Write operation L H L H - - H L - Read action H H L H - - L H -

It demonstrates with reference to Table 5.

Write operation

First, one end of the antifuse ANT_FS is grounded. The write operation signal WR_EN0 is applied as 'low' and the remaining write operation signals WR_EN1 to WR_ENn are applied as 'high'. In addition, 'low' is applied to the read driving line RD_CT0 and 'high' is applied to the remaining read driving lines RD_CT1 to RD_CTn. In addition, the read operation signal RD_EN is applied in a 'high' state. Accordingly, the high voltage VPP, which is a write voltage, is transferred to the antifuse ANT_FS through the first and second switching means SW1 and SW2. Therefore, the gate insulating film formed between the gate of the antifuse ANT_FS and the substrate is destroyed by the high electric field.

Read action

After the write operation is completed, the write operation signal WR_EN0 is applied as 'high'. In addition, 'low' is applied to the read driving line RD_CT0 and 'high' is applied to the remaining read driving lines RD_CT1 to RD_CTm. In addition, the read operation signal RD_EN is applied in a 'low' state. Under these conditions, the first and third switching means SW1 and SW3 are turned on, and the read voltage, that is, the power supply voltage VDD is transferred to the corresponding data line DL0 through the third switching means SW3. Accordingly, a current path leading to the data line DL0, the first switching means SW1, and the antifuse ANT_FS is formed. At this time, since the gate insulating layer of the antifuse ANT_FS is in a destroyed state, the data line DL0 is electrically connected to the ground voltage terminal through the first switching means SW1 and the antifuse ANT_FS. Accordingly, the detector SA0 senses data corresponding to the ground voltage from the data line DL0.

As described above, although the technical spirit of the present invention has been described in detail in the preferred embodiments, it should be noted that the above-described embodiments are for the purpose of description and not of limitation. In addition, a person of ordinary skill in the art, through the combination of Embodiments 1 to 8 of the present invention, specifically, the combination between the unit cell and the sensing unit, various embodiments are possible within the scope of the technical idea of the present invention. I can understand.

1 is an equivalent circuit diagram illustrating an OTP unit cell according to the prior art.

2 is an equivalent circuit diagram illustrating a unit cell of a nonvolatile memory device according to Embodiment 1 of the present invention;

FIG. 3 is a view showing the first switching element SW1 shown in FIG. 2.

FIG. 4 is a view showing the second switching element SW2 shown in FIG. 2.

FIG. 5 illustrates the antifuse ANT_FS shown in FIG.

FIG. 6 is a diagram for explaining operating characteristics of a unit cell of a nonvolatile memory device according to Embodiment 1 of the present invention; FIG.

7 is an equivalent circuit diagram illustrating a unit cell of a nonvolatile memory device according to Embodiment 2 of the present invention.

FIG. 8 is a diagram for explaining operating characteristics of a unit cell of a nonvolatile memory device according to Embodiment 2 of the present invention; FIG.

9 is an equivalent circuit diagram showing a unit cell of a nonvolatile memory device according to Embodiment 3 of the present invention.

Fig. 10 is an equivalent circuit diagram showing a nonvolatile memory device according to the fourth embodiment of the present invention.

Fig. 11 is an equivalent circuit diagram showing a nonvolatile memory device according to the fifth embodiment of the present invention.

Fig. 12 is an equivalent circuit diagram showing a nonvolatile memory device according to Embodiment 6 of the present invention.

Fig. 13 is an equivalent circuit diagram showing a nonvolatile memory device according to the seventh embodiment of the present invention.

Fig. 14 is an equivalent circuit diagram showing a nonvolatile memory device according to Embodiment 8 of the present invention.

<Explanation of symbols for the main parts of the drawings>

SW1 ~ SW3: switching element

ANT_FS: antifuse

SA0 ~ SAn: Detector

Claims (7)

delete An antifuse connected between the output terminal and the ground voltage terminal; First switching means connected to the output terminal and transferring a write voltage to the output terminal; And A second switching means connected with the output terminal and transferring a read voltage to the output terminal, During write driving, the first switching means is turned on and the second switching means is turned off, so that a high voltage is applied to one end of the antifuse and a ground voltage is applied to the other end. During read driving, the first switching means is turned off and the second switching means is turned on so that a power supply voltage having a level lower than the high voltage is applied to one end of the antifuse and a ground voltage is applied to the other end. Unit cell of a nonvolatile memory device. The method of claim 2, Wherein the first and second switching means comprise a transistor. The method of claim 2, And the first and second switching means comprise a transistor having channels of the same or different type from each other. The method of claim 2, And the first switching means is formed of a transistor having a p-channel, and the second switching means is made of a transistor having an n-channel. The method of claim 2, The antifuse unit cell of a nonvolatile memory device consisting of a transistor. The method of claim 2, The antifuse unit cell of a nonvolatile memory device comprising a capacitor.

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