KR100943885B1 - 개질된 실리카/폴리디메틸실록산 나노복합재 멤브레인 - Google Patents
개질된 실리카/폴리디메틸실록산 나노복합재 멤브레인 Download PDFInfo
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- KR100943885B1 KR100943885B1 KR1020070115770A KR20070115770A KR100943885B1 KR 100943885 B1 KR100943885 B1 KR 100943885B1 KR 1020070115770 A KR1020070115770 A KR 1020070115770A KR 20070115770 A KR20070115770 A KR 20070115770A KR 100943885 B1 KR100943885 B1 KR 100943885B1
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- propylene
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- 229920000435 poly(dimethylsiloxane) Polymers 0.000 title claims abstract description 152
- 239000004205 dimethyl polysiloxane Substances 0.000 title claims abstract description 151
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 145
- 239000012528 membrane Substances 0.000 title claims abstract description 122
- -1 Polydimethylsiloxane Polymers 0.000 title claims abstract description 37
- 239000002114 nanocomposite Substances 0.000 title claims abstract description 37
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 154
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 77
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims abstract description 76
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims abstract description 74
- 239000007789 gas Substances 0.000 claims abstract description 28
- 229910021485 fumed silica Inorganic materials 0.000 claims description 36
- 229920000642 polymer Polymers 0.000 claims description 29
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 15
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 claims description 12
- DBKNGKYVNBJWHL-UHFFFAOYSA-N chloro-dimethyl-octylsilane Chemical compound CCCCCCCC[Si](C)(C)Cl DBKNGKYVNBJWHL-UHFFFAOYSA-N 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 8
- 239000003431 cross linking reagent Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 238000004132 cross linking Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims 2
- 238000001291 vacuum drying Methods 0.000 claims 2
- 230000035699 permeability Effects 0.000 abstract description 96
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 47
- 239000001301 oxygen Substances 0.000 abstract description 47
- 229910052760 oxygen Inorganic materials 0.000 abstract description 47
- 239000000377 silicon dioxide Substances 0.000 abstract description 26
- 230000000694 effects Effects 0.000 abstract description 18
- 239000011159 matrix material Substances 0.000 abstract description 16
- 239000000945 filler Substances 0.000 abstract description 11
- 229920000620 organic polymer Polymers 0.000 abstract description 6
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- 238000007872 degassing Methods 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 238000004064 recycling Methods 0.000 abstract description 3
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 138
- 238000012986 modification Methods 0.000 description 24
- 230000004048 modification Effects 0.000 description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 230000007423 decrease Effects 0.000 description 12
- 238000009792 diffusion process Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical compound C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 7
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000012856 packing Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000000921 elemental analysis Methods 0.000 description 5
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- 229910003475 inorganic filler Inorganic materials 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000000047 product Substances 0.000 description 4
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- 239000012466 permeate Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
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- 239000011261 inert gas Substances 0.000 description 2
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- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 2
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- 239000000126 substance Substances 0.000 description 2
- UDYJJCZCPMQSQG-UHFFFAOYSA-N trimethyl(prop-1-enyl)silane Chemical compound CC=C[Si](C)(C)C UDYJJCZCPMQSQG-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003958 fumigation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 229910002011 hydrophilic fumed silica Inorganic materials 0.000 description 1
- 229920001600 hydrophobic polymer Polymers 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
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- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 238000006057 reforming reaction Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
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- 238000004611 spectroscopical analysis Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/14—Dynamic membranes
- B01D69/141—Heterogeneous membranes, e.g. containing dispersed material; Mixed matrix membranes
- B01D69/148—Organic/inorganic mixed matrix membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0095—Drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/024—Oxides
- B01D71/027—Silicium oxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/70—Polymers having silicon in the main chain, with or without sulfur, nitrogen, oxygen or carbon only
- B01D71/701—Polydimethylsiloxane
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
- C04B35/571—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide obtained from Si-containing polymer precursors or organosilicon monomers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/10—Nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/702—Hydrocarbons
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/12—Specific ratios of components used
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/30—Cross-linking
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/36—Introduction of specific chemical groups
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/56—Use of ultrasound
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
w/w [%] | 질소 | 탄소 | 수소 |
훈증 실리카 (SiO2) | 0 | 0.07 | 0.0236 |
Si-DMS | 0 | 3.58 | 0.879 |
Si-DMOS | 0 | 5.3 | 1 |
투과제 | MW | Tfp [K] | Tb [K] | TC [K] | PC [ bar ] | VC [ cm 3 / mol ] |
N2 | 28.013 | 63.3 | 77.4 | 126.2 | 33.9 | 89.8 |
O2 | 31.999 | 54.4 | 90.2 | 154.6 | 50.4 | 73.4 |
C3H6 | 42.081 | 87.9 | 225.5 | 364.9 | 46.0 | 181.0 |
Claims (4)
- 훈증 실리카(Si)의 표면을 클로로디메틸옥틸실란(chlorodimethyloctylsilane, CDMOS)으로 개질시켜 표면개질 Si-DMOS를 제조하는 단계;폴리디메틸실록산(PDMS)과 Pt 기재 가교제를 10:1의 중량비로 톨루엔에 용해시켜 중합체 용액을 제조하는 단계;상기 중합체 용액에 표면개질 Si-DMOS를 10중량%의 양으로 가하고, 초음파 처리하는 단계; 및표면개질 Si-DMOS/PDMS 용액을 진공건조하여 용매를 제거한 후, 진공 조건에서 가교시키는 단계로 이루어진 방법으로 제조된, 배기가스의 질소 중 프로필렌 분리용 표면개질 Si-DMOS/PDMS 나노복합재 멤브레인.
- 훈증 실리카(Si)의 표면을 클로로디메틸페닐실란(chlorodimethylphenylsilane, CDMPS)으로 개질시켜 표면개질 Si-DMPS를 제조하는 단계;폴리디메틸실록산(PDMS)과 Pt 기재 가교제를 10:1의 중량비로 톨루엔에 용해시켜 중합체 용액을 제조하는 단계;상기 중합체 용액에 표면개질 Si-DMPS를 10중량%의 양으로 가하고, 초음파 처리하는 단계; 및표면개질 Si-DMPS/PDMS 용액을 진공건조하여 용매를 제거한 후, 진공 조건에서 가교시키는 단계로 이루어진 방법으로 제조된, 배기가스의 질소 중 프로필렌 분리용 표면개질 Si-DMPS/PDMS 나노복합재 멤브레인.
- 삭제
- 삭제
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KR20010082817A (ko) * | 2000-02-21 | 2001-08-31 | 김왕식 | 휘발성 유기화합물 분리회수용 하이브리드막 및 이의제조방법 |
KR20060049351A (ko) * | 2004-10-25 | 2006-05-18 | 주식회사 에코솔루션 | 표면개질된 실리카 나노입자와 피디엠에스를 이용하여제조된 휘발성유기화합물 분리용 혼합 막, 이의 제조방법및 용도 |
US20070015022A1 (en) | 2005-07-12 | 2007-01-18 | Samsung Sdi Co., Ltd. | Ion conductive composite membrane using inorganic conductor and method of manufacturing the same |
KR20080084324A (ko) * | 2007-03-16 | 2008-09-19 | 명지대학교 산학협력단 | 다공성 알루미늄실리케이트 나노입자를 함유하는 pdms혼합막 |
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- 2007-11-13 KR KR1020070115770A patent/KR100943885B1/ko active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20010082817A (ko) * | 2000-02-21 | 2001-08-31 | 김왕식 | 휘발성 유기화합물 분리회수용 하이브리드막 및 이의제조방법 |
KR20060049351A (ko) * | 2004-10-25 | 2006-05-18 | 주식회사 에코솔루션 | 표면개질된 실리카 나노입자와 피디엠에스를 이용하여제조된 휘발성유기화합물 분리용 혼합 막, 이의 제조방법및 용도 |
US20070015022A1 (en) | 2005-07-12 | 2007-01-18 | Samsung Sdi Co., Ltd. | Ion conductive composite membrane using inorganic conductor and method of manufacturing the same |
KR20080084324A (ko) * | 2007-03-16 | 2008-09-19 | 명지대학교 산학협력단 | 다공성 알루미늄실리케이트 나노입자를 함유하는 pdms혼합막 |
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