KR100922004B1 - 기판 노광 장치 및 방법 - Google Patents
기판 노광 장치 및 방법 Download PDFInfo
- Publication number
- KR100922004B1 KR100922004B1 KR1020070120435A KR20070120435A KR100922004B1 KR 100922004 B1 KR100922004 B1 KR 100922004B1 KR 1020070120435 A KR1020070120435 A KR 1020070120435A KR 20070120435 A KR20070120435 A KR 20070120435A KR 100922004 B1 KR100922004 B1 KR 100922004B1
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- South Korea
- Prior art keywords
- substrate
- exposure
- light source
- spin chuck
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims abstract description 129
- 238000000034 method Methods 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (9)
- 삭제
- 삭제
- 삭제
- 기판이 안착되는 다수의 스핀 척; 및상기 다수의 스핀 척 사이 중심에 위치하며, 상기 기판들에 대해 노광을 수행하는 하나의 광원부를 포함하는데,상기 다수의 스핀 척이 상기 광원부로 동시에 이동하는 기판 노광 장치.
- 기판이 안착되는 다수의 스핀 척; 및상기 다수의 스핀 척 사이 중심에 위치하며, 상기 기판들에 대해 노광을 수행하는 하나의 광원부를 포함하는데,상기 광원부가 상기 다수의 스핀척으로 순차적으로 이동하는 기판 노광 장치.
- 제 5 항에 있어서,상기 광원부가 상기 다수의 스핀 척 중 어느 하나의 스핀 척으로 이동하여 기판의 노광이 진행되는 동안, 다른 스핀 척들에서는 노광을 위한 기판의 정렬동작이 수행되는 기판 노광 장치.
- 삭제
- 제 1 스핀 척 및 제 2 스핀 척에 안착되는 제 1 기판 및 제2 기판에 대해 노광을 위한 기판 정렬을 수행하는 단계;상기 제 1 스핀 척 및 상기 제2 스핀 척이 동시에 광원부로 이동하는 단계; 및상기 광원부가 상기 제 1 기판 및 제2 기판에 대해 동시에 노광을 수행하는 단계를 포함하는 기판 노광 방법.
- 제 1 스핀 척에 안착되는 제 1 기판에 대해 노광을 위한 기판 정렬을 수행하는 단계;광원부가 상기 제 1 스핀 척으로 이동하는 단계;상기 광원부가 상기 제 1 기판에 대해 노광을 수행하는 단계;상기 제 1 기판의 노광이 진행되는 동안, 제 2 스핀 척에 안착되는 제 2 기판에 대해 노광을 위한 기판 정렬을 수행하는 단계;상기 제 1 기판의 노광이 완료되면, 상기 광원부가 상기 제 2 스핀 척으로 이동하는 단계; 및상기 광원부가 상기 제 2 기판에 대해 노광을 수행하는 단계를 포함하는 기판 노광 방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070120435A KR100922004B1 (ko) | 2007-11-23 | 2007-11-23 | 기판 노광 장치 및 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070120435A KR100922004B1 (ko) | 2007-11-23 | 2007-11-23 | 기판 노광 장치 및 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090053552A KR20090053552A (ko) | 2009-05-27 |
| KR100922004B1 true KR100922004B1 (ko) | 2009-10-14 |
Family
ID=40861043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070120435A Active KR100922004B1 (ko) | 2007-11-23 | 2007-11-23 | 기판 노광 장치 및 방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100922004B1 (ko) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010092288A (ko) * | 2000-03-14 | 2001-10-24 | 시마무라 테루오 | 위치맞춤방법, 노광방법, 노광장치 및 디바이스제조방법 |
| KR20030096435A (ko) * | 1996-11-28 | 2003-12-31 | 가부시키가이샤 니콘 | 노광장치 및 노광방법 |
| KR20060129387A (ko) * | 2004-02-19 | 2006-12-15 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 디바이스 제조 방법 |
-
2007
- 2007-11-23 KR KR1020070120435A patent/KR100922004B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030096435A (ko) * | 1996-11-28 | 2003-12-31 | 가부시키가이샤 니콘 | 노광장치 및 노광방법 |
| KR20010092288A (ko) * | 2000-03-14 | 2001-10-24 | 시마무라 테루오 | 위치맞춤방법, 노광방법, 노광장치 및 디바이스제조방법 |
| KR20060129387A (ko) * | 2004-02-19 | 2006-12-15 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 디바이스 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090053552A (ko) | 2009-05-27 |
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