KR100902881B1 - 마스크 운반박스 개방장치 - Google Patents
마스크 운반박스 개방장치 Download PDFInfo
- Publication number
- KR100902881B1 KR100902881B1 KR1020070116506A KR20070116506A KR100902881B1 KR 100902881 B1 KR100902881 B1 KR 100902881B1 KR 1020070116506 A KR1020070116506 A KR 1020070116506A KR 20070116506 A KR20070116506 A KR 20070116506A KR 100902881 B1 KR100902881 B1 KR 100902881B1
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- carrying box
- cover
- transport box
- box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (5)
- 마스크 운반박스가 장착되는 마스크 운반박스 스테이지;상기 마스크 운반박스 스테이지 양측에 한 쌍이 설치되고, 상기 마스크 운반박스의 본체 양측면을 압착하여 상기 마스크 운반박스의 커버와 본체와의 결합을 해제하는 압착 실린더; 및상기 마스크 운반박스 이송부의 상부에 승강가능하도록 설치되고, 상기 본체와의 결합이 해제된 커버를 흡착하여 상부로 이동시키는 커버 개방부를 포함하는 것을 특징으로 하는 마스크 운반박스 개방장치.
- 제 1 항에 있어서,상기 압착 실린더의 로드 선단에는 상방으로 회동가능하도록 힌지결합되는 후크부재가 설치되는 것을 특징으로 하는 마스크 운반박스 개방장치.
- 제 1 항에 있어서,상기 커버 개방부는상기 커버를 흡착하는 흡착부;상기 흡착부의 양측에 결합되어 상기 흡착부의 커버 흡착시 충격을 흡수하고 상기 커버의 균형을 유지하기 위한 완충부; 및상기 흡착부 및 완충부를 승강시키는 승강 실린더를 포함하는 것을 특징으로 하는 마스크 운반박스 개방장치.
- 제 1 항에 있어서,상기 운반박스 스테이지를 전후 이송하는 운반박스 이송부가 더 포함되는 것을 특징으로 하는 마스크 운반박스 개방장치.
- 제 4 항에 있어서,상기 운반박스 이송부는상면부에 가이드 레일이 설치된 베이스 플레이트;상기 베이스 플레이트의 일측에 설치되는 모터;상기 모터와 축결합되어 상기 모터에 연동하여 회전하는 벨트부재;일측이 상기 벨트부재에 취부되는 연결블록; 및일측이 상기 연결블록의 타측에 연결되어 상기 가이드 레일 상을 전후진이동하고, 상부면에 상기 마스크 운반박스가 안착되는 마스크 운반박스 스테이지를 포함하는 것을 특징으로 하는 마스크 운반박스 개방장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070116506A KR100902881B1 (ko) | 2007-11-15 | 2007-11-15 | 마스크 운반박스 개방장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070116506A KR100902881B1 (ko) | 2007-11-15 | 2007-11-15 | 마스크 운반박스 개방장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090050202A KR20090050202A (ko) | 2009-05-20 |
KR100902881B1 true KR100902881B1 (ko) | 2009-06-16 |
Family
ID=40858700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070116506A Expired - Fee Related KR100902881B1 (ko) | 2007-11-15 | 2007-11-15 | 마스크 운반박스 개방장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100902881B1 (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020026157A (ko) * | 1999-04-30 | 2002-04-06 | 더글라스 제이. 맥큐천 | Smif 및 개방 포드 애플리케이션을 위한 유니버설 툴인터페이스 및/또는 워크피스 이송 장치 |
KR20030036377A (ko) * | 2003-03-20 | 2003-05-09 | (주)인터노바 | 반도체 제조공정에서 사용하는 자재 저장용기의 자동 개폐및 반송용 스미프 로더장치 |
KR20060007455A (ko) * | 2006-01-04 | 2006-01-24 | 코리아테크노(주) | 마스크 운송박스 박스커버 오프너 |
KR20060011898A (ko) * | 2006-01-10 | 2006-02-03 | 코리아테크노(주) | 포토마스크 무인 운반장치 |
-
2007
- 2007-11-15 KR KR1020070116506A patent/KR100902881B1/ko not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020026157A (ko) * | 1999-04-30 | 2002-04-06 | 더글라스 제이. 맥큐천 | Smif 및 개방 포드 애플리케이션을 위한 유니버설 툴인터페이스 및/또는 워크피스 이송 장치 |
KR20030036377A (ko) * | 2003-03-20 | 2003-05-09 | (주)인터노바 | 반도체 제조공정에서 사용하는 자재 저장용기의 자동 개폐및 반송용 스미프 로더장치 |
KR20060007455A (ko) * | 2006-01-04 | 2006-01-24 | 코리아테크노(주) | 마스크 운송박스 박스커버 오프너 |
KR20060011898A (ko) * | 2006-01-10 | 2006-02-03 | 코리아테크노(주) | 포토마스크 무인 운반장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20090050202A (ko) | 2009-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100936903B1 (ko) | 검사 장치 및 검사 방법 | |
TWI450030B (zh) | 淨化裝置及淨化方法 | |
KR100880462B1 (ko) | 검사장치 및 검사방법 | |
JP2006153899A (ja) | レチクル保護部材、レチクル搬送装置、露光装置、及びレチクルの搬送方法。 | |
KR100928478B1 (ko) | 반도체 제조 라인의 파드 저장장치 | |
JP4166813B2 (ja) | 検査装置及び検査方法 | |
KR100909494B1 (ko) | 처리장치 | |
TWI442493B (zh) | Processing device | |
KR100902881B1 (ko) | 마스크 운반박스 개방장치 | |
JP4818767B2 (ja) | 外観検査装置 | |
WO2007057980A1 (ja) | トレイ保持装置 | |
JPWO2019234821A1 (ja) | 印刷装置 | |
JP2009059930A (ja) | オープンカセットロードポート | |
JPS62195143A (ja) | 基板の高速変換装置及び方法 | |
JP2006062801A (ja) | 基板搬送装置及びそれを備えた画像形成装置並びに基板搬送方法 | |
WO2011136856A1 (en) | Opener for extreme ultra violet lithography reticle pods | |
KR100911767B1 (ko) | 반도체 제조 라인의 파드 교환장치 | |
JP3642729B2 (ja) | 処理装置 | |
JPH07277499A (ja) | リードフレームの移送装置 | |
TWI814990B (zh) | 蓋開閉裝置 | |
CN117470866A (zh) | 应用于光罩检查机的载台机构 | |
KR102195131B1 (ko) | 인쇄회로기판의 로딩 장치 | |
KR101510224B1 (ko) | 얼라이너와 이것을 이용한 웨이퍼 분류장치 | |
TW200409266A (en) | Wafer processing apparatus capable of mapping wafer | |
CN218067618U (zh) | 一种aoi检测装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20071115 |
|
PA0201 | Request for examination | ||
N231 | Notification of change of applicant | ||
PN2301 | Change of applicant |
Patent event date: 20081016 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20081211 Patent event code: PE09021S01D |
|
N231 | Notification of change of applicant | ||
PN2301 | Change of applicant |
Patent event date: 20090119 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20090421 |
|
PG1501 | Laying open of application | ||
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20090608 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20090608 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20120608 Start annual number: 4 End annual number: 4 |
|
FPAY | Annual fee payment |
Payment date: 20131209 Year of fee payment: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20131209 Start annual number: 5 End annual number: 5 |
|
FPAY | Annual fee payment |
Payment date: 20140602 Year of fee payment: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20140602 Start annual number: 6 End annual number: 6 |
|
FPAY | Annual fee payment |
Payment date: 20150706 Year of fee payment: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20150706 Start annual number: 7 End annual number: 7 |
|
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20170509 |