KR100874125B1 - 초임계 및 아임계 이산화탄소 건조공정을 사용한 저독성세포독심 프록세틸의 제조 - Google Patents
초임계 및 아임계 이산화탄소 건조공정을 사용한 저독성세포독심 프록세틸의 제조 Download PDFInfo
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- KR100874125B1 KR100874125B1 KR1020070068895A KR20070068895A KR100874125B1 KR 100874125 B1 KR100874125 B1 KR 100874125B1 KR 1020070068895 A KR1020070068895 A KR 1020070068895A KR 20070068895 A KR20070068895 A KR 20070068895A KR 100874125 B1 KR100874125 B1 KR 100874125B1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/02—Preparation
- C07D501/12—Separation; Purification
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
- C07D501/26—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
- C07D501/34—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by carboxylic acids containing hetero rings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
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- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
구분 | 건조 조건 | 건조시간 (분) | 건조전→건조후 IPE 잔류량(%) | 건조전→건조후 MC 잔류량(%) | 건조전→건조후 EA 잔류량(%) |
실시예 1 | 35℃, 100기압 | 30 | 0.030→0.004 | 0.012→미검출 | 0.011→미검출 |
실시예 2 | 40℃, 100기압 | 3 | 0.417→0.074 | 0.020→0.010 | 0.034→0.012 |
실시예 3 | 40℃, 100기압 | 6 | 0.417→미검출 | 0.020→미검출 | 0.034→미검출 |
실시예 4 | 40℃, 100기압 | 9 | 0.417→미검출 | 0.020→미검출 | 0.034→미검출 |
실시예 5 | 40℃, 100기압 | 12 | 0.417→미검출 | 0.020→미검출 | 0.034→미검출 |
실시예 6 | 40℃, 100기압 | 15 | 0.417→미검출 | 0.020→미검출 | 0.034→미검출 |
구분 | 건조 조건 | 건조시간 (분) | 건조전→건조후 IPE 잔류량(%) | 건조전→건조후 MC 잔류량(%) | 건조전→건조후 EA 잔류량(%) |
실시예 7 | 23℃, 70기압 | 60 | 0.250→0.045 | 0.015→미검출 | 0.026→0.004 |
실시예 8 | 24℃, 75기압 | 60 | 0.250→0.026 | 0.015→미검출 | 0.026→0.004 |
실시예 9 | 20℃, 90기압 | 20 | 0.250→0.004 | 0.015→미검출 | 0.026→미검출 |
실시예 10 | 20℃, 90기압 | 40 | 0.250→미검출 | 0.015→미검출 | 0.026→미검출 |
구분 | 건조 조건 온도(℃)/압력(기압)/유지시간(분) | 건조전→건조후 IPE 잔류량(%) | 건조전→건조후 MC 잔류량(%) | 건조전→건조후 EA 잔류량(%) |
실시예 11 | 23/60/30 → 승온 시간 20분 → 32/80/10 | 0.200→0.002 | 0.013→미검출 | 0.035→미검출 |
실시예 12 | 23/65/20 → 승온 시간 35분 → 35/90/5 | 0.200→0.014 | 0.013→미검출 | 0.035→미검출 |
실시예 13 | 25/70/20 → 승온 시간 25분 → 32/80/10 | 0.200→미검출 | 0.013→미검출 | 0.035→미검출 |
실시예 14 | 25/70/20 → 승온 시간 35분 → 40/100/5 | 0.200→미검출 | 0.013→미검출 | 0.035→미검출 |
실시예 15 | 25/70/20 → 승온 시간 15분 → 32/80/10 | 1.3→미검출 | 0.022→미검출 | 0.039→0.004 |
구분 | 건조 조건 온도(℃)/압력(기압)/유지시간(분) | 건조전→건조후 IPE 잔류량(%) | 건조전→건조후 MC 잔류량(%) | 건조전→건조후 EA 잔류량(%) |
실시예 16 | 35/100/10→훈풍 건조(55℃) 30분 | 0.250→미검출 | 0.015→미검출 | 0.026→미검출 |
실시예 17 | 35/100/10→질소 건조(55℃) 30분 | 0.250→미검출 | 0.015→미검출 | 0.026→미검출 |
실시예 18 | 20/90/20→훈풍 건조(55℃) 30분 | 0.250→0.010 | 0.015→미검출 | 0.026→0.004 |
실시예 19 | 22/85/20→질소 건조(55℃) 30분 | 0.250→0.011 | 0.015→미검출 | 0.026→0.004 |
실시예 20 | 20/70/20→훈풍 건조(55℃) 30분→32/80/10 | 0.250→0.005 | 0.015→미검출 | 0.026→미검출 |
실시예 21 | 20/70/20→질소 건조(55℃) 30분→35/90/5 | 0.250→미검출 | 0.015→미검출 | 0.026→미검출 |
실시예 22 | 23/60/20→진공 건조(55℃) 30분→35/90/5 | 0.250→0.004 | 0.015→미검출 | 0.026→미검출 |
실시예 23 | 20/90/20→훈풍 건조(55℃) 30분→20/90/20 | 0.250→미검출 | 0.015→미검출 | 0.026→미검출 |
실시예 24 | 20/90/20→질소 건조(55℃) 30분→20/90/20 | 0.250→0.004 | 0.015→미검출 | 0.026→미검출 |
구분 | 건조 조건 (건조 방식/온도) | 건조 시간 (시간) | 건조전→건조후 IPE 잔류량(%) | 건조전→건조후 MC 잔류량(%) | 건조전→건조후 EA 잔류량(%) |
비교예 1 | 훈풍 건조/60℃ | 24 | 1.3→0.320 | 0.022→0.022 | 0.034→0.031 |
비교예 2 | 훈풍 건조/60℃ | 48 | 1.3→0.302 | 0.022→0.020 | 0.034→0.030 |
Claims (4)
- 세포독심 프록세틸의 제조과정에 있어서, 온도가 0℃ 내지 70℃ 이고, 압력이 35 기압 내지 600 기압인 초임계 및 아임계 이산화탄소를 사용하여 약물에 잔류하는 유기 용매를 제거하는 방법을 특징으로 하는 건조 방법.
- 제1항에 있어서, 상기 건조방법은 잔류 유기 용매인 디이소프로필에테르(diisopropyl ether), 에틸 아세테이트 (ethyl acetate), 디클로로메탄 (dichloromethane)을 0.01% 이하로 제거하는 것을 특징으로 하는 건조 방법.
- 제 1항에 있어서 이산화탄소의 밀도가 0.16보다 크고 1.12보다 작은 범위에서의 초임계 이산화탄소 및 아임계 이산화탄소를 사용한 건조를 수행하여 잔류 유기 용매를 제거하는 것을 특징으로 하는 건조 방법.
- 제 3항에 있어서 초임계 및 아임계 이산화탄소 건조를 수행함에 있어서 훈풍 건조, 질소 건조, 진공 건조와 병행하여 건조를 수행하는 것을 특징으로 하는 건조 방법.
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KR1020070068895A KR100874125B1 (ko) | 2007-07-09 | 2007-07-09 | 초임계 및 아임계 이산화탄소 건조공정을 사용한 저독성세포독심 프록세틸의 제조 |
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KR1020070068895A KR100874125B1 (ko) | 2007-07-09 | 2007-07-09 | 초임계 및 아임계 이산화탄소 건조공정을 사용한 저독성세포독심 프록세틸의 제조 |
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KR100874125B1 true KR100874125B1 (ko) | 2008-12-15 |
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KR1020070068895A Expired - Fee Related KR100874125B1 (ko) | 2007-07-09 | 2007-07-09 | 초임계 및 아임계 이산화탄소 건조공정을 사용한 저독성세포독심 프록세틸의 제조 |
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