KR100837884B1 - 액정표시장치의 제조방법 - Google Patents
액정표시장치의 제조방법 Download PDFInfo
- Publication number
- KR100837884B1 KR100837884B1 KR1020010089128A KR20010089128A KR100837884B1 KR 100837884 B1 KR100837884 B1 KR 100837884B1 KR 1020010089128 A KR1020010089128 A KR 1020010089128A KR 20010089128 A KR20010089128 A KR 20010089128A KR 100837884 B1 KR100837884 B1 KR 100837884B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist pattern
- layer
- film
- pattern
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (2)
- 글라스기판 상에 제 1금속막 및 게이트 전극 형성영역이 정의된 제1감광막 패턴을 차례로 형성하는 단계와,상기 제 1감광막 패턴을 마스크로 하고 상기 제 1금속막을 제거하여 게이트 전극을 형성하는 단계와,상기 제 1감광막 패턴을 제거하는 단계와,상기 게이트 전극을 포함한 기판 상에 게이트 절연막, 비정질 실리콘층, 투명도전막 제 2금속막 및 반도체층 및 화소전극 형성영역이 정의된 제 2감광막 패턴을 형성하는 단계와,상기 제 2감광막 패턴을 마스크로 하고, 상기 제 2금속막, 투명도전막 및 비정질 실리콘층을 제거하여 각각의 반도체층 및 화소 전극을 형성하는 단계와,상기 제 2감광막 패턴 에싱을 진행하여 픽셀쪽을 제거하여 제 3감광막 패턴을 형성하는 단계와,상기 제 3감광막 패턴을 마스크로 하고, 상기 잔류된 제 2금속막을 식각하여 각각의 소오스/드레인 전극을 형성하는 단계와,상기 제 3감광막 패턴을 제거하는 단계와,상기 소오스/드레인을 포함한 기판 상에 활성화층, 보호막 및 화소영역이 정의된 제 4감광막 패턴을 차례로 형성하는 단계와,상기 제 4감광막 패턴을 마스크로 하고 상기 활성화층 및 상기 보호막을 제거하는 단계와,상기 제 4감광막 패턴을 제거하는 단계를 포함한 것을 특징으로 하는 액정표시장치의 제조방법.
- 제 1항에 있어서, 상기 반도체층, 화소 전극 및 상기 소오스/드레인 전극 형성은 동일 화학기상증착 챔버 내에서 진행하는 것을 특징으로 하는 액정표시장치의 제조방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020010089128A KR100837884B1 (ko) | 2001-12-31 | 2001-12-31 | 액정표시장치의 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020010089128A KR100837884B1 (ko) | 2001-12-31 | 2001-12-31 | 액정표시장치의 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20030058614A KR20030058614A (ko) | 2003-07-07 |
| KR100837884B1 true KR100837884B1 (ko) | 2008-06-12 |
Family
ID=32216513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020010089128A Expired - Lifetime KR100837884B1 (ko) | 2001-12-31 | 2001-12-31 | 액정표시장치의 제조방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100837884B1 (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7279370B2 (en) | 2003-10-11 | 2007-10-09 | Lg.Philips Lcd Co., Ltd. | Thin film transistor array substrate and method of fabricating the same |
| WO2006015510A1 (fr) * | 2004-08-09 | 2006-02-16 | Quanta Display Inc. | Structure des pixels d’un afficheur a cristaux liquides et procede de fabrication de celui-ci |
| JP4740203B2 (ja) | 2006-08-04 | 2011-08-03 | 北京京東方光電科技有限公司 | 薄膜トランジスタｌｃｄ画素ユニットおよびその製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR970059799A (ko) * | 1996-01-15 | 1997-08-12 | 구자홍 | 액정표시장치의 구조 및 제조방법 |
| KR20000003179A (ko) * | 1998-06-26 | 2000-01-15 | 김영환 | 액정표시소자의 데이터 라인 형성방법 |
-
2001
- 2001-12-31 KR KR1020010089128A patent/KR100837884B1/ko not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR970059799A (ko) * | 1996-01-15 | 1997-08-12 | 구자홍 | 액정표시장치의 구조 및 제조방법 |
| KR20000003179A (ko) * | 1998-06-26 | 2000-01-15 | 김영환 | 액정표시소자의 데이터 라인 형성방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030058614A (ko) | 2003-07-07 |
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