KR100817853B1 - 점진적 농도구배 껍질 구조를 갖는 양자점 및 이의 제조방법 - Google Patents
점진적 농도구배 껍질 구조를 갖는 양자점 및 이의 제조방법 Download PDFInfo
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- KR100817853B1 KR100817853B1 KR1020060093025A KR20060093025A KR100817853B1 KR 100817853 B1 KR100817853 B1 KR 100817853B1 KR 1020060093025 A KR1020060093025 A KR 1020060093025A KR 20060093025 A KR20060093025 A KR 20060093025A KR 100817853 B1 KR100817853 B1 KR 100817853B1
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- quantum dot
- quantum dots
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- 239000011669 selenium Substances 0.000 claims description 20
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- 229910052717 sulfur Inorganic materials 0.000 claims description 16
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- 239000007769 metal material Substances 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
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- 230000000704 physical effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
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- GOBNDSNLXZYUHQ-UHFFFAOYSA-N selenium;tributylphosphane Chemical compound [Se].CCCCP(CCCC)CCCC GOBNDSNLXZYUHQ-UHFFFAOYSA-N 0.000 description 1
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- QZZGJDVWLFXDLK-UHFFFAOYSA-N tetracosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(O)=O QZZGJDVWLFXDLK-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/812—Single quantum well structures
- H10D62/814—Quantum box structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/002—Compounds containing, besides selenium or tellurium, more than one other element, with -O- and -OH not being considered as anions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/007—Tellurides or selenides of metals
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G11/00—Compounds of cadmium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G11/00—Compounds of cadmium
- C01G11/02—Sulfides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G9/00—Compounds of zinc
- C01G9/08—Sulfides
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- C—CHEMISTRY; METALLURGY
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Abstract
Description
Claims (7)
- II-VI족 화합물 중심 및 II-VI족 화합물 껍질 구조를 갖는 양자점으로서,상기 껍질을 구성하는 II-VI족 화합물은 중심을 구성하는 II-VI족 화합물 보다 더 큰 밴드갭을 가지고 있고,상기 II-VI족 화합물 껍질은 농도구배가 점진적으로 형성되어 이루어지며,중심 및 껍질을 구성하는 II족 금속 및 VI족 원소의 하나 이상이 서로 상이한 것을 특징으로 하는양자점.
- 중심을 형성하는 II족 금속 함유 화합물 및 껍질을 형성하는 II족 금속 함유 화합물을 혼합한 후 가열하는 제 1 단계;상기 혼합물을 100 ~ 350℃로 가열하는 제 2 단계;상기 가열된 혼합물에 중심을 형성하는 VI족 원소 함유 화합물 및 껍질을 형성하는 VI족 원소 함유 화합물을 혼합하는 제 3 단계; 및상기 제 3 단계 혼합물을 100 ~ 350℃에서 유지시켜 기울기를 갖는 껍질 구조를 형성시키는 제 4 단계를 포함하며,중심 및 껍질을 구성하는 II족 금속 및 VI족 원소의 하나 이상이 서로 상이한 것을 특징으로 하는는 제1항 기재의 양자점 제조 방법.
- 제 2 항에 있어서,상기 II족 금속은, 아연, 카드뮴 및 수은으로 이루어진 군에서 선택되는 어느 하나인 것을 특징으로 하는양자점 제조 방법.
- 제 2 항에 있어서,제 1 단계에서 중심을 형성하는 II족 금속 함유 화합물 및 껍질을 형성하는 II족 금속 함유 화합물을 질소 또는 아르곤 분위기의 상압 이하의 압력조건 및 100 ~ 350℃의 온도조건에서 10~600분 동안 가열시키는 것을 특징으로 하는양자점 제조 방법.
- 제 2 항에 있어서,제 1 단계에서 중심을 형성하는 II족 금속 함유 화합물과 껍질을 형성하는 II족 원소 함유 화합물의 함량비가 1:1 ~ 1:50(몰비)인 것을 특징으로 하는양자점 제조 방법.
- 제 2 항에 있어서,상기 VI족 원소는, 황, 셀레늄, 텔루륨 및 폴로늄으로 이루어진 군에서 선택 되는 어느 하나인 것을 특징으로 하는양자점 제조 방법.
- 제 2 항에 있어서,제 3 단계에서 중심을 형성하는 VI족 원소 함유 화합물과 껍질을 형성하는 VI족 원소 함유 화합물의 함량비가 1:1 ~ 1:50(몰비)인 것을 특징으로 하는양자점 제조 방법.
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KR1020060093025A KR100817853B1 (ko) | 2006-09-25 | 2006-09-25 | 점진적 농도구배 껍질 구조를 갖는 양자점 및 이의 제조방법 |
PCT/KR2007/004662 WO2008038970A1 (en) | 2006-09-25 | 2007-09-21 | Quantum dots having composition gradient shell structure and manufacturing method thereof |
US12/442,943 US20100140586A1 (en) | 2006-09-25 | 2007-09-21 | Quantum dots having composition gradient shell structure and manufacturing method thereof |
US13/589,821 US8847201B2 (en) | 2006-09-25 | 2012-08-20 | Quantum dots having composition gradient shell structure and manufacturing method thereof |
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KR100657639B1 (ko) * | 2004-12-13 | 2006-12-14 | 재단법인서울대학교산학협력재단 | 반도체 양자점의 대량 합성 방법 |
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US20030092227A1 (en) * | 2001-09-21 | 2003-05-15 | Lee Jang-Eun | Method of forming a quantum dot and a gate electrode using the same |
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KR101797366B1 (ko) | 2016-06-16 | 2017-11-13 | 아주대학교산학협력단 | 양자점의 제조 방법 |
US11365348B2 (en) | 2018-01-11 | 2022-06-21 | Samsung Electronics Co., Ltd. | Quantum dot, production method thereof, and electronic device including the same |
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US20120315391A1 (en) | 2012-12-13 |
WO2008038970A1 (en) | 2008-04-03 |
US20100140586A1 (en) | 2010-06-10 |
KR20080027642A (ko) | 2008-03-28 |
US8847201B2 (en) | 2014-09-30 |
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