KR100787908B1 - Preliminary ejection apparatus, substrate coating apparatus and substrate coating method comprising same - Google Patents

Abstract

The present invention includes at least one pair of sheet conveying portions positioned laterally opposite to each other, and a sheet formed to move according to rotation of the sheet conveying portion, wherein the sheet is configured to cover a portion of the substrate, and a substrate coating apparatus including the same. To provide.

The invention as described above has proposed a preliminary ejection device having a new configuration, a substrate coating apparatus and a substrate coating method including the same, so that the process can be simplified and the ejection can be continuously performed without stopping the slit nozzle. Therefore, the thickness uniformity of the tip and end of the substrate is improved, and the process control factors are simplified, in particular, the constant speed movement of the slit nozzle achieves the process stability of the substrate coating and the cost reduction of the substrate coating apparatus, and the preliminary ejection apparatus is connected to the substrate tip and end. By placing in, there is an effect that can greatly contribute to the productivity improvement through the reduction of the process time.

Description

Preliminary ejection apparatus, substrate coating apparatus and substrate coating method including same {COATER HAVING PRE-SPREADING UNIT AND METHOD OF COATING}

1 is a perspective view showing a general substrate coating apparatus.

2A and 2B are sectional views showing the operation of a general substrate coating apparatus.

3 and 4 are a side view and a schematic perspective view showing a substrate coating apparatus having a preliminary ejection unit according to the present invention.

5 is a side view illustrating various modifications of the preliminary discharge part rotating unit according to the present invention.

6 is a perspective view showing a modification of the preliminary ejection unit according to the present invention.

7 is a flowchart illustrating a substrate coating method using the substrate coating apparatus according to the present invention.

8 to 15 are schematic cross-sectional views and perspective views showing the detailed operation of the substrate coating apparatus of the present invention.

              <Description of the code | symbol about the principal part of drawings>

100: nozzle portion 102: discharge port

106: slit nozzle 110: base

120: guide rail 200: stage portion

210: horizontal plate 230: lift pins

240: table 300: preliminary discharge portion

310: sheet 320: roller

330: washing tank 360: rotating part

370: sheet storage 400: substrate

The present invention relates to a preliminary ejection apparatus, a substrate coating apparatus and a substrate coating method including the same, and more particularly, a preliminary ejection portion for improving the uniformity of the photosensitive film at the tip or the end of the substrate and a substrate coating apparatus including the same; It relates to a substrate coating method.

In general, when manufacturing a liquid crystal display device, a process error mainly occurs in a photo process using a photo-resist (PR). At this time, if the photoresist is not uniformly applied, a difference in resolution and circuit line width may occur in a later process, and a difference in reflectance may also occur, causing a defect to appear on a screen as it is.

As a method of uniformly applying the photoresist, a roll coating method in which the photoresist is loaded on the outside of the round roll and the roll is rolled on the substrate in a predetermined direction to apply the photoresist, and the substrate is placed on the support of the original plate. A spin coating method in which the photoresist is dropped in the center of the substrate and then rotated to apply the photoresist to the substrate by centrifugal force, and a slit that is scanned and applied in a predetermined direction while discharging the photoresist onto the substrate through a slit nozzle. There is a coating method.

Among the above coating methods, the roll coating method is difficult to precisely perform the uniformity and film thickness adjustment of the photoresist film, and thus the spin coating method is used for forming the high precision pattern. However, the spin coating method is suitable for coating a photosensitive material on a substrate having a small size, such as a wafer, and is not suitable for a substrate having a large size and a heavy weight, such as a glass substrate for a liquid crystal display panel.

This is because the larger and heavier the substrate is, the more difficult it is to rotate the substrate at high speed, and there is a problem in that breakage or energy consumption of the substrate is increased at high speed. For this reason, the slit coating method is mainly used as a method for coating a photoresist on a large glass substrate.

1 is a perspective view showing a general substrate coating apparatus, Figures 2a and 2b is a cross-sectional view showing the operation of the general coating apparatus.

Referring to FIG. 1, the substrate coating apparatus includes a substrate chuck 10, a preliminary ejection unit 20 provided on one side of the substrate chuck 10, and an upper portion of the substrate chuck 10 and the preliminary ejection unit 20. It consists of a slit nozzle 30 located.

The substrate chuck 10 has a rectangular shape larger than that of the glass substrate in order to seat the glass substrate, and a plurality of vacuum holes (not shown) are formed on the top thereof to communicate with the vacuum pump for vacuum adsorption.

One side of the substrate chuck 10 is provided with a preliminary ejection part 20, and the preliminary ejection part 20 is a cylindrical priming roller 22 rotatably installed in the cleaning tank 24 and the cleaning tank 24. It consists of. The cleaning tank 24 is filled with a cleaning liquid so that the lower portion of the priming roller 22 is immersed therein, and an opening is formed in the upper portion of the cleaning tank 24 so that the upper portion of the priming roller 22 is exposed to the outside. .

In addition, the slit nozzle 30 is provided above the substrate chuck 10 so as to be movable in the longitudinal direction of the substrate chuck 10, so that the preliminary discharge portion 20 and the upper portion of the substrate chuck 10 are horizontally moved. A photoresist is applied to the film.

Looking at the operation of the device, the slit nozzle 30 is moved to the upper portion of the preliminary discharge portion 20, as shown in Figure 2a, the slit nozzle 30 moved to the upper portion of the preliminary discharge portion 20 is stopped The photoresist is preliminarily ejected onto the priming roller 22 rotating in the preliminary ejection section 20 at.

The photoresist is discharged from the slit nozzle 30 to the circumferential surface of the priming roller 22, and the discharged photoresist moves to the lower part of the roller 22 by the rotation of the roller 22, and the cleaning liquid in the cleaning tank 24 is removed. Is immersed in. Thereafter, the priming roller 22 immersed in the cleaning tank 24 is removed by the photoresist applied thereto in the cleaning apparatus to complete the cleaning.

Usually, in addition to the cleaning liquid, various cleaning units, such as a cleaning liquid dropping unit, a blade, a cleaning liquid injector, and a CDA (Clean Dry Air) dryer, are installed in the cleaning tank 24, but the description and illustration thereof are omitted here.

Such preliminary ejection is performed to prevent the nozzle from being in contact with air during the waiting time in the middle of the substrate coating operation, thereby increasing the photoresist concentration in the nozzle and discharging the photoresist of the increased concentration to the substrate 12. All. That is, when the photoresist having a higher concentration is applied to the substrate 12, when the applied photoresist is cured, the coating film may be vertically cracked or cut. Therefore, the preliminary ejection is a precedent operation to prevent such a problem.

After completing the preliminary discharge, the slit nozzle 30 stops discharging the photoresist for a while, moves to the tip of the substrate chuck 10 on which the substrate 12 is seated, and then discharges the photoresist to proceed with coating. do. This is due to the process conditions in which a certain portion of the front end and the end of the substrate 12 should not be coated, the slit nozzle 30 proceeds a further distance from the front end of the substrate 12 and starts coating the photoresist.

Therefore, since the injection of the photoresist is stopped between the preliminary discharge portion 20 and the substrate 12, there is a problem that the process efficiency is lowered.

In addition, after finishing the preliminary discharge as described above, in order to meet the initial coating failure and thickness uniformity in the state stopped at the tip of the substrate 12, various process factors should be adjusted. That is, factors such as bead formation conditions, acceleration of the photosensitive liquid discharge amount, acceleration in the traveling direction, and the like should be controlled.

Similarly, when the slit nozzle 30 discharges the photoresist on the substrate 12 and reaches near the end of the substrate 12, the photoresist should not be coated for a predetermined distance from the end, so that the slit nozzle 30 discharges the photoresist at constant speed. The slit nozzle 30 that has been moved is stopped.

Again, several process factors need to be adjusted to match coating defects and thickness uniformity. That is, factors such as the stop position of the discharge, the deceleration of the discharge amount, and the stop position of the slit nozzle should be controlled.

Such control factors have a significant influence on the influence of the photoresist uniformity near the stop position of the front end and the end of the slit nozzle. In addition, controlling such process factors introduces problems of complexity and process instability in current substrate coating processes.

In addition, the substrate coating apparatus having the preliminary ejection part according to the related art has a problem in that the process time is long because the slit nozzle always returns to the front end of the substrate and the preliminary ejection is performed when the process is repeated.

In order to solve the above problems, the present invention improves the process stability by improving the uniformity of the photoresist film at the front and the end of the substrate, and the preliminary ejection device that contributes to cost reduction and productivity improvement by simplifying the coating apparatus and shortening the substrate coating time; It is an object of the present invention to provide a substrate coating apparatus and a coating method comprising the same.

In order to achieve the above object, the preliminary ejection apparatus of the present invention includes at least one pair of sheet conveying portions positioned laterally opposite to each other, and a sheet formed to move according to rotation of the sheet conveying portion, wherein the sheet covers a portion of the substrate. It is configured to.

The sheet is configured to be circulated and further comprises a cleaning unit for cleaning a portion of the sheet.

The sheet conveying portion is composed of a roller, the sheet is characterized in that the one end is connected to the take-up roller and the other end is connected to the take-out roller is wound on the roller.

The sheet is characterized in that the rectangular wave shape formed with a recess.

A substrate coating method according to the present invention comprises the steps of loading a substrate, covering a portion of the front end or the end of the substrate with a sheet, continuously applying a slit nozzle to the sheet and the substrate, and removing the sheet from the substrate. And unloading the coated substrate.

And further cleaning after removing the sheet from the substrate.

The method may further include moving the sheet laterally after unloading the substrate, and repeating the loading of the substrate and subsequent steps.

Covering the sheet and removing the sheet may include advancing and retracting the sheet toward the substrate, respectively.

The sheet has a square wave shape having recesses and protrusions formed therein, and the loading of the substrate is performed with a portion of the substrate positioned in the recess, and the covering of the sheet by moving the sheet laterally. And covering a portion of the substrate with a protrusion, wherein removing the sheet includes moving the sheet laterally to expose the entirety of the substrate by recesses in the sheet.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. However, the present invention is not limited to the embodiments disclosed below, but will be embodied in various forms, and only the present embodiments make the disclosure of the present invention complete, and fully scope the scope of the invention to those skilled in the art. It is provided to inform you. Like numbers refer to like elements in the figures.

3 and 4 are a side view and a perspective view showing a substrate coating apparatus having a preliminary ejection unit according to the present invention.

Referring to the drawings, the substrate coating apparatus of the present invention includes a stage part 200, a nozzle part 100, and preliminary ejection devices 300a and 300b (hereinafter, referred to as a preliminary ejection part).

The stage unit 200 is installed at the center of the upper surface of the base 110 via a leg having a height adjustment mechanism, and a plurality of through holes are formed through the table 240 and the base 110. It includes a horizontal plate 210 installed so as to be lifted between the table 240 and a plurality of lift pins 230 are installed on the upper surface.

The plurality of lift pins 230 are inserted into the through holes of the table 240, and protrude upward from the table 240 or retreat into the table 240 as the horizontal plate 210 moves up and down. do. The plurality of lift pins 230 serve to lift and lower the substrate from the table 240.

On the other hand, the left and right sides of the upper surface of the base 110, that is, the left and right outer side of the table 240 is provided with a pair of guide rails 120 extending in the longitudinal direction. The pair of guide rails 120 are respectively mounted with a transfer unit 130 to move in the longitudinal direction.

Between the pair of transfer units 130, the nozzle unit 100 for discharging and applying a coating agent such as a photoresist to a substrate such as glass is supported so as to cross the table 240. The slit nozzle 106 of the nozzle unit 100 has a bar shape formed to extend in the left and right transverse directions, and is generally larger than the left and right widths of the substrate. On the lower surface of the slit nozzle 106, fine discharge holes 102 through which photoresist is discharged are formed extending in the lateral direction. The photoresist is discharged to the substrate through the linear discharge port 102.

In addition, the transfer unit 130 moves the nozzle unit 100 on the table 240 by moving in the longitudinal direction at a constant speed while supporting both sides of the nozzle unit 100. On the other hand, the transfer unit 130 is configured to adjust the height of the nozzle unit 100 in the vertical direction, considering the amount and viscosity of the photoresist is applied between the discharge port 102 and the substrate of the slit nozzle 106 The spacing of can be finely controlled.

On the other hand, as a means for supplying the photoresist to the nozzle unit 100, between the photoresist supply unit 104 provided on one side of the transfer unit 130, between the photoresist supply unit 104 and the slit nozzle 106 A first photoresist supply line 108 for communicating the photoresist, and a second photoresist supply line 101 for supplying the photoresist to the photoresist supply unit 104 from an external source (not shown).

The photoresist is supplied to the photoresist supply part 104 through the second photoresist supply line 101 from an external source. The photoresist supply unit 104 applies a predetermined pressure to the photoresist with a pump provided therein, so that the photoresist is supplied to the slit nozzle 106 via the first photoresist supply line 108 and then the slit nozzle 106. Is discharged at a predetermined pressure through the discharge port (102).

Preliminary discharge parts 300a and 300b are disposed on one side and the other side of the stage 200 facing each other. The base 110 is provided with a support 340 and a rail 350 to move the preliminary ejection unit 300, so that the preliminary ejection unit 300 is in the longitudinal direction, that is, the longitudinal direction of the table 240. It is installed to be movable. At this time, the rail 350 is preferably formed so as not to overlap the linear rail 120 that can move the nozzle unit 100 formed on the base 110.

The preliminary discharge part 300 includes a rotating part 360 and a washing tank 330 including a lower portion of the rotating part 360.

The rotating part 360 is composed of a plurality of guide rollers 320, and the sheet 310 wound on the guide roller 320. The guide roller 320 is an elongated cylindrical roller, which is rotatably installed so as to face each other in pairs up and down, and is rotated by a driving unit (not shown). The driving unit may be connected to each of the guide rollers 320 and simultaneously rotate in one direction. The driving unit drives one of the guide rollers 320 of the plurality of guide rollers 320 as the driving unit, and the other guide rollers 320 rotate freely. It can also be configured to.

The sheet 310 is formed to surround the plurality of guide rollers 320, and the sheet 310 also rotates laterally at the same time as the guide roller 320 rotates. In this case, the sheet 310 is preferably surrounded by the guide roller 320 with a predetermined tension, for this purpose, a separate tension adjusting means may be added.

For example, a roller similar in shape to the guide roller 320 may be further installed to closely contact the sheet 310 between the guide rollers 320 arranged up and down, and may be perpendicular to the conveying direction of the sheet 310. The tension can be adjusted by elastically pressing the sheet 310. On the other hand, the sheet 310 is preferably a PTFE (Polytetrafluoro ethylene) material.

The preliminary ejection portion includes a sheet 310 positioned on the upper portion of the rotating part 360 to cover a portion of the front end and the end of the substrate, and the slit nozzle 106 passes therethrough, and photoresist is formed on both the sheet 310 and the glass substrate. By discharging the preliminary discharge and substrate coating without interruption. At this time, the photoresist applied on the sheet 310 is moved downward by the rotation of the guide roller 320 to be cleaned or discarded in the cleaning tank 330.

5 is a side view illustrating various modifications of the preliminary discharge part rotating unit according to the present invention.

As shown in FIG. 5, the rotating part 360 may be configured by two guide rollers 320 and a sheet 310, and may be configured by arranging three guide rollers 320 in a triangular shape. In addition, four guide rollers 320 may be arranged in a trapezoidal form. In this case, in any case, the guide roller 320 is arranged such that the sheet 310 is horizontal on the upper portion of the rotating part 360.

As such, the shape of the rotating part 360 is not limited to FIG. 5 and may have various configurations.

The cleaning tank 330 is positioned below the rotating part 360 so that the sheet 310 positioned below the rotating part 360 is immersed, and the cleaning tank 330 may shower the sheet 310. And a blade and a CDA dryer may be formed. That is, the shower head sprays the cleaning liquid onto the sheet 310 from which the photoresist is discharged, the blade physically removes the cleaning liquid and the photoresist discharged to the sheet 310, and the CDA dryer removes the cleaned sheet 310. It functions to dry.

Therefore, when the sheet 310 having the photoresist discharged from the upper portion of the rotating part 360 rotates laterally and is introduced into the cleaning tank 330, the cleaning solution is sprayed onto the rotating sheet 310 to perform cleaning. The seat 310 is moved to the upper portion of the rotating part 360 to be repeatedly circulated in this operation.

6 is a perspective view showing a modification of the preliminary ejection unit according to the present invention.

Referring to the drawings, the preliminary ejection unit 300 includes a rotating unit 360 and a sheet storage unit 370 provided below the rotating unit 360.

The rotating part 360 includes a guide roller 320 horizontally opposed to each other, and a sheet 310 formed to surround the upper and side surfaces of the guide roller 320. The guide roller 320 may be configured to freely rotate to support the sheet.

The sheet 310 is formed to surround the upper and side surfaces of the guide roller 320 positioned opposite, and the sheet 310 is connected to the sheet storage unit 370. That is, one side of the sheet 310 is connected to a winding roller 370a capable of storing the sheet 310 in which the photoresist is discharged, and the sheet 310 in which the photoresist is not discharged on the other side of the sheet 310. ) Is wound around the take-out roller 370b.

At this time, the driving unit is preferably formed in the take-up roller 370a to rotate the sheet 310 in the lateral direction, and when the take-up roller 370a rotates by the drive unit, the sheet 310 connected to the take-up roller 370a Is wound, and the sheet 310 provided in the take-out roller 370b is released. At this time, the sheet 310 released from the take-out roller 370b is wound to the take-up roller 370a through the side and the upper end of the guide roller 320.

That is, when the photoresist is discharged to the upper end supported by the guide roller 320 during the substrate coating operation, the sheet 310 from which the photoresist is discharged is wound by the winding roller 370a by driving the winding roller 370a. The sheet 310 in which the photoresist is not discharged from the take-out roller 370b moves to the upper end of the guide roller 320. Therefore, when the sheet 310 of the take-out roller 370b is consumed, the substrate coating operation may be performed by replacing the sheet storage unit 370. At this time, the sheet from which the photoresist is discharged is recycled or discarded.

7 is a flowchart illustrating a substrate coating method using the substrate coating apparatus according to the present invention, and FIGS. 8 to 15 are schematic cross-sectional views and perspective views showing detailed operations of the substrate coating apparatus of the present invention.

Referring to FIG. 7, the substrate coating method includes loading a substrate (S10), preliminary ejection unit covering a part of a front end and an end of the substrate (S20), and a nozzle continuously applying a coating agent to the preliminary ejection unit and the substrate. And coating (S30) and unloading the coated substrate (S40).

First, in the coating apparatus configured according to the present invention, the substrate is mounted on the table to load the substrate (S10).

That is, as shown in FIG. 8, the lift pins 230 formed on the table 240 move upwardly to protrude from the table 240 to support the substrate 400, and the substrate 400 may move to the table 240. It is seated on the table 240 by a lift pin 230 protruding upward. The seated substrate 400 is aligned by an aligner (not shown) on the table 240, and vacuum-adsorbed onto the table 240 through a vacuum suction hole to finish loading the substrate (S10). At this time, the preliminary ejection portion is in a retracted state with respect to the table 240.

When the substrate 400 is safely seated on the table 240, the preliminary ejection unit may cover a portion of the front end and the end of the substrate (S20).

That is, the preliminary discharge portion 300 positioned at the front end and the end of the substrate 400 is moved by the transfer member to cover a portion of the front end of the substrate 400 and a portion of the end of the substrate as shown in FIG. 9. This is because part of the front end and the end of the substrate 400 meets process conditions for preventing the photoresist from being coated. In this case, the length B of the sheet 310 of the preliminary discharge part 300 covering the substrate 400 is preferably about 2 mm or less. In addition, the thickness of the sheet 310 is preferably 30um or less.

Of course, the step of covering the substrate 400 with the sheet 310 may be variously changed according to the process conditions. For example, only a portion of the front end of the substrate 400 may be covered, or both the front end and the end of the substrate 400 may not be covered.

At this time, the sheet 310 of the preliminary discharge part 300 covering a portion of the substrate 400 is moved so as not to contact the substrate 400, and after the movement is completed, the sheet 310 is lowered to lower the substrate 400. Contact with a part of the tip and the end of the).

The thickness C of the sheet is more preferably smaller than the distance A between the slit nozzle and the substrate. For example, the distance (A) between the slit nozzle and the substrate is configured to be 200 μm or less, which is a process that can minimize the influence of thickness unevenness due to surface tension when the distance (A) between the slit nozzle and the substrate is less than or equal to 200 μm. This is because the condition is satisfied. Therefore, by configuring the thickness C of the sheet smaller than the distance A between the slit nozzle and the substrate, the slit nozzle can continuously move along the preliminary discharge portion and the substrate.

When the preliminary ejection unit finishes the step S20 of covering the part of the front end and the end of the substrate, the nozzle performs the step of sequentially coating the preliminary ejection unit and the substrate (S30).

That is, the slit nozzle 106 moves to be positioned above the preliminary ejection unit 300a, and sprays a photoresist on the preliminary ejection unit 300a to start ejection. At this time, while discharging the photoresist to control the control factors such as the acceleration of the slit nozzle 106, the moving speed, the injection amount of the photoresist, such that the photoresist is uniformly coated on the substrate 400.

As shown in FIG. 10, the slit nozzle 106 discharges an initial high concentration photoresist to the preliminary ejection portion 300a and a photoresist of a suitable concentration at the tip of the substrate 400 via the preliminary ejection portion 300a. The discharge starts and does not stop by the constant speed movement, but moves to the preliminary discharge portion 300b covering a part of the end of the substrate 400 through the end of the substrate 400 to uniformly coat the photoresist on the entire surface.

This is because the sheet 310 of the preliminary discharge part 300 is continuously in close contact with the front end and the upper end portion of the substrate 400, while the slit nozzle 106 moves at a constant speed, the front end and the upper end portion of the substrate 400 are moved. The uniformity of the photoresist may be improved by allowing the photoresist to be discharged over the entire substrate 400 without coating the photoresist.

When the nozzle finishes the step (S30) of continuously coating the preliminary discharge portion and the substrate, thereafter, the step (S40) of unloading the coated substrate is performed.

That is, as shown in FIG. 11, when the coating of the substrate 400 is finished, the preliminary discharge part 300 covering the front end and the end of the substrate 400 returns to its original position through forward and backward movement. At this time, the photoresist is not applied to the tip and the end of the substrate 400, the photoresist is uniformly coated by the coating method of the present invention.

Subsequently, the vacuum force used to vacuum the substrate 400 is deactivated to separate the substrate 400 from the table 240, and the lift pin 230 positioned inside the table 240 is raised to lift the coated substrate 400. Lift it up. Thereafter, the substrate 400 coated by the external robot arm is unloaded.

At this time, the preliminary ejection unit 300 located at the front and end of the substrate 400 starts to clean the sheet from which the photoresist is ejected to replace the sheet 310. That is, as shown in FIG. 12, the rotating part 360 supporting the sheet 310 rotates, and the sheet discharged from the photoresist rotates laterally to move to the cleaning tank 330 and is cleaned. The sheet is moved above the rotating part 360.

At this time, the contaminated sheet introduced into the cleaning tank 330 undergoes a cleaning process using a nozzle and an exhaust port to remove contaminated material.

In addition, the conventional slit nozzle is always returned to the front end of the substrate after finishing the substrate coating, in this configuration, the coating time can be applied while running the slit nozzle 106 in the reverse direction of the travel direction when coating the next substrate 400 There is also an advantage to reduce.

Subsequently, when the coated substrate 400 is unloaded, a new substrate is seated on the table again, and the preliminary discharge part 300 that has been cleaned is moved to surround a part of the front end and the end of the substrate. The slit nozzle 106 positioned at the end 400 may move in a constant speed in the direction of the front end of the substrate 400 to coat the photoresist on the substrate.

In the above-described embodiment, the preliminary ejection unit 300 is required to move forward and backward in order to load or unload the substrate 400 on the table 240. However, as shown in FIG. 13, when the sheet 310 is formed in a square wave shape, the substrate may be coated without advancing the preliminary discharge portion 300 back and forth, thereby simplifying the construction of the coating apparatus.

That is, as shown in FIG. 13, the sheet 310 may form an uneven portion having a square wave shape. The sheet 310 includes a concave portion 310a having a shape in which a portion of the edge is cut off in a square and a protrusion 310b protruding from the concave portion 310a. The concave portion 310a may be positioned above the guide roller 320 by the rotation of the substrate, and when the substrate is coated, the protrusion 310b may be moved to the upper portion of the guide roller 320 to perform substrate coating. At this time, the width of the recess 310a is substantially similar to or slightly larger than the substrate, and a lower portion of the sheet 310 may further include a cleaning tank or a sheet storage unit according to an exemplary embodiment of the present invention.

As shown in FIG. 14 by the preliminary ejection portion, when loading the substrate 400, the recess 310a is positioned above the guide roller 320 so that the substrate 400 does not interfere with the recess 310a. When the loading of the substrate 400 is completed, the sheet 310 is rotated, as shown in FIG. 15, so that the protrusion 310b may partially remove the edge of the substrate 400. Cover it. In this case, the length of the protrusion 310b covering the substrate 400 is preferably 2 mm.

Thereafter, the preliminary ejection is started by the coating method as shown in the above embodiment, and the slit nozzle is uniformly ejected the photoresist onto the substrate through the constant speed movement to finish the substrate coating operation. When the coating operation of the substrate 400 is finished, as shown in FIG. 14, the sheet 310 is rotated to move the substrate to be positioned in the concave region of the recess 310a, and then the substrate 400 is unloaded. Finish the coating process.

The sheet 310 moved downward may be cleaned by a cleaning tank according to the above-described embodiment, or may be replaced by a roller.

As such, the sheet 310 may be implemented in the shape of a square wave to perform substrate coating without moving the preliminary ejection unit.

Although described above with reference to the drawings and embodiments, those skilled in the art that the present invention can be variously modified and changed within the scope without departing from the spirit of the invention described in the claims below. I can understand.

As described above, the present invention proposes a preliminary ejection apparatus having a new configuration, a substrate coating apparatus and a substrate coating method including the same, so that the process can be simplified and the ejection can be continuously performed without stopping the slit nozzle. Therefore, there is an effect that can improve the thickness uniformity of the front end and the end of the substrate.

In addition, the simplification of the process control factors, in particular the constant movement of the slit nozzle, has the effect of achieving process stability of the substrate coating and cost reduction of the substrate coating apparatus.

In addition, the preliminary ejection device is disposed at the front end and the end of the substrate, thereby greatly contributing to productivity improvement through shortening of the process time.

Claims (10)

At least a pair of sheet conveying portions which are laterally opposed, It includes a sheet formed to move in accordance with the rotation of the sheet conveying portion, And the sheet is configured to cover a portion of the substrate. The preliminary ejection apparatus according to claim 1, wherein the sheet is configured to be circulated and further comprises a cleaning unit for cleaning a portion of the sheet. The preliminary ejection apparatus according to claim 1, wherein the sheet conveying unit is formed of a roller, and one end of the sheet is connected to a winding roller and the other end is connected to a take-out roller and wound around the roller. The preliminary ejection apparatus according to any one of claims 1 to 3, wherein the sheet has a square wave shape in which a recess is formed. An apparatus for coating a substrate, A stage portion on which the substrate is mounted; A preliminary discharging device according to any one of claims 1 to 3, installed on at least one side of the stage; Nozzle part for spraying the coating liquid on the substrate Substrate coating apparatus comprising a. In the method of coating a substrate, Loading the substrate, Covering a part of the front end or the end of the substrate with a sheet, A slit nozzle continuously coating the sheet and the substrate, Removing the sheet from the substrate; Unloading the coated substrate Substrate coating method comprising a. 7. The method of claim 6, further comprising cleaning after removing the sheet from the substrate. 7. The method of claim 6, further comprising laterally moving the sheet after unloading the substrate, and repeating loading and subsequent steps of loading the substrate. . The method of claim 6, wherein covering the sheet and removing the sheet comprise advancing and retracting the sheet toward the substrate, respectively. 10. The method of claim 8, wherein the sheet has a rectangular wave shape having recesses and protrusions formed therein, and the loading of the substrate is performed with a portion of the substrate positioned in the recess, and covering the sheet comprises: Moving laterally to cover a portion of the substrate with protrusions, and removing the sheet includes moving the sheet laterally to expose the entirety of the substrate by recesses of the sheet. Substrate coating method.

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