KR100722814B1 - High dielectric constant and low dielectric loss resin composition for copper foil laminate - Google Patents
High dielectric constant and low dielectric loss resin composition for copper foil laminate Download PDFInfo
- Publication number
- KR100722814B1 KR100722814B1 KR1020040092830A KR20040092830A KR100722814B1 KR 100722814 B1 KR100722814 B1 KR 100722814B1 KR 1020040092830 A KR1020040092830 A KR 1020040092830A KR 20040092830 A KR20040092830 A KR 20040092830A KR 100722814 B1 KR100722814 B1 KR 100722814B1
- Authority
- KR
- South Korea
- Prior art keywords
- resin
- copper foil
- resin composition
- phenol
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 100
- 239000011889 copper foil Substances 0.000 title claims abstract description 97
- 239000011342 resin composition Substances 0.000 title claims abstract description 54
- 229920005989 resin Polymers 0.000 claims abstract description 81
- 239000011347 resin Substances 0.000 claims abstract description 81
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 39
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 26
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 20
- 239000011256 inorganic filler Substances 0.000 claims abstract description 19
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 19
- VKJLWXGJGDEGSO-UHFFFAOYSA-N barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[Ti+4].[Ba+2] VKJLWXGJGDEGSO-UHFFFAOYSA-N 0.000 claims description 21
- 229920003986 novolac Polymers 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 12
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 11
- 239000000945 filler Substances 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims description 10
- 239000002270 dispersing agent Substances 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- -1 Acrylate-ester Chemical compound 0.000 claims description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 9
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 9
- 239000005011 phenolic resin Substances 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 229920006380 polyphenylene oxide Polymers 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 150000003141 primary amines Chemical class 0.000 claims description 7
- 229920000459 Nitrile rubber Polymers 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229920002857 polybutadiene Polymers 0.000 claims description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 4
- 229930003836 cresol Natural products 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 3
- 239000005062 Polybutadiene Substances 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052454 barium strontium titanate Inorganic materials 0.000 claims description 2
- WJAKXPUSJAKPHH-UHFFFAOYSA-N buta-1,3-diene;ethene;styrene Chemical group C=C.C=CC=C.C=CC1=CC=CC=C1 WJAKXPUSJAKPHH-UHFFFAOYSA-N 0.000 claims description 2
- 239000006229 carbon black Substances 0.000 claims description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- 238000007142 ring opening reaction Methods 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229920000800 acrylic rubber Polymers 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 36
- 239000003822 epoxy resin Substances 0.000 abstract description 14
- 230000009477 glass transition Effects 0.000 abstract description 14
- 229920000647 polyepoxide Polymers 0.000 abstract description 14
- 239000003365 glass fiber Substances 0.000 abstract description 12
- 230000002787 reinforcement Effects 0.000 abstract description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003990 capacitor Substances 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 102
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 59
- 230000000052 comparative effect Effects 0.000 description 25
- 239000002002 slurry Substances 0.000 description 19
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 15
- 239000002966 varnish Substances 0.000 description 15
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 8
- 239000004695 Polyether sulfone Substances 0.000 description 7
- 229920006393 polyether sulfone Polymers 0.000 description 7
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 235000013824 polyphenols Nutrition 0.000 description 5
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 4
- 229920001800 Shellac Polymers 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 150000002460 imidazoles Chemical class 0.000 description 4
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 4
- 239000004208 shellac Substances 0.000 description 4
- 229940113147 shellac Drugs 0.000 description 4
- 235000013874 shellac Nutrition 0.000 description 4
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012744 reinforcing agent Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- 229920001342 Bakelite® Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
- C08G73/0627—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with only one nitrogen atom in the ring
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Abstract
본 발명은 수지 부착 동박 및 동착 적층판용 수지 조성물을 제공하는 바, 상기 조성물은 벤족사진 수지, 페놀 경화제, 및 열가소성 수지의 혼합물에 강유전체 무기필러가 고르게 분산되어 있는 구성으로 되어 있다. 이러한 조성은 유리섬유 보강제를 사용하는 대신에 열가소성 수지를 도입함으로써 탄성을 보강하고, 에폭시 수지를 사용하는 대신에 벤족사진 수지를 도입함으로써 유전손실을 낮추었으며, 디시안 디아마이드(Dicy)를 사용하는 대신에 페놀 경화제를 사용함으로써 내열성을 높이는 효과를 가진다. The present invention provides a resin composition for a copper foil with resin and a copper clad laminate, wherein the composition has a structure in which a ferroelectric inorganic filler is evenly dispersed in a mixture of a benzoxazine resin, a phenol curing agent, and a thermoplastic resin. This composition reinforces elasticity by introducing thermoplastic resin instead of glass fiber reinforcement, and lowers dielectric loss by introducing benzoxazine resin instead of epoxy resin, and uses dicyanic diamide. Instead, by using a phenol curing agent has the effect of improving the heat resistance.
상기 조성물을 사용하여 제조된 동박 적층판은 기존의 내장형 캐패시터용 동박 적층판에 비해 두께가 얇고, 유전율이 높기 때문에, 정전용량을 크게 높일 수 있을 뿐 아니라, 높은 유리전이온도와 납 내열 특성을 가지며, 낮은 유전손실 특성을 나타내는 효과가 있다.
The copper foil laminate prepared using the composition has a thinner thickness and a higher dielectric constant than the conventional copper foil laminate for built-in capacitors, and thus can not only significantly increase capacitance, but also have high glass transition temperature and lead heat resistance. Dielectric loss characteristics are effective.
Description
도 1은 본 발명의 실시예에서 동박 적층판의 유전율 및 유전손실을 측정하기 위하여 동박 적층판에 주전극, 접지전극 및 부전극을 패턴화하여 형성한 상태의 모식도이다.
1 is a schematic view of the state formed by patterning the main electrode, ground electrode and the secondary electrode on the copper foil laminate in order to measure the dielectric constant and dielectric loss of the copper foil laminate in the embodiment of the present invention.
본 발명은 임베디드 인쇄회로기판(Embedded PCB)에 사용되는 높은 유전상수와 낮은 유전손실을 갖는 동박 적층판용 수지 조성물에 관한 것이다.The present invention relates to a resin composition for a copper foil laminate having high dielectric constant and low dielectric loss used in an embedded printed circuit board (Embedded PCB).
최근 전자제품에 있어서, 휴대전화, PDA 등과 같은 소형 단말기의 비중이 높아지면서, 단말기의 소형 경량화에 대한 요구가 더욱 높아지고 있다. PCB 내부에 부품을 삽입하는 임베디드 인쇄회로기판 기술은 최단거리 배선이 가능하여 PCB 면적을 줄일 수 있을 뿐 아니라, 표면실장 부품 수를 줄여 실장 신뢰성을 높일 수 있으며, 부품 조립 비용을 절감할 수 있는 장점으로 인해, 최근 주목 받고 있는 기술 중에 하나이다. In recent years, as the proportion of small terminals such as mobile phones and PDAs increases in electronic products, there is an increasing demand for smaller and lighter terminals. Embedded printed circuit board technology, which inserts components inside the PCB, can shorten the wiring distance and shorten the PCB area, increase mounting reliability by reducing the number of surface-mount components, and reduce component assembly costs. Due to this, it is one of the technologies that are attracting attention recently.
종래에 사용되고 있는 임베디드 인쇄회로기판용 동박 적층판은 유리섬유 보강제에 에폭시 섬유를 함침시켜 사용하고 있으며, 정전 용량을 높이기 위해 두께를 얇게 하거나 강유전체 무기필러를 도입하는 방법 등이 제안되고 있다. 그러나 유리섬유 보강제를 사용할 경우 두께를 얇게 하는데 한계가 있고, 에폭시 수지 조성물 자체의 유전손실이 높기 때문에 디커플링용 컨덴서에는 쓰일 수 있으나 고주파용 부품에 있어서는 사용이 곤란하다는 문제점을 가지고 있다.BACKGROUND ART Copper foil laminates for embedded printed circuit boards, which are conventionally used, are used by impregnating epoxy fibers in glass fiber reinforcing agents, and methods of reducing thickness or introducing ferroelectric inorganic fillers have been proposed to increase capacitance. However, when the glass fiber reinforcing agent is used, there is a limit to thin thickness, and because the dielectric loss of the epoxy resin composition itself is high, it may be used in a decoupling capacitor, but it has a problem in that it is difficult to use in high frequency components.
이와 같은 이유로, 수지 조성물의 구성요소로서 에폭시 조성물 대신 분자 중에 질소 원자를 다량 함유한 디히드로 벤조옥사딘환을 가진 화합물을 이용하는 방안이 제안되고 있다. For this reason, a method of using a compound having a dihydro benzooxadine ring containing a large amount of nitrogen atoms in a molecule instead of an epoxy composition has been proposed as a component of the resin composition.
미국특허 제5,162,977호에는 기존 FR-4 에폭시 수지 조성물에 강유전체 필러를 분산시킨 수지 조성물에 유리섬유 보강재를 함침시킨 프리프레그를 제조하여, 그 프리프레그(Prepreg)를 동박 사이에 끼워 넣고 가압하여 임베디드 인쇄회로기판용 동박 적층판을 제조하는 기술이 개시되어 있다. 이 경우, 강유전체 필러를 사용하여 동박 적층판의 유전율을 높일 수 있었으나, 수지 조성물에 있어서 에폭시 수지가 사용되었기 때문에 유전손실이 높고, 디시안 디아마이드 경화제가 사용되어 내열 특성이 떨어지는 단점이 나타났다. 또한, 동박 적층판의 제조 방법에 있어서도 유리섬유 보강재를 사용하였기 때문에 두께를 얇게 하는데 한계가 있어 바람직한 정전용량을 얻기 어렵다는 문제가 있다.U.S. Patent No. 5,162,977 describes a prepreg in which a glass fiber reinforcing material is impregnated into a resin composition in which a ferroelectric filler is dispersed in an existing FR-4 epoxy resin composition, and the prepreg is sandwiched between copper foils to pressurize embedded printing. Disclosed is a technique for producing a copper foil laminate for a circuit board. In this case, the dielectric constant of the copper-clad laminate could be increased by using the ferroelectric filler, but since the epoxy resin was used in the resin composition, the dielectric loss was high and the dicyane diamide curing agent was used, resulting in a poor heat resistance. Moreover, also in the manufacturing method of a copper foil laminated board, since the glass fiber reinforcement material was used, there exists a limit to thin thickness, and there exists a problem that it is difficult to obtain a preferable capacitance.
또한, 미국특허 제6,274,224호에는 에폭시 수지에 바륨 티타네이트를 분산 시킨 조성물을 동박에 코팅하고, 코팅된 동박 2 장을 라미네이트(laminate) 한 후, 가압하여 임베디드 인쇄회로 기판용 동박 적층판을 제조하는 기술이 개시되어 있다. 이 경우, 강유전체 필러가 함유되어 있어 높은 유전율어 높은 유전율을 나타낼 수 있고, 유리섬유 보강재를 사용하지 않고 직접 동박에 코팅하였기 때문에 두께를 얇게 할 수 있어 바람직한 정전용량을 얻을 수 있었으나, 유리섬유 대신 보강재 역할을 할 수 있는 탄성을 가진 열가소성 수지가 포함되어 있지 않기 때문에, 동박 적층판이 잘 부서져 취취급하기가 어려운 것으로 밝혀졌다.In addition, US Pat. No. 6,274,224 discloses a technique of coating a composition obtained by dispersing barium titanate in an epoxy resin on a copper foil, laminating two coated copper foils, and then pressing to manufacture a copper foil laminate for an embedded printed circuit board. Is disclosed. In this case, the ferroelectric filler is contained, so that the high dielectric constant and high dielectric constant can be exhibited, and since the coating is directly on the copper foil without using the glass fiber reinforcement material, the thickness can be made thin, thereby obtaining a desirable capacitance, but instead of the glass fiber reinforcement material It was found that copper foil laminates were brittle and difficult to handle because they did not contain an elastic thermoplastic resin that could play a role.
또한, 미국특허 제6,150,456호에는 열경화성 혹은 열가소성 폴리이미드에 바륨티타네이트와 같은 강유전체 필러를 분산시킨 조성물을 동박에 코팅 한 후, 코팅된 동박 2 장을 프레스나 라미네이트로 접합한 후, 경화하여 임베디드 인쇄회로기판용 동박 적층판을 제조하는 기술이 제조하는 기술이 개시되어 있다. 이 경우, 강유전체 필러를 사용하여 유전율을 높일 수 있었으며, 폴리이미드 자체가 기계적 강도가 크고 탄성이 좋기 때문에 유리섬유 보강재 없이도 동박 적층판의 제조가 가능하다. 그러나 폴리이미드는 에폭시 수지와 같은 열경화성 수지에 비해 경화 온도가 상당히 높기 때문에 350℃ 이상의 온도에서 경화시켜야 하는 단점 때문에 PCB 공정에 쉽게 적용하기 어렵다는 문제점이 있다.In addition, US Patent No. 6,150,456 discloses a composition obtained by dispersing a ferroelectric filler such as barium titanate in a thermosetting or thermoplastic polyimide on a copper foil, and then bonding two coated copper foils by press or laminate, and then curing the embedded printing. The technique which manufactures the technique which manufactures the copper foil laminated board for circuit boards is disclosed. In this case, the dielectric constant could be increased by using a ferroelectric filler, and since the polyimide itself has high mechanical strength and good elasticity, it is possible to manufacture a copper foil laminate without a glass fiber reinforcement. However, polyimide has a problem in that it is difficult to be easily applied to a PCB process because of the disadvantage of curing at a temperature of 350 ° C. or higher because the curing temperature is considerably higher than that of a thermosetting resin such as an epoxy resin.
이와 같이 종래의 수지 조성물은 높은 유전상수와 낮은 유전 손실 및 동박 적층판에 요구되는 다양한 물성들을 균형 있게 제공하지 못하고 있다.
As such, the conventional resin composition does not provide a good balance of various dielectric properties required for high dielectric constant and low dielectric loss and copper foil laminate.
따라서, 본 발명은 상기와 같은 종래 기술의 문제점과 과거로부터 요청되어온 기술적 과제를 해결하는 것을 목적으로 한다. Therefore, an object of the present invention is to solve the problems of the prior art as described above and the technical problem that has been requested from the past.
본 발명자는 심도있는 연구와 다양한 실험을 거듭한 끝에, 벤족사진 수지, 페놀 경화제, 열가소성 수지 및 강유전체 무기필러를 포함하는 동박 적층판용 수지 조성물을 개발하였고, 이러한 조성물은 유리섬유 보강제를 사용하는 대신에 열가소성 수지를 도입하여 탄성을 보강하고, 에폭시 수지를 사용하는 대신에 벤족사진 수지를 도입하여 유전손실을 낮추며, 디시안 디아마이드(Dicy)를 사용하는 대신 페놀 경화제를 사용하여 내열성을 높일 수 있음을 발견하였다. 또한, 상기 조성에 의해 동박 적층판용 조성물에 요구되는 다양한 물성들이 균형있게 얻어질 수 있음을 발견하고, 본 발명을 완성하기에 이르렀다.After extensive research and various experiments, the inventors have developed a resin composition for copper clad laminates comprising benzoxazine resins, phenol curing agents, thermoplastic resins, and ferroelectric inorganic fillers. Introduced thermoplastic resin to reinforce elasticity, benzoxazine resin is introduced instead of epoxy resin to lower the dielectric loss, and phenolic curing agent can be used to improve heat resistance instead of using dicyandiamide. Found. In addition, it has been found that various physical properties required for the composition for copper foil laminated plates can be obtained in a balanced manner by the above composition, and have completed the present invention.
구체적으로 본 발명의 첫 번째 목적은 높은 유전상수, 낮은 유전 손실을 비롯하여, 높은 유리전이온도(Tg), 우수한 동박 박리 강도, 난연성 및 납 내열성 등의 다양한 물성들이 균형 있게 얻어지는 수지 조성물을 제공하는 것이다.Specifically, the first object of the present invention is to provide a resin composition in which various physical properties such as high dielectric constant, low dielectric loss, high glass transition temperature (Tg), excellent copper foil peel strength, flame retardancy, and lead heat resistance are obtained in a balanced manner. .
본 발명의 두 번째 목적은 상기 조성물을 사용하여 제조된 수지 부착 동박을 제공하는 것이다.A second object of the present invention is to provide a copper foil with a resin produced using the composition.
본 발명의 세 번째 목적은 상기 수지 부착 동박을 사용하여 제조된 동박 적층판을 제공하는 것이다.
A third object of the present invention is to provide a copper foil laminated sheet produced using the resin-clad copper foil.
이러한 목적을 달성하기 위한 본 발명에 따른 수지 조성물은, (A) 벤족사진 (Benzoxazine) 수지, (B) 페놀 경화제, (C) 열가소성 수지 및 (D) 강유전체 무기필러를 포함하는 것으로 구성되어 있다.The resin composition according to the present invention for achieving this object is composed of (A) benzoxazine resin, (B) phenol curing agent, (C) thermoplastic resin and (D) ferroelectric inorganic filler.
일반적으로 동박 적층판용 수지 조성물에서 다양한 물성들을 균형있게 향상시키는 것은 매우 어렵다. 반면에, 본 발명은 상기한 특정 구성요소들의 조합에 의해 소망하는 물성들을 발현할 수 있는 동박 적층판용 수지 조성물을 제공한다.In general, it is very difficult to balance various physical properties in the resin composition for copper foil laminate. On the other hand, the present invention provides a resin composition for a copper foil laminate that can express desired properties by a combination of the above specific components.
또한, 본 발명은 상기 수지 조성물을 동박에 5 내지 20 ㎛ 두께로 코팅한 수지 부착 동박을 제공한다.Moreover, this invention provides the copper foil with resin which coat | covered the said resin composition to copper foil in thickness of 5-20 micrometers.
또한, 본 발명은 상기 수지 부착 동박 2 장을 가열 및 가압하거나, 또는 수지 부착 동박과 동박을 가열 및 가압하는 방법으로 일체화시킨 동박 적층판을 제공한다.
Moreover, this invention provides the copper foil laminated board integrated by the method of heating and pressurizing two said copper foils with resin, or heating and pressurizing the copper foil with resin and copper foil.
이하에서 본 발명을 상세하게 설명한다.Hereinafter, the present invention will be described in detail.
본 발명의 조성물에서는 에폭시 수지 대신에 벤족사진 수지를 사용한다. 에폭시 수지를 사용할 경우에는 유리섬유 없이 유전 손실을 0.03 이하로 낮추기 어렵지만, 벤족사진 수지를 사용할 경우에는 유전 손실을 0.02 이하로, 더 나아가 0.01 이하로 떨어뜨리는 것이 가능하다. 또한, 벤족사진 수지 자체의 난연성이 V-1 수준이지만, 본 발명의 조성물에서는 과량의 강유전체 필러가 함께 사용되기 때문에 별도의 난연제 없이도 동박 적층판의 난연성은 V-0 수준에 도달할 수 있다. In the composition of the present invention, benzoxazine resin is used instead of the epoxy resin. When using an epoxy resin, it is difficult to lower the dielectric loss to 0.03 or less without glass fiber, but when using a benzoxazine resin, it is possible to lower the dielectric loss to 0.02 or less and further to 0.01 or less. In addition, although the flame retardancy of the benzoxazine resin itself is V-1 level, in the composition of the present invention, since the excess ferroelectric filler is used together, the flame retardancy of the copper foil laminate may reach V-0 level without a separate flame retardant.
상기 벤족사진 수지(A)는, 디히드로 벤조옥사딘 환을 가지고 있으면서 디히드로 벤조옥사딘의 개환 반응에 의해 경화하는 수지라면 특별히 한정되는 것은 아 니며, 예를 들어, 페놀성 수산기를 가지고 있는 화합물과 1급 아민 및 포름알데히드로부터 합성될 수 있다.The benzoxazine resin (A) is not particularly limited as long as it is a resin having a dihydro benzooxadine ring and cured by a ring opening reaction of dihydrobenzoxadine, for example, a compound having a phenolic hydroxyl group. And primary amines and formaldehyde.
이러한 화합물의 바람직한 예는 하기 화학식 1의 구조를 포함하고 있다.Preferred examples of such compounds include the structure of Formula 1 below.
[화학식 1][Formula 1]
상기 식에서 R1 은 알킬기, 시클로 헥실기, 페닐기, 또는 알킬기나 알콕시기로부터 치환된 페닐기이다.In the formula, R 1 is an alkyl group, a cyclohexyl group, a phenyl group, or a phenyl group substituted from an alkyl group or an alkoxy group.
상기 페놀성 수산기를 가지고 있는 화합물의 예로는, 다관능성 페놀(polyfunctional phenols), 바이페놀 화합물(biphenol compounds), 비스페놀 화합물(bisphenol compounds), 트리스페놀 화합물(trisphenol compounds), 테트라 페놀 화합물(tetraphenol compounds), 페놀 수지(phenolic resins) 등을 들 수 있다. 여기서, 다관능성 페놀의 예로는 카테콜(catechol), 히드로퀴논(hydroquinone), 레졸시놀(resorcinol) 등이 있고, 비스페놀 화합물로는 비스페놀 A(bisphenol A), 비스페놀 F(bisphenol F) 및 그것의 위치 이성질체, 비스페놀 S(bisphenol S) 등이 있으며, 상기 페놀 수지로는 페놀 노볼락 수지, 레졸 페놀 수지, 페놀 변성 크실렌 수지, 알킬 페놀 수지, 멜라민 페놀 수지, 페놀 변성 폴리부타디엔 수지 등이 있다. Examples of the compound having a phenolic hydroxyl group, polyfunctional phenols (bifunctional compounds), biphenol compounds (biphenol compounds), bisphenol compounds (bisphenol compounds), trisphenol compounds (trisphenol compounds), tetraphenol compounds (tetraphenol compounds) And phenolic resins. Here, examples of the polyfunctional phenol include catechol, hydroquinone, resorcinol, and the like, and bisphenol compounds such as bisphenol A, bisphenol F, and their positions Isomers, bisphenol S, and the like, and the phenol resins include phenol novolak resins, resol phenol resins, phenol-modified xylene resins, alkyl phenol resins, melamine phenol resins, and phenol-modified polybutadiene resins.
상기 1급 아민의 예로는, 메틸아민(Methylamine), 시클로헥실아민(Cyclohexylamine), 아닐린(Aniline), 치환 아닐린 등을 들 수 있다. 1급 아민 중에서 지방족 아민을 사용할 경우 경화물의 경화속도가 빨라지나 내열성이 떨어지는 단점이 있으며, 아닐린과 같은 방향족 아민을 사용할 경우 내열성은 향상되지만 경화 속도가 느려지는 단점이 있다.Examples of the primary amine include methylamine, cyclohexylamine, aniline, substituted aniline, and the like. When the aliphatic amine is used among the primary amines, the curing rate of the cured product is increased but the heat resistance is poor. When the aromatic amine such as aniline is used, the heat resistance is improved, but the curing rate is slowed.
상기 벤족사진 수지(A)는 페놀성 수산기를 가지는 화합물 1 몰에 대해 1급 아민을 0.5 내지 1.5 몰, 바람직하게는 0.6 내지 1.0 몰로 첨가하고, 혼합물을 50 내지 60℃ 로 가열한 후, 포름알데히드를 1급 아민 1 몰에 대해 1.5 몰 내지 2.5 몰, 바람직하게는 1.9 몰 내지 2.1 몰로 첨가한 후, 60 내지 120℃, 바람직하게는 90 내지 110℃로 가열하고,가열한 후 60 내지 120 분간 반응시킨 뒤에 100℃ 이상의 온도에서 감압건조에 의해 생성할 수 있다.The benzoxazine resin (A) is 0.5 to 1.5 mol, preferably 0.6 to 1.0 mol of a primary amine per 1 mol of a compound having a phenolic hydroxyl group, and the mixture is heated to 50 to 60 ℃, formaldehyde Is added in an amount of 1.5 mol to 2.5 mol, preferably 1.9 mol to 2.1 mol, based on 1 mol of the primary amine, and then heated to 60 to 120 캜, preferably 90 to 110 캜, and heated for 60 to 120 minutes. After drying, it may be produced by drying under reduced pressure at a temperature of 100 ° C. or higher.
상기 벤족사진 수지(A)의 바람직한 함량은 전체 수지 조성물 100 중량부에 대해 40 내지 90 중량부이고, 더욱 바람직하게는 60 내지 80 중량부이다. 벤족사진 수지의 함량이 40 중량부 미만인 경우는 소망하는 난연성을 제공하기 어렵고, 90 중량부를 초과하면 접착력이 떨어지고, 수지 조성물의 취성이 증가하는 문제점이 발생할 수 있으므로 바람직하지 않다. The preferred content of the benzoxazine resin (A) is 40 to 90 parts by weight, more preferably 60 to 80 parts by weight based on 100 parts by weight of the total resin composition. When the content of the benzoxazine resin is less than 40 parts by weight, it is difficult to provide the desired flame retardancy, and when it exceeds 90 parts by weight, the adhesive strength is lowered, and the problem that the brittleness of the resin composition may increase may be undesirable.
상기 페놀 경화제(B)는 벤족사진의 경화반응을 촉진시키는 역할을 하며, 기존의 에폭시 수지 경화제로 널리 쓰이는 디시안 디아마이드(Dicy)와는 달리 내열성을 떨어뜨리지 않는다. 상기 페놀 경화제(B)로는 페놀 노볼락 수지, 비스페놀 A 노볼락 수지, 크레졸 노볼락 수지, 페놀변변성 크실렌 수지, 알킬 페놀 수지, 멜라 민 변성 수지 등이 사용될 수 있다.The phenol curing agent (B) serves to promote the curing reaction of the benzoxazine, and does not degrade heat resistance unlike dicyandiamide (Dicy) widely used as a conventional epoxy resin curing agent. As the phenol curing agent (B), a phenol novolak resin, a bisphenol A novolak resin, a cresol novolak resin, a phenol-modified xylene resin, an alkyl phenol resin, melamine-modified resin and the like may be used.
상기 페놀 경화제(B)는 당량이 110 이상, 바람직하게는 120 이상인 것이 적합하며, 수평균 분자량은 1000, 바람직하게는 1500 이상인 고분자형 페놀 수지를 사용하는 것이 좋다. 페놀 경화제(B)의 함량은 상기 벤족사진 수지(A) 100 중량부에 대해 1 내지 50 중량부가 사용되며, 바람직하게는 5 내지 20 중량부가 사용된다. 상기 페놀 경화제(B)가 벤족사진 수지 100 중량부에 대해 1 중량부 미만으로 사용될 경우는 경화반응이 느려져서 경화시간이 오래 걸리는 단점이 있으며, 50 중량부를 초과하여 사용될 경우 역시 과량의 미경화 페놀이 발생되어 내열성이 떨어지는 단점이 있다.It is suitable that the said phenol hardener (B) is 110 or more, Preferably it is 120 or more, The number average molecular weight is 1000, It is good to use the high molecular type phenol resin which is preferably 1500 or more. The content of the phenol curing agent (B) is 1 to 50 parts by weight based on 100 parts by weight of the benzoxazine resin (A), preferably 5 to 20 parts by weight. When the phenol curing agent (B) is used in less than 1 part by weight based on 100 parts by weight of benzoxazine resin, there is a disadvantage in that the curing reaction is slow and takes a long time, and when used in excess of 50 parts by weight, an excessive amount of uncured phenol is also used. There is a disadvantage that the heat resistance is generated.
본 발명의 수지 조성물에는 경화반응을 촉진하기 위하여 경화촉진제를 더 포함할 수 있으며, 그러한 경화촉진제로는 이미다졸계 경화촉진제가 바람직하다. 상기 이미다졸계 경화촉진제의 예로는, 1-메틸이미다졸(1-Methylimidazole), 2-메틸이미다졸(2-Methylimidazole), 2-에틸-4-메틸이미다졸(2-Ethyl-4-methylimidazole), 2-페닐이미다졸(2-Phenylimidazole), 2-시클로헥실-4-메틸이미다졸(2-Cyclohexyl-4-methylimidazole), 4-부틸-5-에틸이미다졸(4-Butyl-5-ethyl imidazole), 2-메틸-5-에틸이미다졸(2-Methyl-5-ethylimidazole), 2-옥틸-4-헥실이미다졸(2-Octhyl-4-hexylimidazole), 2,5-클로로-4-에틸이미다졸(2,5-Chloro-4-ethyl imidazole), 2-부톡시-4-알릴이미다졸(2-Butoxy-4-allylimidazole)과 같은 이미다졸, 이미다졸 유도체 등이 있으며, 우수한 반응 안정성 및 저가로 인해 2-메틸이미다졸이나 2-페닐이미다졸이 특히 바람직하다. 이때 이미다졸의 함량은 전체 수지 성분 100 중량부에 대하여 0.01 내지 0.1 중량부로 사용되며, 보다 바람직하게는 0.03 내지 0.06 중량부로 사용된다. 상기 이미다졸의 함량이 0.01 중량부 보다 작게 사용될 경우 경화시간이 오래 걸리고 유리전이 온도가 충분히 나오지 않는 문제가 발생하며, 0.1 중량부를 초과하여 사용될 경우바니쉬 바니쉬(varnish)의 저장 안정성이 떨어진다.The resin composition of the present invention may further include a curing accelerator in order to promote the curing reaction, and such a curing accelerator is preferably an imidazole series curing accelerator. Examples of the imidazole series curing accelerators include 1-methylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole (2-Ethyl-4 -methylimidazole), 2-Phenylimidazole, 2-cyclohexyl-4-methylimidazole, 4-butyl-5-ethylimidazole (4- Butyl-5-ethyl imidazole), 2-Methyl-5-ethylimidazole, 2-octyl-4-hexylimidazole, 2, Imidazoles, such as 5-chloro-4-ethylimidazole, 2-butoxy-4-allylimidazole, imidazole Derivatives and the like, and 2-methylimidazole and 2-phenylimidazole are particularly preferred due to excellent reaction stability and low cost. At this time, the content of imidazole is used in an amount of 0.01 to 0.1 parts by weight, and more preferably 0.03 to 0.06 parts by weight, based on 100 parts by weight of the total resin component. If the content of the imidazole is used less than 0.01 parts by weight, the curing time is long and the glass transition temperature does not come out enough, when used in excess of 0.1 parts by weight of varnish varnish (varnish) storage stability is poor.
경우에 따라서는, 상기 이미다졸과 더불어서 경화 속도의 조절 및 유리전이온도(Tg)의 향상을 위하여, 본 발명의 조성물에 경화 지연제가 더 포함될 수도 있다. 이러한 경화 지연제로는, 붕산(boric acid), 살리실산(salicylic acid), 염산(hydrochloric acid), 황산(sulfuric acid), 옥살산(oxalic acid), 테레프탈산(terephthalic acid), 이소프탈산(isophthalic acid), 인산(phophoric acid), 라틱산(lactic acid) 등을 사용할 수 있으며, 그것의 함량은 이미다졸 경화 촉진제의 몰 당량을 기준으로 0.1 내지 10 몰 당량이 바람직하며, 0.5 내지 5 몰 당량이 더욱 바람직하다.In some cases, in addition to the imidazole, a curing retardant may be further included in the composition of the present invention for controlling the curing rate and improving the glass transition temperature (Tg). Such curing retardants include boric acid, salicylic acid, hydrochloric acid, sulfuric acid, oxalic acid, terephthalic acid, isophthalic acid, and phosphoric acid. (phophoric acid), lactic acid, and the like, and the content thereof is preferably 0.1 to 10 molar equivalents, more preferably 0.5 to 5 molar equivalents, based on the molar equivalent of the imidazole cure accelerator.
상기 열가소성 수지(C)는 유리섬유 보강제 대신 수지 조성물에 탄성을 부여하고 지지하는 역할을 하는 동시에, 유전율을 높이기 위해 첨가되는 과량의 무기필러로 인해 수지가 잘 부서지고 동박과의 접착력이 떨어지는 문제를 줄여주는 역할을 한다. 상기 열가소성 수지(C)의 예로는, 폴리 에테르 설폰(PES), 폴리 페닐렌 옥사이드(PPO), 아크릴로 니트릴 부타디엔 고무(NBR), 카르복실 말단 아크릴로 니트릴 부타디엔 고무(CTBN), 카르복실 말단 부타디엔 고무(CTB), 아크릴 산, 아크릴레이드-에스테르, 아크릴아마이드를 조합한 아크릴 고무(acryl rubber), 바닐 말단 폴리 부타디엔 고무(VTBN), 스티렌 부타디엔 고무(SBR), 스티렌 부타디엔 에틸렌(SBE), 폴리에스테르, 폴리스티렌(PS) 폴리비닐아세탈(PVA), 폴리아마이드(polyamide), 페녹시(phenoxy) 등을 들 수 있고, 이들을 단독으로 또는 2 종류 이상을 혼합하여 사용할 수 있다. 상기 열가소성 수지(C)의 함량은 전체 수지 조성물의 중량을 기준으로 5 내지 30 중량% 인 것이 바람직하다. 열가소성 수지가 5 중량% 미만으로 사용될 경우에는 탄성이 적고 잘 부서지기 때문에 보강제 역할을 충분히 발휘할 수 없는 단점이 있고, 30 중량% 를 초과하여 사용될 경우에는 분자량이 큰 고분자 열가소성 수지와 열경화성 수지 간에 상전이 현상이 발생되고, 조성물의 최저 점도가 높아져 수지 흐름성이 줄어들기 때문에 프레스 접합시에 수지 부착 동박과 수지 부착 동박 사이 및/또는 수지 부착 동박과 동박 사이에 접합이 제대로 이루어지지 못하는 문제가 발생할 수 있다.The thermoplastic resin (C) serves to provide elasticity and support to the resin composition instead of the glass fiber reinforcement, and at the same time, the resin is easily broken due to the excessive inorganic filler added to increase the dielectric constant, and the adhesion to the copper foil is poor. It serves to reduce. Examples of the thermoplastic resin (C) include polyether sulfone (PES), polyphenylene oxide (PPO), acrylonitrile butadiene rubber (NBR), carboxyl terminated acrylonitrile butadiene rubber (CTBN), carboxyl terminated butadiene Rubber (CTB), acrylic acid, acrylate-ester, acryl rubber in combination with acrylamide, vanyl-terminated polybutadiene rubber (VTBN), styrene butadiene rubber (SBR), styrene butadiene ethylene (SBE), polyester And polystyrene (PS) polyvinyl acetal (PVA), polyamide, phenoxy, and the like, and these may be used alone or in combination of two or more thereof. The content of the thermoplastic resin (C) is preferably 5 to 30% by weight based on the total weight of the resin composition. If the thermoplastic resin is used at less than 5% by weight, the elasticity and brittleness of the thermoplastic resin may not be sufficient. Therefore, when used in excess of 30% by weight, the phase transition phenomenon between the high molecular weight thermoplastic resin and the thermosetting resin is used. May occur, and the minimum viscosity of the composition may be increased to reduce resin flowability, and thus, bonding may not occur properly between the copper foil with resin and the copper foil with resin and / or between the copper foil with resin and copper foil during press bonding. .
본 발명의 조성물에 첨가되는 상기 강유전체 무기필러(D)로는, 예를 들어, 바륨 티타늄 옥사이드(Barium titanium oxide), 바륨 스트론티움 티타네이드(Barium strontium titanate), 티타늄 옥사이드(Titanium oxide), 리드 지르코니움 티타네이트(Lead zirconium titanate), 리드 렌타늄 지르코네이이트 티타네이트(Lead lanthanum zirconate titanate), 리드 마그네슘 니보에이트-리드 티타네이트(Lead magnesium niobate-lead titanate), 은, 니켈, 니켈-코팅 폴리머 스페어(Nickel coated Polymer sphere), 금-코팅 폴리머 스페어(Gold coated Polymer sphere), 틴 소울더(Tin solder), 그래피트(Graphite), 탄탈륨 니티데(Tantalum nitides), 메탈 실리콘 니트라이드(Metal silicon nitride), 카본 블랙(Carbon black) 및 알루미늄 보레이트(Aluminum borate) 중에서 선택적으로 사용할 수 있으며, 이들을 단독으로 또는 2 종류 이상을 혼합하여 사용할 수 있다. 경우에 따라서는, 다소 유전율이 떨어지지만 실리카(Silica), 크레이(Clay) 등을 사용할 수도 있다. 상기 강유전체 무기필러(D)의 입경은 0.1 내지 10 ㎛ 인 것이 바람직하다.As the ferroelectric inorganic filler (D) added to the composition of the present invention, for example, barium titanium oxide (barium titanium oxide), barium strontium titanate, titanium oxide (Titanium oxide), lead zir Lead zirconium titanate, lead lanthanum zirconate titanate, lead magnesium niobate-lead titanate, silver, nickel, nickel-coated Nickel coated Polymer sphere, Gold coated Polymer sphere, Tin solder, Graffite, Tantalum nitides, Metal silicon nitride Nitride, Carbon black and Aluminum borate can be optionally used, and these can be used alone or in combination of two or more. have. In some cases, although the dielectric constant is slightly lower, silica, cray, or the like may be used. The particle diameter of the ferroelectric inorganic filler (D) is preferably 0.1 to 10 ㎛.
상기 강유전체 무기필러(D)의 함량은 전체 수지 조성물 100 중량부를 기준으로 10 내지 700 중량부인 것이 바람직하다. 무기필러(D)의 함량이 10 중량부 미만이면 첨가에 따른 효과를 발휘하기 어렵고, 반대로 700 중량부를 초과하면 수지 흐름이 너무 적어 프레스 접합이 되지 않는 문제점이 발생하므로 바람직하지 않다.The content of the ferroelectric inorganic filler (D) is preferably 10 to 700 parts by weight based on 100 parts by weight of the total resin composition. If the content of the inorganic filler (D) is less than 10 parts by weight, it is difficult to exert the effect of the addition, on the contrary, if it exceeds 700 parts by weight, the resin flow is too small, which is not preferable because the press bonding occurs.
경우에 따라서는, 조성물 내에서의 강유전체 무기필러(D)의 분산을 고르게 하고, 그것의 침강을 방지하기 위하여 적절한 분산제를 더 포함할 수 있으며, 이러한 분산제는 카르복실레이트, 설포네이트, 및 포스페이트로 이루어진 군으로 선택할 수 있다. 상기 분산제가 첨가되는 경우, 그것의 함량은 강유전체 무기필러(D) 1 중량부에 대해 0.005 내지 0.05 중량부가 바람직하며, 더욱 바람직한 함량은 0.01 내지 0.03 중량부이다. In some cases, it may further comprise an appropriate dispersant to evenly disperse the ferroelectric inorganic filler (D) in the composition and prevent its settling, which dispersant may be carboxylate, sulfonate, and phosphate. You can choose from the group consisting of. When the dispersant is added, its content is preferably 0.005 to 0.05 parts by weight, more preferably 0.01 to 0.03 parts by weight based on 1 part by weight of the ferroelectric inorganic filler (D).
본 발명은 또한, 상기 수지 조성물을 동박에 5 내지 20 ㎛ 두께로 코팅한 수지 부착 동박을 제공한다. 또한, 본 발명은 그러한 수지 부착 동박 2 장을 가열 및 가압하여 일체화시키거나, 수지 부착 동박과 동박을 가열 및 가압하는 방법으로 일체화시킨 동박 적층판을 제공한다.This invention also provides the copper foil with resin which coat | covered the said resin composition to copper foil in thickness of 5-20 micrometers. Moreover, this invention provides the copper foil laminated board integrated by the method of heating and pressurizing two such copper foils with resin, and integrated, or the method of heating and pressurizing the copper foil with resin and copper foil.
이들 수지 부착 동박과 동박 적층판의 제조방법은 당업계에 공지되어 있으므로, 그에 대한 자세한 설명은 생략한다.
Since the manufacturing method of these copper foil with resin and copper foil laminated board is known in the art, the detailed description is abbreviate | omitted.
이하, 실시예 및 비교예를 통하여 본 발명의 내용을 상술하지만, 본 발명의 범주가 그것에 의해 한정되는 것은 아니다.Hereinafter, the content of the present invention will be described in detail through Examples and Comparative Examples, but the scope of the present invention is not limited thereto.
[실시예 1]Example 1
하기 표 1에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared in the composition shown in Table 1 below.
(1) 슬러리 제조(1) slurry production
메틸에틸케톤(MEK) 30 g과 디메틸포름알데히드(DMF) 30 g에 분산제(BYK-Chemi社 BYK W9010) 3 g을 완전히 용해시킨 후, 볼밀(Ball mill) 용기에 넣고, 강유전체 필러로서 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g을 넣은 뒤 24 시간 동안 볼밀하여 슬러리를 제조하였다.
After completely dissolving 3 g of a dispersant (BYK-Chemi BYK W9010) in 30 g of methyl ethyl ketone (MEK) and 30 g of dimethyl formaldehyde (DMF), it was placed in a ball mill container and barium titanium oxide as a ferroelectric filler. (Sakai BT05) 300 g of the ball was added for 24 hours to prepare a slurry.
(2) 바니쉬 제조(2) varnish manufacturing
먼저 500 ml 비이커에 메틸에틸케톤(MEK) 90 g과 디메틸포름알데히드(DMF) 150 g에 폴리비닐아세탈(Sekisui社 KS-5z) 40 g, 에폭시 변성 폴리페닐렌 옥사이드(Asahi Kasei社 P412) 20 g을 완전히 녹인 후, 벤족사진 수지(Huntsman社, XTW8291, 메틸에틸케톤 80% 용해) 250 g, 페놀 노볼락 수지(Huntsman社, XTW8293, 메틸에틸케톤 68% 용해) 58.84 g, 및 2-페닐이미다졸 0.06 g을 넣고 완전히 용해시킨 후, 상기 (1)에서 제조한 슬러리를 첨가한 후, 10 시간 동안 믹싱하여, 바니쉬(Varnish)를 제조하였다.
First, in a 500 ml beaker, 90 g of methyl ethyl ketone (MEK), 150 g of dimethyl formaldehyde (DMF), 40 g of polyvinyl acetal (Sekisui KS-5z), 20 g of epoxy modified polyphenylene oxide (Asahi Kasei P412) After completely dissolved, 250 g of benzoxazine resin (Huntsman, XTW8291, methyl ethyl ketone dissolved 80%), phenol novolak resin (Huntsman, XTW8293, methyl ethyl ketone 68% dissolved), 58.84 g, and 2-phenylimida 0.06 g of sol was added and completely dissolved. Then, the slurry prepared in (1) was added thereto, followed by mixing for 10 hours to prepare a varnish.
(3) 동박 적층판 제조(3) Copper Clad Laminate Manufacturing
두께가 18 ㎛인 동박(Furukawa社 F2-WS)에 상기 (2)에서 제조한 바니쉬를 최종 두께가 10 ㎛가 되도록 코팅한 후, 170℃에서 6 분간 건조하여, 수지 부착 동박을 제조하였다. 상기 수지 부착 동박 2 장을 맞대고, 프레스를 이용하여 200℃의 온도 및 35 kg/㎠의 압력으로 90 분간 가열, 가압하여 유전체 두께가 20 ㎛인 동박 적층판을 제조하였다.
The varnish prepared in (2) was coated on a copper foil (Furukawa Co., F2-WS) having a thickness of 18 μm so as to have a final thickness of 10 μm, and then dried at 170 ° C. for 6 minutes to prepare a copper foil with resin. The two copper foils with the resin were faced together and heated and pressed for 90 minutes at a temperature of 200 ° C. and a pressure of 35 kg / cm 2 using a press to prepare a copper foil laminate having a dielectric thickness of 20 μm.
[실시예 2]Example 2
하기 표 1에 나타낸 조성으로 조성물을 제조하였다.A composition was prepared with the composition shown in Table 1 below.
슬러리를 제조함에 있어서, 메틸에틸케톤(MEK) 30 g 대신 60 g, 디메틸포름알데히드(DMF) 30 g 대신 60 g, 분산제(BYK-Chemi社 BYK W9010) 3 g 대신 6 g, 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g 대신 600 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
In preparing the slurry, 60 g instead of 30 g of methyl ethyl ketone (MEK), 60 g instead of 30 g of dimethylformaldehyde (DMF), 6 g instead of 3 g of a dispersant (BYK-Chemi BYK W9010), barium titanium oxide (Sakai BT05) A copper foil laminate was manufactured in the same manner as in Example 1, except that 600 g was used instead of 300 g.
[실시예 3]Example 3
하기 표 1에 나타낸 조성으로 비할로겐계 수지 조성물을 제조하였다.A non-halogen resin composition was prepared with the composition shown in Table 1 below.
슬러리를 제조함에 있어서, 메틸에틸케톤(MEK) 30 g 대신 90 g, 디메틸포름알데히드(DMF) 30 g 대신 90 g, 분산제(BYK-Chemi社 BYK W9010) 3 g 대신 9 g, 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g 대신 900 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
In preparing the slurry, 90 g instead of 30 g of methyl ethyl ketone (MEK), 90 g instead of 30 g of dimethylformaldehyde (DMF), 9 g instead of 3 g of a dispersant (BYK-Chemi, BYK W9010), barium titanium oxide (Sakai BT05) Copper foil laminate was manufactured in the same manner as in Example 1, except that 900 g was used instead of 300 g.
[실시예 4]Example 4
하기 표 1에 나타낸 조성으로 비할로겐계 수지 조성물을 제조하였다.A non-halogen resin composition was prepared with the composition shown in Table 1 below.
슬러리를 제조함에 있어서, 메틸에틸케톤(MEK) 30 g 대신 120 g, 디메틸포름알데히드(DMF) 30 g 대신 120 g, 분산제(BYK-Chemi社 BYK W9010) 3 g 대신 12 g, 강유전체 필러인 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g 대신 1200 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
In preparing the slurry, 120 g instead of 30 g of methyl ethyl ketone (MEK), 120 g instead of 30 g of dimethylformaldehyde (DMF), 12 g instead of 3 g of a dispersant (BYK-Chemi BYK W9010), barium titanium as a ferroelectric filler A copper foil laminate was manufactured in the same manner as in Example 1, except that 1200 g was used instead of 300 g of oxide (Sakai BT05).
[실시예 5]Example 5
하기 표 1에 나타낸 조성으로 비할로겐계 수지 조성물을 제조하였다.A non-halogen resin composition was prepared with the composition shown in Table 1 below.
바니쉬를 제조함에 있어서, 메틸에틸케톤(MEK) 90 g 대신 110 g, 에폭시 변성 폴리페닐렌 옥사이드(Asahi Kasei社 P412) 20 g을 사용하는 대신 폴리스티렌(엘지화학社 GPPS 15NFE) 20 g, 페놀 노볼락 수지(Huntsman社, XTW8293, 메틸에틸케톤 68% 용해) 58.84 g을 사용하는 대신 고분자형 페놀 노볼락 수지(Gifu Shellac GPX-41) 40 g을 사용하였다는 것을 제외하고는, 상기 실시예 2와 동일한 방법으로 동박 적층판을 제조하였다.
In preparing varnish, instead of 90 g of methyl ethyl ketone (MEK), 110 g, 20 g of epoxy modified polyphenylene oxide (Asahi Kasei P412), 20 g of polystyrene (GPPS 15NFE, LG Chemical), phenol novolac Except that 58.84 g of the resin (Huntsman, XTW8293, 68% methylethyl ketone dissolved) was used, the same as in Example 2 except that 40 g of the polymer type phenol novolak resin (Gifu Shellac GPX-41) was used. The copper foil laminated board was manufactured by the method.
[실시예 6]Example 6
하기 표 1에 나타낸 조성으로 비할로겐계 수지 조성물을 제조하였다. A non-halogen resin composition was prepared with the composition shown in Table 1 below.
슬러리 제조에 있어서, 메틸에틸케톤(MEK) 60 g과 디메틸포름알데히드(DMF) 60 g을 사용하는 대신 디메틸포름알데히드 120 g을 사용하였다는 것을 제외하고는 실시예 2와 동일한 방법으로 슬러리를 제조하였다. In preparing the slurry, a slurry was prepared in the same manner as in Example 2, except that 120 g of dimethylformaldehyde was used instead of 60 g of methyl ethyl ketone (MEK) and 60 g of dimethyl formaldehyde (DMF). .
바니쉬를 제조함에 있어서, 메틸에틸케톤(MEK) 90 g과 디메틸포름알데히드(DMF) 150 g을 사용하는 대신 디메틸포름알데히드 240 g, 폴리비닐아세탈(Sekisui社 KS-5z) 40 g을 사용하는 대신 반응형 폴리비닐아세탈(Sekisui社 KS-23Z) 30 g, 에폭시 변성 폴리페닐렌 옥사이드(Asahi Kasei社 P412) 30 g을 사용하는 대신 폴리에테르설폰(Smitomo 화학社 5003PS) 30 g, 페놀 노볼락 수지(Huntsman社 XTW8293, 메틸에틸케톤 68%용해) 58.84 g을 사용하는 대신 고분자형 페놀 노볼락 수지(Gifu Shellac GPX-41) 40 g을 사용하였다는 것을 제외하고는, 실시예 2와 동일한 방법으로 동박 적층판을 제조하였다.
In preparing varnish, instead of using 90 g of methyl ethyl ketone (MEK) and 150 g of dimethyl formaldehyde (DMF), instead of using 240 g of dimethyl formaldehyde and 40 g of polyvinyl acetal (Sekisui KS-5z) Instead of using 30 g of polyvinyl acetal (Sekisui KS-23Z), 30 g of epoxy modified polyphenylene oxide (Asahi Kasei P412), 30 g of polyethersulfone (Smitomo Chemical 5003PS), phenol novolac resin (Huntsman Copper foil laminates were prepared in the same manner as in Example 2, except that 40 g of a polymeric phenol novolak resin (Gifu Shellac GPX-41) was used instead of 58.84 g of XTW8293, 68% dissolved in methyl ethyl ketone. Prepared.
[비교예 1]Comparative Example 1
하기 표 2에 나타낸 조성으로 수지 조성물을 제조하였다. A resin composition was prepared with the composition shown in Table 2 below.
먼저 500 ㎖ 비이커에 메틸에틸케톤(MEK) 115 g, 디메틸포름알데히드(DMF) 150 g 및 아민계 경화제인 디시안디아마이드(Dicy) 6.1 g을 가하여 완전히 용해시킨 후, 폴리비닐아세탈(Sekisui社 KS-5z) 40 g과 에폭시 변성 폴리페닐렌 옥사이드(Asahi Kasei社 P412) 20 g을 가하여 완전히 용해시켰다. 그런 다음, 비스페놀 A형 에폭시 수지(베이크라이트社, LER1222, 메틸에틸케톤 80%용해) 175 g, 크레졸 노볼락 에폭시 수지(베이크라이트社, LER N690) 60 g 및 2-페닐이미다졸 0.3 g을 혼합 용액에 넣고 완전히 용해시켜, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
First, 115 g of methyl ethyl ketone (MEK), 150 g of dimethylformaldehyde (DMF), and 6.1 g of dicyandiamide (Dicy), an amine curing agent, were completely dissolved in a 500 ml beaker, followed by complete dissolution. Then, polyvinyl acetal (Sekisui KS- 5z) 40 g and 20 g of epoxy-modified polyphenylene oxide (Asahi Kasei Co., P412) were added to dissolve completely. Then, 175 g of bisphenol A type epoxy resin (Bakelite, LER1222, methyl ethyl ketone dissolved in 80%), 60 g of cresol novolac epoxy resin (BAKELITE, LER N690) and 0.3 g of 2-phenylimidazole were added. It was put in a mixed solution and completely dissolved, to prepare a copper foil laminate in the same manner as in Example 1.
[비교예 2]Comparative Example 2
하기 표 2에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared with the composition shown in Table 2 below.
실시예 2와 동일한 방법으로 슬러리를 제조하였다는 것을 제외하고는, 상기 비교예 1과 동일한 방법으로 동박 적층판을 제조하였다.
A copper foil laminate was produced in the same manner as in Comparative Example 1 except that the slurry was prepared in the same manner as in Example 2.
[비교예 3]Comparative Example 3
하기 표 2에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared with the composition shown in Table 2 below.
실시예 3과 동일한 방법으로 슬러리를 제조하였다는 것을 제외하고는, 상기 비교예 1과 동일한 방법으로 동박 적층판을 제조하였다.
A copper foil laminate was manufactured in the same manner as in Comparative Example 1 except that the slurry was prepared in the same manner as in Example 3.
[비교예 4][Comparative Example 4]
하기 표 2에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared with the composition shown in Table 2 below.
실시예 4와 동일한 방법으로 슬러리를 제조하였다는 것을 제외하고는, 상기 비교예 1과 동일한 방법으로 동박 적층판을 제조하였다.
A copper foil laminate was produced in the same manner as in Comparative Example 1 except that the slurry was prepared in the same manner as in Example 4.
[비교예 5][Comparative Example 5]
하기 표 2에 나타낸 조성으로 수지 조성물을 제조하였다. A resin composition was prepared with the composition shown in Table 2 below.
슬러리 제조에 있어서, 메틸에틸케톤(MEK) 60 g과 디메틸포름알데히드(DMF) 60 g을 사용하는 대신 디메틸포름알데히드 120 g을 사용하였다는 것을 제외하고는, 상기 실시예 2와 동일한 방법으로 슬러리를 제조하였다. In preparing the slurry, the slurry was prepared in the same manner as in Example 2, except that 120 g of dimethylformaldehyde was used instead of 60 g of methyl ethyl ketone (MEK) and 60 g of dimethyl formaldehyde (DMF). Prepared.
바니쉬를 제조함에 있어서, 메틸에틸케톤(MEK) 115 g과 디메틸포름알데히드(DMF) 150 g을 사용하는 대신 디메틸포름알데히드 265 g, 아민계 경화제인 디시안디아마이드(Dicy) 6.1 g을 사용하는 대신 고분자형 페놀경화제(Gifu Shellac社 GPX-41) 70 g, 폴리비닐아세탈(Sekisui社 KS-5z) 40 g을 사용하는 대신 반응형 폴리비닐아세탈(Sekisui社 KS-23Z) 30 g, 에폭시 변성 폴리페닐렌 옥사이드(Asahi Kasei社 P412) 30 g을 사용하는 대신 폴리에테르설폰(Smitomo 화학社 5003PS) 30 g, 아민계 경화제인 디시안 디아마이드디아마이드 6.1 g을 사용하는 대신 고분자형 페놀 노볼락 수지(Gifu Shellac GPX-41)을 사용하였다는 것을 제외하고는, 상기 비교예 2와 동일한 방법으로 동박 적층판을 제조하였다.
In preparing varnish, instead of using 115 g of methyl ethyl ketone (MEK) and 150 g of dimethyl formaldehyde (DMF), instead of using 265 g of dimethylformaldehyde and 6.1 g of dicyandiamide (Dicy), an amine curing agent, 70 g of polyphenol acetal (Gifu Shellac, GPX-41), 40 g of polyvinyl acetal (KS-5z, Sekisui), 30 g of reactive polyvinyl acetal (KS-23Z, Sekisui), epoxy modified polyphenylene Instead of using 30 g of oxide (Asahi Kasei P412), instead of using 30 g of polyether sulfone (Smitomo Chemical Co., Ltd. 5003PS) and 6.1 g of dicyanic diamide diamide, an amine-based curing agent, polymer type phenol novolak resin (Gifu Shellac) A copper foil laminate was manufactured in the same manner as in Comparative Example 2, except that GPX-41) was used.
[비교예 6]Comparative Example 6
하기 표 3에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared in the composition shown in Table 3 below.
슬러리를 제조함에 있어서, 메틸에틸케톤(MEK) 30 g 대신 50 g, 디메틸포름알데히드(DMF) 30 g 대신 50 g, 분산제(BYK-Chemi社 BYK W9010) 3 g 대신 5 g, 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g 대신 500 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 슬러리를 제조하였다.In preparing the slurry, 50 g instead of 30 g of methyl ethyl ketone (MEK), 50 g instead of 30 g of dimethylformaldehyde (DMF), 5 g instead of 3 g of a dispersant (BYK-Chemi BYK W9010), barium titanium oxide (Sakai BT05) Slurry was prepared in the same manner as in Example 1, except that 500 g was used instead of 300 g.
바니쉬를 제조함에 있어서, 페놀 노볼락 수지(Huntsman社, XTW8293, 메틸에 틸케톤 68% 용해) 58.84 g 대신 디시안 디아마이드(Dicy) 10 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
In preparing the varnish, Example 1 and 10 except that 10 g of dicyan diamide was used instead of 58.84 g of phenol novolak resin (Huntsman, XTW8293, methyl ketone 68% dissolved in methyl). The copper foil laminated sheet was manufactured by the same method.
[비교예 7]Comparative Example 7
하기 표 3에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared in the composition shown in Table 3 below.
(1) 슬러리 제조(1) slurry production
슬러리를 제조함에 있어서, 메틸에틸케톤(MEK) 30 g 대신 120 g, 디메틸포름알데히드(DMF) 30 g 대신 120 g, 분산제(BYK-Chemi社 BYK W9010) 3 g 대신 12 g, 바륨 티타늄 옥사이드(Sakai社 BT05) 300 g 대신 1200 g을 사용하였다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 슬러리를 제조하였다.In preparing the slurry, 120 g instead of 30 g of methyl ethyl ketone (MEK), 120 g instead of 30 g of dimethylformaldehyde (DMF), 12 g instead of 3 g of a dispersant (BYK-Chemi, BYK W9010), barium titanium oxide (Sakai BT05) Slurry was prepared in the same manner as in Example 1, except that 1200 g was used instead of 300 g.
(2) 바니쉬 제조(2) varnish manufacturing
바니쉬를 제조함에 있어서, 1000 mL 비이커에 메틸에틸케톤 10 g, 디메틸포름알데히드 160 g, 벤족사진 수지(Huntsman社, XTW8291, 메틸에틸케톤 80% 용해) 500 g, 페놀 노볼락 수지(Huntsman社, XTW8293, 메틸에틸케톤 68% 용해) 147.06 g 및 2-페닐이미다졸 0.12 g을 넣고 완전히 용해시킨 후, 상기 실시예 1과 동일한 방법으로 바니쉬(Varnish)를 제조하였다. In preparing the varnish, 10 g of methyl ethyl ketone, 160 g of dimethylformaldehyde, 500 g of benzoxazine resin (soluble in Huntsman, XTW8291, methyl ethyl ketone 80%), phenol novolac resin (Huntsman, XTW8293) 147.06 g of methyl ethyl ketone (68% dissolved) and 0.12 g of 2-phenylimidazole were completely dissolved, and then varnish was prepared in the same manner as in Example 1.
(2) 동박 적층판 제조(2) Copper Foil Laminate Manufacturing
유리(Nittibo社, 106)를 상기 (1)에서 제조한 바니쉬에 함침시킨 후, 170℃에서 6 분간 건조하여 프리프레그를 제작하였다. 상기에서 제작한 프리프레그 한 장을 동박 사이에 넣고, 200℃의 온도 및 35 kg/㎠의 압력으로 90 분간 가열, 가압 하여 유전체 두께가 50 ㎛ 인 동박 적층판을 제조하였다.
The glass (Nittibo, 106) was impregnated into the varnish prepared in the above (1), and then dried at 170 ° C. for 6 minutes to prepare a prepreg. One sheet of the prepreg prepared above was sandwiched between copper foils and heated and pressed for 90 minutes at a temperature of 200 ° C. and a pressure of 35 kg / cm 2 to prepare a copper foil laminate having a dielectric thickness of 50 μm.
[비교예 8]Comparative Example 8
하기 표 3에 나타낸 조성으로 수지 조성물을 제조하였다.A resin composition was prepared in the composition shown in Table 3 below.
슬러리를 첨가하지 않았다는 것을 제외하고는, 상기 실시예 1과 동일한 방법으로 동박 적층판을 제조하였다.
A copper foil laminate was produced in the same manner as in Example 1 except that no slurry was added.
[실험예]Experimental Example
(1) 동박 적층판 평가(1) Copper foil laminated sheet evaluation
상기 동박 적층판에 대하여 다음의 방법으로 물성을 평가하였으며, 그 결과를 하기 표 1 및 2에 나타내었다.The physical properties of the copper foil laminate were evaluated by the following methods, and the results are shown in Tables 1 and 2 below.
(ⅰ) 유전율과 유전손실: 동박 적층판을 도 1에서와 같이 주전극(a) 지름 3 cm, 부전극(c) 지름 4 cm, 주전극과 접지전극 간격 1 cm 로 패턴을 형성한 후, 패턴을 제외한 나머지 동박 부분을 에칭으로 제거하고, 시편 크기를 5×5 cm 로 절단한 후, L, C, R 측정기(휴렛패커드社 HP4194A)를 이용하여 1 MHz 유전율과 유전손실을 각각 측정하였다. 도 1에서 a 는 주전극이고, b 는 접지전극이며, c 는 부전극이다.(Iii) Dielectric constant and dielectric loss: After the copper foil laminate was formed into a pattern with a main electrode (a) diameter of 3 cm, a negative electrode (c) diameter of 4 cm, and a main electrode and ground electrode gap of 1 cm as shown in FIG. After removing the remaining copper foil except the etching, and cut the specimen size to 5 × 5 cm, 1 MHz dielectric constant and dielectric loss were measured by using L, C, R measuring instruments (HP4194A, Hewlett Packard). In FIG. 1, a is a main electrode, b is a ground electrode, and c is a negative electrode.
(ⅱ) 유리전이온도: 동박 적층판의 동박층을 에칭으로 제거하고 DSC(differential scanning calorimeter, TA社, Q100)로 유리전이온도를 측정하였다.(Ii) Glass transition temperature: The copper foil layer of the copper foil laminated sheet was removed by etching, and the glass transition temperature was measured by DSC (differential scanning calorimeter, TA, Q100).
(ⅲ) 동박 박리 강도: 동박 적층판 표면에서 폭 1 cm 의 동박을 벗겨낸 후 인장 강도 측정기(Texture Analyzer)를 사용하여 동박의 박리 강도를 측정하였다. (Iii) Copper foil peeling strength: After peeling the copper foil of width 1cm from the copper foil laminated board surface, the peeling strength of copper foil was measured using the tensile strength analyzer (Texture Analyzer).
(ⅳ) 납 내열성: 288℃의 납조에 5 cm × 5 cm 크기로 절단한 샘플을 올린 후 견디는 시간을 측정하였다. (Iii) Lead heat resistance: The time taken to bear after placing a sample cut into a size of 5 cm × 5 cm in a lead bath at 288 ℃.
(ⅴ) 난연성 : 난연성 측정용 동박 적층판은 상시 실시예 1 내지 6, 비교예 1 내지 6 및 비교예 8의 경우 수지 부착 동박 2장 사이에 0.4 mm 두께의 Unclad(LG 화학社, LG-E451)를 끼워 넣고, 200℃의 온도 및 35 kg/㎠의 압력으로 90 분간 가열, 가압하여 동박 적층판을 제조하였으며, 비교예 7의 경우 0.4 mm Unclad 양쪽으로 프리프레그와 18 ㎛ 동박을 대고, 같은 방법으로 가압하여 동박 적층판을 제조하였다. 상기에서 제조한 동박 적층판을 에칭(Etching)하여 동박을 완전히 제거한 후, 125 mm × 13 mm 크기로 절단한 샘플을 수직 연소 실험법에 의해 V-0, V-1 및 V-2 등급등급으로 나누는 난연성 평가 표준 방법인 UL94 실험법을 수행하여 측정하였다. (Iii) Flame retardancy: Copper foil laminates for flame retardancy measurement are always unclad (LG Chemical, LG-E451) of 0.4 mm thickness between two sheets of copper foil with resin in Examples 1-6, Comparative Examples 1-6, and Comparative Example 8. Copper foil laminated plate was manufactured by heating and pressing for 90 minutes at a temperature of 200 ° C. and a pressure of 35 kg / cm 2. In Comparative Example 7, a prepreg and an 18 μm copper foil were placed on both sides of 0.4 mm Unclad, and in the same manner. It pressed and manufactured the copper foil laminated board. After the copper foil laminated plate prepared above was etched to completely remove the copper foil, the flame retardance of dividing the sample cut into 125 mm × 13 mm size into V-0, V-1 and V-2 grades by the vertical combustion test method Measurement was performed by performing the UL94 test method, an evaluation standard method.
상기 표 1에서 보는 바와 같이, 본 발명에 따른 실시예 1 내지 실시예 4에서 바륨 티타늄 옥사이드(BT05) 함량에 따라 유전율이 증가하였으며, 벤족사진 수지 자체 및 열가소성 수지로 사용된 에폭시 변성 폴리페닐렌 옥사이드의 유전손실이 낮은 특성으로 인해 0.02 이하의 낮은 유전손실을 나타내었다. 또한, 175℃의 높 은 유리전이온도 특성을 나타내며, 납 내열 특성에 있어서도 600초 이상 견디는 우수한 내열성을 나타내었다. 고분자형 페놀 노볼락 수지와 폴리스티렌을 사용한 실시예 5에서는 유리전이온도가 20℃ 가량 낮아지긴 했지만, 바륨 티타늄 옥사이드 함량을 실시예 2와 동일하게 하여, 실시예 2와 동일한 유전율과 정전용량을 나타내었고, 실시예 1 내지 실시예 4에서와 마찬가지로, 우수한 납 내열특성을 나타내었으며, 특히 유전손실 값이 0.009로 많이 낮아지는 효과를 나타내었다. 고분자형 페놀 노볼락 수지, 반응형 폴리비닐아세탈, 폴리에테르설폰을 사용한 실시예 6에서는 실시예 1 내지 실시예 4에 비해 유리전이온도가 10℃ 정도 낮아지긴 했지만, 바륨 티타늄 옥사이드를 실시예 2와 동일하게 함유하여, 이 경우 역시 유전손실이 0.01로 많이 낮아지는 효과를 얻을 수 있었다. 실시예 2 내지 실시예 6 에서는 벤족사진 수지 자체가 난연성을 V-1 을 나타내고, 무기 필러가 60% 이상 첨가될 경우 별도의 난연제 사용 없이도 난연성이 V-0 을 나타내었다. As shown in Table 1, the dielectric constant increased according to the barium titanium oxide (BT05) content in Examples 1 to 4 according to the present invention, the epoxy modified polyphenylene oxide used as benzoxazine resin itself and thermoplastic resin The low dielectric loss resulted in low dielectric loss of less than 0.02. In addition, it exhibits a high glass transition temperature characteristic of 175 ℃, and excellent heat resistance withstand 600 seconds or more in the lead heat characteristics. In Example 5 using the polymer type phenol novolak resin and polystyrene, the glass transition temperature was lowered by about 20 ° C., but the barium titanium oxide content was the same as in Example 2, showing the same dielectric constant and capacitance as in Example 2. As in Examples 1 to 4, excellent lead heat resistance was shown, and in particular, the dielectric loss value was significantly lowered to 0.009. In Example 6 using the polymer type phenol novolak resin, reactive polyvinyl acetal, and polyether sulfone, the glass transition temperature was lowered by about 10 ° C. compared with Examples 1 to 4, but barium titanium oxide was used as Example 2 Containing the same, in this case, too, the dielectric loss could be much lowered to 0.01. In Examples 2 to 6, the benzoxazine resin itself exhibited flame retardancy of V-1, and when the inorganic filler was added at 60% or more, the flame retardancy of the benzoxazine resin itself was V-0 without using a flame retardant.
상기 표 2에서 보는 바와 같이, 비교예 1 내지 비교예 4에서는 벤족사진 수지를 사용하는 대신 비스페놀 A형 에폭시 수지인 LER1222와 크레졸 노볼락 에폭시 수지인 N690을 함께 사용하였으며, 페놀 노볼락 수지를 사용하는 대신 아민계 경화제인 디시안 디아마이드(Dicy)를 사용하였으며, 실시 예 1 내지 실시예 4와 마찬가 지로 바륨 티타늄 옥사이드 함량을 변경하면서, 바니쉬를 제조하였다. 비교예 1 내지 4에서 나타난 바와 같이 유전율은 수지 조성 보다는 바륨 티타늄 옥사이드 함량에 의해 결정되고, 같은 함량의 바륨 티타늄 옥사이드를 사용할 경우 거의 수지 조성과 관계없이 유사한 유전율 값을 나타내었다. 유리전이온도는 벤족사진 수지를 사용하는 본 발명에 따른 실시예 1 내지 4와 비교하여 40℃ 정도 낮은 값을 나타내었으며, 페놀 경화제를 사용하는 대신 내열성이 낮은 디시안 디아마이드(Dicy) 경화제를 사용하였기 때문에 납 내열성이 많이 떨어졌으며, 에폭시 수지 자체의 유전손실이 높기 때문에 벤족사진 수지를 사용할 때에 비해 유전손실이 많이 올라가는 문제가 발생되었다. 비교예 5에서는 디시안 디아마이드(Dicy) 경화제를 사용하는 비교예 1 내지 4에서와는 달리 고분자형 페놀 노볼락 수지인 GPX-41을 사용하였으며, 실시예 6과 마찬가지로 열가소성 수지로 반응형 폴리비닐아세탈인 KS-23z와 폴리에테르설폰(5003PS)을 사용하였다. 이 경우 비교예 1 내지 4에 비해 유리전이온도가 10℃ 정도 올라가고, 납 내열 특성과 유전손실도 약간 개선되긴 하였으나, 여전히 실시예 1 내지 실시예 6에서 나타난 물성보다는 떨어지는 물성을 나타내었다. 비교예 2 내지 비교예 5에서는 에폭시 수지 자체의 난연성이 벤족사진 수지에 비해 떨어지기 때문에 실시예 2 내지 실시예 6에서와는 달리 강유전체 필러가 60% 이상 첨가되어도 난연성이 V-0를 나타내지 못하였다. As shown in Table 2, in Comparative Examples 1 to 4, instead of using a benzoxazine resin, bisphenol A type epoxy resin LER1222 and cresol novolac epoxy resin N690 were used together, and phenol novolac resin was used. Instead, diamine diamide (Dicy), which is an amine curing agent, was used, and the varnish was prepared by changing the barium titanium oxide content as in Examples 1 to 4. As shown in Comparative Examples 1 to 4, the dielectric constant was determined by the barium titanium oxide content rather than the resin composition, and when using the same barium titanium oxide, the dielectric constant showed similar values regardless of the resin composition. The glass transition temperature was about 40 ° C. lower than that of Examples 1 to 4 according to the present invention using a benzoxazine resin. Instead of using a phenol curing agent, the glass transition temperature used a low heat resistance dicyan diamide curing agent. Because of this, the lead heat resistance was much lowered, and the dielectric loss of the epoxy resin itself was high, resulting in a much higher dielectric loss than when the benzoxazine resin was used. In Comparative Example 5, unlike in Comparative Examples 1 to 4 using dicyan diamide curing agent, GPX-41, which is a polymer type phenol novolak resin, was used. As in Example 6, a reactive polyvinyl acetal was used as the thermoplastic resin. KS-23z and polyethersulfone (5003PS) were used. In this case, the glass transition temperature was increased by about 10 ° C. compared with Comparative Examples 1 to 4, and the lead heat resistance and dielectric loss were slightly improved, but still exhibited poor physical properties than those shown in Examples 1 to 6. In Comparative Examples 2 to 5, since the flame retardancy of the epoxy resin itself was inferior to that of the benzoxazine resin, the flame retardancy did not show V-0 even when 60% or more of the ferroelectric filler was added, unlike in Examples 2 to 6.
상기 표 3에서 보는 바와 같이, 비교예 6에서는 페놀 노볼락 수지 대신 디시안 디아미드(Dicy) 경화제를 사용하였으나, 이 경우 실시예 2에 비해 유전손실이 높아지고 유리전이 온도와 납 내열성이 크게 떨어졌다. 비교예 7에서는 열가소성 수지를 첨가하지 않았기 때문에 점도가 낮고, 취성이 증가하여 수지부착동박 제조가 불가능하여, 유리섬유를 이용하여 동박 적층판을 제조하였기 때문에 유전율이 떨어지고, 동박 적층판의 두께가 두꺼워 정전용량이 크게 감소하였다. 비교예 8에서는 강유전체 필러가 첨가되지 않았기 때문에 역시 정전용량이 크게 감소하였고, 난연성이 V-0를 나타내지 못하였다.As shown in Table 3, in Comparative Example 6, instead of the phenol novolak resin, dicyandiamide (Dicy) curing agent was used, but in this case, dielectric loss was higher and glass transition temperature and lead heat resistance were significantly lower than those of Example 2. . In Comparative Example 7, since the thermoplastic resin was not added, the viscosity was low, the brittleness was increased, and the resin-bonded copper foil could not be manufactured. Since the copper foil laminated plate was manufactured using glass fiber, the dielectric constant decreased, and the thickness of the copper foil laminated plate was thick. This greatly decreased. In Comparative Example 8, since the ferroelectric filler was not added, the capacitance was also greatly reduced, and the flame retardancy did not show V-0.
본 발명이 속한 분야에서 통상의 지식을 가진 자라면 상기 내용을 바탕으로 본 발명의 범주내에서 다양한 응용 및 변형을 행하는 것이 가능할 것이다.
Those skilled in the art to which the present invention pertains will be able to perform various applications and modifications within the scope of the present invention based on the above contents.
본 발명의 수지 조성물은 벤족사진 수지, 페놀 경화제, 열가소성 수지 및 강유전체 무기필러로 구성되어 있는 것을 특징으로 하며, 이러한 조성은 유리섬유 보강제를 사용하는 대신에 열가소성 수지를 도입함으로써 탄성을 보강하고, 에폭시 수지를 사용하는 대신에 벤족사진 수지를 도입함으로써 유전손실을 낮추었으며, 벤족사진 수지 자체와 과량의 무기 필러를 함유함으로써 별도의 난연제 없이도 우수한 난연성을 나타내었다. 경화제로는 디시안 디아마이드(Dicy)를 사용하는 대신에 페놀 경화제를 사용함으로써 내열성을 높이는 효과가 있다.The resin composition of the present invention is characterized by being composed of a benzoxazine resin, a phenol curing agent, a thermoplastic resin, and a ferroelectric inorganic filler, and this composition reinforces elasticity by introducing a thermoplastic resin instead of using a glass fiber reinforcing agent, and epoxy Dielectric loss was reduced by introducing benzoxazine resin instead of resin, and benzoxazine resin itself and excess inorganic filler showed excellent flame retardancy without a separate flame retardant. As a curing agent, a phenol curing agent is used instead of dicyanide (Dicy) to increase heat resistance.
또한, 상기한 조성물을 이용한 본 발명의 동박 적층판은 기존의 내장형 캐패시터용 동박 적층판에 비해 두께가 얇고 유전율이 높기 때문에, 정전용량을 크게 높일 수 있을 뿐 아니라, 높은 유리전이온도와 우수한 납 내열성 및 난연성을 가지며, 낮은 유전손실 특성을 나타내는 효과가 있다. In addition, the copper foil laminate of the present invention using the above-mentioned composition is thinner and has a higher dielectric constant than the conventional copper foil laminate for built-in capacitors, and thus can not only significantly increase capacitance, but also have high glass transition temperature and excellent lead heat resistance and flame resistance. Has an effect of exhibiting low dielectric loss characteristics.
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