KR100710178B1 - color filter substrate of liquid crystal display device and method for manufacturing the same - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate for a liquid crystal display device and a method of manufacturing the same, which can simplify process, reduce manufacturing cost, and improve color reproduction characteristics. Red, green, and blue color filters respectively formed in the color filter region of the substrate, trenches having a predetermined depth in the black matrix region of the substrate, and red, green, and blue color filters overlapping the trench. It is characterized in that it comprises a black matrix formed.

Color Filters, Trench, Black Matrix, Overlap

Description

Color filter substrate of liquid crystal display device and method for manufacturing the same

1 is a three-dimensional view of a portion of a general liquid crystal display device

Figure 2a is a plan view showing a color filter substrate for a liquid crystal display device according to the prior art

FIG. 2B is a cross-sectional view illustrating a color filter substrate for a liquid crystal display device cut along the line II-II ′ of FIG. 2A.

3A to 3F are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display device according to the prior art.

4 is a cross-sectional view of a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.

5A to 5G are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.

6 is a cross-sectional view of a color filter substrate for a liquid crystal display according to a second embodiment of the present invention.

7A to 7H are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

8 is a cut-away view of a color filter substrate for a liquid crystal display according to a third embodiment of the present invention.

Explanation of symbols for the main parts of the drawings

100 substrate 110 photoresist

120: trench 130: red color filter

140: green color filter 150: blue color filter

160: common electrode

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a manufacturing method thereof, and more particularly, to a color filter substrate for a liquid crystal display device and a method for manufacturing the same, which simplify process and reduce manufacturing cost.

In general, a liquid crystal display (hereinafter referred to as LCD) displays an image by adjusting the light transmittance of the liquid crystal using an electric field.

To this end, the LCD includes a liquid crystal panel in which liquid crystal cells are arranged in a matrix, and a driving circuit for driving the liquid crystal panel.

In addition, the liquid crystal panel includes pixel electrodes and a common electrode for applying an electric field to each of the liquid crystal cells.

The pixel electrode is formed for each liquid crystal cell on the lower substrate, while the common electrode is integrally formed on the front surface of the upper substrate. Each of the pixel electrodes is connected to a thin film transistor used as a switching element. The liquid crystal cell is driven along with the common electrode in accordance with the data signal supplied through the TFT.

Such LCDs can be miniaturized compared to CRTs, and are widely used in personal computers and notebook computers, as well as office automation devices such as photocopiers, mobile phones and pagers.

On the other hand, the active matrix type liquid crystal display device uses a color filter of red (R), green (G), blue (B) corresponding to the three primary colors of light to implement the color.

Colors are represented by arranging the color filters adjacent to each other and applying a color signal corresponding to each color filter to control brightness.

The liquid crystal display device is completed by substrate cleaning, substrate manufacturing, substrate bonding / liquid crystal injection, and mounting process, and color filters are formed on the upper substrate in the substrate manufacturing process.

In general, the most common method used in the production of each color filter is a pigment dispersion method produced by coating, exposure, development, baking by dispersing the pigment in polyimide or acrylic resin, which is a material of the color filter.

This pigment dispersion method is easy to form a fine pattern of the color filter, but has a disadvantage in that the manufacturing process is complicated because a photolithographic process is required for each of red (R), green (G), and blue (B).

1 is a three-dimensional view of a part of a general liquid crystal display.

As shown in FIG. 1, the upper and lower substrates 10 and 30 are opposed to each other by a predetermined interval, and the liquid crystal layer 50 is interposed between the upper and lower substrates 10 and 30.

Here, a point where a plurality of gate lines 32 and data lines 34 intersect with each other, and the gate lines 32 and data lines 34 cross each other in order to define a pixel area on the lower substrate 30. The thin film transistor T is formed on the substrate.

In addition, a pixel electrode 46 connected to the thin film transistor T is formed in the pixel area P defined as an area where the gate line 32 and the data line 34 cross each other.

On the other hand, although not shown in detail in the drawing, the thin film transistor T is turned on / off by a gate electrode to which a gate voltage is applied, a source and drain electrode to which a data voltage is applied, and a gate voltage and a data voltage difference. It consists of a channel (ch: channel) to control.

In addition, a color filter layer 12 and a common electrode 16 are sequentially formed on the upper substrate 10.

Here, the color filter layer 12 blocks a color filter that transmits only light of a specific wavelength band, and light on the pixel region P of the lower substrate 30, which is positioned at the boundary of the color filter and does not control the arrangement of liquid crystals. It consists of a black matrix.

In addition, the upper and lower substrates 10 and 30 configured as described above are bonded at regular intervals, and the liquid crystal layer 50 is formed between the bonded upper and lower substrates 10 and 30. In addition, upper and lower polarizing plates 52 and 54 for transmitting only light parallel to the polarization axis are positioned on each outer surface of the bonded upper and lower substrates 10 and 30, and a lower portion of the lower polarizing plate 54 is provided. A back light, which is a light source, is disposed.

Such a liquid crystal display requires a color filter composed of red, green, and blue primary colors to realize full color.

Hereinafter, a color filter substrate for a liquid crystal display device and a method of manufacturing the same according to the related art will be described with reference to the accompanying drawings.

2A is a plan view showing a color filter substrate for a liquid crystal display device according to the prior art, and FIG. 2B is a cross-sectional view showing a color filter substrate for a liquid crystal display device cut along the line II-II 'of FIG. 2A.

As shown in FIG. 2A, a black matrix 64 having a pixel region P as an opening 62 is formed, and red and green are formed in the opening 62 with the black matrix 64 as a color-specific boundary. , A color filter 66 is formed in which the blue color filters 66a, 66b, 66c are sequentially arranged in sequence.

Subsequently, a common electrode 68 is formed on the entire surface of the substrate including the color filter 66.

That is, as shown in FIG. 2B, black matrices 64 are formed on the glass substrate 60 to be spaced apart from each other at regular intervals, and the red, green, and blue color filters are formed using the black matrices 64 as color boundaries. 66a, 66b, and 66c are formed in order to form a color filter 66, and a common electrode 68 is formed on the entire surface of the substrate 60 including the color filter 66.

3A to 3F are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display device according to the prior art.

As shown in FIG. 3A, a metal thin film such as chromium or a carbon-based resin material 64a is deposited on the glass substrate 60 by sputtering.

As shown in FIG. 3B, after applying the photoresist 65 on the resin material 64a, the photoresist 65 is patterned by an exposure and development process to define a black matrix region.

Subsequently, the resin material 64a is selectively patterned using the patterned photoresist 65 as a mask to form a black matrix 64 having a predetermined interval.

In this case, the bla matrix 64 is formed to correspond to the area where the unit pixel edge and the thin film transistor are formed to block an area where the electric field passes through the unstable area.

As shown in FIG. 3C, a red (R) color resist is applied to the entire surface of the glass substrate 60 including the black matrix 64.

Subsequently, the red color resist is selectively patterned through a photolithographic process to form a red color filter 66a having both ends overlapping on the black matrix 64.

As shown in FIG. 3D, a green color resist is applied to the entire surface of the glass substrate 60 including the red color filter 66a.

Subsequently, the green color resist is selectively patterned through a photolithographic process to form a green color filter 66b.

The green color filter 66b is formed in a pixel adjacent to the red color filter 66a with the black matrix 64 interposed therebetween.

As shown in FIG. 3E, a blue color resist is coated on the entire surface of the glass substrate 60 including the green color filter 66b.

Subsequently, the blue color resist is selectively patterned through a photolithographic process to form a blue color filter 66c.

The blue color filter 66c is formed in a pixel adjacent to the green color filter 66b with the black matrix 64 interposed therebetween, thereby completing the color filter 66 including R, G, and B.

Here, the color filter 66 is formed in the order of R, G, and B in general.

As shown in FIG. 3F, indium tin oxide (ITO), a transparent electrode material having good permeability and conductivity and excellent chemical and thermal stability, is deposited on the entire surface of the glass substrate 60 including the color filter layer 66 by sputtering. The common electrode 68 is formed.

Here, the common electrode 68 serves to operate the liquid crystal cell together with the pixel electrode formed on the TFT array substrate.

This completes the color filter substrate including the black matrix 64, the color filter layer 66, and the common electrode 68.

For reference, a transverse electric field type liquid crystal display device typically forms a common electrode on a TFT array substrate, thereby completing a color filter layer by forming a black matrix, a color filter layer, and an overcoat layer.

However, the above-described conventional color filter substrate for a liquid crystal display device and a manufacturing method thereof have the following problems.

First, since the black matrix is formed at the boundary of each color filter using a metal such as Cr or a black resin, the manufacturing cost due to the use of the black matrix material increases.

Second, a step occurs in the color filter layer due to the protrusion of the black matrix, thereby degrading color reproduction characteristics.

Third, when each color filter is overlapped and formed on the black matrix, the leveling or the optical density (OD) cannot be satisfied.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object thereof is to provide a color filter substrate for a liquid crystal display device and a method of manufacturing the same, to simplify the process and reduce the manufacturing cost.

Color filter substrate for a liquid crystal display device according to the present invention for achieving the above object is a substrate defined by a plurality of color filter region and black matrix region, red, green, respectively formed in the color filter region of the substrate A blue color filter, a trench formed at a predetermined depth in the black matrix region of the substrate, and a black matrix formed by overlapping the red, green, and blue color filters inside the trench. .

In addition, the method for manufacturing a color filter substrate for a liquid crystal display device according to the present invention for achieving the above object comprises the steps of preparing a substrate defined by a plurality of color filter region and black matrix region, and the black matrix of the substrate Forming a trench having a predetermined depth in an area, forming a red, green, and blue color filter in the color filter area of the substrate, and forming the red, green, and blue color filter in the trench. Forming a black matrix by overlapping one by one.

In addition, a method of manufacturing a color filter substrate for a liquid crystal display device according to the present invention for achieving the above object comprises the steps of preparing a substrate defined by a plurality of color filter region and black matrix region; Forming a trench having a predetermined depth in the black matrix region of the substrate; And forming a red, green, and blue color filter in the color filter area of the substrate, and simultaneously stacking materials of the red, green, and blue color filter layers in the trench to form a black matrix. There is another feature to be done.

Hereinafter, a color filter substrate for a liquid crystal display device and a method of manufacturing the same according to the present invention having the above characteristics will be described in detail with reference to the accompanying drawings.

First Embodiment

4 is a cross-sectional view illustrating a color filter substrate for a liquid crystal display device according to a first embodiment of the present invention.

As shown in FIG. 4, a color filter substrate for a liquid crystal display according to a first embodiment of the present invention includes a substrate 100 made of a transparent material having a plurality of color filter regions and a black matrix region, and the substrate 100. ), Red, green, and blue color filters 130, 140, and 150 formed in each color filter region, trenches 120, and a trench 120 formed in a black matrix region of the substrate 100 with a predetermined depth. And a black matrix formed of the same material as the red, green, and blue color filters 130, 140, 150, and the common electrodes 160 formed on the color filters 130, 140, 150, and the black matrix.

In the black matrix, the color resists 130a, 140a, and 150a of the red color filter 130, the green color filter 140, and the blue color filter 150 remain in the pattern 120. In order.

In addition, the black matrix and the red, green, and blue color filters 130, 140, and 150 are formed at the same height.

5A to 5G are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display device according to a first embodiment of the present invention.

As shown in FIG. 5A, after the photoresist 110 is applied onto the transparent substrate 100, the photoresist 110 is selectively patterned by an exposure and development process to define a black matrix region. .

Here, other regions of the substrate 100 except for the black matrix region are regions where color filters are to be formed and correspond to pixel regions of the lower substrate.

Subsequently, the exposed substrate 100 is selectively etched using the patterned photoresist 110 as a mask to form a trench 120 having a predetermined depth.

The trench 120 has a depth of about 5 μm or less, and an etchant for etching the substrate 100 uses an etching gas including HF.

As shown in FIG. 5B, a red (R) color resist 130a is formed to remove the photoresist 110 and to implement color on the entire surface of the substrate 100 including the trench 120. Apply.

Here, the method of applying the red color resist 130a includes a spin method and a roll coat method.

First, the spin method is a method of spreading the color resist evenly throughout the substrate by flowing the color resist on the substrate appropriately and rotating the substrate at high speed, and the roll coating method transfers / prints the color resist developed on the roll onto the substrate. That's how.

In addition, the main component of the red color resist 130a is composed of a photopolymerization initiator, a monomer, a binder, and an organic pigment that realizes color, such as a general photoresist.

On the other hand, when the red color filter 130a is applied to the entire surface of the substrate 100, the thickness of the color resist is thicker than other portions due to the flatness of the color resist inside the trench 120.

As shown in FIG. 5C, after masking only a specific area where a pattern on the red color resist 130a is formed with a light shielding portion of a mask (not shown), UV rays are irradiated to cover the red color resist 130a. It exposes.

At this time, there are three methods of exposing, including a proximity method for exposing the original light to daylight, a stepper method for repeatedly exposing a reduced pattern, and a mirror projection method for projecting and exposing a mask pattern. .

On the other hand, simple matrix LCDs that give priority to productivity are poor in accuracy but fast in processing, and active matrix LCDs that require high precision use stepper methods or mirror projection methods.

The red color resist 130a having the photochemical structure changed by the exposure is cured at a high temperature of about 230 ° C., and then developed to form a red color filter 130.

In this case, the development may use any one of a dipping, puddle, and shower spray method.

For reference, if the red color resist 130a has the characteristics of a negative resist, an unexposed portion is removed. Therefore, unlike the above, the red color resist 130a may be exposed by exposing a specific region where a pattern is formed to a light transmitting portion of a mask.

On the other hand, when the red color filter 130 is developed to form the red color filter 130, the trench 120 is completely thicker than other portions due to the flatness of the resist as described above. Instead, the red color resist 130a remains a predetermined thickness to serve as a black matrix.

As shown in FIG. 5D, a green color resist 140a is applied to the entire surface of the substrate 100 including the red color filter 130, and a specific region of the green color resist 140a is formed on the mask. Mask with light shield.

As shown in FIG. 5E, the selectively masked green color resist 140a is irradiated with UV rays to expose the green color resist 140a and then developed to form a green color filter 140.

The green color filter 140 is formed in a pixel adjacent to the red color filter 130 with the trench 120 interposed therebetween.

On the other hand, when the green color resist 140a is developed to form the green color filter 140, the green portion of the trench 120 is thicker than other portions due to the flatness of the resist as described above. The color resist 140a is not completely removed but remains a predetermined thickness to serve as a black matrix.

As shown in FIG. 5F, a blue color resist 150a is applied to the entire surface of the substrate 100 including the red and green color filters 130 and 140, and the blue color resist 150a is applied. After masking a specific area with the light shielding portion of the mask, the blue color resist 150a is exposed by irradiating UV rays.

Subsequently, the blue color resist 150a whose photochemical structure is changed by the exposure is developed to form a blue (B) color filter 150.

Here, the blue color filter 150 is formed in a pixel adjacent to the green color filter 140 with the trench 120 interposed therebetween, thereby completing a color filter layer consisting of R, G, and B.

On the other hand, when the blue color resist 150a is developed to form the blue color filter 150, the blue is formed in the trench 120 because it is thicker than other portions due to the flatness of the resist as described above. The color resist 150a is not completely removed and remains a predetermined thickness to serve as a black matrix.

Therefore, red, green, and blue color resists 130a, 140a, and 150a remain in the pattern 120 in the trench 120 formed at a predetermined depth in the black matrix region to serve as a black matrix.

As shown in FIG. 5G, indium tin oxide (ITO), which is a transparent electrode material having good permeability, conductivity, and excellent chemical and thermal stability, is deposited on the color filters 130, 140, and 150 by sputtering to form a common electrode 160. Form.

Here, the common electrode 160 serves to operate the liquid crystal cell together with the pixel electrode formed on the TFT array substrate.

For reference, in the transverse electric field type liquid crystal display device, a common electrode is formed on the TFT array substrate. Therefore, in the case of a transverse electric field type liquid crystal display device, an overcoat layer (not shown) is formed on the entire surface of the substrate including the color filter layer instead of the common electrode 160.

Second Embodiment

6 is a cross-sectional view illustrating a color filter substrate for a liquid crystal display device according to a second embodiment of the present invention, and FIGS. 7A to 7H illustrate a method of manufacturing a color filter substrate for a liquid crystal display device according to a second embodiment of the present invention. The process cross section shown.

As shown in FIG. 5, a color filter substrate for a liquid crystal display according to a second embodiment of the present invention includes a substrate 100 made of a transparent material having a plurality of color filter regions and a black matrix region, and the substrate 100. Red, green, and blue color filters 130, 140, and 150 formed in each color filter region of the photoresist, trenches 120, and trenches formed in the black matrix region of the substrate 100 to a predetermined depth. The black matrices 130a, 140a, and 150a formed of the same material as the red, green, and blue color filters 130, 140, and 150 inside the 120, and the color filters 130, 140, 150, and black, respectively. The common electrode 160 is formed on the matrix.

In the black matrix, the color resists 130a, 140a, and 150a of the red color filter 130, the green color filter 140, and the blue color filter 150 remain in the pattern 120. In order.

In addition, the height of the black matrix is formed to be lower than the height of the red, green, and blue color filters (130, 140, 150).

In the case of a transverse electric field type liquid crystal display, an overcoat layer (not shown) is formed in place of the common electrode 160.

The manufacturing method of the color filter substrate for a liquid crystal display device according to the second embodiment of the present invention having such a configuration is as follows.

As shown in FIG. 7A, after the photoresist 110 is coated on the transparent substrate 100, the black resist region is defined by selectively patterning the photoresist 110 through an exposure and development process.

Here, other regions of the substrate 100 except for the black matrix region are regions where color filters are to be formed and correspond to pixel regions of the lower substrate.

Subsequently, the exposed substrate 100 is selectively etched using the patterned photoresist 110 as a mask to form a trench 120 having a predetermined depth.

The trench 120 has a depth of about 10 μm or less, and an etchant for etching the substrate 100 uses an etching gas including HF.

As shown in FIG. 7B, the photoresist 110 is removed, and a red (R) color resist 130a for implementing color on the entire surface of the substrate 100 including the trench 120 is formed. Apply.

Here, the method of applying the red color resist 130a includes a spin method and a roll coat method.

First, the spin method is a method of spreading the color resist evenly throughout the substrate by flowing the color resist on the substrate appropriately and rotating the substrate at high speed, and the roll coating method transfers / prints the color resist developed on the roll onto the substrate. That's how.

In addition, the main component of the red color resist 130a is composed of a photopolymerization initiator, a monomer, a binder, and an organic pigment that realizes color, such as a general photoresist.

On the other hand, when the red color filter 130a is applied to the entire surface of the substrate 100, the thickness of the color resist is thicker than other portions due to the flatness of the color resist inside the trench 120.

As shown in FIG. 7C, a mask (mask1) in which a light shielding layer is formed only in the red color filter region is positioned on the red color resist 130a, and then irradiated with light (UV) to irradiate the red color resist. 130a is exposed.

In addition, the red color resist 130a having a photochemical structure changed by the exposure is cured at a high temperature of about 230 ° C., and then developed to form a red color filter 130.

In this case, the development may use any one of a dipping, puddle, and shower spray method.

For reference, if the red color resist 130a has the characteristics of a negative resist, an unexposed portion is removed. Therefore, unlike the above, the red color resist 130a may be exposed by exposing a specific region where a pattern is formed to a light transmitting portion of a mask.

On the other hand, when the red color filter 130 is developed to form the red color filter 130, the trench 120 is completely thicker than other portions due to the flatness of the resist as described above. Without being removed, the red color resist 130a remains a predetermined thickness to serve as a black matrix.

As shown in FIG. 7D, a green color resist 140a is coated on the entire surface of the substrate 100 including the red color filter 130, and a light shielding layer is formed only on the green color filter area. A mask mask2 is positioned on the green color resist 140a.

As shown in FIG. 7E, the green color resist 140a is irradiated with light (UV) through the mask mask2 to expose the green color resist 140a, and then developed to expose the green color filter 140. Form.

The green color filter 140 is formed in a pixel adjacent to the red color filter 130 with the trench 120 interposed therebetween.

On the other hand, when the green color resist 140a is developed to form the green color filter 140, the green portion of the trench 120 is thicker than other portions due to the flatness of the resist as described above. The color resist 140a is not completely removed but remains a predetermined thickness to serve as a black matrix.

As shown in FIG. 7F, a blue color resist 150a is coated on the entire surface of the substrate 100 including the red and green color filters 130 and 140, and the light shielding portion is shied only in the blue color filter area. After placing the mask (mask3) having a layer formed on the blue color resist 150a, the blue color resist 150a is irradiated with light (UV) to the blue color resist 150a through the mask3. ) Is exposed.

Subsequently, as shown in FIG. 7G, the blue color resist 150a whose photochemical structure is changed by the exposure is developed to form a blue (B) color filter 150.

Here, the blue color filter 150 is formed in a pixel adjacent to the green color filter 140 with the trench 120 interposed therebetween, thereby completing a color filter layer consisting of R, G, and B.

On the other hand, when the blue color resist 150a is developed to form the blue color filter 150, the blue is formed in the trench 120 because it is thicker than other portions due to the flatness of the resist as described above. The color resist 150a is not completely removed and remains a predetermined thickness to serve as a black matrix.

Therefore, red, green, and blue color resists 130a, 140a, and 150a remain in the trench 120 formed at a predetermined depth in the black matrix region to serve as a black matrix.

As shown in FIG. 7H, indium tin oxide (ITO), which is a transparent electrode material having good permeability and conductivity and excellent chemical and thermal stability, is deposited on the entire surface of the substrate including the color filters 130, 140, and 150 by sputtering. The common electrode 160 is formed.

Here, the common electrode 160 serves to operate the liquid crystal cell together with the pixel electrode formed on the TFT array substrate.

For reference, in the case of a transverse electric field type liquid crystal display device, an overcoat layer (not shown) is formed in place of the common electrode 160.

Third embodiment

8 is a cross-sectional view of a color filter substrate for a liquid crystal display according to a third embodiment of the present invention.

As shown in FIG. 8, a color filter substrate for a liquid crystal display according to a third embodiment of the present invention includes a substrate 100 made of a transparent material having a plurality of color filter regions and a black matrix region, and the substrate 100. Red, green, and blue color filters 130, 140, and 150 formed in each color filter region of the photoresist, trenches 120, and trenches formed in the black matrix region of the substrate 100 to a predetermined depth. The black matrix 130a, 140a, and 150a formed of the same material as the red, green, and blue color filters 130, 140, and 150 may be provided inside the 120.

In this case, the heights of the color filters 130, 140, and 150 and the black matrix 130a, 140a, and 150a are formed to be the same.

Although not shown, a common electrode (see 160 of FIG. 6) or an overcoat layer may be further formed on the color filters 130, 140, and 150 and the black matrices 130a, 140a, and 150a.

In the black matrix, the color resists 130a, 140a, and 150a of the red color filter 130, the green color filter 140, and the blue color filter 150 remain in the pattern 120. In order.

The manufacturing method of the color filter substrate for liquid crystal displays of the third embodiment of the present invention as described above is as follows.

That is, after the substrate is completed by the process described with reference to FIGS. 7A to 7G, the surface height of the blue color resist 150a constituting the black matrix is formed by using a chemical mechanical polishing process. The red, green, and blue color filter layers 130, 140, and 150 are polished and planarized.

On the other hand, the present invention described above is not limited to the above-described embodiment and the accompanying drawings, it is possible that various substitutions, modifications and changes within the scope without departing from the technical spirit of the present invention. It will be apparent to those of ordinary skill in Esau.

As described above, the color filter substrate for the liquid crystal display device and the manufacturing method thereof according to the present invention have the following effects.

First, since the substrate is selectively etched in the black matrix region to form a trench, the black matrix is formed by overlapping each color filter, thereby reducing the material cost.

Second, because there is no step between each color filter and the black matrix, color reproduction characteristics are improved.

Third, uniform overlap thickness and optical density (OD) value can be formed by overlapping each color filter in the trench to form a black matrix.

Fourth, since the resin black matrix is not used, not only the manufacturing cost can be reduced, but also the defects caused by the projection of the black matrix can be reduced.

Claims (17)

A substrate defined by a plurality of color filter regions and a black matrix region, Red, green, and blue color filters respectively formed in the color filter region of the substrate; A trench formed at a predetermined depth in the black matrix region of the substrate; A black matrix formed by stacking materials of the red, green, and blue color filters in the trench, The color filter substrate, characterized in that the color filter and the black matrix are formed at the same height through chemical mechanical polishing. delete The method of claim 1, And a common electrode formed on the substrate on which the black matrix and each color filter are formed. The method of claim 1, And an overcoat layer formed on the substrate on which the black matrix and each color filter are formed. delete Preparing a substrate defined by a plurality of color filter regions and a black matrix region; Forming a trench having a predetermined depth in the black matrix region of the substrate; Forming red, green, and blue color filters in the color filter region of the substrate, respectively; Overlapping the red, green, and blue color filters in the trench to form a black matrix; And, And planarizing the black matrix and the red, green, and blue color filters by chemical mechanical polishing so that the black matrix and the red, green, and blue color filters have the same height. Method for producing a color filter substrate for an apparatus. The method of claim 6, And said trench is formed to a depth of 5 [mu] m or less. The method of claim 6, And said trench is formed to a depth of 10 [mu] m or less. The method of claim 6, And the trench is formed by selectively etching the black matrix region of the substrate with an etching gas including HF. The method of claim 6, wherein each color filter, Applying a red color resist to the entire surface of the substrate including the trench and selectively patterning to form a red color filter in the color filter area; Applying a green color resist to the entire surface of the substrate including the trench and selectively patterning to form a green color filter in the color filter area to be separated from the red color filter by the trench; And  Forming a blue color filter in the color filter area so as to be separated from the green color filter by the trench by applying and selectively patterning a blue color resist on the entire surface of the substrate including the trench. A manufacturing method of a color filter substrate for a display device. The method of claim 10, wherein the black matrix is And remaining inside the trench when selectively patterning the red, green and blue color filter resists. The method of claim 6, And forming a common electrode on each of the color filters and the black matrix. The method of claim 6, And forming an overcoat layer on each of the color filters and the black matrix. Preparing a substrate defined by a plurality of color filter regions and a black matrix region; Forming a trench having a predetermined depth in the black matrix region of the substrate; Forming a black matrix by sequentially forming a red, green, and blue color filter in the color filter area of the substrate, and simultaneously stacking materials of the red, green, and blue color filter layers in the trench; And, And planarizing the black matrix and the red, green, and blue color filters by chemical mechanical polishing so that the black matrix and the red, green, and blue color filters have the same height. Method for producing a color filter substrate for an apparatus. The method of claim 14, Forming each of the color filters and the black matrix, Applying and selectively patterning red color resist on the entire surface of the substrate including the trench to form a red color filter in the color filter area and leaving the red color register in the trench area to a predetermined thickness; Applying a green color resist on the front surface of the substrate including the trench, and selectively patterning the green color filter in the color filter area to be separated from the red color filter by the trench, and the green color register in the trench area to a predetermined thickness Remaining with; And  Applying a blue color resist on the front surface of the substrate including the trench and selectively patterning the blue color resist in the color filter region so as to be separated from the green color filter by the trench and forming the blue color register in the trench region by a predetermined thickness. Method of manufacturing a color filter substrate for a liquid crystal display device comprising the step of remaining in the. The method of claim 14, And forming a common electrode on each of the color filters and the black matrix. The method of claim 14, And forming an overcoat layer on each of the color filters and the black matrix.

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