KR100614187B1 - 기판 처리 방법 및 장치 - Google Patents
기판 처리 방법 및 장치 Download PDFInfo
- Publication number
- KR100614187B1 KR100614187B1 KR1020020029942A KR20020029942A KR100614187B1 KR 100614187 B1 KR100614187 B1 KR 100614187B1 KR 1020020029942 A KR1020020029942 A KR 1020020029942A KR 20020029942 A KR20020029942 A KR 20020029942A KR 100614187 B1 KR100614187 B1 KR 100614187B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- processing
- holding plate
- processed
- concave portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 223
- 238000003672 processing method Methods 0.000 title claims abstract description 11
- 239000007788 liquid Substances 0.000 claims abstract description 97
- 238000004140 cleaning Methods 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims description 55
- 125000006850 spacer group Chemical group 0.000 claims description 20
- 230000033001 locomotion Effects 0.000 claims description 12
- 238000007599 discharging Methods 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims 3
- 230000014759 maintenance of location Effects 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 58
- 238000001035 drying Methods 0.000 abstract description 12
- 238000001020 plasma etching Methods 0.000 abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 239000011261 inert gas Substances 0.000 abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 208000028659 discharge Diseases 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 11
- 230000004048 modification Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- 238000007789 sealing Methods 0.000 description 6
- 238000005192 partition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229920001973 fluoroelastomer Polymers 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
- F16K31/18—Actuating devices; Operating means; Releasing devices actuated by fluid actuated by a float
- F16K31/20—Actuating devices; Operating means; Releasing devices actuated by fluid actuated by a float actuating a lift valve
- F16K31/22—Actuating devices; Operating means; Releasing devices actuated by fluid actuated by a float actuating a lift valve with the float rigidly connected to the valve
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/44—Mechanical actuating means
- F16K31/53—Mechanical actuating means with toothed gearing
- F16K31/54—Mechanical actuating means with toothed gearing with pinion and rack
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K33/00—Floats for actuation of valves or other apparatus
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03D—WATER-CLOSETS OR URINALS WITH FLUSHING DEVICES; FLUSHING VALVES THEREFOR
- E03D1/00—Water flushing devices with cisterns ; Setting up a range of flushing devices or water-closets; Combinations of several flushing devices
- E03D1/30—Valves for high or low level cisterns; Their arrangement ; Flushing mechanisms in the cistern, optionally with provisions for a pre-or a post- flushing and for cutting off the flushing mechanism in case of leakage
- E03D1/33—Adaptations or arrangements of floats
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2001-00162153 | 2001-05-30 | ||
| JP2001162153 | 2001-05-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20020091819A KR20020091819A (ko) | 2002-12-06 |
| KR100614187B1 true KR100614187B1 (ko) | 2006-08-18 |
Family
ID=19005322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020020029942A Expired - Fee Related KR100614187B1 (ko) | 2001-05-30 | 2002-05-29 | 기판 처리 방법 및 장치 |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR100614187B1 (zh) |
| CN (1) | CN1267973C (zh) |
| HK (1) | HK1049547A1 (zh) |
| TW (1) | TW559927B (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3560962B1 (ja) * | 2003-07-02 | 2004-09-02 | エス・イー・エス株式会社 | 基板処理法及び基板処理装置 |
| KR20060061299A (ko) * | 2003-07-04 | 2006-06-07 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판처리시스템 |
| KR100776281B1 (ko) * | 2006-06-20 | 2007-11-13 | 세메스 주식회사 | 기판 처리 장치 |
| TWI378502B (en) | 2006-06-12 | 2012-12-01 | Semes Co Ltd | Method and apparatus for cleaning substrates |
| KR102359846B1 (ko) * | 2021-08-13 | 2022-02-09 | (주)피앤테크 | 증착 장비 내 균일한 가스 공급을 위한 가스 공급 장치 |
-
2002
- 2002-05-28 TW TW091111312A patent/TW559927B/zh not_active IP Right Cessation
- 2002-05-29 KR KR1020020029942A patent/KR100614187B1/ko not_active Expired - Fee Related
- 2002-05-30 CN CNB02121655XA patent/CN1267973C/zh not_active Expired - Fee Related
-
2003
- 2003-03-04 HK HK03101589.2A patent/HK1049547A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN1388569A (zh) | 2003-01-01 |
| KR20020091819A (ko) | 2002-12-06 |
| TW559927B (en) | 2003-11-01 |
| HK1049547A1 (zh) | 2003-05-16 |
| CN1267973C (zh) | 2006-08-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20020529 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20040413 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20020529 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20051118 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20060525 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20060811 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20060814 End annual number: 3 Start annual number: 1 |
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| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
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| FPAY | Annual fee payment |
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| FPAY | Annual fee payment |
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| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |