KR100577473B1 - 전계방출팁을 이용한 저에너지 대면적 전자빔 조사장치 - Google Patents
전계방출팁을 이용한 저에너지 대면적 전자빔 조사장치 Download PDFInfo
- Publication number
- KR100577473B1 KR100577473B1 KR1020040015693A KR20040015693A KR100577473B1 KR 100577473 B1 KR100577473 B1 KR 100577473B1 KR 1020040015693 A KR1020040015693 A KR 1020040015693A KR 20040015693 A KR20040015693 A KR 20040015693A KR 100577473 B1 KR100577473 B1 KR 100577473B1
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- Prior art keywords
- electron beam
- beam irradiation
- cathode
- vacuum chamber
- field emission
- Prior art date
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- Expired - Fee Related
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 81
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000002041 carbon nanotube Substances 0.000 claims abstract description 8
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract description 8
- 238000003780 insertion Methods 0.000 claims description 24
- 230000037431 insertion Effects 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000012212 insulator Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 10
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 239000010406 cathode material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/02—Irradiation devices having no beam-forming means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/02—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
- A61L2/087—Particle radiation, e.g. electron-beam, alpha or beta radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
- H01J33/02—Details
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2202/00—Aspects relating to methods or apparatus for disinfecting or sterilising materials or objects
- A61L2202/20—Targets to be treated
- A61L2202/24—Medical instruments, e.g. endoscopes, catheters, sharps
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- General Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Veterinary Medicine (AREA)
- Public Health (AREA)
- Animal Behavior & Ethology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Epidemiology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
- Cold Cathode And The Manufacture (AREA)
Abstract
Description
Claims (6)
- 둘레의 일측에 길이방향으로 전자빔 조사창이 형성된 진공챔버;상기 진공챔버의 내부 중심 길이방향으로 구비되고, 둘레의 일측으로 상기 전자빔 조사창에 대응되는 전계방출팁이 형성된 음극;상기 진공챔버의 일단에 구비되고, 상기 음극측으로 고전압을 인가시키는 고전압 인가부;상기 진공챔버의 일측에 결합되고, 상기 고전압 인가부를 구비하는 제 1 진공플랜지;상기 진공챔버의 타측에 결합되는 제 2 진공플랜지;상기 음극의 일측단에 핀삽입공을 형성하고, 상기 고전압 인가부의 일측에는 상기 고전압 인가부의 접속핀이 관통하는 제 1 절연체를 구비하여 상기 제 1 절연체를 관통한 접속핀이 음극의 핀삽입공에 삽입되도록 구성된 제 1 지지부; 및상기 제 2 진공플랜지의 중심부에 종축방향으로 구비된 제 2 절연체에 삽입홈을 형성하여 음극의 타측단에 형성되는 삽입돌부가 상기 삽입홈에 삽입되어 음극을 지지하도록 구성된 제 2 지지부; 를 포함하는 전자빔 조사장치.
- 제 1항에 있어서,상기 전계방출팁은 탄소나노튜브인 것을 특징으로 하는 전자빔 조사장치.
- 제 1항에 있어서,상기 음극은 원형단면을 갖는 봉체로 형성되고, 그 봉체의 외주면 길이방향으로 띠 형태의 전계방출팁이 형성되는 것을 특징으로 하는 전자빔 조사장치.
- 삭제
- 제 1항에 있어서,상기 전자빔 조사창은, 상기 진공챔버의 외측으로 다소 돌출되고 중앙부에 폭이 좁고 길이가 긴 직사각형태의 투시공이 형성된 베이스판;상기 베이스판의 투시공 외곽을 따라 형성되는 와이어 삽입홈에 삽입되는 금속와이어;상기 금속와이어가 둘러싸는 면적보다 다소 큰 면적으로 금속와이어 상측에 구비되는 금속막; 및상기 베이스판과 대응되고 중앙부에 투시공에 상응하는 빔조사공이 형성되어 베이스판과 결합되는 덮개판;을 포함하는 것을 특징으로 하는 전자빔 조사장치.
- 제 1항 또는 제 3항에 있어서,상기 진공챔버는 원통형태로 형성되고, 그 외주면에 다수의 전자빔 조사창이 형성되며, 상기 진공챔버 내부의 음극 외주면에는 상기 전자빔 조사창과 각각 대응되는 전계방출팁이 형성되는 것을 특징으로 하는 전자빔 조사장치.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040015693A KR100577473B1 (ko) | 2004-03-09 | 2004-03-09 | 전계방출팁을 이용한 저에너지 대면적 전자빔 조사장치 |
CN2005800076635A CN1954402B (zh) | 2004-03-09 | 2005-03-09 | 具有作为电子源的场发射器的大面积指示电子束照射器 |
EP05726933A EP1735810B1 (en) | 2004-03-09 | 2005-03-09 | A large-area shower electron beam irradiator with field emitters as an electron source |
PCT/KR2005/000650 WO2005086201A1 (en) | 2004-03-09 | 2005-03-09 | A large-area shower electron beam irradiator with field emitters as an electron source |
JP2007502711A JP4977006B2 (ja) | 2004-03-09 | 2005-03-09 | 電界放出チップを用いた低エネルギー大面積電子ビーム照射装置 |
US10/591,894 US7671522B2 (en) | 2004-03-09 | 2005-03-09 | Large-area shower electron beam irradiator with field emitters as an electron source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040015693A KR100577473B1 (ko) | 2004-03-09 | 2004-03-09 | 전계방출팁을 이용한 저에너지 대면적 전자빔 조사장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050090556A KR20050090556A (ko) | 2005-09-14 |
KR100577473B1 true KR100577473B1 (ko) | 2006-05-10 |
Family
ID=34918724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040015693A Expired - Fee Related KR100577473B1 (ko) | 2004-03-09 | 2004-03-09 | 전계방출팁을 이용한 저에너지 대면적 전자빔 조사장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7671522B2 (ko) |
EP (1) | EP1735810B1 (ko) |
JP (1) | JP4977006B2 (ko) |
KR (1) | KR100577473B1 (ko) |
CN (1) | CN1954402B (ko) |
WO (1) | WO2005086201A1 (ko) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101028715B1 (ko) | 2009-05-28 | 2011-04-12 | 한국원자력연구원 | 3극형 대면적 전자빔 조사장치 |
KR101091567B1 (ko) | 2009-05-29 | 2011-12-13 | 한국원자력연구원 | 나노입자의 제조장치 |
WO2020085669A1 (en) * | 2018-10-24 | 2020-04-30 | Korea Atomic Energy Research Institute | Atmosphere purification reactor using electron beam and atmosphere purification apparatus including the same |
KR20200046291A (ko) * | 2018-10-24 | 2020-05-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR20200114323A (ko) * | 2019-03-28 | 2020-10-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR20200114322A (ko) * | 2019-03-28 | 2020-10-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007051996A (ja) * | 2005-08-19 | 2007-03-01 | Ngk Insulators Ltd | 電子線照射装置 |
JP5061680B2 (ja) * | 2007-03-26 | 2012-10-31 | 澁谷工業株式会社 | 電子線殺菌装置 |
SE534156C2 (sv) * | 2009-03-11 | 2011-05-17 | Tetra Laval Holdings & Finance | Förfarande för montering av ett fönster för utgående elektroner och en fönsterenhet för utgående elektroner |
CN101893659B (zh) * | 2009-05-19 | 2012-06-20 | 清华大学 | 电磁波偏振方向检测方法及检测装置 |
JPWO2011040625A1 (ja) * | 2009-09-29 | 2013-02-28 | 有限会社真空実験室 | イオン源を有する真空計測装置 |
JP2011141176A (ja) * | 2010-01-07 | 2011-07-21 | Life Technology Research Institute Inc | 電子線照射装置 |
US20120175532A1 (en) * | 2011-01-11 | 2012-07-12 | Ushio America, Inc. | Compact modular ebeam systems and methods |
US9142377B2 (en) | 2011-07-04 | 2015-09-22 | Tetra Laval Holdings & Finance S.A. | Cathode housing suspension of an electron beam device |
ES2624977T3 (es) * | 2011-07-04 | 2017-07-18 | Tetra Laval Holdings & Finance Sa | Un emisor de haz de electrones con una brida de refrigeración, y un método de refrigeración de un emisor de haz de electrones |
DE102013223517A1 (de) * | 2013-11-19 | 2015-06-03 | Siemens Aktiengesellschaft | Elektronenkanone und Strahlungserzeugungsanlage |
US9576765B2 (en) | 2014-09-17 | 2017-02-21 | Hitachi Zosen Corporation | Electron beam emitter with increased electron transmission efficiency |
JP7434041B2 (ja) * | 2020-04-13 | 2024-02-20 | 浜松ホトニクス株式会社 | エネルギー線照射装置 |
CN112271128B (zh) * | 2020-11-13 | 2025-04-01 | 黄石上方检测设备有限公司 | 一种横向真空电子束管 |
CN115274380A (zh) * | 2021-04-30 | 2022-11-01 | 中国科学院上海应用物理研究所 | 电子束发生器及包含其的系统 |
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JPH09166699A (ja) | 1995-12-14 | 1997-06-24 | Nissin High Voltage Co Ltd | 電子線照射装置 |
JPH1062600A (ja) | 1996-08-23 | 1998-03-06 | Iwasaki Electric Co Ltd | 電子線照射装置 |
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JP2002228800A (ja) | 2001-02-05 | 2002-08-14 | Nissin High Voltage Co Ltd | 電子線照射装置 |
US6750461B2 (en) | 2001-10-03 | 2004-06-15 | Si Diamond Technology, Inc. | Large area electron source |
JP2004047254A (ja) | 2002-07-11 | 2004-02-12 | Toshiba Corp | カーボンナノチューブ冷陰極を用いた電子ビーム装置 |
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-
2004
- 2004-03-09 KR KR1020040015693A patent/KR100577473B1/ko not_active Expired - Fee Related
-
2005
- 2005-03-09 EP EP05726933A patent/EP1735810B1/en not_active Expired - Lifetime
- 2005-03-09 JP JP2007502711A patent/JP4977006B2/ja not_active Expired - Fee Related
- 2005-03-09 CN CN2005800076635A patent/CN1954402B/zh not_active Expired - Fee Related
- 2005-03-09 US US10/591,894 patent/US7671522B2/en not_active Expired - Fee Related
- 2005-03-09 WO PCT/KR2005/000650 patent/WO2005086201A1/en active Application Filing
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101028715B1 (ko) | 2009-05-28 | 2011-04-12 | 한국원자력연구원 | 3극형 대면적 전자빔 조사장치 |
KR101091567B1 (ko) | 2009-05-29 | 2011-12-13 | 한국원자력연구원 | 나노입자의 제조장치 |
WO2020085669A1 (en) * | 2018-10-24 | 2020-04-30 | Korea Atomic Energy Research Institute | Atmosphere purification reactor using electron beam and atmosphere purification apparatus including the same |
KR20200046291A (ko) * | 2018-10-24 | 2020-05-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR102143019B1 (ko) | 2018-10-24 | 2020-08-10 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
US12036504B2 (en) | 2018-10-24 | 2024-07-16 | Korea Atomic Energy Research Institute | Atmosphere purification reactor using electron beam and atmosphere purification apparatus including the same |
KR20200114323A (ko) * | 2019-03-28 | 2020-10-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR20200114322A (ko) * | 2019-03-28 | 2020-10-07 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR102179839B1 (ko) * | 2019-03-28 | 2020-11-17 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
KR102179838B1 (ko) * | 2019-03-28 | 2020-11-17 | 한국원자력연구원 | 전자빔을 이용한 대기정화용 반응장치 및 이를 포함하는 대기정화장치 |
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EP1735810B1 (en) | 2012-05-23 |
US7671522B2 (en) | 2010-03-02 |
US20070278928A1 (en) | 2007-12-06 |
KR20050090556A (ko) | 2005-09-14 |
JP4977006B2 (ja) | 2012-07-18 |
EP1735810A1 (en) | 2006-12-27 |
CN1954402B (zh) | 2010-08-04 |
WO2005086201A1 (en) | 2005-09-15 |
CN1954402A (zh) | 2007-04-25 |
JP2007528497A (ja) | 2007-10-11 |
EP1735810A4 (en) | 2009-08-05 |
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