KR100501339B1 - 플라즈마 장치 - Google Patents
플라즈마 장치 Download PDFInfo
- Publication number
- KR100501339B1 KR100501339B1 KR10-2001-0068095A KR20010068095A KR100501339B1 KR 100501339 B1 KR100501339 B1 KR 100501339B1 KR 20010068095 A KR20010068095 A KR 20010068095A KR 100501339 B1 KR100501339 B1 KR 100501339B1
- Authority
- KR
- South Korea
- Prior art keywords
- feed
- bell
- dome
- bell jar
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001816 cooling Methods 0.000 claims abstract description 13
- 239000010453 quartz Substances 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 25
- 238000004804 winding Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32467—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims (5)
- 상부가 석영돔으로 이루어지며 기체주입구 및 기체배출구가 마련되는 플라즈마 챔버;상기 석영돔과 일정간격 이격되면서 상기 석영돔을 덮도록 내측은 상기 석영돔과 같은 돔 형상을 하되 외측 상면은 평평한 형태를 하는 벨자;상기 석영돔과 같은 돔 형상을 하며 상기 석영돔에서 일정간격 이격되면서 상기 석영돔을 덮도록 상기 벨자와 상기 석영돔 사이에 설치되는 플라즈마 전극;상기 벨자를 수평으로 감아서 상기 벨자의 측벽을 둘러싸도록 설치되는 벨자히터;상기 돔형 플라즈마 전극의 가운데 정점에 닿도록 외부로부터 상기 벨자의 윗부분을 수직관통하도록 설치되는 막대형태의 RF 피드 스루우; 및상기 벨자의 외측에 있는 RF 피드 스루우를 둘러싸도록 설치되는 냉각라인을 구비하는 것을 특징으로 하는 플라즈마 장치.
- 제1항에 있어서, 상기 막대형태의 RF 피드 스루우의 두께가 7 내지 10mm 인 것을 특징으로 하는 플라즈마 장치.
- 제1항에 있어서, 상기 막대형태의 RF 피드 스루우의 길이가 90 내지 110 mm 인 것을 특징으로 하는 플라즈마 장치.
- 삭제
- 삭제
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0068095A KR100501339B1 (ko) | 2001-11-02 | 2001-11-02 | 플라즈마 장치 |
US10/282,305 US6642662B2 (en) | 2001-11-02 | 2002-10-28 | Plasma apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0068095A KR100501339B1 (ko) | 2001-11-02 | 2001-11-02 | 플라즈마 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030035686A KR20030035686A (ko) | 2003-05-09 |
KR100501339B1 true KR100501339B1 (ko) | 2005-07-18 |
Family
ID=19715634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0068095A Expired - Fee Related KR100501339B1 (ko) | 2001-11-02 | 2001-11-02 | 플라즈마 장치 |
Country Status (2)
Country | Link |
---|---|
US (1) | US6642662B2 (ko) |
KR (1) | KR100501339B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101464357B1 (ko) | 2008-06-13 | 2014-11-25 | 주성엔지니어링(주) | 기판처리장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100561642B1 (ko) * | 2003-06-27 | 2006-03-20 | 엘지.필립스 엘시디 주식회사 | 표시소자 제조 장치 및 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5976308A (en) * | 1993-08-27 | 1999-11-02 | Applied Materials, Inc. | High density plasma CVD and etching reactor |
JP2001152338A (ja) * | 1999-11-29 | 2001-06-05 | Japan Science & Technology Corp | 高導電率ダイアモンドライクカーボン薄膜製造装置 |
KR20010063770A (ko) * | 1999-12-24 | 2001-07-09 | 황 철 주 | 플라즈마를 이용하는 반도체소자 제조장치 및 이 장치를이용한 박막형성방법 |
KR20010087598A (ko) * | 2000-03-08 | 2001-09-21 | 황 철 주 | Hdp-cvd 장치 및 이를 이용한 갭 필링 방법 |
WO2001078105A1 (de) * | 2000-04-12 | 2001-10-18 | Aixtron Ag | Reaktionskammer mit wenigstens einer hf-durchführung |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
US5628829A (en) * | 1994-06-03 | 1997-05-13 | Materials Research Corporation | Method and apparatus for low temperature deposition of CVD and PECVD films |
US5665640A (en) * | 1994-06-03 | 1997-09-09 | Sony Corporation | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
KR100415435B1 (ko) * | 1999-09-21 | 2004-01-31 | 주성엔지니어링(주) | 반도체 소자 제조장치 |
-
2001
- 2001-11-02 KR KR10-2001-0068095A patent/KR100501339B1/ko not_active Expired - Fee Related
-
2002
- 2002-10-28 US US10/282,305 patent/US6642662B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5976308A (en) * | 1993-08-27 | 1999-11-02 | Applied Materials, Inc. | High density plasma CVD and etching reactor |
JP2001152338A (ja) * | 1999-11-29 | 2001-06-05 | Japan Science & Technology Corp | 高導電率ダイアモンドライクカーボン薄膜製造装置 |
KR20010063770A (ko) * | 1999-12-24 | 2001-07-09 | 황 철 주 | 플라즈마를 이용하는 반도체소자 제조장치 및 이 장치를이용한 박막형성방법 |
KR20010087598A (ko) * | 2000-03-08 | 2001-09-21 | 황 철 주 | Hdp-cvd 장치 및 이를 이용한 갭 필링 방법 |
WO2001078105A1 (de) * | 2000-04-12 | 2001-10-18 | Aixtron Ag | Reaktionskammer mit wenigstens einer hf-durchführung |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101464357B1 (ko) | 2008-06-13 | 2014-11-25 | 주성엔지니어링(주) | 기판처리장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20030035686A (ko) | 2003-05-09 |
US6642662B2 (en) | 2003-11-04 |
US20030085661A1 (en) | 2003-05-08 |
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