KR100480795B1 - 정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널 - Google Patents
정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널 Download PDFInfo
- Publication number
- KR100480795B1 KR100480795B1 KR10-2000-0021620A KR20000021620A KR100480795B1 KR 100480795 B1 KR100480795 B1 KR 100480795B1 KR 20000021620 A KR20000021620 A KR 20000021620A KR 100480795 B1 KR100480795 B1 KR 100480795B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- light source
- guiding panel
- pattern
- panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
Claims (1)
- 광원 반사면(31)의 빛의 이용률을 높이도록 앙각(elevation angle)을 갖는 단면 플랫폼(platform)을 구비한 패턴(32)이 형성된 광-안내 패널(3)에 있어서,상기 패턴(32)의 바닥부(33) 및 측면의 측벽(34)은 광출력 효율을 강화시키도록 빛을 전반사시키는 거울로 형성되고,상기 광-안내 패널(3)이 정면 광원 또는 후면 광원에 사용되는 것을 특징으로 하는 정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2000-0021620A KR100480795B1 (ko) | 2000-04-24 | 2000-04-24 | 정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2000-0021620A KR100480795B1 (ko) | 2000-04-24 | 2000-04-24 | 정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010097496A KR20010097496A (ko) | 2001-11-08 |
KR100480795B1 true KR100480795B1 (ko) | 2005-04-06 |
Family
ID=43667823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-0021620A Expired - Fee Related KR100480795B1 (ko) | 2000-04-24 | 2000-04-24 | 정면 광원 또는 후면 광원을 사용하는 전반사 패턴의 광-안내 패널 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100480795B1 (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09159833A (ja) * | 1995-12-05 | 1997-06-20 | Kuraray Co Ltd | 導光体 |
JPH11224518A (ja) * | 1997-12-01 | 1999-08-17 | Hiroshi Inoue | 導光照明装置 |
KR19990072927A (ko) * | 1998-02-27 | 1999-09-27 | 가나이 쓰도무 | 액정표시장치 |
KR20010091089A (ko) * | 2000-03-13 | 2001-10-23 | 왕 펜-잔 | 표면형 광원 장치의 빛-유도 플레이트 |
-
2000
- 2000-04-24 KR KR10-2000-0021620A patent/KR100480795B1/ko not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09159833A (ja) * | 1995-12-05 | 1997-06-20 | Kuraray Co Ltd | 導光体 |
JPH11224518A (ja) * | 1997-12-01 | 1999-08-17 | Hiroshi Inoue | 導光照明装置 |
KR19990072927A (ko) * | 1998-02-27 | 1999-09-27 | 가나이 쓰도무 | 액정표시장치 |
KR20010091089A (ko) * | 2000-03-13 | 2001-10-23 | 왕 펜-잔 | 표면형 광원 장치의 빛-유도 플레이트 |
Also Published As
Publication number | Publication date |
---|---|
KR20010097496A (ko) | 2001-11-08 |
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