KR100455700B1 - Microbattery adopting carbon nanotubes and manufacturing method thereof - Google Patents

Abstract

A microbattery using carbon nanotubes and a method of manufacturing the same are disclosed. Micro battery according to an aspect of the present invention, the carbon nanotubes and Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ filled between the carbon nanotubes Solid electrolyte of a thin film made of Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ or a mixture thereof, which is introduced between a negative electrode of a thin film including O ₅ or SiO ₂ , a positive electrode of a thin film opposite to the negative electrode, and a negative electrode and a positive electrode And a first current collector and a second current collector of a thin film made of chromium, platinum, copper, aluminum, or nickel on the rear surface of each of the negative electrode and the positive electrode.

Description

Microbattery using carbon nanotubes and a method for manufacturing the same {Microbattery adopting carbon nanotubes and manufacturing method}

The present invention relates to a rechargeable secondary battery, and more particularly, to a rechargeable microbattery including a thin film electrode formed using carbon nanotubes and a method of manufacturing the same.

Recently, with the development of scientific and industrial technology, the development of micro precision mechanical component devices or ultra-fine electrical and electronic devices has been rapidly progressing worldwide. Accordingly, research has been attempted to refine the driving energy source of such devices. As a driving energy source having such a small size, a method of using a concept of a secondary battery has been attempted. However, there is still no commercialization of such fine size power supplies worldwide.

An object of the present invention is to provide a micro battery using the concept of a secondary battery that can be used as a power supply device of a fine size.

Another technical problem to be achieved by the present invention is to provide a method for manufacturing a micro battery using the concept of a secondary battery that can be used as a power supply device of a fine size.

1 to 5 are schematic views illustrating a micro battery and a method of manufacturing the same according to an embodiment of the present invention.

<Brief description of the major symbols in the drawings>

100; Substrates 210, 250; House,

300; Negative electrode of the carbon nanotube thin film, 400: solid electrolyte,

500; Positive electrode. 600; Protective coating.

One aspect of the present invention for achieving the above technical problem, a negative electrode of a thin film comprising carbon nanotubes, a positive electrode of a thin film opposed to the negative electrode, and a solid electrolyte of a thin film introduced between the negative electrode and the positive electrode It provides a micro battery comprising.

The negative electrode may further include a material forming the solid electrolyte filled between the carbon nanotubes. In this case, the material forming the solid electrolyte may be Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ .

The solid electrolyte may be composed of Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ or a mixture thereof, and further include B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ in these materials. The solid electrolyte may be made.

The positive electrode may be made of LiCoO ₂ or LiMnO ₂ , and further include Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ in these materials. The positive electrode may be made.

The first current collector of the thin film formed on the rear of the negative electrode, and the second current collector of the thin film formed on the rear of the positive electrode may be further included, wherein the first current collector and the second current collector are chromium, platinum, copper, aluminum Or nickel.

One aspect of the present invention for achieving the above technical problem, to form a negative electrode of a thin film comprising carbon nanotubes on a substrate, to form a thin electrolyte of the thin film on the negative electrode, a thin film on the solid electrolyte It is possible to provide a micro battery manufacturing method comprising the step of forming a positive electrode.

The forming of the negative electrode may include depositing on the substrate by sputtering, thermal vapor deposition, or vacuum vapor deposition using carbon nanotubes as a sample. Here, the sample may further include a material forming the solid electrolyte mixed in the carbon nanotubes, wherein the sample is a material forming a solid electrolyte Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ .

The forming of the solid electrolyte may include depositing a sample including Li ₃ PO ₄ , LiPO ₃ , LiBO _2, or LiO ₂ on the negative electrode by sputtering, thermal vapor deposition, or vacuum vapor deposition. In this case, the sample may further include B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO ₂ . In addition, the deposition may be included, or performed in an atmosphere containing N ₂ or O ₂ and N _2, or including the O _2.

The forming of the positive electrode may include depositing a sample including LiCoO ₂ or LiMnO ₂ on the solid electrolyte by sputtering, thermal vapor deposition, or vacuum vapor deposition. Here, the sample may further include Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO ₂ .

A first current collector of a thin film of chromium, platinum, copper, aluminum or nickel is formed on the substrate so as to be introduced between the negative electrode and the substrate, and the thin film of chromium, platinum, copper, aluminum or nickel is formed on the positive electrode. The method may further include forming a second current collector.

The forming of the negative electrode, the forming of the solid electrolyte, and the forming of the positive electrode may be continuously performed.

According to the present invention, it is possible to provide a micro-secondary battery that can be used as a micro-sized energy storage and supply device by thinning a negative electrode and a solid electrolyte and a positive electrode made of carbon nanotubes.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, embodiments of the present invention may be modified in many different forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. Embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art. Accordingly, the shape and the like of the elements in the drawings are exaggerated to emphasize a more clear description, and the elements denoted by the same reference numerals in the drawings means the same elements. In addition, where a layer is described as being "on" another layer or semiconductor substrate, the layer may exist in direct contact with the other layer or semiconductor substrate, or a third layer therebetween. May be interposed.

An embodiment of the present invention proposes to form a microcell using carbon nanotubes using the concept of a secondary battery.

Carbon nanotubes are several nanometers to several tens of nanometers in diameter and tens of micrometers to hundreds of micrometers in length, which are largely anisotropic in structure and have various shapes in the form of single walls, multi walls, or bundles. Have Carbon nanotubes are mechanically strong, have excellent chemical stability, and have high thermal and electrical conductivity.

In the embodiment of the present invention by using the carbon nanotubes to form a thin film electrode. In this case, the carbon nanotube thin film has a thickness of about 1 μm or less and is used as an electrode of a micro battery. Carbon nanotubes are deposited on a medium by sputtering, thermal evaporation, or vacuum evaporation, to form a thin film electrode. Conventional carbon-based electrode materials are known to be difficult to be formed by thinning, but in the embodiment of the present invention, since the carbon nanotubes may be formed as thin films, the size of the secondary battery may be reduced.

By adopting such a carbon nanotube thin film electrode, the characteristic showing the high specific surface area of a carbon nanotube can be utilized for the improvement of the characteristic of a secondary battery. That is, the individual carbon nanotubes have a hollow tube shape, so that electrolyte ions can be easily occluded, and there are many seats in which electrolyte ions can be occluded between the carbon nanotubes and the carbon nanotubes. Therefore, when the secondary battery is formed by forming the carbon nanotubes as thin film electrodes, the charge / discharge capacity of the battery may be increased and high repeatability may be realized. Thus, by using a carbon nanotube thin film electrode, it becomes possible to provide a high performance micro secondary battery.

On the other hand, in the embodiment of the present invention by using a carbon nanotube thin film electrode, and also by using a solid electrolyte by thinning the ion conductors (solid conductors) in a completely solid state, by using a positive electrode active material (thin film) The preparation of the micro secondary battery is presented.

1 is a view schematically illustrating a micro battery according to an embodiment of the present invention.

Specifically, the micro-cell using the concept of a secondary battery according to an embodiment of the present invention, the negative electrode (negative node: 300) formed by thinning the carbon nanotubes and made of a positive electrode (thinned node: 500), The solid electrolyte 400 is introduced in the form of a thin film between the negative electrode 300 and the positive electrode 500.

The first current collector 210 for applying a charge to the negative electrode 300 or withdrawing the charge generated from the negative electrode 300 may be introduced in the form of a thin film on the rear surface of the negative electrode 300. In addition, a second current collector 250 for applying charge to the positive electrode 500 or withdrawing charge generated from the positive electrode 500 may be introduced in a thin film form on the rear surface of the positive electrode 500. The first current collector 210, the negative electrode 300, the solid electrolyte 400, the positive electrode 500, and the second current collector 250 may be sequentially stacked on the substrate 100. . The passivation layer 600 is introduced onto the second current collector 250.

The negative electrode 300 is formed of a thin film made of a plurality of single or multiwalled carbon nanotubes. The negative electrode 300 may be formed in a thin film form by sputtering, thermal vapor deposition, or vacuum vapor deposition. In this case, the negative electrode 300 is preferably formed as a thin film having a thickness of about 1 μm or less.

The first current collector 210 introduced to the rear surface of the negative electrode 300 is introduced to effectively apply or draw voltage or current to the negative electrode 300, and is formed of a conductive material such as chromium, platinum, copper, aluminum, nickel, or the like. It may be made of a thin film. Such materials are deposited in a thin film on a substrate 100, for example, a substrate 100 of an insulating material by sputtering, thermal vapor deposition, or vacuum vapor deposition. The first current collector 210 is preferably formed of a thin film having a thickness of about 1 μm or less.

The solid electrolyte 400 may be formed in a thin film form, and the solid electrolyte 400 may be formed of ion conductors, for example, Li ₃ PO ₄ , LiPO ₃ , LiBO _2, or LiO ₂ . The solid electrolyte 400 may be made of these ion conductors alone or mixed. In addition, the solid electrolyte 400 may be formed by mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ with these ion conductors. The solid electrolyte 400 is introduced to prevent a short circuit between the negative electrode 300 and the positive electrode 500 and to allow free ion exchange.

On the other hand, the negative electrode 300 is made of carbon nanotubes, in order to further promote free ion exchange with the solid electrolyte 400 may be formed by mixing the above-described ion conductors between the carbon nanotubes. That is, the negative electrode 300 may be formed of carbon nanotubes and ion conductors filled between the carbon nanotubes. Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ or LiO ₂ may be used as such ion conductors, and these ion conductors may be filled alone or in a mixture between the carbon nanotubes described above. In addition, B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ may be further mixed with these ion conductors to fill the carbon nanotubes to form the negative electrode 300 of the thin film.

The positive electrode 500 introduced to face the negative electrode 300 with the solid electrolyte 400 therebetween may be formed of a thin film made of LiCoO ₂ or LiMnO ₂ . In this case, the positive electrode 500 may be formed by being deposited in a thin film form on the solid electrolyte 400 by sputtering, thermal vapor deposition, or vacuum vapor deposition.

At this time, the thin film constituting the positive electrode 500 is a material or ionic conductors, such as Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ or Li ₂ O and the like constituting the solid electrolyte 400 as a single or a mixture It may contain more. In addition to the material of the solid electrolyte 400, the positive electrode 500 may further contain a material such as B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ , alone or in a mixture. The positive electrode 500 further includes a material constituting the solid electrolyte 400 to obtain an effect of activating free exchange of ions between the positive electrode 500 and the solid electrolyte 400. The positive electrode 500 is preferably deposited as a thin film having a thickness of about 1 μm or less.

The second current collector 250 introduced to the rear surface of the positive electrode 500 is introduced to effectively apply or draw voltage or current to the negative electrode 500, and is formed of a conductive material such as chromium, platinum, copper, aluminum, nickel, or the like. It may be made of a thin film. Such materials are deposited in thin films by sputtering, thermal vapor deposition or vacuum vapor deposition. The second current collector 250 is preferably formed of a thin film having a thickness of about 1 μm or less.

The protective film 600 is formed by depositing an insulating material or the like so as to cover the second current collector 250. At this time, one end of each of the first current collector 210 and the second current collector 250 is exposed to the outside of the range of the protective film 600, and then induced to be electrically contacted with other connection wires.

When current and voltage are applied to the two thin film electrodes 300 and 500 of the negative electrode 300 and the positive electrode 500 of the micro secondary battery configured as described above, lithium ions in the solid electrolyte 400 may form carbon nanotubes. Charging occurs while moving to the negative electrode 300, which includes the battery. At the time of discharge, the lithium ions occluded in the negative electrode 300 including the carbon nanotubes move to an active material forming the positive electrode 500, thereby discharging. That is, the micro-secondary battery is charged or discharged by the redox reaction occurring at the two electrodes 300 and 500 as the lithium ions move.

2 to 5 are schematic views for explaining a method of manufacturing a micro battery according to an embodiment of the present invention in detail.

2 schematically illustrates a step of forming the first current collector 210 on the substrate 100.

Specifically, the substrate 100 made of an insulating material or the like is introduced into a chamber (not shown) of the deposition equipment. The first current collector 210 is formed by depositing a conductive material such as chromium, platinum, copper, aluminum, nickel, or the like on the substrate 100 to form a thin film. Such deposition may be performed by sputtering, thermal vapor deposition or vapor deposition. The thin film by such deposition is formed to a thickness of about 1 μm or less.

Meanwhile, the patterning of the thin film may use various thin film patterning methods. For example, after deposition of the thin film may be patterned using a photolithography method or the like, or before depositing the thin film, a first mask (701) is introduced onto the substrate 100, and then The thin film may be patterned by depositing a thin film on the substrate and removing or removing the first mask 701 from the substrate 100.

3 schematically illustrates a step of forming the negative electrode 300 on the first current collector 210.

Specifically, the negative electrode 300 is formed by depositing carbon nanotubes on the first current collector 210 of the thin film. The deposition of such carbon nanotubes may be performed by thermal vapor deposition, sputtering or vacuum vapor deposition. For example, after forming a target using the synthesized carbon nanotubes, the target is sputtered to deposit sputtered carbon nanotubes on the first current collector 210 of the thin film, whereby the carbon nanotube thin film To form. Alternatively, in the case of thermal vapor deposition, a carbon nanotube thin film is formed by vaporizing a sample of the synthesized carbon nanotubes with heat and depositing them on the first current collector 210. Alternatively, in the case of vacuum vapor deposition, a carbon nanotube thin film is formed by charging a sample of the synthesized carbon nanotubes in a vacuum chamber and forming a vacuum to vaporize the carbon nanotubes and depositing them on the first current collector 210. . The carbon nanotube thin film is preferably deposited at a thickness of at most 1 μm for the formation of a micro cell.

Meanwhile, the patterning of the carbon nanotube thin film may be performed in various ways, but before depositing the carbon nanotube thin film, the substrate 100 may include a second mask 702 that selectively exposes the position where the negative electrode 300 is to be formed. After introduction into the phase, the carbon nanotube thin film can be patterned by depositing the carbon nanotube thin film thereon as described above and leaving or removing the second mask 702 from the substrate 100.

When the negative electrode 300 of the carbon nanotube thin film is formed, a part of the first current collector 210 is partially connected to the first current collector 210 in order to connect a conductor to apply or draw a voltage or current to the first current collector 210. It is preferable that the negative electrode 300 of the thin film is exposed without being completely covered.

On the other hand, the negative electrode 300 may be formed of a thin film of carbon nanotubes as described above, but in order to facilitate free ion exchange with the solid electrolyte (400 of FIG. 1) to be formed on the negative electrode 300 Further materials may be added between the nanotubes to form a solid electrolyte (400 in FIG. 1).

For example, in preparation for performing a deposition process for forming the negative electrode 300, carbon nanotubes are mixed with an ion conductor material that can be used as a solid electrolyte (400 in FIG. 1). When the thin film for the negative electrode 300 is formed by the sputtering method, a target for sputtering is prepared in advance by homogeneously mixing ion conductors such as Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ or LiO ₂ to carbon nanotubes. do. In this case, the target may be prepared by further mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ . Thereafter, sputtering may be performed using such a target to form a thin film so that the negative electrode 300 may include carbon nanotubes and ion conductors filled between the carbon nanotubes.

When the thin film for the negative electrode 300 is formed by thermal vapor deposition or vacuum vapor deposition, the ion conductors such as Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ or LiO ₂ are homogeneously formed on the carbon nanotubes. Mixing prepares a sample for vapor deposition in advance. In this case, the sample may be prepared by further mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ . Thereafter, such a sample may be vaporized and deposited to form a thin film, such that the negative electrode 300 includes carbon nanotubes and ion conductors filled between the carbon nanotubes.

As such, the materials forming the solid electrolyte (400 in FIG. 1), such as ion conductors homogeneously filled between the carbon nanotubes forming the negative electrode 300, are formed between the carbon nanotubes and the solid electrolyte (400 in FIG. 1). It promotes ion exchange, that is, serves as a passage through which the ions of the solid electrolyte (400 in FIG. 1) can move faster into the carbon nanotubes.

As described above, the negative electrode 300 including the carbon nanotubes deposited as a thin film is preferably deposited to a thickness of about 1 μm or less to be suitable for use in a micro secondary battery.

4 schematically illustrates a step of sequentially forming the solid electrolyte 400 on the negative electrode 300.

Specifically, after forming the negative electrode 300, the solid electrolyte 400 is deposited on the negative electrode 300 to form a thin film. In this case, the solid electrolyte 400 may be formed of ion conductors, for example, Li ₃ PO ₄ , LiPO ₃ , LiBO _2, or LiO ₂ . The solid electrolyte 400 may be made of these ion conductors alone or mixed. In addition, the solid electrolyte 400 may be formed by mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ with these ion conductors.

In this case, the solid electrolyte 400 may be formed by sputtering, thermal vapor deposition, or vacuum vapor deposition. That is, the thin film of the solid electrolyte 400 may be formed by sputtering using the ion conductors as a target or by vapor deposition using samples made of the ion conductors. The patterning of the solid electrolyte 400 of the thin film may be performed by various patterning methods. For example, a mask that selectively exposes a portion of the solid electrolyte 400 to be deposited on the substrate 100 when the deposition is performed. After introducing (not shown) in advance, the patterned solid electrolyte 400 thin film can be obtained by performing vapor deposition and then removing or leaving the mask.

On the other hand, it is desirable to introduce these to perform the deposition of the solid electrolyte 400, a mood or atmosphere, or O ₂ and the deposition process the atmosphere of a mixed gas of N ₂ containing N ₂ containing O _2. This is to induce oxygen or nitrogen atoms to be introduced into the solid electrolyte 400 during the deposition process, thereby further increasing the ionic conductivity of the solid electrolyte 400. Accordingly, the ionic conductivity of the deposited solid electrolyte 400 may be obtained with a value between approximately 10 ⁻⁵ S / cm and 10 ⁻⁶ S / cm.

On the other hand, the solid electrolyte 400 may be deposited to a thickness of about 1 ㎛ or less.

5 schematically illustrates a step of forming the positive electrode 500 on the solid electrolyte 400.

Specifically, the positive electrode 500 is formed on the solid electrolyte 400 as a thin film made of LiCoO ₂ or LiMnO ₂ . In this case, the positive electrode 500 may be formed by being deposited using a sputtering method, a thermal vapor deposition method, or a vacuum vapor deposition method. That is, the positive electrode 500 of the thin film may be formed by sputtering using a target made of the above materials, or vapor deposition using samples made of the above materials. The patterning of the cathode 500 of the thin film may be performed by various patterning methods. For example, a mask that selectively exposes only a portion of the cathode 500 to be deposited on the substrate 100 when performing deposition. Or the like) in advance, and then the deposition is performed, and then the patterned positive electrode 500 thin film can be obtained by removing or leaving the mask.

Meanwhile, the positive electrode 500 may be formed of a thin film made of LiCoO ₂ or LiMnO ₂ , as described above. However, the positive electrode 500 may further include a material forming the solid electrolyte 400 to further promote free ion exchange with the solid electrolyte 400. It can be formed by containing.

For example, in a preparation step of performing a deposition process for forming the positive electrode 500, such an ion conductor material used as the solid electrolyte 400 is mixed with a material such as LiCoO ₂ or LiMnO ₂ . When the thin film for the negative electrode 500 is formed by the sputtering method, sputtering is performed by homogeneously mixing ion conductors such as Li ₃ PO ₄ , LiPO ₃ , LiBO _2, or LiO ₂ with a material such as LiCoO ₂ or LiMnO ₂ . Prepare targets in advance. In this case, the target may be prepared by further mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ . Subsequently, by sputtering using such a target to form a thin film, the positive electrode 500 may be formed of a material such as LiCoO ₂ or LiMnO ₂ and ion conductors homogeneously distributed between these materials. have.

When the thin film for the positive electrode 500 is formed by thermal vapor deposition or vacuum vapor deposition, the above-described ion conductors such as LiCoO ₂ or LiMnO ₂ may be used, for example, Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ or Homogeneously mix LiO ₂ to prepare a sample for vapor deposition in advance. In this case, the sample may be prepared by further mixing B ₂ O ₃ , V ₂ O ₅ , P ₂ O _5, or SiO ₂ . Thereafter, the positive electrode 500 may be formed by vaporizing and depositing the sample to form a thin film.

As such, the materials constituting the solid electrolyte 400, such as ion conductors homogeneously distributed among the materials such as LiCoO ₂ or LiMnO ₂ constituting the positive electrode 500, may be formed between the positive electrode 500 and the solid electrolyte 400. Serves to promote ion exchange.

As described above, the positive electrode 300 deposited as a thin film is preferably deposited to a thickness of about 1 μm or less to be suitable for use in a micro secondary battery.

Subsequently, a second current collector 250 is formed by depositing a conductive material such as chromium, platinum, copper, aluminum, nickel, and the like on the rear surface of the positive electrode 500 to form a thin film. Such deposition may be performed by sputtering, thermal vapor deposition or vapor deposition. The thin film by such deposition is formed to a thickness of about 1 μm or less.

Thereafter, as shown in FIG. 1, the passivation layer 600 is deposited on the second current collector 250 by using an insulating material or the like. In this case, the passivation layer 600 may be patterned to expose an end portion of the first current collector 210 and a portion of the second current collector 250. A conductive wire may be connected to the exposed first current collector 210 and the second current collector 250.

Meanwhile, the process of depositing the first current collector 210, the negative electrode 300, the solid electrolyte 400, the positive electrode 500, and the second current collector 250 as described above may be performed continuously.

The micro-secondary battery using the two electrodes 300 and 500 of the negative electrode 300 and the positive electrode 500 and the solid electrolyte 400 manufactured as described above is a solid having an ion conductivity of approximately 10 ⁻⁵ S / cm. In the case of using the electrolyte 400, when the discharge current density is 100 mA / cm ² at the operating voltage of 2.5 V, a specific capacitance of about 200 mA / cm ² can be realized, and the discharge current density is 300 mA / cm ^2. It is measured to have a charge and discharge efficiency of more than 90% and a repeat life of at least 1000 times.

As mentioned above, although this invention was demonstrated in detail through the specific Example, this invention is not limited to this, It is clear that the deformation | transformation and improvement are possible by the person of ordinary skill in the art within the technical idea of this invention.

According to the present invention, a thin film including carbon nanotubes is used as a negative electrode, a solid electrolyte is deposited in a thin film form, and a positive electrode is deposited in a thin film form to form a micro secondary battery having a micro size, for example, a thickness of about 3 μm or less. Can be formed. Such a micro secondary battery can be used as an energy storage and supply device, and can be utilized as an independent energy supply device for ultra small precision machines and micro electric and electronic devices, thereby promoting the development of ultra fine technology. In addition, by depositing carbon nanotubes simultaneously with the solid electrolyte, the ions can be allowed to diffuse quickly into the electrode, thereby maximizing the discharge capacity and the charge and discharge efficiency.

Claims (19)

Thin film comprising carbon nanotubes and Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO ₂ filled between the carbon nanotubes Negative electrode; A positive electrode of a thin film opposite to the negative electrode; A thin film solid electrolyte introduced between the negative electrode and the positive electrode and formed of Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO _2, or a mixture thereof; And And a first current collector and a second current collector of a thin film made of chromium, platinum, copper, aluminum, or nickel on a rear surface of each of the negative electrode and the positive electrode. delete delete delete The method of claim 1, wherein the solid electrolyte _{B 2 O 3, V 2 O} 5, P 2 O 5 or a micro cell according to claim 1, further including SiO _2. The method of claim 1, wherein the positive electrode A microcell comprising LiCoO ₂ or LiMnO ₂ . The method of claim 6, wherein the positive electrode A micro-cell further comprising Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO ₂ . delete Carbon nanotubes and a mixture of Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO ₂ on the substrate Forming a negative electrode of the thin film by sputtering, thermal vapor deposition, or vacuum vapor deposition; Depositing a sample containing Li ₃ PO ₄ , LiPO ₃ , LiBO _2, or LiO ₂ on the negative electrode by sputtering, thermal vapor deposition, or vacuum vapor deposition to form a solid electrolyte in a thin film; Forming a positive electrode of a thin film on the solid electrolyte; Forming a first current collector of a thin film made of chromium, platinum, copper, aluminum, or nickel on the substrate to be introduced between the negative electrode and the substrate; And And forming a second current collector of a thin film made of chromium, platinum, copper, aluminum, or nickel on the positive electrode. delete delete delete delete The method of claim 9, wherein the sample B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO _{2 The} method for producing a micro-cell further comprising. The method of claim 9, wherein the deposition is A method of manufacturing a micro cell, characterized in that it is carried out in an atmosphere containing O ₂ , containing N ₂ , or containing O ₂ and N ₂ . The method of claim 9, wherein forming the positive electrode Depositing a sample comprising LiCoO ₂ or LiMnO ₂ on the solid electrolyte by sputtering, thermal vapor deposition, or vacuum vapor deposition. The method of claim 16, wherein the sample Li ₃ PO ₄ , LiPO ₃ , LiBO ₂ , LiO ₂ , B ₂ O ₃ , V ₂ O ₅ , P ₂ O ₅ or SiO _{2 The} method for producing a micro-cell characterized in that it further comprises. delete The method of claim 9, Forming the negative electrode, forming the solid electrolyte, and forming the positive electrode are continuously performed.