KR100453046B1 - 유기 감광체용 오버코트 형성용 조성물 및 이로부터형성된 오버코트층을 채용한 유기 감광체 - Google Patents
유기 감광체용 오버코트 형성용 조성물 및 이로부터형성된 오버코트층을 채용한 유기 감광체 Download PDFInfo
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- KR100453046B1 KR100453046B1 KR10-2002-0020596A KR20020020596A KR100453046B1 KR 100453046 B1 KR100453046 B1 KR 100453046B1 KR 20020020596 A KR20020020596 A KR 20020020596A KR 100453046 B1 KR100453046 B1 KR 100453046B1
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- 239000000203 mixture Substances 0.000 title claims abstract description 51
- 108091008695 photoreceptors Proteins 0.000 title claims description 5
- 239000010410 layer Substances 0.000 claims abstract description 137
- -1 silane compound Chemical class 0.000 claims abstract description 84
- 238000000576 coating method Methods 0.000 claims abstract description 26
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims abstract description 26
- 239000002904 solvent Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 17
- 229910000077 silane Inorganic materials 0.000 claims abstract description 16
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 10
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims abstract description 7
- 125000000524 functional group Chemical group 0.000 claims abstract description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 6
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims abstract description 5
- 125000005843 halogen group Chemical group 0.000 claims abstract description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 5
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 27
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 25
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 238000006460 hydrolysis reaction Methods 0.000 claims description 14
- 230000007062 hydrolysis Effects 0.000 claims description 13
- 229920003145 methacrylic acid copolymer Polymers 0.000 claims description 13
- 229940117841 methacrylic acid copolymer Drugs 0.000 claims description 13
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 claims description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 6
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 5
- 230000018044 dehydration Effects 0.000 claims description 5
- 238000006297 dehydration reaction Methods 0.000 claims description 5
- 239000000047 product Substances 0.000 claims description 5
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 5
- KKYDYRWEUFJLER-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F KKYDYRWEUFJLER-UHFFFAOYSA-N 0.000 claims description 4
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 4
- 239000006184 cosolvent Substances 0.000 claims description 4
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 4
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 claims description 4
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- 238000004132 cross linking Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- PMQIWLWDLURJOE-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F PMQIWLWDLURJOE-UHFFFAOYSA-N 0.000 claims description 3
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 claims description 3
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 claims description 3
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 claims 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 claims 2
- 239000012790 adhesive layer Substances 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 abstract 1
- 239000012948 isocyanate Substances 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 10
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000011254 layer-forming composition Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000012188 paraffin wax Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000002355 dual-layer Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000004299 exfoliation Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- UWCVGPLTGZWHGS-ZORIOUSZSA-N pergolide mesylate Chemical compound CS(O)(=O)=O.C1=CC([C@H]2C[C@@H](CSC)CN([C@@H]2C2)CCC)=C3C2=CNC3=C1 UWCVGPLTGZWHGS-ZORIOUSZSA-N 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- WDVSHHCDHLJJJR-UHFFFAOYSA-N Proflavine Chemical compound C1=CC(N)=CC2=NC3=CC(N)=CC=C3C=C21 WDVSHHCDHLJJJR-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000013615 primer Substances 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 108020003175 receptors Proteins 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14734—Polymers comprising at least one carboxyl radical, e.g. polyacrylic acid, polycrotonic acid, polymaleic acid; Derivatives thereof, e.g. their esters, salts, anhydrides, nitriles, amides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/1473—Polyvinylalcohol, polyallylalcohol; Derivatives thereof, e.g. polyvinylesters, polyvinylethers, polyvinylamines
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
평가항목 | 실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 | |
단위면적당 코팅무게(g/㎠) | 1.64 | 1.65 | 1.79 | 0.65 | 1.57 | 1.54 | |
대전전위(V) | 코팅전 | 700 | 708 | 709 | 764 | 763 | 723 |
오버코트코팅후 | 702→702* | 713→705 | 711→685 | 766→730 | 764→764 | 746→740 | |
노르파르12침적후 | 698→698 | 704→699 | 698→681 | 784→732 | 727→725 | 721→719 | |
노광전위(V) | 코팅전 | 67 | 68 | 62 | 42 | 39 | 59 |
오버코트코팅후 | 71→83 | 69→81 | 63→73 | 61→146 | 49→55 | 69→75 | |
노르파르12침적후 | 67→73 | 59→70 | 59→67 | 71→139 | 70→77 | 74→87 | |
접착력 | 양호 | 양호 | 양호 | 쉽게 벗겨짐 | 벗겨짐 | 벗겨짐 | |
막상태 | 없음 | 없음 | 없음 | 크랙발생 | 없음 | 없음 |
Claims (19)
- 화학식 1의 유기 실란 화합물, 아크릴레이트계 고분자, 폴리비닐부티랄 및 용매를 포함하는 것을 특징으로 하는 유기 감광체용 오버코트층 형성용 조성물.<화학식 1>상기식중, R'은 C1-C20의 알킬기, 페닐기, 비닐기, 메타크릴옥시프로필기, 아미노프로필기, 아미노에틸아미노프로필기, 페닐아미노프로필기, 클로로프로필기, 머캡토프로필기, 아크릴옥시프로필기, 3-글리시독시프로필기, 트리플루오로프로필기, 헵타데카플루오로데실기, 및 이소시아네이트프로필기로 이루어진 군으로부터 선택된 하나이고,R''은 가수분해가능한 관능기로서, C1-C20의 알콕시기 또는 할로겐 원자이다.
- 제1항에 있어서, 상기 아크릴레이트계 고분자가화학식 2로 표시되는 메틸 메타크릴레이트-메타크릴산 공중합체이고,그 함량이 화학식 1의 유기 실란 화합물 100 중량부를 기준으로 하여 10 내지 200 중량부인 것을 특징으로 하는 유기 감광체용 오버코트층 형성용 조성물.<화학식 2>상기식중, m은 10 내지 50몰%이고, n은 50 내지 90몰%이다.
- 제1항에 있어서, 상기 폴리부티랄 수지가 화학식 3으로 표시되며,상기 폴리비닐부티랄의 함량이 화학식 1의 유기 실란 화합물 100 중량부를 기준으로 하여 1 내지 20 중량부인 것을 특징으로 하는 유기 감광체용 오버코트층 형성용 조성물.<화학식 3>상기식중, a는 60 내지 90 몰%이고, b는 0 내지 10 몰%이고, c는 0 내지 40 몰%이다.
- 제1항에 있어서, 상기 화학식 1의 유기 실란 화합물이 3-글리시독시프로필 트리메톡시실란, 메타크릴옥시프로필트리메톡시실란, 아미노프로필트리메톡시실란, 아미노에틸아미노프로필트리메톡시실란, 트리플루오로프로필트리메톡시실란, 헵타데카플루오로데실트리메톡시실란, 이소시아네이트프로필트리메톡시실란, 3-글리시독시프로필트리에톡시실란, 메타크릴옥시프로필트리에톡시실란, 아미노프로필트리에톡시실란, 아미노에틸아미노프로필트리에톡시실란, 트리플루오로프로필트리에톡시실란, 헵타데카플루오로데실트리에톡시실란, 이소시아네이트프로필트리에톡시실란으로 이루어진 군으로부터 선택된 하나 이상인 것을 특징으로 하는 유기 감광체의 오버코트층 형성용 조성물.
- 제1항에 있어서, 상기 화학식 1의 유기 실란 화합물 100 중량부를 기준으로 하여 5 내지 20 중량부의 가수분해용 촉매가 더 포함되는 것을 특징으로 하는 유기 감광체의 오버코트층 형성용 조성물.
- 제5항에 있어서, 상기 가수분해용 촉매가 아세트산인 것을 특징으로 하는 유기 감광체용 오버코트층 형성용 조성물.
- 제1항에 있어서, 상기 용매가 메탄올, 에탄올, 이소프로판올, 부탄올로 이루어진 군으로부터 선택된 하나 이상의 알콜계 용매와, 물의 공용매이며, 그 함량이 오버코트층 형성용 조성물의 고형분 100 중량부를 기준으로 하여 400 내지 9900 중량부인 것을 특징으로 하는 유기 감광체의 오버코트층 형성용 조성물.
- 도전성 지지체;상기 도전성 지지체 상부에 형성된 감광층;상기 감광층 상부에 형성되며, 화학식 1의 유기 실란 화합물, 아크릴레이트계 고분자, 폴리비닐부티랄 및 용매를 포함하는 오버코트층 형성용 조성물을 코팅 및 열처리하여 얻어진 결과물로 이루어진 오버코트층을 포함하는 것을 특징으로 하는 유기 감광체.<화학식 1>상기식중, R'은 C1-C20의 알킬기, 페닐기, 비닐기, 메타크릴옥시프로필기, 아미노프로필기, 아미노에틸아미노프로필기, 페닐아미노프로필기, 클로로프로필기,머캡토프로필기, 아크릴옥시프로필기, 3-글리시독시프로필기, 트리플루오로프로필기, 헵타데카플루오로데실기, 및 이소시아네이트프로필기 로 이루어진 군으로부터 선택된 하나이고,R''은 가수분해가능한 관능기로서, C1-C20의 알콕시기 또는 할로겐 원자이다.
- 제8항에 있어서, 상기 결과물이 화학식 1의 유기 실란 화합물의 가수분해 탈수축합물인 실세스퀴옥산과, 아크릴레이트계 고분자와 폴리비닐부티랄 수지로 이루어지거나 또는 실세스퀴옥산과 아크릴레이트계 고분자와 폴리비닐부티랄간의 가교 반응 생성물로 이루어지는 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 아크릴레이트계 고분자가 화학식 2로 표시되는 메틸 메타크릴레이트-메타크릴산 공중합체이고, 그 함량이 화학식 2의 유기 실란 화합물 100 중량부를 기준으로 하여 10 내지 200 중량부인 것을 특징으로 하는 유기 감광체.<화학식 2>상기식중, m은 10 내지 50몰%이고, n은 50 내지 90몰%이다.
- 제8항에 있어서, 상기 화학식 1의 유기 실란 화합물이 3-글리시독시프로필 트리메톡시실란, 메타크릴옥시프로필트리메톡시실란, 아미노프로필트리메톡시실란, 아미노에틸아미노프로필트리메톡시실란, 트리플루오로프로필트리메톡시실란, 헵타데카플루오로데실트리메톡시실란, 이소시아네이트프로필트리메톡시실란, 3-글리시독시프로필트리에톡시실란, 메타크릴옥시프로필트리에톡시실란, 아미노프로필트리에톡시실란, 아미노에틸아미노프로필트리에톡시실란, 트리플루오로프로필트리에톡시실란, 헵타데카플루오로데실트리에톡시실란, 이소시아네이트프로필트리에톡시실란으로 이루어진 군으로부터 선택된 하나 이상인 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 오버코트층 형성용 조성물의 폴리비닐부티랄이 화학식 3으로 표시되며, 폴리비닐부티랄의 함량이 화학식 1의 유기 실란 화합물 100 중량부를 기준으로 하여 1 내지 20 중량부인 것을 특징으로 하는 유기 감광체.<화학식 3>상기식중, a는 60 내지 90 몰%이고, b는 0 내지 10 몰%이고, c는 0 내지 40 몰%이다.
- 제8항에 있어서, 상기 오버코트층 형성용 조성물이 화학식 1의 유기 실란 화합물 100 중량부를 기준으로 하여 5 내지 20 중량부의 가수분해용 촉매가 더 포함되는 것을 특징으로 하는 유기 감광체.
- 제13항에 있어서, 상기 가수분해용 촉매가 아세트산인 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 열처리온도가 80 내지 140℃인 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 오버코트층 형성용 조성물의 용매가 메탄올, 에탄올, 이소프로판올, 부탄올로 이루어진 군으로부터 선택된 하나 이상의 알콜계 용매와, 물의 공용매이며, 그 함량이 오버코트층 형성용 조성물의 고형분 100 중량부를 기준으로 하여 400 내지 9900 중량부인 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 오버코트층의 두께가 0.1 내지 10㎛인 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 상기 감광층이 전하 발생 물질과 전하 수송 물질을 포함하는 단일층 구조를 갖거나, 또는 전하 발생 물질을 포함하는 전하 발생층과 전하 수송 물질을 포함하는 전하 수송층을 포함하는 2층 적층 구조를 갖는 것을 특징으로 하는 유기 감광체.
- 제8항에 있어서, 건식 또는 습식 토너를 이용한 전자사진적인 화상 형성시 이용되는 것을 특징으로 하는 유기 감광체.
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JP2003103870A JP2003316058A (ja) | 2002-04-16 | 2003-04-08 | 有機感光体の表面保護層形成用組成物及び有機感光体 |
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2002
- 2002-04-16 KR KR10-2002-0020596A patent/KR100453046B1/ko not_active IP Right Cessation
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2003
- 2003-04-08 JP JP2003103870A patent/JP2003316058A/ja active Pending
- 2003-04-15 US US10/413,399 patent/US7132208B2/en not_active Expired - Fee Related
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Also Published As
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US7132208B2 (en) | 2006-11-07 |
KR20030082067A (ko) | 2003-10-22 |
US20030199620A1 (en) | 2003-10-23 |
JP2003316058A (ja) | 2003-11-06 |
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