KR100406779B1 - Plasma Display Bulkhead Manufacturing Method - Google Patents

Abstract

PURPOSE: A method is provided to obtain uniform barrier ribs and high resolution by using a laser for transferring barrier rib materials on the substrate. CONSTITUTION: A method comprises a first step of radiating a laser beam on a film(31) where a predetermined pattern is formed; a second step of permitting a heat absorbing layer(32) arranged beneath the film to absorb the energy of the laser beam radiated in the first step; and a third step of transferring barrier rib materials(34) on a substrate(35) in accordance with a predetermined pattern, by transmitting the energy absorbed by the heat absorbing layer to the barrier rib material through a buffer layer arranged beneath the heat absorbing layer.

Description

Plasma Display Bulkhead Manufacturing Method

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display partition wall manufacturing method, and more particularly, to a plasma display partition wall manufacturing method using a laser to uniformize partition walls and increase resolution.

The plasma display panel is one of flat panel display elements. The partition walls of the flat panel display devices electrically and optically separate neighboring cells from each other.

Although there are various methods of manufacturing the partition, the printing method is the most widely used method in the related art. The one made by this method is as shown in FIG.

This printing method is a method of accumulating and stacking a plurality of times by a screen printing method.

Screen printing method is generally tied to wooden frame and aluminum frame, tightly tied to nylon, Tetron and fibrous mesh or stainless steel metal mesh, and using the manual method or photochemical photographic method on the mesh surface, where it is not necessary to print. The ink is pushed back and forth while pressing the ink inside the screen with a squeegee, and the ink is pushed back and forth through the wire line of the mesh, which is printed on the printed object.

As shown in the figure, the partition wall 13 is installed to maintain the separation distance with the upper plate 11 and the lower plate 14 therebetween, the cathode 15 and the anode 12 in the opposite direction to the upper plate ( 11) and the lower plate 14, respectively. At this time, the partition wall is repeatedly formed a plurality of times by the printing method described above. According to the printing degree, the partition wall of about 100 microns is not uniform and the height difference occurs, so that the electrical and optical blocking between the cells, which is the intended purpose, is surely prevented. There was a problem that can not be done.

Moreover, the defect by the contamination at the time of printing generate | occur | produced. And when applied to mass production, the amount actually obtained was significantly lower than expected to yield good bulkheads.

The best method besides printing method is sand blasting method. In this method, as shown in FIG. 2, the photoresist 23 is applied to the upper surface of the partition material 21, developed in a predetermined pattern, and then the developed partition material 21 is hardened. Sandblasting. This sand blasting is a method of processing a surface by injecting sand (22) of sand sand or the like into a predetermined position or projecting it onto the workpiece surface from an impeller wheel rotating at high speed. Thus, a small pattern such as sand 22 is projected onto the upper surface of the partition material 21 in a predetermined pattern to form a groove to form a desired pattern. After the sand blasting process is completed, peeling and partition wall heat treatment are performed to complete partitions of desired shape.

However, the process of making a partition by sandblasting is complicated. In addition, the sand blasting method was considerably lower than the actual amount produced compared to the expected amount of good production in the actual production of the bulkhead.

The present invention has been made to solve the above problems, to ensure the electrical and optical interception between each cell, to prevent defects due to contamination of foreign matters, and to provide a plasma display bulkhead manufacturing method with a good production actually high in mass production. Has its purpose.

1 schematically shows a plasma display partition wall manufactured according to a conventional method.

2 is a view schematically showing another method of manufacturing a conventional plasma display partition wall.

3 is a cross-sectional view schematically showing the structure of a film used in the plasma display partition wall manufacturing method according to the present invention.

4 is a view showing a plasma display partition wall manufacturing method according to the present invention;

5 is a view schematically showing another method of manufacturing a plasma display partition wall according to the present invention.

* Explanation of symbols for main parts of the drawings

31 film 32 heat absorbing layer

33: buffer layer 34: partition material

35 substrate 40 irradiated laser

In order to achieve the above object, a plasma display partition wall manufacturing method according to the present invention includes a first step of irradiating a laser onto an upper surface of a film on which a predetermined pattern is formed, and a laser positioned on a lower surface of the film and irradiated according to a predetermined pattern. The second step of absorbing the energy of the heat absorbing layer and the third step of transferring the energy absorbed in the heat absorbing layer to the partition material through a buffer layer located on the lower surface of the heat absorbing layer to transfer the partition material on the substrate in a predetermined pattern. It is characterized by that, including.

In another aspect, the material of the film is a transparent material, the heat absorption layer preferably comprises any one of a metal, a metal oxide, a dye, and a pigment, the buffer layer is a polymer (polymer), Nitrogen content and one of trinitrotoluene (TNT) is characterized in that it contains.

In still another aspect, the barrier material may include any one of alumina (Al ₂ O ₃ ) and glass powder, and the light source irradiating the laser may be any one of a xenon (Xe) lamp and a mercury lamp. It is one, the width of the partition is any one of 20 microns to 300 microns, the height of the partition is characterized in that any one of 10 microns to several hundred microns.

The third step includes a firing step of fixing the partition material transferred onto the substrate.

Another method of manufacturing the plasma display partition wall according to the present invention, the material layer of the partition wall is placed above the substrate, the buffer layer is located on the material layer of the partition wall, the heat absorption layer is placed on the buffer layer. When the film is placed on the heat absorbing layer, the first step of irradiating a laser to the upper surface of the film, the predetermined pattern is formed, and heat the energy of the laser placed on the lower surface of the film and irradiated according to the predetermined pattern A second step of absorbing the absorbing layer and transferring the energy absorbed by the heat absorbing layer to the partition material through a buffer layer disposed on the lower surface of the heat absorbing layer to transfer the partition material onto the substrate in a predetermined pattern; A fourth step of sequentially repeating the steps and the second and third steps to transfer the partition material to the substrate in multiple layers to form a multilayer partition wall; What has that feature.

In another aspect, the material of the film is a transparent material, the heat absorption layer preferably comprises any one of a metal, a metal oxide, a dye, and a pigment, the buffer layer is a polymer (polymer), Nitrogen content and one of trinitrotoluene (TNT) is characterized in that it contains.

In still another aspect, the barrier material may include any one of alumina (Al ₂ O ₃ ) and glass powder, and the light source irradiating the laser may be any one of a xenon (Xe) lamp and a mercury lamp. It is one, the width of the partition is any one of 20 microns to 300 microns, the height of the partition is characterized in that any one of 10 microns to several hundred microns.

The third step includes a firing step of fixing the partition material transferred onto the substrate.

By employing the present invention, it is possible to ensure the electrical and optical interception between each cell (cell), to prevent defects due to contamination of foreign matter, to increase the good actual production somewhat during mass production and to simplify the process.

Hereinafter, an embodiment of a plasma display partition wall manufacturing method according to the present invention will be described in detail. 3 is a cross-sectional view schematically showing a structure of a film used in the method for manufacturing a plasma display partition wall according to the present invention, FIG. 4 is a view showing a method for manufacturing a plasma display partition wall according to the present invention, and FIG. 4 is a view schematically showing another method of manufacturing the plasma display partition wall.

Plasma display partition wall manufacturing method according to the present invention is irradiated laser 40 to the film 31, the predetermined pattern is formed to transfer the partition material 34 located on the lower surface of the film 31 on the substrate 35 to the desired partition wall How to make it.

In the above-described method, the film 31 used to irradiate the laser 40 mainly uses polyethylene terephthalate (PET), and other types of transparent films are applicable. The heat absorption layer exists on the lower surface of this film 31. The heat absorption layer 32 is a layer for absorbing the energy of the laser and is made of any one of metal, metal oxide, dye and pigment. A buffer layer 33 for transferring heat is formed on the bottom surface of the heat absorbing layer 32. The buffer layer 33 may include any one of a polymer, a nitrogen content, and trinitrotoluene (TNT). The partition wall material 34 is positioned on the lower surface of the buffer layer 33. The partition material 34 is formed in combination with alumina (Al ₂ O ₃ ), glass powder, or the like, or without firing as a single material.

The plasma display partition wall manufacturing method according to the present invention using such a material is the upper surface of the film 31, the predetermined pattern is formed on the laser 40 emitted from the xenon (Xe) and the mercury lamp as shown in FIG. The heat absorption layer 32 located on the lower surface of the film 31 absorbs the irradiated laser 40 according to a predetermined pattern. The energy absorbed by the heat absorption layer 32 is transferred to the partition material 34 through the buffer layer 33 disposed on the lower surface of the heat absorption layer 32 to transfer the partition material onto the substrate 35 in a predetermined pattern. . It is preferable that the width of this partition is 20 microns-300 microns, and the height of a partition is 10 microns-several hundred microns. The transferred barrier rib material is fixed and solidified through a firing step. The formation method of such a partition may be applied to the transverse direction and the longitudinal direction of the partition.

As another embodiment of the method for manufacturing the plasma display partition wall according to the present invention, as shown in FIG. In the thickness to be transferred, the required thickness can be transferred at a time. However, the barrier material 133 is formed on the barrier material layer 134 formed by being irradiated with a laser on the film 131 on which the predetermined pattern is formed and passed through the heat absorbing layer (not shown) and the buffer layer 132 and then transferred onto the substrate 135. The above-described transfer method capable of transferring a plurality of times to transfer a desired thickness can form a barrier material layer having a precise thickness as compared with the transfer method limited to one time.

The plasma display partition wall manufacturing method according to the present invention has the following effects.

First, you can improve the quality of the display.

Plasma display bulkheads manufactured according to the conventional printing method and sand blast manufacturing method do not ensure electrical blocking and optical blocking between cells, causing electrical and optical conduction to cells adjacent to each other, resulting in poor display quality. In addition, the partition wall made by the manufacturing method according to the manufacturing method according to the present invention can improve the quality of the display by ensuring the electrical blocking and optical blocking between each cell.

Second, the process water is simplified.

In the conventional sand blasting method, the sand blasting method has a complicated process such as a photoresist coating process, a developing process, a curing process, a blasting process, a peeling process, a partition wall heat treatment process, etc. The process is simplified compared to the prior art because it consists of the transfer process of the partition material and the firing step of the transferred partition material.

Third, the defective rate is reduced.

Since the process is processed by dry, it is less affected by foreign matters than the printing method by wet, thereby reducing defects caused by contamination.

Fourth, the resolution is improved.

In terms of resolution, plasma displays with barrier ribs manufactured according to conventional methods have a resolution limit between 70 microns and 100 microns, but in displays with barrier ribs manufactured according to the present invention, the resolution is dependent upon the laser beam. Since it is determined by the resolution can be implemented up to 20 microns resolution is improved compared to the conventional.

Fifth, the brightness is high and power consumption is reduced.

The above resolution is improved compared to the prior art, and thus the display having high luminance is possible due to the high aperture ratio, that is, the ratio of the light emission rate to the area, which is the biggest problem of the plasma display, resulting in reduction of power consumption.

As described above, the present invention has been described with reference to one embodiment shown in the drawings, but this is only an example, and those skilled in the art may various modifications and equivalent other embodiments therefrom. Will understand. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (18)

When the material layer of the partition wall is placed above the substrate, the buffer layer is positioned on the material layer of the partition wall, and the heat absorption layer is placed on the upper surface of the buffer layer, and when the film is placed on the heat absorption layer, the predetermined pattern of the film is formed. A first step of irradiating a laser onto an upper surface, a second step of absorbing energy of a laser irradiated according to a predetermined pattern on a lower surface of the film in a heat absorption layer, and the energy absorbed by the heat absorption layer to the heat absorption layer And a third step of transferring the partition material onto the substrate in a predetermined pattern by transferring the partition material through the buffer layer disposed on the lower surface of the plasma display partition wall. The method of claim 1, wherein the film is transparent. The method of claim 1, wherein the heat absorption layer comprises any one of a metal, a metal oxide, a dye, and a pigment. The method of claim 1, wherein the buffer layer comprises any one of a polymer, a nitrogen co-ntent, and trinitrotoluene (TNT). The method of claim 1, wherein the barrier material comprises any one of alumina (Al ₂ O ₃ ) and a glass powder (glass po-wder). The method of claim 1, wherein the light source for irradiating the laser comprises any one of a xenon (Xe) lamp and a mercury lamp. The method of claim 1, wherein the width of the partition wall is any one of 20 microns to 300 microns. The method of claim 1, wherein the height of the barrier rib is any one of 10 microns to several hundred microns. The method of claim 1, wherein the third step includes a firing step of fixing the partition material transferred onto the substrate. When the material layer of the partition wall is placed above the substrate, the buffer layer is positioned on the material layer of the partition wall, and the heat absorption layer is placed on the upper surface of the buffer layer, and when the film is placed on the heat absorption layer, the predetermined pattern of the film is formed. A first step of irradiating a laser onto an upper surface, a second step of absorbing energy of a laser irradiated according to a predetermined pattern on a lower surface of the film in a heat absorption layer, and the energy absorbed by the heat absorption layer to the heat absorption layer The barrier material is transferred to the barrier material through the buffer layer located on the lower surface thereof, and the barrier material is formed into multiple layers by sequentially repeating the third step, the first step, the second step, and the third step to transfer the barrier material on the substrate in a predetermined pattern. And a fourth step of transferring the substrate to form a multilayer partition wall. The method of claim 10, wherein the film is transparent. The method of claim 10, wherein the heat absorption layer comprises any one of a metal, a metal oxide, a dye, and a pigment. The method of claim 10, wherein the buffer layer comprises one of a polymer, a nitrogen content, and trinitrotoluene (TNT). The method of claim 10, wherein the barrier material comprises any one of alumina (Al ₂ O ₃ ) and glass powder. The method of claim 10, wherein the light source for irradiating the laser comprises any one of a xenon (Xe) lamp and a mercury lamp. The method of claim 10, wherein the width of the partition wall is any one of 20 microns to 300 microns. The method of claim 10, wherein the height of the barrier rib is any one of 10 microns to several hundred microns. 12. The method of claim 10, wherein the third step includes a firing step of fixing the barrier material transferred onto the substrate.