KR100404904B1 - 차동 용량형 압력센서 및 그 제조방법 - Google Patents
차동 용량형 압력센서 및 그 제조방법 Download PDFInfo
- Publication number
- KR100404904B1 KR100404904B1 KR10-2001-0032277A KR20010032277A KR100404904B1 KR 100404904 B1 KR100404904 B1 KR 100404904B1 KR 20010032277 A KR20010032277 A KR 20010032277A KR 100404904 B1 KR100404904 B1 KR 100404904B1
- Authority
- KR
- South Korea
- Prior art keywords
- lower electrode
- electrode
- pressure sensor
- capacitive pressure
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims description 17
- 239000003990 capacitor Substances 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims description 48
- 239000004065 semiconductor Substances 0.000 claims description 31
- 238000005530 etching Methods 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 30
- 239000010408 film Substances 0.000 description 19
- 238000006073 displacement reaction Methods 0.000 description 13
- 239000004020 conductor Substances 0.000 description 10
- 239000002184 metal Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
Description
Claims (10)
- 두 개의 센싱 커패시터를 갖는 압력 센서에 있어서,반도체 기판 상부면에 각각 소정 거리 이격되어 형성된 외측전극, 제 1하부전극 및 제 2하부전극;상기 외측전극 및 제 1하부전극의 일측에 각각 수직으로 연결된 기둥; 및상기 외부전극의 기둥에 연결되며 상기 제 1하부전극과 평행으로 배치된 제 1상부전극, 상기 제 1하부전극의 기둥에 연결되며 상기 제 2하부전극과 평행으로 배치된 제 2상부전극을 포함하는 것을 특징으로 하는 차동 용량형 압력 센서.
- 제 1항에 있어서, 상기 반도체 기판의 상부 및 하부 표면에 형성된 절연막과, 상기 반도체 기판의 하부면에서 상기 제 1하부전극에 대응하는 기판의 소정 두께가 제거된 다이어프램을 더 포함하는 것을 특징으로 하는 차동 용량형 압력센서.
- 두 개의 센싱 커패시터를 갖는 압력 센서에 있어서,반도체 기판 상부면에 각각 소정 거리 이격되어 형성된 제 1하부전극, 제 2하부전극, 제 3하부전극, 및 가운데전극;상기 제 2하부전극의 양측과 상기 가운데 전극의 일측에 각각 수직으로 연결된 기둥;상기 제 2하부전극의 어느 한 기둥에 연결되며 상기 제 1하부전극과 평행으로 배치된 제 1상부전극, 상기 제 2하부전극의 다른 한 기둥에 연결되며 상기 제 3하부전극과 평행으로 배치된 제 3상부전극, 및 상기 가운데 전극의 기둥에 연결되며 상기 제 2하부전극과 평행으로 배치된 제 2상부전극을 포함하고,상기 제 1하부전극과 제 3하부전극이 상호 연결되어 있는 것을 특징으로 하는 차동 용량형 압력센서.
- 제 3항에 있어서, 상기 하부전극들은 일렬로 배열되고, 상기 가운데 전극은 상기 제 2하부전극에 이웃하도록 하며 상기 하부전극들에 교차되게 배치한 것을 특징으로 하는 차동 용량형 압력센서.
- 제 3항에 있어서, 상기 제 1하부전극과 제 3하부전극의 폭은 각각 제 2하부전극의 1/2인 것을 특징으로 하는 차동 용량형 압력센서.
- 제 5항에 있어서, 상기 반도체 기판의 상부 및 하부 표면에 형성된 절연막과, 상기 반도체 기판의 하부면에서 상기 제 2하부전극에 대응하는 기판의 소정 두께가 제거된 다이어프램을 더 포함하는 것을 특징으로 하는 차동 용량형 압력센서.
- 제 2항 또는 제 6항에 있어서, 상기 다이어프램의 형태는 트렌치 형태로 식각되거나, 상기 제 1하부전극쪽 기판이 돌출되고 그 주변이 함몰된 형태로 식각된 것을 특징으로 하는 차동 용량형 압력센서.
- 두 개의 센싱 커패시터를 갖는 압력 센서의 제조방법에 있어서,반도체 기판 상부면에 적어도 2이상의 하부전극을 형성하는 단계;상기 하부전극이 형성된 기판 전면에 희생층을 형성하는 단계;상기 희생층에 상기 하부전극의 일측이 개방되는 비아홀을 형성하는 단계;상기 비아홀에 매립된 기둥을 통해 상기 하부전극에 연결되는 상부전극을 형성하되, 서로 이웃하는 좌측/우측 하부전극과 우측/좌측 상부전극이 연결되는 단계; 및상기 희생층을 제거하는 단계를 포함하는 것을 특징으로 하는 차동 용량형 압력센서의 제조방법.
- 제 8항에 있어서, 상기 반도체 기판의 상부 표면과 하부 표면에 각각 절연막을 형성하는 단계와, 상기 반도체 기판의 하부면에서 상기 중앙에 위치한 하부전극에 대응하는 기판의 소정 두께가 제거된 다이어프램을 형성하는 단계를 더 포함하는 것을 특징으로 하는 차동 용량형 압력센서의 제조 방법.
- 제 9항에 있어서, 상기 다이어프램을 형성하는 단계는 상기 하부 전극들의 중앙 부위를 트렌치 형태로 식각하거나, 상기 제 2하부전극쪽 기판이 돌출되고 그 주변이 함몰된 형태로 식각하는 것을 특징으로 하는 차동 용량형 압력센서의 제조 방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0032277A KR100404904B1 (ko) | 2001-06-09 | 2001-06-09 | 차동 용량형 압력센서 및 그 제조방법 |
US10/100,826 US6651506B2 (en) | 2001-06-09 | 2002-03-15 | Differential capacitive pressure sensor and fabricating method therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0032277A KR100404904B1 (ko) | 2001-06-09 | 2001-06-09 | 차동 용량형 압력센서 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20020093491A KR20020093491A (ko) | 2002-12-16 |
KR100404904B1 true KR100404904B1 (ko) | 2003-11-07 |
Family
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Family Applications (1)
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KR10-2001-0032277A Expired - Fee Related KR100404904B1 (ko) | 2001-06-09 | 2001-06-09 | 차동 용량형 압력센서 및 그 제조방법 |
Country Status (2)
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US (1) | US6651506B2 (ko) |
KR (1) | KR100404904B1 (ko) |
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Also Published As
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US6651506B2 (en) | 2003-11-25 |
US20020194919A1 (en) | 2002-12-26 |
KR20020093491A (ko) | 2002-12-16 |
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