KR100402263B1 - 다층의 저항 재료를 갖는 저항 구성요소 - Google Patents
다층의 저항 재료를 갖는 저항 구성요소 Download PDFInfo
- Publication number
- KR100402263B1 KR100402263B1 KR10-2001-0058037A KR20010058037A KR100402263B1 KR 100402263 B1 KR100402263 B1 KR 100402263B1 KR 20010058037 A KR20010058037 A KR 20010058037A KR 100402263 B1 KR100402263 B1 KR 100402263B1
- Authority
- KR
- South Korea
- Prior art keywords
- resistive
- layer
- foil
- chromium
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims description 44
- 239000011888 foil Substances 0.000 claims abstract description 64
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 52
- 229910052751 metal Inorganic materials 0.000 claims abstract description 40
- 239000002184 metal Substances 0.000 claims abstract description 40
- 229910052802 copper Inorganic materials 0.000 claims abstract description 37
- 239000010949 copper Substances 0.000 claims abstract description 37
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 58
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 31
- 229910052804 chromium Inorganic materials 0.000 claims description 31
- 239000011651 chromium Substances 0.000 claims description 31
- 229910052759 nickel Inorganic materials 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 21
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 19
- 229910045601 alloy Inorganic materials 0.000 claims description 17
- 239000000956 alloy Substances 0.000 claims description 17
- 229910052715 tantalum Inorganic materials 0.000 claims description 12
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 229910052720 vanadium Inorganic materials 0.000 claims description 10
- 239000011701 zinc Substances 0.000 claims description 10
- 229910052725 zinc Inorganic materials 0.000 claims description 10
- 229910000838 Al alloy Inorganic materials 0.000 claims description 9
- 229910000676 Si alloy Inorganic materials 0.000 claims description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 150000004767 nitrides Chemical class 0.000 claims description 8
- 229910021332 silicide Inorganic materials 0.000 claims description 8
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052748 manganese Inorganic materials 0.000 claims description 6
- 239000011572 manganese Substances 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 230000006641 stabilisation Effects 0.000 claims description 6
- 238000011105 stabilization Methods 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 6
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 2
- 239000000758 substrate Substances 0.000 description 19
- 239000011889 copper foil Substances 0.000 description 15
- 238000004070 electrodeposition Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000000873 masking effect Effects 0.000 description 4
- 238000001465 metallisation Methods 0.000 description 4
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910019974 CrSi Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- MPTQRFCYZCXJFQ-UHFFFAOYSA-L copper(II) chloride dihydrate Chemical compound O.O.[Cl-].[Cl-].[Cu+2] MPTQRFCYZCXJFQ-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- -1 oxides Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/167—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C3/00—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids
- H01C3/10—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids the resistive element having zig-zag or sinusoidal configuration
- H01C3/12—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids the resistive element having zig-zag or sinusoidal configuration lying in one plane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/07—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by resistor foil bonding, e.g. cladding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/18—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material comprising a plurality of layers stacked between terminals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0317—Thin film conductor layer; Thin film passive component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0391—Using different types of conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Non-Adjustable Resistors (AREA)
- Details Of Resistors (AREA)
- Semiconductor Memories (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
Description
Claims (26)
- 저항 포일에 있어서,제 1 면 및 제 2 면을 갖는 구리층과;상기 구리층의 상기 제 1 면 위에 5Å과 70Å 사이의 두께를 가지며, 아연, 니켈, 팔라듐, 티타늄, 탄탈, 알루미늄, 철, 바나듐, 크롬, 크롬-기반 합금들 및 니켈-기반 합금들, 및 이것들의 조합으로 구성되는 그룹으로부터 선택된 하나의 금속 산화물로 구성되는 적어도 하나의 안정화층으로 구성되는 중간층과;상기 중간층 위에 50Å과 2㎛ 사이의 두께를 갖는 제 1 저항 금속으로 된 제 1 층과; 그리고상기 제 1 저항 금속으로 된 상기 제 1 층 위에 50Å과 2㎛ 사이의 두께를 갖는 제 2 저항 금속으로 된 제 2 층을 포함하며, 상기 제 1 저항 금속은 상기 제 2 저항 금속과는 다른 저항치를 갖는 것을 특징으로 하는 저항 포일.
- 제 1 항에 있어서, 상기 제 1 저항 금속은 알루미늄, 아연, 니켈, 니켈/크롬, 니켈/크롬/알루미늄/실리콘 합금, 티타늄, 바나듐, 크롬, 탄탈, 철, 망간 및 합금들, 산화물들, 질화물들 및 이것들의 실리사이드들로 구성되는 그룹으로부터 선택되는 것을 특징으로 하는 저항 포일.
- 제 2 항에 있어서, 상기 제 2 저항 금속은 알루미늄, 아연, 니켈, 니켈/크롬, 니켈/크롬/알루미늄/실리콘 합금, 티타늄, 바나듐, 크롬, 탄탈, 철, 망간 및 합금들, 산화물들, 질화물들 및 이것들의 실리사이드들로 구성되는 그룹으로부터 선택되는 것을 특징으로 하는 저항 포일.
- 제 3 항에 있어서, 상기 제 1 저항 금속은 상기 제 2 저항 금속과는 다른 것을 특징으로 하는 저항 포일.
- 제 4 항에 있어서, 상기 제 1 저항 금속은 니켈/크롬/알루미늄/실리콘 합금인 것을 특징으로 하는 저항 포일.
- 제 5 항에 있어서, 상기 제 2 저항 금속은 탄탈 산화물인 것을 특징으로 하는 저항 포일.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 제 1 항에 있어서, 상기 제 1 저항 금속 및 상기 제 2 저항 금속 각각은 100Å와 500Å 사이의 두께를 갖는 것을 특징으로 하는 저항 포일.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 저항 포일에 있어서,제 1 면 및 제 2 면을 갖는 구리층과;상기 구리층의 상기 제 1 면 위에 5Å과 70Å 사이의 두께를 가지며, 아연, 니켈, 팔라듐, 티타늄, 탄탈, 알루미늄, 철, 바나듐, 크롬, 크롬-기반 합금들 및 니켈-기반 합금들, 및 이것들의 조합으로 구성되는 그룹으로부터 선택된 하나의 금속 산화물로 구성되는 적어도 하나의 안정화층으로 구성되는 중간층과;상기 구리층 위에 제 1 저항 재료로 된 제 1 층과; 그리고상기 제 1 저항 재료로 된 상기 제 1 층 위에 제 2 저항 재료로 된 제 2 층을 포함하며, 상기 제 1 저항 재료는 상기 제 2 저항 재료와는 다른 저항치를 갖는 것을 특징으로 하는 저항 포일.
- 제 19 항에 있어서, 상기 제 1 저항 재료는 알루미늄, 아연, 니켈, 니켈/크롬, 니켈/크롬/알루미늄/실리콘 합금, 티타늄, 바나듐, 크롬, 탄탈, 철, 망간 및 합금들, 산화물들, 질화물들 및 이것들의 실리사이드들로 구성되는 그룹으로부터 선택되는 것을 특징으로 하는 저항 포일.
- 제 20 항에 있어서, 상기 제 2 저항 재료는 알루미늄, 아연, 니켈, 니켈/크롬, 니켈/크롬/알루미늄/실리콘 합금, 티타늄, 바나듐, 크롬, 탄탈, 철, 망간 및 합금들, 산화물들, 질화물들 및 이것들의 실리사이드들로 구성되는 그룹으로부터 선택되는 것을 특징으로 하는 저항 포일.
- 제 21 항에 있어서, 상기 제 1 저항 재료는 상기 제 2 저항 재료와는 다른 것을 특징으로 하는 저항 포일.
- 제 22 항에 있어서, 상기 제 1 저항 재료는 니켈/크롬/알루미늄/실리콘 합금인 것을 특징으로 하는 저항 포일.
- 제 23 항에 있어서, 상기 제 2 저항 재료는 탄탈 산화물인 것을 특징으로 하는 저항 포일.
- 삭제
- 삭제
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/667,294 US6622374B1 (en) | 2000-09-22 | 2000-09-22 | Resistor component with multiple layers of resistive material |
US09/667,294 | 2000-09-22 | ||
US09/921,074 | 2001-08-02 | ||
US09/921,074 US6771160B2 (en) | 2000-09-22 | 2001-08-02 | Resistor component with multiple layers of resistive material |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020023646A KR20020023646A (ko) | 2002-03-29 |
KR100402263B1 true KR100402263B1 (ko) | 2003-10-17 |
Family
ID=27099655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0058037A Expired - Lifetime KR100402263B1 (ko) | 2000-09-22 | 2001-09-19 | 다층의 저항 재료를 갖는 저항 구성요소 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1191551B1 (ko) |
JP (2) | JP2002134301A (ko) |
KR (1) | KR100402263B1 (ko) |
AT (1) | ATE311092T1 (ko) |
DE (1) | DE60115175T2 (ko) |
TW (1) | TW550600B (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5074822B2 (ja) * | 2007-05-29 | 2012-11-14 | 三井金属鉱業株式会社 | 表面処理銅箔 |
CN102177015A (zh) * | 2008-10-14 | 2011-09-07 | Jx日矿日石金属株式会社 | 带电阻膜的金属箔及其制造方法 |
JP5391981B2 (ja) * | 2009-02-02 | 2014-01-15 | 富士通株式会社 | 回路基板とその製造方法、及び抵抗素子 |
US9159413B2 (en) | 2010-12-29 | 2015-10-13 | Stmicroelectronics Pte Ltd. | Thermo programmable resistor based ROM |
US8526214B2 (en) | 2011-11-15 | 2013-09-03 | Stmicroelectronics Pte Ltd. | Resistor thin film MTP memory |
TWI713424B (zh) * | 2018-10-15 | 2020-12-11 | 鼎展電子股份有限公司 | 銅箔電阻與具有該銅箔電阻的電路板結構 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0452812A2 (en) * | 1990-04-12 | 1991-10-23 | Planar Circuit Technologies | Resistive laminate for printed circuit boards |
US5689227A (en) * | 1993-07-21 | 1997-11-18 | Ohmega Electronics, Inc. | Circuit board material with barrier layer |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2662957A (en) * | 1949-10-29 | 1953-12-15 | Eisler Paul | Electrical resistor or semiconductor |
JPS5378050A (en) * | 1976-12-21 | 1978-07-11 | Nitto Electric Ind Co | Multilayer resistance circuit board |
US4503112A (en) * | 1981-06-12 | 1985-03-05 | Oak Industries Inc. | Printed circuit material |
JPS59182592A (ja) * | 1983-03-31 | 1984-10-17 | 日東電工株式会社 | 抵抗回路基板 |
US5243320A (en) * | 1988-02-26 | 1993-09-07 | Gould Inc. | Resistive metal layers and method for making same |
DE4136198A1 (de) * | 1991-11-02 | 1993-05-06 | Deutsche Aerospace Ag, 8000 Muenchen, De | Verfahren zur herstellung eines strukturierten duennfilm-widerstandsschichtsystems sowie schaltungsanordnung mit einem insbesondere nach diesem verfahren hergestellten duennfilm-widerstandsschichtsystem |
TW289900B (ko) * | 1994-04-22 | 1996-11-01 | Gould Electronics Inc | |
US6132887A (en) * | 1995-06-16 | 2000-10-17 | Gould Electronics Inc. | High fatigue ductility electrodeposited copper foil |
US6268070B1 (en) * | 1999-03-12 | 2001-07-31 | Gould Electronics Inc. | Laminate for multi-layer printed circuit |
-
2001
- 2001-09-19 EP EP01122336A patent/EP1191551B1/en not_active Expired - Lifetime
- 2001-09-19 DE DE60115175T patent/DE60115175T2/de not_active Expired - Lifetime
- 2001-09-19 KR KR10-2001-0058037A patent/KR100402263B1/ko not_active Expired - Lifetime
- 2001-09-19 AT AT01122336T patent/ATE311092T1/de not_active IP Right Cessation
- 2001-09-21 TW TW090123354A patent/TW550600B/zh not_active IP Right Cessation
- 2001-09-21 JP JP2001287920A patent/JP2002134301A/ja active Pending
-
2006
- 2006-12-19 JP JP2006340612A patent/JP2007074005A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0452812A2 (en) * | 1990-04-12 | 1991-10-23 | Planar Circuit Technologies | Resistive laminate for printed circuit boards |
US5689227A (en) * | 1993-07-21 | 1997-11-18 | Ohmega Electronics, Inc. | Circuit board material with barrier layer |
Also Published As
Publication number | Publication date |
---|---|
JP2002134301A (ja) | 2002-05-10 |
DE60115175T2 (de) | 2006-07-27 |
EP1191551B1 (en) | 2005-11-23 |
JP2007074005A (ja) | 2007-03-22 |
KR20020023646A (ko) | 2002-03-29 |
TW550600B (en) | 2003-09-01 |
EP1191551A2 (en) | 2002-03-27 |
EP1191551A3 (en) | 2003-03-19 |
DE60115175D1 (de) | 2005-12-29 |
ATE311092T1 (de) | 2005-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6356455B1 (en) | Thin integral resistor/capacitor/inductor package, method of manufacture | |
US6771160B2 (en) | Resistor component with multiple layers of resistive material | |
US6781506B2 (en) | Resistor structure | |
JP2001210956A (ja) | 多層ラミネート | |
JPH03165501A (ja) | チップ形電気抵抗器およびその製造方法 | |
US6284982B1 (en) | Method and component for forming an embedded resistor in a multi-layer printed circuit | |
JP4232871B2 (ja) | 埋込抵抗体を形成するエッチング溶液 | |
JP2007074005A (ja) | 多層の抵抗材料を有する抵抗構成要素 | |
KR101384821B1 (ko) | 전기 저항막 부착 금속박 및 그 제조 방법 | |
KR100736665B1 (ko) | 프린트 배선판 | |
JPWO2022009675A5 (ko) | ||
US6248247B1 (en) | Method of fortifying an air bridge circuit | |
CA2357290C (en) | Resistor component with multiple layers of resistive material | |
JP2006019323A (ja) | 抵抗組成物、チップ抵抗器及びその製造方法 | |
JP3144596B2 (ja) | 薄膜電子部品及びその製造方法 | |
JP3134067B2 (ja) | 低抵抗チップ抵抗器及びその製造方法 | |
JPH0245996A (ja) | 混成集積回路の製造方法 | |
US20020171530A1 (en) | Production method of thin film passive element formed on printed circuit board and thin film passive element produced by the method | |
JP2005005354A (ja) | プリント配線基板およびその製造方法 | |
JPH05166883A (ja) | 薄膜導体 | |
JPH03119789A (ja) | 配線板の製造方法 | |
JPH02106992A (ja) | 薄膜抵抗回路基板及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20010919 |
|
PA0201 | Request for examination | ||
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20030522 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20030908 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20031006 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20031007 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20060929 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20071004 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20081002 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20091005 Start annual number: 7 End annual number: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20100929 Start annual number: 8 End annual number: 8 |
|
PR1001 | Payment of annual fee |
Payment date: 20110926 Start annual number: 9 End annual number: 9 |
|
FPAY | Annual fee payment |
Payment date: 20120924 Year of fee payment: 10 |
|
PR1001 | Payment of annual fee |
Payment date: 20120924 Start annual number: 10 End annual number: 10 |
|
FPAY | Annual fee payment |
Payment date: 20131002 Year of fee payment: 11 |
|
PR1001 | Payment of annual fee |
Payment date: 20131002 Start annual number: 11 End annual number: 11 |
|
FPAY | Annual fee payment |
Payment date: 20140923 Year of fee payment: 12 |
|
PR1001 | Payment of annual fee |
Payment date: 20140923 Start annual number: 12 End annual number: 12 |
|
FPAY | Annual fee payment |
Payment date: 20150925 Year of fee payment: 13 |
|
PR1001 | Payment of annual fee |
Payment date: 20150925 Start annual number: 13 End annual number: 13 |
|
FPAY | Annual fee payment |
Payment date: 20160923 Year of fee payment: 14 |
|
PR1001 | Payment of annual fee |
Payment date: 20160923 Start annual number: 14 End annual number: 14 |
|
FPAY | Annual fee payment |
Payment date: 20180928 Year of fee payment: 16 |
|
PR1001 | Payment of annual fee |
Payment date: 20180928 Start annual number: 16 End annual number: 16 |
|
PR1001 | Payment of annual fee |
Payment date: 20200925 Start annual number: 18 End annual number: 18 |
|
PC1801 | Expiration of term |
Termination date: 20220319 Termination category: Expiration of duration |