KR100393289B1 - 포토레지스트 토출 감시장치 - Google Patents
포토레지스트 토출 감시장치 Download PDFInfo
- Publication number
- KR100393289B1 KR100393289B1 KR10-2001-0036699A KR20010036699A KR100393289B1 KR 100393289 B1 KR100393289 B1 KR 100393289B1 KR 20010036699 A KR20010036699 A KR 20010036699A KR 100393289 B1 KR100393289 B1 KR 100393289B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist
- amount
- discharge
- discharged
- discharge pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 72
- 238000012544 monitoring process Methods 0.000 title claims abstract description 14
- 239000000126 substance Substances 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 5
- 238000012806 monitoring device Methods 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- 238000005086 pumping Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (3)
- 스텝핑 모터에 의해 구동되는 토출 펌프로부터 토출되는 포토레지스트 량을 감지하기 위한 PR량 감지센서와; 상기 PR량 감지센서의 출력을 감시하여 상기 토출 펌프로부터 토출되는 포토레지스트 량을 자동으로 제어하는 PR량 콘트롤러를 구비하는 포토레지스트 토출 감시장치에 있어서,상기 PR량 콘트롤러는 상기 토출 펌프의 스텝핑 모터가 동작 한계치에 이르러도 원하는 포토레지스트 토출이 이루어지지 못하면 케미컬 필터의 교체시기로 판단하여 필터 교환시기를 표시할 수 있도록 표시부에 필터 교체신호를 출력하는 PR량 제어부를 구비하는 것을 특징으로 하는 포토레지스트 토출 감시장치.
- 삭제
- 삭제
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0036699A KR100393289B1 (ko) | 2001-06-26 | 2001-06-26 | 포토레지스트 토출 감시장치 |
US10/178,958 US6712956B2 (en) | 2001-06-26 | 2002-06-25 | Apparatus for monitoring discharge of photoresist |
JP2002186469A JP2003017380A (ja) | 2001-06-26 | 2002-06-26 | フォトレジスト吐出し監視装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0036699A KR100393289B1 (ko) | 2001-06-26 | 2001-06-26 | 포토레지스트 토출 감시장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020020628A KR20020020628A (ko) | 2002-03-15 |
KR100393289B1 true KR100393289B1 (ko) | 2003-07-31 |
Family
ID=19711354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0036699A Expired - Lifetime KR100393289B1 (ko) | 2001-06-26 | 2001-06-26 | 포토레지스트 토출 감시장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6712956B2 (ko) |
JP (1) | JP2003017380A (ko) |
KR (1) | KR100393289B1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100452329B1 (ko) * | 2002-10-04 | 2004-10-12 | 삼성전자주식회사 | 반도체 코팅설비의 포토레지스트 퍼지 제어장치 |
JP4382569B2 (ja) * | 2004-05-07 | 2009-12-16 | 株式会社東芝 | 塗膜形成装置、塗膜形成方法および製造管理装置 |
JP4541069B2 (ja) * | 2004-08-09 | 2010-09-08 | 東京エレクトロン株式会社 | 薬液供給システム |
KR100702793B1 (ko) * | 2005-12-06 | 2007-04-03 | 동부일렉트로닉스 주식회사 | 포토 레지스트 공급장치 및 포토 레지스트 공급장치의검사방법 |
KR100714278B1 (ko) * | 2005-12-22 | 2007-05-02 | 삼성전자주식회사 | 반도체 장치 제조용 포토설비의 필터 장착 알림 장치 및방법 |
US8580117B2 (en) | 2007-03-20 | 2013-11-12 | Taiwan Semiconductor Manufactuing Company, Ltd. | System and method for replacing resist filter to reduce resist filter-induced wafer defects |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4660586A (en) * | 1984-12-21 | 1987-04-28 | Aluminum Company Of America | Liquid level control |
KR20020054698A (ko) * | 2000-12-28 | 2002-07-08 | 최창구 | 웨이퍼 코팅용 약액 공급감시방법 및 공급감시용유량계측장치 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5527161A (en) * | 1992-02-13 | 1996-06-18 | Cybor Corporation | Filtering and dispensing system |
KR0141059B1 (ko) * | 1993-09-20 | 1998-06-01 | 코사이 아키오 | 액체공급시스템 액체공급방법 |
KR100236270B1 (ko) * | 1996-11-18 | 1999-12-15 | 윤종용 | 감광제 분사 체크기능을 갖는 웨이퍼 스핀코팅 시스템 |
JP2002535122A (ja) * | 1999-01-20 | 2002-10-22 | マイクロリス・コーポレーション | 流れコントローラ |
US6554579B2 (en) * | 2001-03-29 | 2003-04-29 | Integrated Designs, L.P. | Liquid dispensing system with enhanced filter |
-
2001
- 2001-06-26 KR KR10-2001-0036699A patent/KR100393289B1/ko not_active Expired - Lifetime
-
2002
- 2002-06-25 US US10/178,958 patent/US6712956B2/en not_active Expired - Fee Related
- 2002-06-26 JP JP2002186469A patent/JP2003017380A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4660586A (en) * | 1984-12-21 | 1987-04-28 | Aluminum Company Of America | Liquid level control |
KR20020054698A (ko) * | 2000-12-28 | 2002-07-08 | 최창구 | 웨이퍼 코팅용 약액 공급감시방법 및 공급감시용유량계측장치 |
Also Published As
Publication number | Publication date |
---|---|
JP2003017380A (ja) | 2003-01-17 |
US6712956B2 (en) | 2004-03-30 |
US20030002026A1 (en) | 2003-01-02 |
KR20020020628A (ko) | 2002-03-15 |
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