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KR100375636B1 - A method for producing a copper plated aluminium wire - Google Patents

A method for producing a copper plated aluminium wire Download PDF

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KR100375636B1
KR100375636B1 KR10-2000-0038021A KR20000038021A KR100375636B1 KR 100375636 B1 KR100375636 B1 KR 100375636B1 KR 20000038021 A KR20000038021 A KR 20000038021A KR 100375636 B1 KR100375636 B1 KR 100375636B1
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copper
aluminum alloy
layer
plating
zinc
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KR20020004284A (en
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허덕
김윤환
장희혁
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주식회사 일 진
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/22Light metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/22Electroplating: Baths therefor from solutions of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • C25D3/40Electroplating: Baths therefor from solutions of copper from cyanide baths, e.g. with Cu+
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • C25D5/42Pretreatment of metallic surfaces to be electroplated of light metals
    • C25D5/44Aluminium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0607Wires

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)

Abstract

본 발명은 알루미늄합금의 외표면에 피복재를 형성하여주는 동복알루미늄선에 관한 것으로, 알루미늄합금을 로드로 가공한 다음, 수산화나트륨이 포함된 탈지액으로 처리하여 유지성분을 제거하는 탈지단계; 유지가 제거된 알루미늄합금을 에칭액에서 50∼70℃의 온도로 에칭처리하여 산화알루미늄층을 제거하는 산화층 제거단계; 산화알루미늄층이 제거된 알루미늄합금을 활성액에서 상온으로 0.5∼2분간 활성화처리하는 활성화처리단계; 활성화처리된 알루미늄합금을 징케이트액에서 상온으로 1∼10분간 처리하여 아연피막을 형성시키는 아연층 형성단계: 아연층 형성단계에서 외표면에 아연층이 형성된 알루미늄합금을 도금액에서 상온으로 1∼10분간 도금처리하여 구리층을 형성하는 예비도금단계; 구리도금된 알루미늄합금을 수세처리한 다음 황산이 함유된 중화액으로 처리하여 구리도금층의 산화물을 제거하는 중화단계; 산화물이 제거된 알루미늄합금을 본도금액에서 처리하여 목적하는 도금두께의 구리층을 형성하는 본도금단계로 이루어져, 구리도금층의 접착성이 향상되어 연신율과 같은 기계적 특성이 향상됨은 물론 신선과정에서 발생하는 박리현상 등이 원천적으로 차단되게 한 것이다.The present invention relates to a copper-clad aluminum wire for forming a coating material on the outer surface of the aluminum alloy, the degreasing step of processing the aluminum alloy with a rod, and then treated with a degreasing solution containing sodium hydroxide to remove the fat and oil components; An oxide layer removing step of removing the aluminum oxide layer by etching the aluminum alloy from which the fat or oil is removed from the etching solution at a temperature of 50 to 70 ° C .; An activation treatment step of activating the aluminum alloy from which the aluminum oxide layer has been removed from the active liquid at room temperature for 0.5 to 2 minutes; A zinc layer forming step of forming a zinc coating by treating the activated aluminum alloy at room temperature for 1 to 10 minutes in a quenching solution: In a zinc layer forming step, an aluminum alloy having a zinc layer formed on an outer surface thereof at a room temperature of 1 to 10 A preplating step of forming a copper layer by plating for a minute; A neutralization step of washing the copper-plated aluminum alloy with water and then treating it with a neutralizing solution containing sulfuric acid to remove oxides of the copper plating layer; It consists of a main plating step in which an oxide-free aluminum alloy is treated in a main plating solution to form a copper layer having a desired plating thickness. The adhesion of the copper plating layer is improved, thereby improving mechanical properties such as elongation, as well as in the drawing process. The peeling phenomenon is to be blocked at the source.

Description

동복알루미늄선의 제조 방법 {A method for producing a copper plated aluminium wire}A method for producing a copper plated aluminum wire

본 발명은 알루미늄합금의 외표면에 구리층을 피복한 동복알루미늄선에 관한 것으로, 특히 알루미늄합금의 산화층을 제거하고 아연층을 형성시킨 다음 구리층을 도금시키므로써, 구리도금층의 접착성을 향상시킬 수 있도록 된 동복알루미늄선의 제조 방법에 관한 것이다.The present invention relates to a copper clad aluminum wire coated with a copper layer on an outer surface of an aluminum alloy, and in particular, by removing an oxide layer of an aluminum alloy, forming a zinc layer, and then plating a copper layer, thereby improving adhesion of the copper plated layer. It relates to a method for producing a copper-clad aluminum wire that can be made.

일반적으로, 동복알루미늄선은, 알루미늄합금이 갖는 낮은 비중 뿐만 아니라 신선성 등의 기계가공성이 우수한 특성과, 구리가 갖는 전기적으로 우수한 특성을 상호 공유하는 금속재질로서, 이러한 알루미늄합금을 소정 직경의 로드로 가공한 다음, 그 둘레면으로 구리를 접착하여 제조하게 된다.In general, copper-clad aluminum wire is a metal material which shares not only low specific gravity of aluminum alloy but also excellent machinability such as freshness and electrical excellent property of copper. After processing, the copper is bonded to its circumferential surface.

따라서, 알루미늄합금 로드의 표면에 구리가 접착된 상태이므로, 알루미늄합금 자체의 특성은 그대로 유지된 상태에서 구리피복층에 의해 전기적인 특성이 향상되어, 예컨대 전기전도도가 우수하면서도 신선공정이 원활하여 원하는 두께 및 길이로 제조가 가능해지는 것이다.Therefore, since copper is bonded to the surface of the aluminum alloy rod, the electrical properties are improved by the copper cladding layer while the properties of the aluminum alloy itself are maintained, for example, the electrical conductivity is smooth and the drawing process is smooth and the desired thickness is achieved. And it becomes possible to manufacture by length.

즉, 종래의 동복알루미늄선을 제조하는 방법은, 알루미늄합금의 로드를 심재로하여 그 주위에 구리를 씌우고 외부에서 물리적인 힘으로 압출하여 구리를 접합시킨 다음, 알루미늄합금의 로드와 구리층의 접착성을 향상시키기 위해 열처리 공정을 거치는 것으로 알려져 있다.That is, in the conventional method for producing a copper-clad aluminum wire, the aluminum alloy rod as a core, copper is wrapped around it, extruded by physical force from the outside to bond copper, and then the aluminum alloy rod is bonded to the copper layer. It is known to go through a heat treatment process to improve the properties.

그런데, 종래의 동복알루미늄선은, 알루미늄합금의 외표면에 존재하고 있는 산화알루미늄층을 제거하지 않은 상태에서 물리적인 힘으로 구리를 부착시키므로써, 신선공정 후 구상화를 위해서는 반드시 열처리공정이 추가됨은 물론 이로인해 부대비용이 증대되는 문제점이 있었다.However, in the conventional copper-clad aluminum wire, copper is attached by physical force without removing the aluminum oxide layer existing on the outer surface of the aluminum alloy, so that the heat treatment process is necessarily added for spheroidization after the drawing process. This caused a problem of increased incidental costs.

특히, 산화알루미늄층은 열역학적으로 매우 안정하여 열처리 등으로는 제거하기가 매우 어려우며, 이로인해 알루미늄합금 표면과 구리층과의 사이에 경계면이 존재하므로, 접합성이 저하될 뿐만 아니라 전기저항 상승 및 각종 결함의 원인으로 작용되는 문제점이 있었다.In particular, the aluminum oxide layer is thermodynamically very stable and difficult to remove by heat treatment. As a result, an interface exists between the surface of the aluminum alloy and the copper layer. There was a problem acting as a cause.

또한, 종래의 동복알루미늄선은, 그 외표면에 물리적인 힘으로 구리가 부착된 상태로서 구리간의 접합공정이 필수적으로 요구되고, 이러한 구리간 접합층의 균일성을 열처리과정을 통해 향상시킨다 하더라도 전기저항의 상승이나 신선공정 중 균열발생의 원인으로 작용되는 문제점이 있었다.In addition, the conventional copper-clad aluminum wire is a state in which copper is attached to the outer surface by physical force, and a bonding process between copper is indispensable, and even if the uniformity of the copper bonding layer is improved through heat treatment, There was a problem acting as a cause of the rise of resistance or cracking during the drawing process.

이에, 본 발명은 상기한 바와 같은 제문제점을 해결하기 위하여 안출된 것으로서, 알루미늄합금의 산화알루미늄층을 제거하고 아연층을 형성시킨 다음 구리를 도금시키므로써, 알루미늄합금의 전기적/기계적 특성을 향상시킬 수 있도록 된 동복알루미늄선의 제조 방법을 제공하는 데에 그 목적이 있다.Accordingly, the present invention has been made to solve the above problems, by removing the aluminum oxide layer of the aluminum alloy, forming a zinc layer and then plating copper, thereby improving the electrical and mechanical properties of the aluminum alloy. It is an object of the present invention to provide a method for producing a copper clad aluminum wire.

도 1은 본 발명에 따른 동복알루미늄선의 제조공정을 도시한 작업공정도,1 is a work flow diagram showing a manufacturing process of a copper-clad aluminum wire according to the present invention,

도 2는 본 발명에 따른 동복알루미늄선을 도시한 단면도이다.2 is a cross-sectional view showing a copper-clad aluminum wire according to the present invention.

* 도면 중 주요부분에 대한 부호의 설명** Explanation of symbols for main parts of drawing

10 : 알루미늄합금 20 : 구리피복재10: aluminum alloy 20: copper cladding

상기한 목적을 달성하기 위한 본 발명은, 알루미늄합금의 외표면에 구리 피복재를 형성하는 동복알루미늄선의 제조방법에 있어서, 알루미늄합금을 로드로 가공한 다음, 수산화나트륨이 포함된 탈지액으로 탈지처리하여 알루미늄합금에 부착된 유지성분을 제거하는 탈지단계; 상기 탈지단계에서 유지가 제거된 알루미늄합금을 에칭액에서 50∼70℃의 온도로 1∼3분간 에칭처리하여 산화알루미늄층을 제거하는 산화층제거단계; 산화알루미늄층이 제거된 알루미늄합금을 활성액으로 상온에서 0.5∼2분간 활성화처리하는 활성화처리단계; 활성화처리된 알루미늄합금을 징케이트액으로 상온에서 1∼10분간 징케이트처리하여 아연피막을 형성시킴과 더불어 잔류 산화알루미늄층을 제거하는 아연층형성단계: 아연층형성단계에서 외표면에 아연층이 형성된 알루미늄합금을 도금액에서 상온으로 1∼10분간 도금처리하여 알루미늄합금에 구리층을 형성하는 예비도금단계; 구리도금된 알루미늄합금을 수세처리한 다음, 황산이 포함된 중화액으로 처리하여 구리도금층에 형성되어있던 산화물을 제거하는 중화단계 및 중화단계에서 산화물이 제거된 알루미늄합금을 목적하는 도금두께의 구리층을 형성하는 본도금단계를 포함하여 이루어져 있다.이하, 본 발명에 따른 작용을 첨부된 예시도면을 참고로하여 상세하게 설명하면 다음과 같다.In the present invention for achieving the above object, in the method for producing a copper-clad aluminum wire to form a copper cladding on the outer surface of the aluminum alloy, by processing the aluminum alloy into a rod, and then degreasing with a degreasing solution containing sodium hydroxide A degreasing step of removing the oil and fat component attached to the aluminum alloy; An oxide layer removing step of removing the aluminum oxide layer by etching the aluminum alloy in which the fat is removed in the degreasing step for 1 to 3 minutes in an etching solution at a temperature of 50 to 70 ° C .; An activation treatment step of activating the aluminum alloy from which the aluminum oxide layer is removed with an active liquid at room temperature for 0.5 to 2 minutes; Zinc layer formation step of removing the residual aluminum oxide layer by zinc coating by quenching the activated aluminum alloy at room temperature for 1 to 10 minutes at room temperature: The zinc layer is formed on the outer surface in the zinc layer formation step. A preplating step of forming a copper layer on the aluminum alloy by plating the formed aluminum alloy at room temperature for 1 to 10 minutes; A copper layer having a desired plating thickness for the aluminum alloy in which the oxide is removed in the neutralization step and the neutralization step of removing the oxide formed in the copper plating layer by washing the copper-plated aluminum alloy with water and then neutralizing with sulfuric acid. It comprises a main plating step to form a. Hereinafter, the operation according to the present invention will be described in detail with reference to the accompanying drawings.

도 1은 본 발명에 따른 동복알루미늄선의 제조공정을 도시한 작업공정도이며, 도 2는 본 발명에 따른 동복알루미늄선을 도시한 단면도이다.본 발명에 따라 알루미늄합금의 외표면에 구리 피복재를 형성하여 알루미늄합금의 특성을 그대로 유지하면서 구리의 특성을 공유하는 동복알루미늄선을 제조하기 위해서는, 먼저 알루미늄합금을 로드로 가공한 다음, 수산화나트륨(NaOH)이 포함된 탈지액으로 탈지처리하여 알루미늄합금에 부착된 유지성분을 제거하는 것이 필요하다. 이때, 탈지액은 후술되는 실시예에서와 같이, 수산화나트륨이 10∼40g/ℓ포함된 것을 사용하는 것이 바람직하다.그 다음, 탈지단계에서 유지가 제거된 알루미늄합금을 에칭처리하여 산화알루미늄층을 제거한다. 이 산화층 제거단계에서 에칭은, 후술하는 실시예에서와 같이, 탄산소다(Na2CO3)가 10∼50g/ℓ이고, 인산나트륨(Na3PO4) 10∼50g/ℓ로 포함된 에칭액에서 50∼70℃의 온도로 1∼3분간 처리하는 것이 바람직하다.이렇게 산화알루미늄층이 제거된 알루미늄합금을 활성화처리후 아연층을 형성한다. 본 발명의 경우 활성화 단계는 적어도 2회 이상 실시하는 것이 바람직하다. 최초 활성화 단계에서는 후술하는 바와 같이, 질산(NH3)이 40∼70 vol%가 포함된 활성액에서 상온으로 0.5∼2분간 활성화 처리하는 것이 바람직하다.상기 활성화처리된 알루미늄합금은 징케이트처리하여 아연피막을 형성시킴과 더불어 잔류 산화알루미늄층을 제거한다. 바람직하게는 후술하는 바와 같이, 산화아연(ZnO)이 8∼12g/ℓ이며 수산화나트륨(NaOH)이 400∼ 600g/ℓ이고, 염화제이철(FeCl3)이 0.5∼1.5g/ℓ이며, 롯셀염(KNaC4H4O6·4H2O)이 5∼15g/ℓ로 포함된 징케이트액에서 상온으로 1∼10분간 처리하여 아연층을 형성하는 것이다.그 다음, 상기 아연층형성단계에서 외표면에 아연층이 형성된 알루미늄합금을 도금처리하여 알루미늄합금에 구리층을 형성한다. 이 예비도금단계에서 도금처리는, 후술되는 바와 같이, 청화동(CuCN)이 37.4∼ 41.2g/ℓ이며, 시안소다(NaCN)가 44∼48g/ℓ이고, 유리청화소다가 2.25∼3.95g/ℓ이며, 탄산소다(Na3CO3·10H2O)가 19.6∼30.0g/ℓ이고, 롯셀염이 30∼60g/ℓ로 포함된 도금액에서 상온으로 1∼10분간 전류밀도 2∼6 A/d㎡로 행하는 것이 바람직하다.상기와 같이 구리도금된 알루미늄합금을 수세처리한 다음, 황산이 함유된 중화액으로 처리하여 구리도금층에 형성되어있던 산화물을 제거할 필요가 있다. 이 중화단계에서 사용되는 황산 함유 중화액은 황산이 15vol% 내외로 함유된 것을 사용하는 바람직하다.그리고, 상기 중화단계에서 산화물이 제거된 알루미늄합금을 도금처리하여 최종적으로 목적하는 도금두께의 구리층을 형성한다. 이 본도금단계에서는 후술되는 바와 같이, 황산구리(Cu2SO4)가 180∼250g/ℓ이며, 황산이 40∼80g/ℓ이고, 티오뇨소 (H2NCSNH2)가 0∼0.05g/ℓ이며, 염소가 0.001∼0.005g/ℓ로 함유된 도금용액에서 20∼60℃의 온도, 전류밀도 2∼6 A/d㎡로 도금을 행하는 것이 바람직하다.1 is a working process diagram showing a manufacturing process of a copper-clad aluminum wire according to the present invention, Figure 2 is a cross-sectional view showing a copper-clad aluminum wire according to the present invention. By forming a copper clad material on the outer surface of the aluminum alloy according to the present invention In order to manufacture copper-clad aluminum wires that share the properties of copper while maintaining the properties of the aluminum alloy, first, the aluminum alloy is processed into a rod, and then degreased with a degreasing solution containing sodium hydroxide (NaOH) to attach to the aluminum alloy. It is necessary to remove the fatted oil component. At this time, it is preferable to use a degreasing liquid containing 10 to 40 g / L sodium hydroxide, as in the embodiment to be described later. Next, the aluminum oxide layer is etched by etching the aluminum alloy from which the oil is removed in the degreasing step Remove The etching in the oxide layer removing step is performed in an etching solution containing 10 to 50 g / l of sodium carbonate (Na 2 CO 3 ) and 10 to 50 g / l of sodium phosphate (Na 3 PO 4 ) as in the following example. It is preferable to process for 1-3 minutes at the temperature of 50-70 degreeC. In this way, the aluminum alloy from which the aluminum oxide layer was removed forms an zinc layer after an activation process. In the case of the present invention, the activation step is preferably performed at least twice. In the initial activation step, as described later, it is preferable to perform activation treatment at room temperature for 0.5 to 2 minutes in an active solution containing 40 to 70 vol% of nitric acid (NH 3 ). The film is formed and the remaining aluminum oxide layer is removed. Preferably, as described later, zinc oxide (ZnO) is 8-12 g / l, sodium hydroxide (NaOH) is 400-600 g / l, ferric chloride (FeCl 3 ) is 0.5-1.5 g / l, loxel salt In a zincate solution containing 5-15 g / l of (KNaC 4 H 4 O 6 .4H 2 O), a zinc layer is formed by treating the mixture at room temperature for 1 to 10 minutes. A copper layer is formed on the aluminum alloy by plating an aluminum alloy having a zinc layer formed on the surface thereof. In this pre-plating step, the plating treatment is 37.4 to 41.2 g / l of cyanide copper (CuCN), 44 to 48 g / l of cyanide (NaCN), and 2.25 to 3.95 g / of soda glass, as described later. L, sodium carbonate (Na 3 CO 3 · 10H 2 O) of 19.6 to 30.0 g / l, and Rossel salt containing 30 to 60 g / l, the current density of 2 to 6 A / for 1 to 10 minutes at room temperature. It is preferable to carry out in dm2. [0034] The copper alloy aluminum alloy as described above needs to be washed with water and then treated with a neutralizing solution containing sulfuric acid to remove oxides formed in the copper plating layer. The sulfuric acid-containing neutralizing solution used in this neutralization step is preferably one containing sulfuric acid of about 15 vol%. Further, in the neutralization step, an aluminum alloy from which oxides are removed is plated and a copper layer having a desired plating thickness is finally obtained. To form. In this main plating step, as described below, copper sulfate (Cu 2 SO 4 ) is 180 to 250 g / l, sulfuric acid is 40 to 80 g / l, and thiourinosodium (H 2 NCSNH 2 ) is 0 to 0.05 g / l. In the plating solution containing 0.001 to 0.005 g / L of chlorine, plating is preferably performed at a temperature of 20 to 60 ° C and a current density of 2 to 6 A / dm 2.

이하, 본 발명에 따른 실시예를 첨부된 표를 참고로하여 상세하게 설명하면 다음과 같다.Hereinafter, described in detail with reference to the accompanying table an embodiment according to the present invention.

(실시예)(Example)

먼저, 본 발명의 동복알루미늄선은 알루미늄합금(전계열)을 인발 등의 작업과정을 통해 직경 3∼8㎜정도의 로드로 가공한 다음, 제조하였는데, 그 처리과정을 설명하면 다음과 같다.First, the copper-clad aluminum wire of the present invention was manufactured by processing an aluminum alloy (electric series) into a rod having a diameter of about 3 to 8 mm through a work process such as drawing, and the like.

1. 탈지단계:알루미늄합금을 로드로 가공하는 과정에서 그 외표면으로 부착되어지는 유지성분과 같은 이물질을 제거하는 단계로서, 표 1에서와 같은 조건하에서 행하였다. 1. Degreasing step: The step of removing foreign matters such as oil and fat component to be attached to the outer surface of the aluminum alloy in the process of the rod, was carried out under the conditions as shown in Table 1.

[표 1]TABLE 1

성분(g/ℓ)Ingredient (g / ℓ) 온도(℃)Temperature (℃) 시간(분)Minutes 비고Remarks 수산화나트륨Sodium hydroxide 최 저lowest 1010 상 온Room temperature 1One 최 고Best 4040 1010 최 적optimal 3030 33

표 1에서와 같이, 수산화나트륨을 10 g/ℓ이하로 첨가한 경우 탈지효과가 저하되어 탈지시간이 증대되었으며, 수산화나트륨을 40 g/ℓ이상으로 첨가한 경우 과잉수산화나트륨이 알루미늄합금을 침식시키므로, 수산화나트륨을 10∼40g/ℓ, 특히 30g/ℓ내외로 첨가함이 바람직함을 알 수 있다.As shown in Table 1, when sodium hydroxide was added at 10 g / l or less, the degreasing effect was reduced, and the degreasing time was increased. When sodium hydroxide was added at 40 g / l or more, the excess sodium hydroxide eroded the aluminum alloy. It can be seen that sodium hydroxide is preferably added in an amount of about 10 to 40 g / l, in particular about 30 g / l.

또한, 표 1에서와 같이, 탈지에 필요한 시간은, 수산화나트륨의 첨가량에 따라 가변되지만, 수산화나트륨이 10∼40g/ℓ정도 포함되었다는 가정하에서 상온(10∼30℃)으로 1∼10분, 특히 3분 정도로 유지함이 바람직함을 알 수 있다.In addition, as shown in Table 1, the time required for degreasing varies depending on the amount of sodium hydroxide added, but it is 1 to 10 minutes at room temperature (10 to 30 ° C), particularly on the assumption that sodium hydroxide is contained in about 10 to 40 g / L. It can be seen that keeping for about 3 minutes is preferable.

2. 산화층 제거단계:알루미늄합금의 외표면에 잔존하는 이물질을 완전하게 제거함과 더불어 산화알루미늄층을 제거하는 단계로서, 표 2와 같은 조건하에서 행하였다. 2. Oxide layer removal step: A step of completely removing foreign substances remaining on the outer surface of the aluminum alloy and removing the aluminum oxide layer, was carried out under the conditions shown in Table 2.

[표 2]TABLE 2

성분(g/ℓ)Ingredient (g / ℓ) 온도(℃)Temperature (℃) 시간(분)Minutes 비 고Remarks 탄산소다Soda Carbonate 인산나트륨Sodium phosphate 최 저lowest 1010 1010 5050 1One 최 고Best 5050 5050 7070 -- 최 적optimal 2525 3030 6060 33

표 2에서와 같이, 탄산소다와 인산나트륨을 각각 10 g/ℓ이하로 첨가한 경우 에칭효과가 미흡하여 에칭시간이 증대되는 반면, 50 g/ℓ이상으로 첨가한 경우에는 에칭이 과다하여 알루미늄합금이 침식된다.As shown in Table 2, when sodium carbonate and sodium phosphate were added below 10 g / l, the etching time was insufficient to increase the etching time, whereas when added above 50 g / l, the etching was excessive and aluminum alloy was added. It is eroded.

따라서, 탄산소다와 인산나트륨을 각각 10∼50g/ℓ, 특히 탄산소다를 25g/ℓ내외로 첨가하면서 인산나트륨을 30g/ℓ내외로 첨가함이 바람직함을 알 수 있다.Therefore, it can be seen that it is preferable to add sodium phosphate at about 30 g / l while adding sodium carbonate and sodium phosphate at 10 to 50 g / l, in particular, sodium carbonate at about 25 g / l.

또한, 알루미늄합금 로드의 에칭온도가 50℃이하인 경우에는 장시간 유지함에도 불구하고 에칭효과가 저하되었으며, 70℃이상인 경우에는 에칭액이 증발하여 액칭액의 농도가 증가됨은 물론 이로인해 유지비가 증대되므로, 50∼70℃의 온도로 1∼3분 정도로 유지함이 바람직하다.In addition, in the case where the etching temperature of the aluminum alloy rod is 50 ° C. or lower, the etching effect is lowered even though the etching time is maintained for a long time. It is preferable to keep at about -70 degreeC about 1-3 minutes.

3. 제1 활성화 단계:알루미늄합금 로드에 잔존하는 산화알루미늄층을 제거함과 더불어 알루미늄 표면을 활성화시키는 단계로서, 표 3과 같은 시험조건하에서 활성화 처리를 행하였다. 3. First activation step: The step of activating the aluminum surface as well as removing the aluminum oxide layer remaining on the aluminum alloy rod, the activation treatment was performed under the test conditions shown in Table 3.

[표 3]TABLE 3

성분(vol.%ℓ)Component (vol.% L) 온도(℃)Temperature (℃) 시간(분)Minutes 비고Remarks 질산nitric acid 최 저lowest 4040 0.50.5 최 고Best 7070 22 최 적optimal 6060 상 온Room temperature 1One

표 3에서와 같이, 질산을 40 부피%이하로 첨가한 경우 활성화 처리에 필요한 시간이 상대적으로 증대되었으며, 70 부피%이상으로 첨가한 경우 증기가 발생되어 폭발 위험성이 존재하므로, 질산을 40∼70 부피%로, 특히 60 부피% 내외로 첨가함이 바람직함을 알 수 있다.As shown in Table 3, the time required for the activation treatment was relatively increased when nitric acid was added at 40 vol% or less, and when it was added at 70 vol% or higher, there was a risk of explosion due to the generation of vapor. It can be seen that it is preferable to add in volume%, especially around 60 volume%.

또한, 알루미늄합금의 활성화에 필요한 시간은, 질산이 40∼70 부피%로 포함되었다는 가정하에서 상온(10∼30℃)상태에서 30초∼2분, 특히 1분 내외의 시간이 바람직함을 알 수 있었다.In addition, it is understood that the time required for the activation of the aluminum alloy is preferably 30 seconds to 2 minutes at room temperature (10 to 30 ° C.), especially about 1 minute, on the assumption that 40 to 70% by volume of nitric acid is contained. there was.

4. 제1 아연층 형성단계:알루미늄합금의 외표면에 존재하고있는 산화알루미늄층을 분해함과 아연피막을 형성하여 더 이상의 산화알루미늄이 형성되지 않도록 보호하는 단계로서, 표 4과 같은 조건하에서 행하였다. 4. The first zinc layer forming step: decomposing the aluminum oxide layer existing on the outer surface of the aluminum alloy and forming a zinc film to protect the aluminum oxide from further formation, and is carried out under the conditions shown in Table 4. It was.

[표 4]TABLE 4

첨가량(g/ℓ)Addition amount (g / ℓ) 성분(g/ℓ)Ingredient (g / ℓ) 온도(℃)Temperature (℃) 시간(분)Minutes 산화아연Zinc oxide 수산화나트륨Sodium hydroxide 염화제이철Ferric chloride 롯셀염Rotsel salt 최저lowest 88 400400 0.50.5 55 1010 1One 최고Best 1212 600600 1.51.5 1515 -- 1010 최적optimal 1010 525525 1.01.0 1010 상온Room temperature 33

표 4에서와 같이, 징케이트액은 산화아연이 8∼12g/ℓ이며, 수산화나트륨이 400∼600g/ℓ이고, 염화제이철이 0.5∼1.5g/ℓ이며, 롯셀염이 5∼15g/ℓ로 포함됨이 바람직하다. 징케이트액 중의 산화아연이 8g/ℓ이하인 경우 산화아연층 두께가 불충분하여 예비도금층이 치밀하게 형성되지 못하며, 12g/ℓ이상인 경우 산화아연이 용액 내에서 석출하여 욕조 바닥에 침적되는 포화상태가 된다. 또한, 수산화나트륨이 400g/ℓ이하인 경우 알루미늄 표면에 잔존하는 산화알루미늄의 제거 효과가 불충분하여 치밀하지 못한 아연층이 형성되어 예비도금단계로 들어가기 전에 물리적인 박리현상이 보이며, 600g/ℓ이상인 경우 과잉의 기지 알루미늄의 에칭과 아연층 형성과정 중에도 그 경계층에서 에칭이 계속되어 결국 아연층과 기지 알루미늄과의 박리의 원인이 되어 바람직하지 않다. 염화제이철이 0.5g/ℓ이하인 경우 다기공의 아연층이 형성되며, 1.5g/ℓ이상 함유하기 곤란하다. 롯셀염이 5g/ℓ이하이면 다기공의 아연층이 형성되며, 15g/ℓ이상 첨가하여도 아연층이 더 이상 치밀화되지 않는다. 더욱 바람직하게는, 산화아연은 10g/ℓ내외로, 수산화나트륨은 525g/ℓ내외로, 염화제이철은 1.0g/ℓ내외로, 롯셀염은 10g/ℓ내외로 포함되도록 하는 것이다.As shown in Table 4, the zincate solution contains 8-12 g / l zinc oxide, 400-600 g / l sodium hydroxide, 0.5-1.5 g / l ferric chloride, and 5-15 g / l lotose salt. It is preferred to be included. If the zinc oxide in the zinc solution is less than 8 g / l, the zinc oxide layer is insufficient in thickness and the pre-plated layer is not dense. If the zinc oxide is more than 12 g / l, the zinc oxide precipitates in the solution and becomes saturated at the bottom of the bath. . In addition, when the sodium hydroxide is less than 400g / ℓ, the effect of removing the remaining aluminum oxide on the aluminum surface is insufficient, a dense zinc layer is formed, the physical peeling phenomenon is visible before entering the pre-plating step, if the excess is more than 600g / ℓ During the etching of the known aluminum and the zinc layer formation process, the etching is continued at the boundary layer, which is the cause of the exfoliation of the zinc layer and the known aluminum, which is undesirable. If the ferric chloride is 0.5g / l or less, a multi-porous zinc layer is formed, and it is difficult to contain 1.5g / l or more. When the lotel salt is 5 g / l or less, a multi-porous zinc layer is formed, and the zinc layer is no longer densified even when 15 g / l or more is added. More preferably, zinc oxide is contained in about 10 g / l, sodium hydroxide is contained in about 525 g / l, ferric chloride is contained in about 1.0 g / l, and lotel salt is contained in about 10 g / l.

또한, 아연층의 형성시간이 1분 이내인 경우 산화알루미늄이 충분히 용해되지 못하는 반면, 10분 이상으로 침적시킨다고 해서 아연층이 두껍게 형성되는 것이 아니므로, 상온에서 3분내외의 시간으로 침적하는 것이 바람직하다.In addition, when the formation time of the zinc layer is less than 1 minute, while aluminum oxide is not sufficiently dissolved, the zinc layer is not thickly formed by being deposited for 10 minutes or more, so that it is deposited for about 3 minutes at room temperature. desirable.

5. 제2 활성화 단계:제1 활성화 단계와 동일한 조성을 갖는 활성화액을 이용하여 아연층을 재용해시킴으로서, 아연층안에 녹아있던 산화알루미늄층을 확실하게 제거하는 단계이다. 5. Second Activation Step: By dissolving the zinc layer using an activating liquid having the same composition as the first activation step, the aluminum oxide layer dissolved in the zinc layer is reliably removed.

6. 제2 아연층 형성단계: 제1 아연층 형성단계와 동일한 조성을 갖는 용액을 이용하여 징케이트처리하여 즉, 이후에 설명하게 되는 도금단계에서 알루미늄합금과 구리의 젖음성(wettability)을 향상시키기 위한 단계이다. 6. Second zinc layer forming step : To improve wettability of the aluminum alloy and copper in the plating step, which will be described later using a solution having the same composition as the first zinc layer forming step, ie, the plating step described later. Step.

특히, 제2아연층형성단계를 거치지 않은 상태에서 도금단계를 행하게 되면, 알루미늄합금과 구리의 젖음성이 불량하여, 신선공정이나 꺽음시험 등의 과정에서 피복재가 박리되는 현상이 발생됨을 첨언한다.In particular, when the plating step is performed without passing through the second zinc layer forming step, the wettability of the aluminum alloy and the copper is poor, and the phenomenon in which the coating material is peeled off during the drawing process or the bending test occurs.

7. 예비도금단계: 알루미늄합금의 외표면에 형성된 아연층에 구리층을 피복하여줌으로써, 구리층의 성장을 용이하게 하는 단계로서, 표 5와 같은 시험조건하에서 도금하였다. 7. Pre-plating step : By coating the copper layer on the zinc layer formed on the outer surface of the aluminum alloy to facilitate the growth of the copper layer, it was plated under the test conditions shown in Table 5.

[표 5]TABLE 5

첨가량Amount 성분(g/ℓ)Ingredient (g / ℓ) 온도(℃)Temperature (℃) 시간(분)Minutes 전류밀도A/d㎡Current density A / dm 청화동Cheonghwa-dong 시안소다Cyan soda 유리청화소다Glass blue soda 탄산소다Soda Carbonate 롯셀염Rotsel salt 최저lowest 37.437.4 44.044.0 2.252.25 19.619.6 3030 1010 1One 22 최고Best 41.241.2 48.048.0 3.953.95 30.030.0 6060 -- 1010 66 최적optimal 39.339.3 46.046.0 3.013.01 19.619.6 52.4352.43 상온Room temperature 2-62-6 2.5-1.32.5-1.3

표 5에서와 같이, 예비도금액은, 청화동이 37.4∼ 41.2g/ℓ이며, 시안소다가 44∼48g/ℓ이고, 유리청화소다가 2.25∼3.95g/ℓ이며, 탄산소다가 19.6∼30.0g/ℓ이고, 롯셀염이 30∼60g/ℓ로 포함되어 있다.As shown in Table 5, the preplating solution contains 37.4 to 41.2 g / l of cyanide copper, 44 to 48 g / l of cyanide, 2.25 to 3.95 g / l of free cyanide, and 19.6 to 30.0 g of sodium carbonate. / l, and the lotel salt is contained at 30-60g / l.

또한, 예비도금시간이 1분 이하의 경우에 중화과정인 황산액에 침적시 구리층의 두께가 충분하지 못하여 중화가 원활하기 이루어지지 않게 되는 반면, 10분 이상의 경우 도금층의 두께증가율이 비효율적이므로, 2∼6분간이 바람직하다.In addition, when the pre-plating time is less than 1 minute, the thickness of the copper layer is not sufficient when the copper layer is immersed in the sulfuric acid, which is a neutralization process, while the neutralization is not smoothly performed. 2-6 minutes are preferable.

그리고. 예비도금과정에서의 전류밀도가 2 A/d㎡이하인 경우에는 도금층이 더디게 형성되는 반면, 6 A/d㎡이상인 경우에는 도금표면이 거칠어지고 도금색깔이 어두워지며 심한 경우에는 타버리게 되므로, 전류밀도 2∼6 A/d㎡에서 2∼6분간 도금함이 바람직하다.And. If the current density in the pre-plating process is 2 A / dm 2 or less, the plating layer is formed slowly, whereas in the case of 6 A / dm 2 or more, the plating surface becomes rough, the plating color becomes dark, and in severe cases burns out, the current density It is preferable to plate at 2-6 A / dm <2> for 2-6 minutes.

8. 중화단계: 예비도금(알카리액)된 알루미늄합금을 본 도금(산성액)으로 옮기기 이전과정에서 수세와 병행하여 이물질을 제거하는 단계로서, 표 6와 같은 시험조건하에서 처리하였다. 8. Neutralization step : A step of removing foreign substances in parallel with water washing in the pre-plating (alkaline solution) before transferring the aluminum alloy to the main plating (acid solution), and was treated under the test conditions shown in Table 6.

[표 6]TABLE 6

방 법Way 내 용Contents 황산농도(vol.%)Sulfuric acid concentration (vol.%) 침적시간(초)Deposition time (seconds) 방법 1Method 1 수세 →중화 → 수세Water washing → neutralization → water washing 1515 1010 방법 2Method 2 수세 →중화 →수세→중화Water washing → China → water washing → Chinese

표 6에서와 같이, 방법 1은 상온에서 약 10초간 침적하여 수세공정으로 진행하며, 방법 2는 첫번째 중화과정에서 형성된 부산물을 수세과정을 거친 후 두번째 중화과정을 진행하는 것이다.As shown in Table 6, Method 1 proceeds to the washing process by immersing at room temperature for about 10 seconds, Method 2 is to proceed with the second neutralization process after washing the by-product formed in the first neutralization process.

즉, 예비도금공정에서 도금된 알루미늄합금을 최소한 2회이상으로 수세와 중화과정을 실시하여 산화물을 완벽히 제거함과 더불어, 본도금공정에서 로드와 구리간의 접척성을 향상시키며, 이때의 황산농도를 15vol% 내외를 유지시킨다.In other words, the aluminum alloy plated in the pre-plating process is washed with water at least twice and neutralized to completely remove oxides, and improve the cohesion between the rod and copper in the main plating process, and the sulfuric acid concentration is 15 vol%. Maintain inside and outside

9, 본도금단계: 알카리성액에서 예비도금된 알루미늄합금을 목적하고자하는 도금두께로 구리층을 성장시키는 단계로서, 표 7와 같은 조성액과 시험조건하에서 본 도금처리하였다. 9, main plating step : as a step of growing a copper layer to the desired plating thickness of the aluminum alloy pre-plated in the alkaline solution, the main plating treatment under the composition solution and test conditions as shown in Table 7.

[표 7]TABLE 7

첨가량Amount 성분(g/ℓ)Ingredient (g / ℓ) 온도(℃)Temperature (℃) 시간(분)Minutes 전류밀도A/d㎡Current density A / dm 황산구리Copper sulfate 황산Sulfuric acid 티오뇨소Thionyozo 염소Goat 최저lowest 180180 4040 -- -- 2020 도금두께 마다 다름Depends on plating thickness 1One 최고Best 250250 8080 0.010.01 0.010.01 6060 88 최적optimal 210210 6060 0.050.05 0.0050.005 4040 44

여기서, 본도금단계에서 도금액은, 황산구리(Cu2SO4)가 180∼250g/ℓ이며, 황산이 40∼80g/ℓ이고, 티오뇨소 (H2NCSNH2)가 0∼0.05g/ℓ이며, 염소가 0.001∼0.005g/ℓ로 함유된 도금용액을 사용하는 것이 바람직하다. 상기 도금액 중 황산과 황산구리는 합법칙에 의해 서로의 첨가량이 조절되는데, 황산구리 대비 황산 첨가량이 적은 경우 전류효율이 저하되면서 양극피막이 형성되는 반면, 황산구리 대비 황산 첨가량이 많은 경우 조직이 치밀하지 못한 도금층이 형성된다.Here, the plating solution in the main plating step is copper sulfate (Cu 2 SO 4 ) is 180 to 250g / l, sulfuric acid is 40 to 80g / l, thionosodium (H 2 NCSNH 2 ) is 0 ~ 0.05g / l, It is preferable to use a plating solution containing chlorine at 0.001 to 0.005 g / l. The amount of sulfuric acid and copper sulfate in the plating solution is controlled by the law of addition to each other. When the amount of sulfuric acid is less than the amount of copper sulfate, the anode current is formed while the current efficiency decreases, whereas when the amount of sulfuric acid is higher than the amount of copper sulfate, the plating layer is not dense. Is formed.

또한, 티오뇨소를 규정범위내로 첨가하면 알루미늄합금의 표면이 검은 구리빛을 띠면서 깨끗해지고 치밀한 도금층이 형성되는 반면, 규정범위 이상으로 첨가하면 도금층이 취약(brittle)하고 신선성이 저하되면서 어두운 빛의 얼룩무늬가 형성되므로, 0.005 g/ℓ내외로 첨가함이 바람직하다.In addition, when the thionosodium is added within the prescribed range, the surface of the aluminum alloy is black copper-colored, and a clean and dense plating layer is formed, whereas when it is added over the prescribed range, the plating layer is brittle and the freshness is reduced, and dark light is generated. Since a mottled pattern of is formed, it is preferable to add around 0.005 g / ℓ.

10. 이후공정: 본도금공정에서 원하는 두께로 도금층인 형성된 알루미늄합금을, 도 1에 도시된 바와 같이, 구리도금층의 표면변색을 방지하기 위한 표면처리공정과, 건조공정을 거쳐 최종제품으로 완성한다. 10. Subsequent process : In the main plating process, the formed aluminum alloy, which is a plating layer having a desired thickness, is finished as a final product through a surface treatment process and a drying process to prevent surface discoloration of the copper plating layer, as shown in FIG. .

이어서, 본도금된 알루미늄합금을, 원하는 직경 또는 길이로 가공하여주는 신선공정과, 건조공정과, 기계적 특성(연신율, 강도 등)을 향상시키기 위해 가열하여주는 표면처리공정 등을 거치게 되는데, 자세한 설명은 생략하기로 한다.Subsequently, the plated aluminum alloy is subjected to a drawing process for processing the desired diameter or length, a drying process, and a surface treatment process for heating to improve mechanical properties (elongation, strength, etc.). Will be omitted.

이상에서 설명한 바와 같이 본 발명에 따른 동복알루미늄선의 제조방법에 의하면, 알루미늄합금 로드의 외표면에 형성되어있던 산화층을 제거하고 아연층을 형성시킨 다음 구리층을 도금시키므로써, 구리도금층의 접착성이 향상되어 연신율과 같은 기계적 특성이 향상됨은 물론 신선과정에서 발생하는 박리현상 등이 원천적으로 차단되는 효과가 있다.As described above, according to the manufacturing method of the copper-clad aluminum wire according to the present invention, by removing the oxide layer formed on the outer surface of the aluminum alloy rod, forming a zinc layer, and then plating a copper layer, the adhesion of the copper plating layer As a result, the mechanical properties such as elongation are improved, and the peeling phenomenon occurring in the drawing process is blocked at the source.

또한, 알루미늄합금 로드의 산화층을 제거하기 위한 별도의 열처리과정이 생략되므로 제반부대비용이 절감됨은 물론 피복재를 접합하기 위한 별도의 접합과정이 생략되므로 전기전도도가 향상되는 효과가 있다.In addition, since the separate heat treatment process for removing the oxide layer of the aluminum alloy rod is omitted, the overall cost is reduced as well as the separate bonding process for bonding the covering material is omitted, thereby improving the electrical conductivity.

Claims (8)

알루미늄합금의 외표면에 구리 피복재를 형성하여 동복알루미늄선을 제조하는 방법에 있어서,In the method for producing a copper clad aluminum wire by forming a copper clad material on the outer surface of the aluminum alloy, 알루미늄합금을 로드로 가공한 다음, 수산화나트륨이 포함된 탈지액으로 탈지처리하여 알루미늄합금에 부착된 유지성분을 제거하는 탈지단계;A degreasing step of processing the aluminum alloy with a rod and then degreasing with a degreasing solution containing sodium hydroxide to remove oil and fat components adhering to the aluminum alloy; 상기 탈지단계에서 유지가 제거된 알루미늄합금을 에칭액에서 50∼70℃의 온도로 1∼3분간 에칭처리하여 산화알루미늄층을 제거하는 산화층 제거단계;An oxide layer removing step of removing the aluminum oxide layer by etching the aluminum alloy in which the oil is removed in the degreasing step at an temperature of 50 to 70 ° C. for 1 to 3 minutes in an etching solution; 산화알루미늄층이 제거된 알루미늄합금을 활성액으로 상온에서 0.5∼2분간활성화처리하는 활성화처리단계; An activation treatment step of activating the aluminum alloy from which the aluminum oxide layer is removed with an active liquid at room temperature for 0.5 to 2 minutes; 활성화처리된알루미늄합금을 징케이트액으로 상온에서 1∼10분간 침적하여 아연피막을 형성시킴과 더불어 잔류 산화알루미늄층을 제거하는 아연층 형성단계:Zinc layer formation step of depositing the activated aluminum alloy with zinc solution at room temperature for 1 to 10 minutes to form a zinc coating and removing the residual aluminum oxide layer: 상기 활성화처리단계와 아연층형성단계를 최소한 2회 이상 반복 실시하는 단계; Repeating the activation treatment step and the zinc layer forming step at least two times ; 아연층 형성단계에서 외표면에 아연층이 형성된 알루미늄합금을 도금액에서 상온으로 1∼10분간 도금처리하여 알루미늄합금에 구리층을 형성하는 예비도금단계;A preplating step of forming a copper layer on the aluminum alloy by plating the aluminum alloy having a zinc layer formed on the outer surface in a zinc layer forming step at room temperature in a plating solution for 1 to 10 minutes; 예비도금된 알루미늄합금을 수세처리한 다음 황산이 함유된 중화액으로 처리하여 구리도금층의 외표면에 형성되어 있던 산화물을 제거하는 중화단계; 및A neutralization step of washing the pre-plated aluminum alloy with water and then treating it with a neutralizing solution containing sulfuric acid to remove oxides formed on the outer surface of the copper plating layer; And 중화단계에서 산화물이 제거된 알루미늄합금을 목적하는 도금두께의 구리층을 형성하는 본도금단계;를 포함하여 이루어진 것을 특징으로 하는 동복알루미늄선의 제조 방법.And a main plating step of forming a copper layer having a desired plating thickness for the aluminum alloy in which the oxide is removed in the neutralization step. 제 1항에 있어서, 산화층제거단계에서 사용되는 에칭액에는, 탄산소다가 10∼50g/ℓ이고, 인산나트륨이 10∼50g/ℓ의 함량으로 포함된 것을 특징으로 하는 동복알루미늄선의 제조 방법.The method for producing a copper-clad aluminum wire according to claim 1, wherein the etching solution used in the oxide layer removing step contains sodium carbonate in a content of 10 to 50 g / l and sodium phosphate in a content of 10 to 50 g / l. 제 1항에 있어서, 활성화단계에서 사용되는 활성화액은, 질산이 40∼70부피%의 함량으로 포함된 것을 특징으로 하는 동복알루미늄선의 제조 방법.The method according to claim 1, wherein the activating liquid used in the activating step comprises nitric acid in an amount of 40 to 70% by volume. 제 1항에 있어서, 아연층형성단계에서 사용되는 징케이트액은, 산화아연이 8∼12g/ℓ이며, 수산화나트륨이 400∼600g/ℓ이고, 염화제이철이 0.5∼1.5g/ℓ이며, 롯셀염이 5∼15g/ℓ의 함량으로 포함된 것을 특징으로 하는 동복알루미늄선의 제조 방법.The zincate solution according to claim 1, wherein the zincate solution used in the zinc layer forming step is zinc oxide of 8-12 g / l, sodium hydroxide 400-600 g / l, ferric chloride 0.5-1.5 g / l, Method for producing a copper-clad aluminum wire, characterized in that the cell salt is contained in the content of 5-15g / l. 삭제delete 제 1항에 있어서, 예비도금단계에서 사용되는 도금액은, 청화동이 37.4∼ 41.2g/ℓ이며, 시안소다가 44∼48g/ℓ이고, 유리청화소다가 2.25∼3.95g/ℓ이며, 탄산소다가 19.6∼30.0g/ℓ이고, 롯셀염이 30∼60g/ℓ의 함량으로 포함된 것을 특징으로 하는 동복알루미늄선의 제조 방법.2. The plating solution used in the pre-plating step has 37.4 to 41.2 g / l of cyanide copper, 44 to 48 g / l of cyanide, 2.25 to 3.95 g / l of free cyanide, and It is 19.6-30.0g / L, and the manufacturing method of the copper-clad aluminum wire characterized by containing Rochelle's salt in the content of 30-60g / L. 제 1항에 있어서, 중화단계에서 수세처리와 중화처리를 최소한 2회이상 실시하는 것을 특징으로 하는 동복알루미늄선의 제조 방법.The method for producing a copper-clad aluminum wire according to claim 1, wherein the washing and neutralizing treatments are performed at least twice in the neutralization step. 제 1항에 있어서, 본도금단계에서 사용되는 도금용액은, 황산구리가 180∼ 250g/ℓ이며, 황산이 40∼80g/ℓ이고, 티오뇨소가 0∼0.05g/ℓ이며, 염소가 0.001∼0.005g/ℓ의 함량으로 포함된 것을 특징으로 하는 동복알루미늄선의 제조 방법.The plating solution according to claim 1, wherein the plating solution used in the main plating step is 180-250 g / l of copper sulfate, 40-80 g / l of sulfuric acid, 0-0.05 g / l of thioureus, and 0.001-0.005 of chlorine. Method for producing a copper-clad aluminum wire, characterized in that contained in the content of g / ℓ.
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