KR100375189B1 - 선형모터 - Google Patents
선형모터 Download PDFInfo
- Publication number
- KR100375189B1 KR100375189B1 KR1019950045973A KR19950045973A KR100375189B1 KR 100375189 B1 KR100375189 B1 KR 100375189B1 KR 1019950045973 A KR1019950045973 A KR 1019950045973A KR 19950045973 A KR19950045973 A KR 19950045973A KR 100375189 B1 KR100375189 B1 KR 100375189B1
- Authority
- KR
- South Korea
- Prior art keywords
- pressure
- cooling medium
- coil
- linear motor
- fluid
- Prior art date
Links
- 239000002826 coolant Substances 0.000 claims abstract description 23
- 239000012530 fluid Substances 0.000 claims description 40
- 238000001816 cooling Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims 1
- 230000020169 heat generation Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000012809 cooling fluid Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- ZTXONRUJVYXVTJ-UHFFFAOYSA-N chromium copper Chemical compound [Cr][Cu][Cr] ZTXONRUJVYXVTJ-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K9/00—Arrangements for cooling or ventilating
- H02K9/19—Arrangements for cooling or ventilating for machines with closed casing and closed-circuit cooling using a liquid cooling medium, e.g. oil
- H02K9/197—Arrangements for cooling or ventilating for machines with closed casing and closed-circuit cooling using a liquid cooling medium, e.g. oil in which the rotor or stator space is fluid-tight, e.g. to provide for different cooling media for rotor and stator
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K11/00—Structural association of dynamo-electric machines with electric components or with devices for shielding, monitoring or protection
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K9/00—Arrangements for cooling or ventilating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Public Health (AREA)
- Electromagnetism (AREA)
- Combustion & Propulsion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Linear Motors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Motor Or Generator Cooling System (AREA)
Abstract
Description
Claims (13)
- 상대적으로 이동하는 2개의 부재;상기 2개의 부재 중 하나에 장착된 코일;상기 2개의 부재 중 다른 하나의 장착된 자석;상기 코일을 둘러싸는 외부튜브 내에 순환배관을 통해 냉각매체를 순환시키는 순환펌프.상기 냉각매체의 압력을 검출하는 압력검출장치; 및상기 압력검출장치로부터의 검출된 압력값에 기초하여 상기 순환펌프의 동작을 제어하는 제어시스템을 구비하는 것을 특징으로 하는 선형모터
- 제 1 항에 있어서,상기 2개의 부재 중 하나가 고정되고, 상기 선형모터는 상기 코일이 상기 고정된 부재에 장착되어 있는 가동자석형인 것을 특징으로 하는 선형모터.
- 선형모터의 냉각방법에 있어서,소정 온도를 갖도록 냉각매체를 조절하는 단계;상기 소정 온도를 갖는 상기 냉각매체를 선형모터 내에 유동시키는 단계;상기 냉각매체의 압력을 측정하는 단계; 및상기 측정된 압력에 기초하여 상기 냉각매체의 유량을 조정하여, 상기 냉각매체의 압력을 소성값 이하로 유지시키는 단계를 구비하는 것을 특징으로 하는 선형모터의 냉각방법.
- 상대적으로 이동하는 2개의 부재를 갖는 스테이지로서, 상기 스테이지상에 마스크 또는 감광성 기판이 놓이는 상기 스테이지;상기 2개의 부재 중 하나에 장착된 코일;상기 2개의 부재 중 다른 하나에 장착된 자석;상기 코일을 둘러싸는 외부튜브 내에 순환배관을 통해 냉각매체를 순환시키는 순환펌프;상기 냉각매체의 악력을 검출하는 압력검출장치; 및상기 압력검출장치로부터의 검출된 압력값에 기초하여 상기 순환펌프의 동작을 제어하는 제어시스템을 구비하는 것을 특징으로 하는 노광장치.
- 제 1 항에 있어서,상기 냉각매체의 온도를 조절하는 온도조절기를 더 구비하는 것을 특징으로 하는 선형모터.
- 제 1 항에 있어서,상기 압력검출장치의 검출결과가 대기압에 기초하여 결정된 문턱값을 초과하면 상기 제어시스템은 상기 순환펌프의 출력을 저하시키는 것을 특징으로 하는 선형모터.
- 제 3 항에 있어서,상기 측정단계의 결과에 따라 상기 냉각매체의 압력을 저하시키는 단계를 더 구비하는 것을 특징으로 하는 선형모터의 냉각방법.
- 제 4 항에 있어서,상기 냉각매체의 온도를 조절하는 온도조절기를 더 구비하는 것을 특징으로 하는 노광장치.
- 제 4 항에 있어서,상기 압력검출장치의 검출결과가 대기압에 기초하여 결정된 문턱값을 초과하면 상기 제어시스템은 상기 순환펌프의 출력을 저하시키거나 또는 정지시키는 것을 특징으로 하는 노광장치.
- 마스크 또는 감광성 기판을 지지하는 스테이지;상기 스테이지를 구동하며, 코일 부재와 자석 부재를 갖는 구동부;상기 코일 부재를 둘러싸는 튜브;상기 튜브 내부에 유체를 공급하는 공급시스템;상기 유체의 압력을 검출하는 압력검출장치; 및상기 압력검출장치의 출력에 기초하여 상기 공급시스템을 제어하여 상기 유체에 의해 상기 튜브의 변형을 방지하도록 상기 튜브 내의 상기 유체의 압력을 조정하는 제어시스템을 구비하는 것을 특징으로 하는 노장장치.
- 제 10 항에 있어서,상기 유체의 온도를 조절하는 온도조절기를 더 구비하는 것을 특징으로 하는 노광장치.
- 제 10 항에 있어서,상기 공급시스템은 펌프를 포함하고, 상기 제어시스템은 상기 압력검출장치의 출력에 기초하여 상기 펌프를 제어하는 것을 특징으로 하는 노광장치.
- 제 12 항에 있어서,상기 압력검출장치의 검출결과가 대기압과 상기 튜브의 두께 중 적어도 하나에 기초하여 결정된 문턱값을 초과하면, 상기 제어시스템은 상기 순환펌프의 출력을 저하시키거나 또는 정지시키는 것을 특징으로 하는 노광장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP94-310501 | 1994-12-14 | ||
JP31050194A JP3475973B2 (ja) | 1994-12-14 | 1994-12-14 | リニアモータ、ステージ装置、及び露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960026286A KR960026286A (ko) | 1996-07-22 |
KR100375189B1 true KR100375189B1 (ko) | 2003-03-19 |
Family
ID=18005990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950045973A KR100375189B1 (ko) | 1994-12-14 | 1995-12-01 | 선형모터 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5770899A (ko) |
JP (1) | JP3475973B2 (ko) |
KR (1) | KR100375189B1 (ko) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6084319A (en) * | 1996-10-16 | 2000-07-04 | Canon Kabushiki Kaisha | Linear motor, and stage device and exposure apparatus provided with the same |
JPH10127035A (ja) * | 1996-10-16 | 1998-05-15 | Canon Inc | リニアモータおよびこれを用いたステージ装置ならびに露光装置 |
KR100223370B1 (ko) * | 1996-12-19 | 1999-10-15 | 윤종용 | 이동 통신시스템에서 채널 절환 방법 |
JPH11307430A (ja) | 1998-04-23 | 1999-11-05 | Canon Inc | 露光装置およびデバイス製造方法ならびに駆動装置 |
JP4088728B2 (ja) * | 1998-07-09 | 2008-05-21 | 株式会社ニコン | 平面モータ装置、駆動装置及び露光装置 |
TW588222B (en) * | 2000-02-10 | 2004-05-21 | Asml Netherlands Bv | Cooling of voice coil motors in lithographic projection apparatus |
JP3832556B2 (ja) * | 2000-02-25 | 2006-10-11 | 株式会社安川電機 | キャンド・リニアモータ |
CN1327294A (zh) * | 2000-06-05 | 2001-12-19 | 杨泰和 | 具有封闭型冷却结构的回转电机 |
JP2002064968A (ja) * | 2000-08-21 | 2002-02-28 | Nippon Thompson Co Ltd | 可動コイル型リニアモータを内蔵したスライド装置 |
US6515381B1 (en) | 2000-09-13 | 2003-02-04 | Nikon Corporation | Cantilever stage |
JP2002186242A (ja) * | 2000-12-14 | 2002-06-28 | Nikon Corp | 電磁アクチュエータ装置、ステージ装置、露光装置及びデバイス |
JP4689058B2 (ja) * | 2001-02-16 | 2011-05-25 | キヤノン株式会社 | リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法 |
US20050088634A1 (en) * | 2002-03-15 | 2005-04-28 | Nikon Corporation | Exposure system and device production process |
EP1542336A1 (en) * | 2002-08-21 | 2005-06-15 | Toyota Jidosha Kabushiki Kaisha | Vehicle motor |
US20040100154A1 (en) * | 2002-11-26 | 2004-05-27 | Rahman Khwaja M. | Concentrated winding electric motor having optimized winding cooling and slot fill |
US20040244963A1 (en) * | 2003-06-05 | 2004-12-09 | Nikon Corporation | Heat pipe with temperature control |
US20050057102A1 (en) * | 2003-09-11 | 2005-03-17 | Nikon Corporation | Holding member, coolant, cooling method and cooling device, linear motor device, stage device, and exposure apparatus |
US20070296286A1 (en) * | 2003-10-28 | 2007-12-27 | Avenell Eric G | Powered Hand Tool |
US7288864B2 (en) * | 2004-03-31 | 2007-10-30 | Nikon Corporation | System and method for cooling motors of a lithographic tool |
EP1806828A4 (en) | 2004-10-01 | 2016-11-09 | Nikon Corp | LINEAR MOTOR, FLOOR APPARATUS AND EXPOSURE APPARATUS |
JP2007123295A (ja) * | 2005-10-24 | 2007-05-17 | Canon Inc | 露光装置 |
US20080073563A1 (en) * | 2006-07-01 | 2008-03-27 | Nikon Corporation | Exposure apparatus that includes a phase change circulation system for movers |
US7916267B2 (en) * | 2006-08-29 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus, and motor cooling device |
US7576459B2 (en) * | 2006-09-25 | 2009-08-18 | Honeywell International Inc. | Electric machine with fluid supply control system |
US8068208B2 (en) * | 2006-12-01 | 2011-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving immersion scanner overlay performance |
DE102010004642B4 (de) * | 2010-01-13 | 2012-09-27 | Integrated Dynamics Engineering Gmbh | Magnetaktor sowie Verfahren zu dessen Montage |
DE202012100266U1 (de) * | 2012-01-26 | 2012-02-23 | Elha-Maschinenbau Liemke Kg | Vertikal-Drehmaschine |
US10931170B2 (en) * | 2017-05-10 | 2021-02-23 | Hamilton Sundstrand Corporation | Motor cooling utilizing cabin air |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3675056A (en) * | 1971-01-04 | 1972-07-04 | Gen Electric | Hermetically sealed dynamoelectric machine |
JPH0641381A (ja) * | 1991-03-18 | 1994-02-15 | Kuraray Co Ltd | 樹脂組成物 |
-
1994
- 1994-12-14 JP JP31050194A patent/JP3475973B2/ja not_active Expired - Lifetime
-
1995
- 1995-12-01 KR KR1019950045973A patent/KR100375189B1/ko not_active IP Right Cessation
-
1997
- 1997-09-22 US US08/934,815 patent/US5770899A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3475973B2 (ja) | 2003-12-10 |
US5770899A (en) | 1998-06-23 |
JPH08167554A (ja) | 1996-06-25 |
KR960026286A (ko) | 1996-07-22 |
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