KR100337925B1 - 반도체 정전기 보호회로 - Google Patents
반도체 정전기 보호회로 Download PDFInfo
- Publication number
- KR100337925B1 KR100337925B1 KR1019970028745A KR19970028745A KR100337925B1 KR 100337925 B1 KR100337925 B1 KR 100337925B1 KR 1019970028745 A KR1019970028745 A KR 1019970028745A KR 19970028745 A KR19970028745 A KR 19970028745A KR 100337925 B1 KR100337925 B1 KR 100337925B1
- Authority
- KR
- South Korea
- Prior art keywords
- transistor
- pad
- active
- resistor
- protection circuit
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract description 8
- 238000000034 method Methods 0.000 claims description 9
- 230000003068 static effect Effects 0.000 description 16
- 230000005611 electricity Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 5
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/711—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (8)
- 패드 및 접지선에 각각 연결된 제 1 바이폴라 트랜지스터와,제 1 저항을 거쳐 상기 접지선에 접속되고 제 2 저항을 거쳐 상기 패드에 연결된 제 1 액티브 트랜지스터와,상기 접지선에 접속되고 제 3 저항을 거쳐 상기 패드에 연결된 액티브 다이오드 트랜지스터; 및,상기 패드 및 파워 라인에 접속되는 제 2 바이폴라 트랜지스터를 포함하는 것을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 1에 있어서,추가로, 제 4 저항을 통해 상기 패드에 접속되고 제 5저항을 통해 상기 파워라인에 접속되는 제 2 액티브 트랜지스터를 포함하는 것을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 2에 있어서,상기 제 1 저항 및 제 5 저항은 50 ∼ 10000Ω의 값을 갖는 것을 특징으로 하는 반도체 정전기 보호회로.
- 패드 및 제 1 접지선에 각각 연결된 제 1 바이폴라 트랜지스터와,제 1 저항을 거쳐 제 2 접지선에 접속되고 제 2 저항을 거쳐 상기 패드에 연결된 제 1 액티브 트랜지스터와,상기 제 1 접지선에 접속되고 제 3 저항을 거쳐 상기 패드에 연결된 액티브 다이오드 트랜지스터로 이루어짐을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 4에 있어서,추가로, 상기 패드 및 제 1 파워 라인에 접속되는 제 2 바이폴라 트랜지스터를 포함하는 것을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 4에 있어서,추가로, 제 4 저항을 통해 상기 패드에 접속되고 제 5저항을 통해 상기 파워라인에 접속되는 제 2 액티브 트랜지스터를 포함하는 것을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 4에 있어서,추가로, 상기 패드 및 상기 파워 라인에 접속되는 제 2 바이폴라 트랜지스터를 포함하는 것을 특징으로 하는 반도체 정전기 보호회로.
- 청구항 4에 있어서,상기 제 1 저항 및 제 5 저항은 50 ∼ 10000Ω의 값을 갖는 것을 특징으로하는 반도체 정전기 보호회로.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970028745A KR100337925B1 (ko) | 1997-06-28 | 1997-06-28 | 반도체 정전기 보호회로 |
US09/105,305 US6031704A (en) | 1997-06-28 | 1998-06-26 | Electrostatic protection circuit in a semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970028745A KR100337925B1 (ko) | 1997-06-28 | 1997-06-28 | 반도체 정전기 보호회로 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990004618A KR19990004618A (ko) | 1999-01-15 |
KR100337925B1 true KR100337925B1 (ko) | 2002-11-18 |
Family
ID=19512087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970028745A KR100337925B1 (ko) | 1997-06-28 | 1997-06-28 | 반도체 정전기 보호회로 |
Country Status (2)
Country | Link |
---|---|
US (1) | US6031704A (ko) |
KR (1) | KR100337925B1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100482362B1 (ko) * | 1997-10-14 | 2005-08-01 | 삼성전자주식회사 | 정전기보호용반도체장치및그제조방법 |
JP2000307070A (ja) * | 1999-04-22 | 2000-11-02 | Fujitsu Ltd | 保護回路を有する半導体装置 |
KR100661671B1 (ko) * | 1999-12-28 | 2006-12-26 | 주식회사 하이닉스반도체 | 플래쉬 메모리 소자의 정전기 방전 보호 회로 |
US6583972B2 (en) | 2000-06-15 | 2003-06-24 | Sarnoff Corporation | Multi-finger current ballasting ESD protection circuit and interleaved ballasting for ESD-sensitive circuits |
US6822295B2 (en) * | 2002-07-30 | 2004-11-23 | Honeywell International Inc. | Overvoltage protection device using pin diodes |
JP3808026B2 (ja) * | 2002-10-23 | 2006-08-09 | 株式会社ルネサステクノロジ | 半導体装置 |
US6952027B2 (en) * | 2002-11-29 | 2005-10-04 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device and electronic card using the same |
US20050180071A1 (en) * | 2004-02-13 | 2005-08-18 | Yi-Hsun Wu | Circuit and method for ESD protection |
JP4996057B2 (ja) * | 2004-05-26 | 2012-08-08 | 旭化成エレクトロニクス株式会社 | 半導体回路 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4990802A (en) * | 1988-11-22 | 1991-02-05 | At&T Bell Laboratories | ESD protection for output buffers |
JPH0766958B2 (ja) * | 1989-03-20 | 1995-07-19 | 株式会社東芝 | 静電保護回路 |
FR2676870B1 (fr) * | 1991-05-24 | 1994-12-23 | Sgs Thomson Microelectronics | Structure de protection dans un circuit cmos contre le verrouillage. |
JPH08195442A (ja) * | 1995-01-17 | 1996-07-30 | Sony Corp | 半導体集積回路の保護回路 |
US5654860A (en) * | 1995-08-16 | 1997-08-05 | Micron Technology, Inc. | Well resistor for ESD protection of CMOS circuits |
-
1997
- 1997-06-28 KR KR1019970028745A patent/KR100337925B1/ko not_active IP Right Cessation
-
1998
- 1998-06-26 US US09/105,305 patent/US6031704A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6031704A (en) | 2000-02-29 |
KR19990004618A (ko) | 1999-01-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4876584A (en) | Electrostatic discharge protection circuit | |
EP0575062B1 (en) | ESD protection of output buffers | |
US4996626A (en) | Resistorless electrostatic discharge protection device for high speed integrated circuits | |
US5502328A (en) | Bipolar ESD protection for integrated circuits | |
US5760446A (en) | Electrostatic discharge structure of semiconductor device | |
US7221184B2 (en) | Semiconductor device with bus terminating function | |
JPH02292914A (ja) | 非負荷形出力駆動回路と出力信号を供給する方法 | |
KR100337925B1 (ko) | 반도체 정전기 보호회로 | |
US6608744B1 (en) | SOI CMOS input protection circuit with open-drain configuration | |
KR0166509B1 (ko) | 정전기 보호 회로 | |
US6414360B1 (en) | Method of programmability and an architecture for cold sparing of CMOS arrays | |
US5705941A (en) | Output driver for use in semiconductor integrated circuit | |
JP3559075B2 (ja) | Cmos技術の集積電子回路用の極性反転保護装置 | |
JP3499578B2 (ja) | 半導体集積回路 | |
JPH10107235A (ja) | ゲートアレーlsiの構成方法とこれを用いた回路装置 | |
CN101197500A (zh) | 静电放电保护电路 | |
JPH0379120A (ja) | 入力保護回路 | |
JPH1168038A (ja) | 半導体集積回路装置における静電破壊保護回路 | |
JPH0532908B2 (ko) | ||
JP3274561B2 (ja) | 半導体集積回路 | |
KR0158626B1 (ko) | 전원단자의 정전기 보호회로 | |
KR20040099154A (ko) | 반도체 장치 | |
JPS6187357A (ja) | 半導体集積回路装置 | |
KR100386079B1 (ko) | 정전방전(esd)구조 | |
JPH03101161A (ja) | 半導体集積回路 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19970628 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20000510 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19970628 Comment text: Patent Application |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20020228 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20020513 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20020514 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20050422 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20060502 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20070419 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20080425 Start annual number: 7 End annual number: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20090427 Start annual number: 8 End annual number: 8 |
|
PR1001 | Payment of annual fee |
Payment date: 20100423 Start annual number: 9 End annual number: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20110429 Start annual number: 10 End annual number: 10 |
|
FPAY | Annual fee payment |
Payment date: 20120424 Year of fee payment: 11 |
|
PR1001 | Payment of annual fee |
Payment date: 20120424 Start annual number: 11 End annual number: 11 |
|
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20140409 |