KR100232136B1 - 칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 - Google Patents
칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 Download PDFInfo
- Publication number
- KR100232136B1 KR100232136B1 KR1019960034416A KR19960034416A KR100232136B1 KR 100232136 B1 KR100232136 B1 KR 100232136B1 KR 1019960034416 A KR1019960034416 A KR 1019960034416A KR 19960034416 A KR19960034416 A KR 19960034416A KR 100232136 B1 KR100232136 B1 KR 100232136B1
- Authority
- KR
- South Korea
- Prior art keywords
- frit glass
- display panel
- plasma display
- color plasma
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 230000004888 barrier function Effects 0.000 title abstract description 13
- 239000011521 glass Substances 0.000 claims abstract description 43
- 238000005192 partition Methods 0.000 claims abstract description 28
- 238000010304 firing Methods 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000005530 etching Methods 0.000 claims abstract description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 7
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 6
- 239000000049 pigment Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 2
- 229910000413 arsenic oxide Inorganic materials 0.000 claims description 2
- 229960002594 arsenic trioxide Drugs 0.000 claims description 2
- KAGOZRSGIYZEKW-UHFFFAOYSA-N cobalt(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Co+3].[Co+3] KAGOZRSGIYZEKW-UHFFFAOYSA-N 0.000 claims description 2
- KTTMEOWBIWLMSE-UHFFFAOYSA-N diarsenic trioxide Chemical compound O1[As](O2)O[As]3O[As]1O[As]2O3 KTTMEOWBIWLMSE-UHFFFAOYSA-N 0.000 claims description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000004448 titration Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 8
- 238000001035 drying Methods 0.000 abstract description 5
- 230000035939 shock Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 16
- 239000005357 flat glass Substances 0.000 description 10
- 239000000843 powder Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/241—Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
- H01J9/242—Spacers between faceplate and backplate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
- C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
- C03C8/245—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders containing more than 50% lead oxide, by weight
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/36—Spacers, barriers, ribs, partitions or the like
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/36—Spacers, barriers, ribs, partitions or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/36—Spacers, barriers, ribs, partitions or the like
- H01J2211/366—Spacers, barriers, ribs, partitions or the like characterized by the material
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
Claims (6)
- 일정한 간격의 전극라인을 갖는 상부기판 및 하부기판과 상기 상부기판과 하부기판 사이에 위치하여 방전셀을 이루는 격벽을 구비한 컬라 플라즈마 디스플레이 패널에 있어서, 상기 격벽은 70 내지 80%의 산화납(PbO), 8 내지 13%의 산화비소(B2O3), 7 내지 12%의 산화아연(ZnO), 3% 이내의 산화규소(SiO2), 그리고 1% 이내의 산화바륨(BaO)의 적정비율로 혼합된 프릿글라스로 이루어짐을 특징으로 하는 컬러 플라즈마 디스플레이 패널.
- 제1항에 있어서, 상기 프릿글라스에 안료를 첨가한 흑색의 프릿글라스를 사용함을 특징으로 하는 컬러 플라즈마 디스플레이 패널.
- 제2항에 있어서, 상기 안료는 산화제2철(Fe2O3)과 산화코발트(Co2O3)를 혼합하여 사용함을 특징으로 하는 컬러 플라즈마 디스플레이 패널.
- 제3항에 있어서, 상기 안료의 첨가량은 전체의 0.5% 정도인 것을 특징으로 하는 컬러 플라즈마 디스플레이 패널.
- 플라즈마 디스플레이 패널의 격벽제조방법에 있어서, 하부 글라스의 전면에 프릿글래스 페이스트를 도포하는 단계, 상기 프릿글래스를 430 내지 450℃로 소성하는 단계, 상기 소성된 프릿글래스 위에 감광막을 도포하여 격벽형상으로 패터닝하는 단계, 35℃ 이상으로 가열된 에칭액을 이용하여 상기 패터닝된 감광막의 형상으로 상기 프릿글래스를 에칭하는 단계를 포함하여 이루어짐을 특징으로 하는 컬러 플라즈마 디스플레이 패널의 격벽제조방법.
- 제5항에 있어서, 상기 프릿글래스는 결정성 프릿글래스를 사용함을 특징으로 하는 컬러 플라즈마 디스플레이 패널의 격벽제조방법.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960034416A KR100232136B1 (ko) | 1996-08-20 | 1996-08-20 | 칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 |
US08/795,866 US5972528A (en) | 1996-08-20 | 1997-02-06 | Barrier in color plasma display panel |
JP09025611A JP3121781B2 (ja) | 1996-08-20 | 1997-02-07 | カラープラズマディスプレイパネルの隔壁及びその製造方法 |
EP97301177A EP0825631B1 (en) | 1996-08-20 | 1997-02-24 | Method for manufacturing a color plasma display panel with a barrier |
EP04077433A EP1492149B1 (en) | 1996-08-20 | 1997-02-24 | Barrier in color plasma display panel and method for manufacturing the same |
DE69731919T DE69731919T2 (de) | 1996-08-20 | 1997-02-24 | Verfahren zur Herstellung eines Farbplasmaanzeigefeldes mit Barrieren |
CN97102668A CN1101005C (zh) | 1996-08-20 | 1997-02-25 | 彩色等离子体显示盘中的挡板及其制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960034416A KR100232136B1 (ko) | 1996-08-20 | 1996-08-20 | 칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980015176A KR19980015176A (ko) | 1998-05-25 |
KR100232136B1 true KR100232136B1 (ko) | 1999-12-01 |
Family
ID=19470079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960034416A Expired - Fee Related KR100232136B1 (ko) | 1996-08-20 | 1996-08-20 | 칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5972528A (ko) |
EP (2) | EP0825631B1 (ko) |
JP (1) | JP3121781B2 (ko) |
KR (1) | KR100232136B1 (ko) |
CN (1) | CN1101005C (ko) |
DE (1) | DE69731919T2 (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100326535B1 (ko) * | 1999-02-09 | 2002-03-25 | 구자홍 | 플라즈마 디스플레이 패널의 전극 및 그 제조방법 |
KR100295112B1 (ko) * | 1998-12-02 | 2001-07-12 | 구자홍 | 플라즈마표시장치용하부기판 |
US6465956B1 (en) * | 1998-12-28 | 2002-10-15 | Pioneer Corporation | Plasma display panel |
JP4069583B2 (ja) * | 2000-03-28 | 2008-04-02 | 三菱電機株式会社 | プラズマディスプレイ装置 |
US6544090B1 (en) * | 2000-06-16 | 2003-04-08 | E. I. Du Pont De Nemours And Company | Method for forming barrier structures on a substrate and the resulting article |
DE10061720A1 (de) * | 2000-12-12 | 2002-06-13 | Philips Corp Intellectual Pty | Plasmabildschirm mit Leuchtstoffschicht |
US6639360B2 (en) * | 2001-01-31 | 2003-10-28 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
US7075112B2 (en) * | 2001-01-31 | 2006-07-11 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
JP4641361B2 (ja) * | 2001-05-31 | 2011-03-02 | 日立プラズマディスプレイ株式会社 | 表示装置用隔壁構造及びその製造方法 |
KR100538323B1 (ko) * | 2001-09-28 | 2005-12-22 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널 |
KR100603260B1 (ko) * | 2001-11-03 | 2006-07-20 | 삼성코닝 주식회사 | 플라즈마 디스플레이 패널의 전자파 차폐 필터 및 그제조방법 |
KR100438577B1 (ko) * | 2001-12-04 | 2004-07-02 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 하판 제조방법 |
KR20040068772A (ko) * | 2003-01-27 | 2004-08-02 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 유전체층과 그 제조방법 |
KR100696444B1 (ko) * | 2005-11-07 | 2007-03-20 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 하판 제조방법 |
FR3003084B1 (fr) * | 2013-03-08 | 2015-02-27 | Saint Gobain | Support electroconducteur pour oled, oled l'incorporant, et sa fabrication |
US10062674B1 (en) * | 2017-04-28 | 2018-08-28 | Corning Incorporated | Systems and methods for display formation using photo-machinable material substrate layers |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0817345A (ja) * | 1994-06-27 | 1996-01-19 | Sumitomo Kinzoku Ceramics:Kk | プラズマディスプレイパネルの障壁形成方法 |
JPH08111178A (ja) * | 1994-10-12 | 1996-04-30 | Dainippon Printing Co Ltd | 交流型プラズマディスプレイ及びその製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3391055A (en) * | 1965-04-27 | 1968-07-02 | Owens Illinois Inc | Electrically conductive solder glass |
JPS499905B1 (ko) * | 1969-11-29 | 1974-03-07 | ||
US3947279A (en) * | 1971-12-23 | 1976-03-30 | Owens-Illinois, Inc. | Thermally crystallizable glasses possessing precision controlled crystallization and flow properties and process of producing same |
NL7317648A (nl) * | 1973-12-22 | 1975-06-24 | Philips Nv | Gasontladingspaneel. |
US3975176A (en) * | 1975-01-02 | 1976-08-17 | Owens-Illinois, Inc. | Method of sealing tubulation with preformed solder glass |
US4256533A (en) * | 1980-01-14 | 1981-03-17 | Modern Controls, Inc. | Method of constructing layered glass display panels |
EP0050294B1 (en) * | 1980-10-20 | 1987-01-14 | Matsushita Electric Industrial Co., Ltd. | Method of making an electrode construction and electrode construction obtainable by this method |
JPS58142728A (ja) * | 1982-02-18 | 1983-08-24 | Sanyo Electric Co Ltd | カラ−受像管の製造方法 |
JPS58184234A (ja) * | 1982-04-22 | 1983-10-27 | Toshiba Kankiyuu Kizai Kk | 管球用口金の製造方法 |
JPS58188030A (ja) | 1982-04-26 | 1983-11-02 | Fujitsu Ltd | ガス放電パネルの製造方法 |
US4692662A (en) * | 1984-07-13 | 1987-09-08 | Okuno Chemical Industries Co. Ltd. | High contrast display device |
JPS6427141A (en) * | 1987-07-21 | 1989-01-30 | Mitsubishi Electric Corp | Method for separating picture tube |
JPH0743996B2 (ja) * | 1988-03-02 | 1995-05-15 | ガス放電表示装置の製造方法 | |
US4948758A (en) * | 1988-10-24 | 1990-08-14 | Corning Incorporated | Fiber-reinforced composite comprising mica matrix or interlayer |
JP2964512B2 (ja) * | 1989-12-18 | 1999-10-18 | 日本電気株式会社 | カラープラズマディスプレイ |
EP0683920B2 (en) * | 1993-02-01 | 2006-04-12 | Candescent Intellectual Property Services, Inc. | Flat panel device with internal support structure |
JP3350184B2 (ja) * | 1993-12-13 | 2002-11-25 | 富士通株式会社 | プラズマディスプレイパネルの製造方法及びプラズマディスプレイパネル |
US5840465A (en) * | 1995-07-17 | 1998-11-24 | Taiyo Ink Manufacturing Co., Ltd. | Compositions and method for formation of barrier ribs of plasma display panel |
JP3292434B2 (ja) * | 1994-10-17 | 2002-06-17 | 太陽インキ製造株式会社 | プラズマディスプレイパネルの隔壁形成用組成物及びそれを用いた隔壁形成方法 |
EP0722179A3 (en) * | 1994-12-05 | 1997-12-10 | E.I. Du Pont De Nemours And Company | Insulator composition, green tape, and method for forming plasma display apparatus barrier-rib |
JP2663915B2 (ja) * | 1995-05-31 | 1997-10-15 | 日本電気株式会社 | プラズマディスプレイパネル |
-
1996
- 1996-08-20 KR KR1019960034416A patent/KR100232136B1/ko not_active Expired - Fee Related
-
1997
- 1997-02-06 US US08/795,866 patent/US5972528A/en not_active Expired - Fee Related
- 1997-02-07 JP JP09025611A patent/JP3121781B2/ja not_active Expired - Fee Related
- 1997-02-24 DE DE69731919T patent/DE69731919T2/de not_active Expired - Lifetime
- 1997-02-24 EP EP97301177A patent/EP0825631B1/en not_active Expired - Lifetime
- 1997-02-24 EP EP04077433A patent/EP1492149B1/en not_active Expired - Lifetime
- 1997-02-25 CN CN97102668A patent/CN1101005C/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0817345A (ja) * | 1994-06-27 | 1996-01-19 | Sumitomo Kinzoku Ceramics:Kk | プラズマディスプレイパネルの障壁形成方法 |
JPH08111178A (ja) * | 1994-10-12 | 1996-04-30 | Dainippon Printing Co Ltd | 交流型プラズマディスプレイ及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0825631A2 (en) | 1998-02-25 |
CN1101005C (zh) | 2003-02-05 |
EP1492149B1 (en) | 2012-01-11 |
EP0825631A3 (en) | 1998-09-30 |
EP1492149A1 (en) | 2004-12-29 |
KR19980015176A (ko) | 1998-05-25 |
EP0825631B1 (en) | 2004-12-15 |
JP3121781B2 (ja) | 2001-01-09 |
US5972528A (en) | 1999-10-26 |
JPH1092327A (ja) | 1998-04-10 |
DE69731919T2 (de) | 2005-12-08 |
DE69731919D1 (de) | 2005-01-20 |
CN1174334A (zh) | 1998-02-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100232136B1 (ko) | 칼라 플라즈마 디스플레이 패널의 격벽구조 및 격벽제조방법 | |
KR100301353B1 (ko) | 플라즈마디스플레이패널및그제조방법 | |
KR100723746B1 (ko) | 플라즈마 디스플레이 표시장치와 그 제조방법 | |
US5698353A (en) | Flat display and method of its manufacture | |
KR19990063062A (ko) | 표시관용 양극기판과 그 제조방법 | |
KR100295112B1 (ko) | 플라즈마표시장치용하부기판 | |
KR100726912B1 (ko) | 전극 플레이트와 그 제조방법, 및 전극 플레이트를 사용한가스 방전 패널과 그 제조방법 | |
US5791960A (en) | Display device and fabrication method therefor | |
US6037713A (en) | Display panel having compound film covered electrodes | |
US20040063041A1 (en) | Method for fabricating an anti-glare pixel-defining layer on an OLED panel | |
US20090091236A1 (en) | Plasma display panel having alignment structures and method of fabricating the same | |
US7220653B2 (en) | Plasma display panel and manufacturing method thereof | |
JPH07254316A (ja) | 透明導電膜の形成方法、その膜を用いた透明電極形成方法およびその電極を用いたフラットディスプレイパネルとその製造方法 | |
KR100400162B1 (ko) | 플라즈마 디스플레이 판넬의 격벽 제조방법 | |
KR100267553B1 (ko) | 플라즈마 디스플레이 패널용 하부패널 제조방법 | |
KR100226862B1 (ko) | 칼라 플라즈마 디스플레이 패널의 하판구조 및 전극 형성방법 | |
KR19980075049A (ko) | 칼라 플라즈마 디스플레이 패널 및 그 제조방법 | |
KR100570682B1 (ko) | 결정성 모유리 조성물, 이를 포함하는 플라즈마디스플레이 패널 및 그 제조방법 | |
KR20080098779A (ko) | 플라즈마 디스플레이 패널 및 그 제조 방법 | |
KR100351149B1 (ko) | 표시소자 제조방법 | |
KR100739573B1 (ko) | 플라즈마 디스플레이 패널의 제조 방법 | |
KR20050075528A (ko) | 플라즈마 디스플레이 패널 소자 및 그 제조 방법 | |
KR19980067852A (ko) | 플라즈마 디스플레이 패널(Plasma Display Pannel)의 격벽 및 그 제조방법 | |
KR19990020127A (ko) | 플라즈마 표시소자의 제조방법 | |
KR19990039426A (ko) | 플라즈마 표시소자의 격벽구조 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19960820 |
|
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19960820 Comment text: Request for Examination of Application |
|
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19990324 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19990728 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19990903 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 19990904 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20011224 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20030108 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20040910 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20050901 Start annual number: 7 End annual number: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20060824 Start annual number: 8 End annual number: 8 |
|
PR1001 | Payment of annual fee |
Payment date: 20070816 Start annual number: 9 End annual number: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20080826 Start annual number: 10 End annual number: 10 |
|
PR1001 | Payment of annual fee |
Payment date: 20090827 Start annual number: 11 End annual number: 11 |
|
FPAY | Annual fee payment |
Payment date: 20100630 Year of fee payment: 12 |
|
PR1001 | Payment of annual fee |
Payment date: 20100630 Start annual number: 12 End annual number: 12 |
|
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20120809 |