KR0171042B1 - Exposure device - Google Patents

Abstract

A base frame 2, a stacking box 4 provided on one side of the base frame 2, a peripheral exposure section 20 in which a plurality of pairs of two are provided on the base frame 2, and a peripheral exposure section ( An alignment unit 30 coupled to the installation 20, a plurality of supports 52 fixed to the peripheral exposure unit 20 and the alignment unit 30, and installed on the base frame 2, and the base frame 2. An optical exposure part 50 connected to the exposure working table 50 installed on the work bench, the exposure part 10 provided on the exposure working table 50, and the exposure part 10 and the peripheral exposure part 20 to transmit the exposure light ( 60, an exposure including a plurality of panel pedestals 54 provided on the base frame 2, and panel conveying means for taking out the glass panel 8 from the stacking box 4 and moving it to the exposure work bench 50. FIG. Provide the device.

Description

Exposure device

1 is a perspective view showing an embodiment of the exposure apparatus of the present invention.

Figure 2 is a side cross-sectional view showing an embodiment of the exposure portion of the exposure apparatus of the present invention.

3 is a perspective view showing an embodiment of an alignment unit and a peripheral exposure unit of the exposure apparatus of the present invention.

4 is a cross-sectional view taken along line A-A of FIG.

5 is a sectional view taken along line B-B in FIG.

6 is a perspective view showing another embodiment of the alignment portion and the peripheral exposure portion of the exposure apparatus of the present invention.

7 is a cross-sectional view taken along line C-C of FIG.

[Industrial use]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus that corrects misalignment of a glass panel center line for performing exposure and exposes a peripheral portion of the glass panel.

[Prior art]

In general, an exposure apparatus performs exposure to a glass panel using an exposure light source, a mask in which an optical system and a circuit pattern are formed in order to form a circuit in a glass panel of a liquid crystal display to which photoresist is applied.

The above exposure apparatus has a mirror-scan method and a step-repeat method, both of which are configured to perform the main exposure to which the circuit pattern is formed and the peripheral exposure to the periphery of the glass panel. The reason for performing the peripheral exposure in the above is that if the photoresist remains on the periphery of the glass panel after the main exposure for forming the circuit pattern, it turns to dust and contaminates the glass panel.

One example of the mirror-scan type exposure apparatus is described in Japanese Patent Laid-Open No. 4-283726. The exposure apparatus described in Japanese Patent Laid-Open No. 4-283726 includes a base frame, an exposure work bench provided on the base frame, main exposure means provided on the exposure work bench, and the main exposure means. Peripheral exposure means which is provided separately from the edge of the glass panel to expose both edges, a stacking box provided on one side of the base frame, and a panel moving means for extracting the glass panel from the stacking box to move the exposure workbench do.

The main exposure means includes a case, a main exposure light source installed in the case, a main exposure light installed above the main exposure light source and having a parabolic cross section and irradiated radially from the main exposure light source. A reflection mirror reflecting in the direction, a shutter provided below the main exposure light source, a mask formed below the shutter and having a circuit pattern for exposure, and the main exposure light passing through the mask. It consists of the projection optical system which passes and keeps this circuit pattern.

The peripheral exposure means includes a case, a peripheral exposure light source provided in the case, a condensing lens provided on both sides of the peripheral exposure light source, a shutter provided outside the condensing lens, and the case. A transmission optical system installed at both sides of the transmission optical system for transmitting the peripheral exposure light passing through the lens and the shutter, and a lens for aligning the traveling direction of the peripheral exposure light emitted from the other end of the transmission optical system in parallel with a horizontal plane; It consists of a reflecting mirror which vertically changes the advancing direction of ambient exposure light which has passed through one lens.

The panel moving means is composed of a robot mechanism consisting of three arms that are capable of rotating and linear movement.

In the mirror-scan type exposure apparatus configured as described above, the main exposure light source is turned on and radiated when the panel moving unit, which is a robot mechanism composed of three arms, pulls out a glass panel coated with photoresist from the stack and places it on an exposure bench. The main exposure light is all irradiated downward by the reflecting mirror, and when the shutter is opened, the main exposure light passes through the mask in which the circuit pattern is formed to expose the glass panel placed on the exposure work bench in a constant circuit pattern.

Further, the ambient exposure light that is turned on and emitted by the ambient exposure light source of the peripheral exposure means is condensed by both condensing lenses, and when the shutter is opened, the ambient exposure light is transmitted through the transmission optical system and emitted at the other end of the transmission optical system. The peripheral exposure light passes through the lens, and the traveling direction is changed in a direction parallel to the horizontal plane, and the traveling direction is changed again in the vertical direction by the reflection mirror, thereby exposing both edges of the glass panel placed on the exposure bench.

Unlike the above, the step-repeat exposure apparatus includes a base frame, an exposure work table provided on the base frame, an exposure means provided on the exposure work table, a loading box provided on one side of the base frame, It includes a panel moving means consisting of a robotic mechanism consisting of three arms formed to withdraw the glass panel from the above-mentioned loading box to move to the exposure workbench and to rotate and linearly move, and an alignment unit for aligning the center line of the glass panel.

The alignment unit is provided between the stacker and the exposure workbench so that the panel moving means draws the glass panel from the stacker to perform the center line alignment of the glass panel before moving the exposure workbench, or install the glass panel on the exposure workbench. After placing it in the center line, perform center line alignment.

The exposure means includes a case, an exposure light source provided in the case, and a reflection that is provided above the exposure light source and has a parabolic cross section and reflects the exposure light irradiated radially from the exposure light source in a downward direction. And a mirror, a shutter provided below the exposure light source, a mask provided below the shutter, and a projection optical system through which the main exposure light passing through the mask maintains a circuit pattern.

In the step-repeat type exposure apparatus configured as described above, when the panel moving unit pulls out the glass panel from the stacker and places the glass panel on the exposure bench and aligns the glass panel in the alignment unit, the exposure light source of the exposure unit is turned on and radiated. The exposure light is all irradiated downward by the reflecting mirror, and when the shutter is opened, the exposure light passes through the mask in which the circuit pattern and the peripheral exposure pattern are formed, and the glass panel placed on the exposure work table is applied to the predetermined circuit pattern. Exposure and peripheral exposure are performed.

[Problem to Solve Invention]

The conventional mirror-scan type exposure apparatus configured as described above has a problem in that the main exposure light source and the peripheral exposure light source are separately provided.

In addition, in the exposure workbench, the main exposure to form a circuit pattern on the glass panel and the peripheral exposure are inevitably performed. Therefore, only two edges of the four corners of the glass panel can be peripherally exposed, and the other two edges can be peripherally exposed. There is a problem that can not be.

In addition, since the transmission system of the ambient exposure light is composed of an optical system such as a lens or a reflecting mirror, it is difficult to readjust the peripheral exposure means to the size of the glass panel when the size of the glass panel is changed.

In the step-repeat exposure apparatus, the peripheral exposure of the glass panel square is possible, but since the pattern region for peripheral exposure must be formed in the mask, the exposure area is limited and the exposure is limited because the circuit pattern region becomes relatively dense. There is a problem of longer time.

In addition, since the step-repeat type exposure apparatus performs alignment in a separate alignment unit, there is a problem that the structure is complicated and the overall exposure process time becomes long.

In addition, since the edge of the light irradiated when the peripheral exposure to the glass panel is lower than the center, there is a problem that the boundary between the exposed and unexposed areas is not uniform.

[Means for solving the problem]

Means to be solved by the present invention in order to solve the above problems are a base frame, a stacking box installed on one side of the base frame, a peripheral exposure portion which is provided in plurality in pairs on each of the base frame, An alignment unit coupled to the peripheral exposure unit, the support unit fixed to the peripheral exposure unit and the alignment unit, and installed at the base frame, and at a predetermined interval from the horizontal and vertical centerlines of the loading box. An exposure bench provided on the base frame, an exposure section provided on the exposure bench, a projection optical system provided between the exposure section and the exposure bench, wherein the light of the exposure section is transmitted to the exposure bench, and the furnace described above. A mask provided between the light portion and the projection optical system and having a constant circuit pattern formed thereon; the exposure portion and the peripheral exposure portion; A plurality of panel pedestals installed on the base frame diagonally at regular intervals with respect to a light transmission unit connected to the light transmission unit for transmitting the exposure light, and the horizontal center line of the loading box and the vertical center line of the exposure work bench; And it is to provide an exposure apparatus including a panel conveying means for taking out the glass panel from the above-mentioned stacking box and moving the glass panel.

It is also possible to provide another stacker on the opposite side of the stacker provided on one side of the base frame in the above exposure apparatus.

The peripheral exposure portion and the alignment portion are provided in pairs at regular intervals in the stacker and the exposure workbench.

The panel conveying means is composed of a robot mechanism consisting of a plurality of arms capable of rotation and linear movement, and a control device for controlling the rotation and linear movement of each of the plurality of arms of the robot mechanism, the last arm of the robot mechanism The supporting member is formed in a plate shape so as to support the glass panel, and the supporting member is provided with a plurality of vacuum holes to absorb the glass panel.

The exposure unit includes a case, an exposure light source provided in the case, and a reflection mirror disposed above the exposure light source and reflecting downwardly the exposure light irradiated radially from the exposure light source in a parabolic cross section. And a shutter provided below the exposure light source, at least one prism provided between the exposure light source and the shutter and refracting a part of the exposure light with the light transmission unit, and between the prism and the light transmission unit. And a condenser lens for focusing the exposure light refracted by the prism to light transmission.

The peripheral exposure portion includes a body fixed to the support, an inlet formed at one end of the body and connected to the light transmission unit, and an optical path formed in the body connected to the inlet at a right angle; At least one lens installed at a predetermined distance from an end of the light transmission unit connected to the inlet, and a direction perpendicular to the direction of travel of the peripheral exposure light that is installed at an angle to the bent portion at right angles to the optical path and passes through the lens. A reflective mirror for changing the direction of the light source and an exit of the ambient exposure light whose direction is changed by the reflective mirror is irradiated to the outside and connected to the light path, and moved up and down between the lens and the end of the light transmitting part connected to the inlet. And a light shielding member which is installed to be possible and blocks a part of the ambient exposure light passing through the light path.

The alignment unit includes a body fixed to the support, a panel groove formed on one side of the body and the edge of the glass panel passes, and an optical path connected to the panel groove and formed in the body; And a light emitting means provided at one end of the light path, a light emitting focus lens provided at a predetermined distance from the light emitting means and forming a focal point of light emitted from the light emitting source, and provided at the other end of the light path. An image pickup device, and a light receiving focus lens provided at predetermined intervals in the image pickup device.

The panel groove is formed in a C shape when viewed from the side, and the optical path is formed in a V shape when viewed in a planar cross section.

The light emitting means is made of a light emitting diode, and a shutter for passing the light emitted from the light emitting diode in a predetermined direction between the light emitting diode and the light emitting focus lens at a predetermined interval.

It is preferable that a plurality of straight slits are formed in the shutter, and that the linear image pickup device is used as the image pickup device.

Unlike the above, the alignment unit includes a body fixed to the support, a light emitting diode installed on an upper portion of the body, and a quadrant light receiving diode installed on a lower portion of the body corresponding to the light emitting diode. It is also possible.

The body is formed in a c-shape viewed from the side.

The image pickup device and the light receiving diode are connected to the control device of the panel moving means, and the result detected by the image pickup device and the light receiving diode is fed back to the control device.

The support is composed of a vertical member and a horizontal member, the vertical member is fixed to the base frame, the horizontal member is fixed to the peripheral exposure portion and the alignment portion, the horizontal member of the glass panel It is formed to adjust the length according to the size.

[Functions and actions]

An operation process of the exposure apparatus of the present invention configured as described above will be described.

When the arm of the robot mechanism is rotated and linearly moved by the control device of the panel moving means to take out the photoresist-coated glass panel loaded on the support member, vacuum is applied through the vacuum hole formed in the support member. The glass panel drawn out by performing is attracted to the support member.

The glass panel adsorbed as described above is attached to the body of the alignment unit fixed to the horizontal members of the support units installed in pairs on both sides at predetermined intervals in the loading box as the arm of the robot mechanism is moved by the control device. Pass through the formed panel groove. At this time, the light emitted from the light emitting diode, which is the light emitting means provided at one end of the optical path of the alignment unit, passes through the slit formed in the shutter, and a focus is formed in the light emitting focus lens and is irradiated to the side of the glass panel passing through the panel groove. The irradiated light is reflected from the side of the glass panel to form a focal point at the light receiving focus lens through the light path, and is formed on the image pickup device installed at the other end of the light path. Here, when the glass panel is rotated about the vertical axis, the position of the light on the image pickup device is out of the predetermined position, and the result is fed back to the control device of the panel moving means to rotate the arm of the robot mechanism on which the support member is installed. By correcting, the state in which the glass panel is rotated about the vertical axis is corrected.

As described above, when the alignment unit detects the rotation of the glass panel about the vertical axis and corrects it by the panel moving unit, the glass panel is moved, and the peripheral exposure of both edges of the glass panel is performed by a pair of peripheral exposure units installed after the alignment unit. Is done. That is, the exposure light emitted from the exposure light source of the exposure portion proceeds in a predetermined direction by the reflection mirror, and a part of the exposure light is refracted by the prism to form the light transmission part through the condensing lens, and the peripheral furnace through the light transmission part. Is sent to the miner. The exposure light transmitted to the peripheral exposure portion travels through the optical path formed in the peripheral exposure portion, and the traveling direction is constantly adjusted while passing through the lens, and the traveling direction is changed at right angles by the reflecting mirror, through the exit of the optical path. Peripheral exposure is performed on both edges of the glass panel that proceed through the alignment section. At this time, by exposing the light blocking member provided between the entrance of the optical path and the lens up and down to block the portion showing the spreadability of the edge of the exposure light passing through the optical path, the exposure light irradiated onto the glass panel can be made clearer. have. In addition, when the horizontal member of the support on which the peripheral exposure portion is fixed is moved in correspondence with the size of the glass panel, the peripheral exposure of glass panels of various sizes can be easily performed.

As described above, when the glass panel is sucked and fixed to the supporting member of the panel conveying means and moved by the robot mechanism, the peripheral exposure of both edges is completed at the peripheral exposure portion, and the peripheral exposure is performed on the other two corners which are not peripherally exposed. In order to change the movement direction of the glass panel. That is, by placing the glass panels subjected to the peripheral exposure of both edges on the four panel pedestals arranged in a square shape on the base frame, and releasing the vacuum suction force through the vacuum holes formed in the support members of the panel moving means, the glass panel and the support members Is separated. Subsequently, by the control device of the panel moving means, the robot mechanism rotates and linearly moves so that the moving direction of the supporting member faces the exposure working platform, and when the direction change is completed so that the end of the supporting member faces the exposure working platform, the supporting member Is adhered to the glass panel mounted on the panel stand and sucked and fixed by vacuuming through a vacuum hole.

The pair of alignment parts fixed to the horizontal members of the support plates installed on both sides at a predetermined distance from the exposure work table as the glass panel fixed to the supporting member whose movement direction is changed as described above is operated by the robot mechanism of the panel moving means. Pass through the panel groove formed in the.

The glass panel is subjected to the peripheral exposure of the other unexposed edges in the same manner as above by a pair of alignment portions and peripheral exposure portions fixed to the horizontal members of the supports provided on both sides at a predetermined distance from the exposure work bench.

As described above, the glass panel on which the peripheral edges of the four corners are all exposed is raised to the exposure position of the exposure bench by the panel moving means.

When the glass panel is placed on the exposure bench, the shutter of the exposure section is opened, and the exposure light emitted from the exposure light source passes through the mask and the projection optical system on which the circuit pattern is formed and exposes the glass panel of the exposure bench in the circuit pattern.

When the exposure to the glass panel is completed in the circuit pattern in the above, the panel moving means is placed in the loading of the glass panel in the reverse order so far. At this time, it is more effective if the peripheral exposure is further performed on the corners of the glass panel.

In addition, when the storage box is installed on both sides, the glass panel which completed exposure at the exposure work bench is placed in the storage box located on the opposite side to the storage box first drawn out by the panel moving means. Also in this case, it is more effective to provide support on both sides at regular intervals from the storage box, and fix the alignment portion and the peripheral exposure portion to the horizontal member of the support to perform further peripheral exposure again.

In the case where the alignment portion is composed of a U-shaped body, a light emitting diode, and a four-segmented light-receiving diode, when the glass panel passes through the U-shaped body of the alignment portion, the light irradiated from the light emitting diode is divided into four-segmented light-receiving diodes. It is determined whether the glass panel is rotated about the vertical axis according to whether it is detected as. That is, the light emitted from the light emitting diode is partially reflected by the edge of the glass panel and reaches the light-receiving diode which is partially divided into four parts. The signal of light sensed in the first and fourth quadrants of the four-segmented light-emitting diode It is determined whether or not the glass panel is rotated about the vertical axis by the values coinciding with each other and whether the signal values of the light detected in the second and third quadrants coincide with each other. The position of the glass panel can be corrected by feeding back.

EXAMPLE

Next, the most preferable embodiment of the exposure apparatus of this invention is described in detail with reference to drawings.

First, as shown in FIG. 1, one embodiment of the exposure apparatus of the present invention includes a base frame 2, a loading box 4 installed on one side of the base frame 2, and the base frame 2 described above. Peripheral exposure section 20, which is provided in pairs two by two above, Alignment section 30 is installed in combination with the peripheral exposure section 20, the peripheral exposure section 20 and the alignment section ( 30 is fixed and installed on the base frame 2 with a plurality of supports 52 which are installed on the base frame 2, and at regular intervals in the horizontal and vertical center lines of the loading box 4, respectively. The exposure part 10 provided on the exposure work bench 50 and the exposure work bench 50 mentioned above, and the exposure part 10 provided between the exposure part 10 and the exposure work table 50, It is provided between the projection optical system 18 which transmits light to the exposure work bench 50, and the said exposure part 10 and the projection optical system 18. As shown in FIG. A light transmission unit 60 made of a mask 17 having a high constant circuit pattern and a plurality of optical fibers 62 and connected to the exposure unit 10 and the peripheral exposure unit 20 to transmit exposure light. And a plurality of panel pedestals 54 installed on the base frame 2 diagonally at a predetermined interval around the point where the horizontal center line of the loading box 4 and the vertical center line of the exposure work bench 50 meet. And a panel conveying means for extracting the glass panel 8 from the above loading box 4 and moving it to the exposure work bench 50.

It is also possible to provide another stacker 6 on the opposite side of the stacker 4 provided on one side of the base frame 2 in the above exposure apparatus.

The peripheral exposure portion 20 and the alignment portion 30 are provided in pairs at regular intervals in the stacking boxes 4, 6 and the exposure work table 50, respectively.

The panel conveying means controls the rotation and the linear movement of each of the robot mechanism 40 consisting of a plurality of arms 42 capable of rotation and linear movement, and the plurality of arms 42 of the robot mechanism 40. A support member 44 is formed of a control device (not shown) and is formed in a plate shape to support the glass panel 8 on the last arm 42 of the robot mechanism 40. A plurality of vacuum holes 45 are formed in one supporting member 44 to adsorb the glass panel 8.

In the present embodiment, the light transmitting unit 60 can change the position of the peripheral exposure unit 20 using the optical fiber 62. However, in the case of exposing a large amount of glass panels of a constant size, the peripheral furnace Since there is little need to change the position of the light part 20, it is also possible to use the optical transmission system which consists of a mirror, a lens, etc.

As shown in FIG. 2, the exposure unit 10 is provided above the case 11, the exposure light source 12 provided inside the case 11, and above the exposure light source 12. A reflection mirror 13 for reflecting the exposure light irradiated radially from the exposure light source 12 downwardly, a shutter 14 provided below the exposure light source 12, A prism 15 provided between the exposure light source 12 and the surrender 14 and refracting a part of the exposure light by the light transmission unit 60, the prism 15 and the light transmission unit 60 described above. And a condenser lens 16 interposed therebetween to focus the exposure light refracted by the prism 15 on the light transmission unit 60.

In the above-described embodiment, one prism 15 is installed and the exposure light is split and transmitted from the light transmitting unit 60 to each peripheral exposure unit 20. However, the prism 15 corresponds to each peripheral exposure unit 20. It is also possible to provide a plurality of prisms 15 corresponding to the light transmission unit 60.

The peripheral exposure portion 20 has a body 21 fixed to the support 52, as shown in FIGS. 3 to 4, and formed at one end of the body 21 and the light An inlet 23 to which the optical fiber 62 of the transmission unit 60 is connected, an optical path 22 connected to the inlet 23 and formed in the body 21 at a right angle, and the inlet At least one lens 52 is installed at regular intervals at the ends of the optical fiber 62 of the light transmission unit 60 connected to the 23 and the inclined portion is installed at a right angle of the optical path 22. The reflective mirror 26 which changes the traveling direction of the peripheral exposure light passing through the lens 25 at right angles, and the peripheral exposure light whose traveling direction is changed by the reflective mirror 26 are irradiated to the outside and the light path ( 22 between the end of the optical fiber 62 and the lens 25 of the light transmitting part 60 connected to the inlet 23 and the outlet 24 connected to the inlet 23. And a light shielding member 27 installed to be movable in the vicinity of the light and blocking a part of the ambient exposure light passing through the light path 22. The body 21 of the peripheral exposure portion 20 is fixed to the alignment unit 30 through the fixing plate 28.

As shown in FIG. 3 and FIG. 5, the alignment part 30 has a body 31 fixed to the support 52 and a c-shape from one side of the body 31. A light path formed in the body 31 in a V-shaped view in plan view and connected to the panel groove 38 through which the edge of the glass panel 8 passes and the panel groove 38. 35, a light emitting diode 32 which is provided at one end of the optical path 35, a shutter 33 which is provided at a predetermined interval from the light emitting diode 32, and the shutter ( A light emitting focus lens 34 provided at a predetermined interval at 33 and forming a focus of light passing through the shutter 33, an image pickup device 37 provided at the other end of the light path 35; The light receiving focus lens 36 is provided at a predetermined interval in the image pickup device 37.

It is preferable that a plurality of straight slits are formed in the shutter 33, and that the linear imaging device is used for the imaging device 36.

And as shown in Figures 6 to 7, unlike the above, the alignment portion 70 is formed in the c-shape viewed from the side and the body 71 is fixed to the support 52, and the body 71 It is also possible to include a light emitting diode (72) installed in the upper portion of the) and a four-segmented light-receiving diode (74) provided in the lower portion of the body 71 corresponding to the light emitting diode (72). Do.

The imaging device 37 and the light receiving diode 74 are connected to the control device of the panel moving means, and the result detected by the imaging device 37 and the light receiving diode 74 is fed back to the control device.

The support 52 is composed of a vertical member (52a) and a horizontal member (52b), the vertical member (52a) is fixed to the base frame (2), the horizontal member (52b) One peripheral exposure portion 20, the alignment portion 30, 70 is fixed, the horizontal member 52b is formed to adjust the length corresponding to the size of the glass panel (8).

Next, an operation process of the exposure apparatus of the present invention configured as described above will be described.

First, the photoresist-coated glass panel, which is loaded in the support member 44 in the stacking chamber 40, by the arm 42 of the robot mechanism 40 rotating and linearly moving by the control unit of the panel moving unit. When the 8 is taken out, the glass panel 8 drawn out by performing vacuum through the vacuum hole 45 formed in the supporting member 44 is fixed to the supporting member 44 by suction.

As the glass panel 8 adsorbed as described above moves the arm 42 of the robot mechanism 40 by the above-mentioned control device, a pair of supports installed at both sides of the stacking box 4 at a predetermined interval ( Passing through the panel groove 38 formed in the U-shape on the body 31 of the alignment portion 30 fixed to the horizontal member 52b of the 52. At this time, the light emitted from the light emitting diode 32 provided at one end of the optical path 35 of the alignment unit 30 passes through the slit formed in the shutter 33, and the focus is formed by the light emitting focus lens 34 to form a panel. The side surface of the glass panel 8 passing through the groove 38 is irradiated. The irradiated light is reflected from the side of the glass panel 8 to form a focal point in the light receiving focus lens 36 through the light path 35, and to be concentrated on the scratch element 37 provided at the other end of the light path 35. do. Here, if the glass panel 8 is rotated about the vertical axis (indicated by a dashed-dotted line in FIG. 5), the position of the light formed on the image pickup device 37 is out of a predetermined position (indicated by a dotted line in FIG. 5). This result is fed back to the control device of the panel moving means, and the glass panel 8 is rotated about the vertical axis by rotating the arm 42 of the robot mechanism 40 on which the support member 44 is installed. Will be corrected.

When the glass panel 8 is moved while the alignment unit 30 detects the rotation of the glass panel 8 about the vertical axis and corrects it by the panel moving unit, the pair of peripheries installed after the alignment unit 30. The exposure part 20 performs peripheral exposure to both edges of the glass panel 8. That is, the exposure light emitted from the exposure light source 12 of the exposure unit 10 proceeds in a predetermined direction by the reflection mirror 13, and part of the exposure light is refracted by the prism 15 to condense the lens 16. And is transmitted to the peripheral exposure unit 20 through the optical fiber 62 of the optical transmission unit 60. The exposure light transmitted to the peripheral exposure section 20 travels through the light path 22 formed in the peripheral exposure section 20, and the traveling direction is constantly adjusted while passing through the lens 25, and the reflection mirror 26 is provided. As a result, the traveling direction is changed at right angles so that the peripheral exposure to both edges of the glass panel 8 which proceeds through the alignment unit 30 through the outlet 24 of the optical path 22 is performed. At this time, the light blocking member 27 provided between the inlet 23 of the optical path 22 and the lens 25 is moved up and down to block a portion showing the spreadability of the edge of the exposure light passing through the optical path 22. The exposure light irradiated to the glass panel 8 can be made clear by making it make it. In addition, when the horizontal member 52b of the support 52 on which the peripheral exposure portion 20 is fixed is moved corresponding to the size of the glass panel 8, the peripheral exposure of the glass panel 8 having various sizes can be easily performed. have.

As described above, when the glass panel 8 is absorbed and fixed to the support member 44 of the panel transfer means and moved by the robot mechanism 40, the peripheral exposure of both edges in the peripheral exposure unit 20 is completed. The moving direction of the glass panel 8 is changed in order to perform peripheral exposure to the other opposite corners. That is, the glass panel 8 subjected to the peripheral exposure of both edges is placed on the four panel pedestals 54 arranged in a square shape on the base frame 2, and the vacuum hole formed in the supporting member 44 of the panel moving means ( When the vacuum suction force through the 45 is released, the glass panel 8 and the supporting member 44 are separated. Subsequently, the robot mechanism 40 rotates and linearly moves so that the moving direction of the supporting member 44 faces the exposure work table 50 by the control device of the panel moving means, and the end of the supporting member 44 is exposed. When the direction change is completed to face the work table 50, the support member 44 is adhered to the glass panel 8 mounted on the panel support 54 and sucked and fixed while being vacuumed through the vacuum hole 45.

As the glass panel 8 fixed to the supporting member 44 whose movement direction is changed as described above, the robot mechanism 40 of the panel moving means is operated by the control device at both sides at a predetermined distance from the exposure work table 50. Passes through the panel groove 38 formed in the pair of alignment portions 30 fixed to the horizontal member 52b of the installed support 52.

The glass panel 8 is a pair of alignment portions 30 and the peripheral exposure portion 20 fixed to the horizontal member 52b of the support 52 installed on both sides at a predetermined distance from the exposure work table 50. In the same manner as described above, peripheral exposure of the other opposite corners that is not exposed is performed.

As described above, the glass panel 8 on which the peripheral edges of the four corners are all exposed is placed on the exposure position of the exposure work bench 50 by panel moving means.

When the glass panel 8 is placed on the exposure work table 50, the shutter 14 of the exposure unit 10 opens, and the exposure light emitted from the exposure light source 12 receives the mask 17 having the circuit pattern and the projection optical system. Through 18, the glass panel 8 of the exposure work bench 50 is exposed in a circuit pattern.

When the exposure to the glass panel 8 is completed in the above-described circuit pattern, the panel moving means rests the glass panel 8 again in the reverse order as it has been. At this time, it is more effective if the peripheral exposure of the four corners of the glass panel 8 is further performed.

In addition, when the storage boxes 4 and 6 are installed at both sides, the storage box located on the opposite side to the storage box 4 where the glass panel 8 which has been exposed on the exposure work bench 50 is first drawn out by the panel moving means ( 6) placed in. Also in this case, the support 52 is provided on both sides with a predetermined distance from the storage box 6, and the alignment part 30 and the peripheral exposure part 20 are fixed to the horizontal member 52b of the support 52 again, and again In addition, it is more effective to allow peripheral exposure.

In the case where the alignment unit 70 is composed of the U-shaped body 71, the light emitting diode 72, and the light-receiving diode 74 divided into four, the glass panel 8 is the U-shaped of the alignment unit 70. Whether the glass panel 8 is rotated about the vertical axis depends on how light emitted from the light emitting diode 72 is sensed by the quadrant light-receiving diode 74 as it passes through the body 71. It turns out. That is, the light irradiated from the light emitting diode 72 reaches the light emitting diode 72 partially reflected by the edges of the glass panel 8 and the remaining light is divided into four parts. Whether the signal values of the light detected in the quadrant 74a and the fourth quadrant 74b coincide with each other, and whether the signal values of the light detected in the second quadrant 74b and the third quadrant 74c coincide with each other. By this, it is determined whether the glass panel is rotated about the vertical axis (when the solid line in FIG. 6 is the correct position and the solid line is the rotated position), and the result is fed back to the controller of the panel moving means. Position correction of the glass panel 8 is made.

[Effects of the Invention]

Using the exposure apparatus of the present invention constructed and operated as described above, the peripheral exposure is performed when the glass panel is withdrawn from the stacker and transported to the exposure bench, so that the peripheral exposure of the four corners can be performed, Since the glass panels are aligned before the exposure, the structure of the exposure apparatus is simplified and the exposure time is reduced.

In addition, since a part of the exposure source for the circuit pattern is used as the exposure source for the peripheral exposure, there is no need for a separate peripheral exposure source, and the peripheral exposure can be performed twice before and after the exposure for the circuit pattern, so that the surroundings more clearly. Exposure is performed.

In addition, since the light shielding member is used to complement the spreadability of the peripheral exposure source, the boundary line between the peripheral exposure area and the non-exposure area is made more clearly.

Moreover, when the optical fiber is used in the light transmitting unit, the position of the peripheral exposure area can be freely moved, and thus it can be used in correspondence with glass panels of various sizes.

Claims (11)

A base frame, a stacking box provided on one side of the base frame, a peripheral exposure unit installed in plural in pairs on the base frame, an alignment unit installed in combination with the peripheral exposure unit, and A plurality of support bases fixed to one peripheral exposure unit and an alignment unit and installed on the base frame, an exposure work bench provided on the base frame, an exposure unit provided on the exposure work bench, and the exposure unit and exposure A projection optical system provided between the worktables and transmitting the light of the exposure unit to the exposure workbench, a mask provided between the exposure unit and the projection optical system and having a predetermined pattern formed thereon, and connected to the exposure unit and the peripheral exposure unit A light transmitting unit for transmitting exposure light, a plurality of panel pedestals provided on the base frame, and the above loading box And a panel conveying means for extracting the glass panel from the apparatus and moving the exposure table, wherein the panel conveying means comprises a plurality of arms capable of rotation and linear movement, and the last arm has a plurality of vacuum holes to adsorb and support the glass panel. And a control device for controlling rotation and linear movement of each of the plurality of arms of the robot device, and the alignment mechanism is fixed to the support and is provided with a light path. A light emitting means installed at one end of the light path, a light emitting focus lens installed at a predetermined distance from the light emitting means, and configured to form a focus of light emitted from the light emitting means; An image pickup device provided at the other end of the optical path and a light receiving candle provided at predetermined intervals in the image pickup device. The exposure apparatus including the lens. 2. An exposure apparatus according to claim 1, further comprising another stacker on the opposite side of the stacker provided on one side of the base frame. The exposure apparatus according to claim 1 or 2, wherein the peripheral exposure portion and the alignment portion are each provided in pairs at regular intervals in the stacking tray and the exposure work bench. The exposure apparatus according to claim 1 or 2, wherein the light transmitting unit uses a plurality of optical fibers. The exposure apparatus according to claim 1 or 2, wherein the light transmitting unit uses an optical transmission system made of a mirror, a lens, or the like. The said exposure part is a case, the exposure light source provided in the said case, the reflection mirror provided in the upper part of the said exposure light source, and having a parabolic cross section, The said exposure light source of Claim 1 or 2 A shutter installed below, at least one prism provided between the exposure light source and the shutter and refracting a portion of the exposure light with the light transmitting portion, and between the prism and the light transmitting portion and refracted at the prism. An exposure apparatus comprising a condenser lens for focusing the exposed exposure light on the light transmitting portion. According to claim 1 or 2, wherein the peripheral exposure portion is fixed to the support, the inlet is formed at one end of the body and the light transmission is connected to the inlet, the inlet is connected to the right angle A light path formed in the body and at least one lens installed at a predetermined distance from an end portion of the light transmission unit connected to the inlet, and the lens is inclined at a right angled portion of the light path. A reflection mirror for changing the traveling direction of the ambient exposure light passing through the lens at a right angle, and a part of the ambient exposure light passing through the light path and moving up and down between the optical fiber end portion and the lens connected to the inlet; Exposure apparatus comprising a light blocking member for blocking the. According to claim 1 or 2, wherein the light emitting head of the alignment unit is made of a light emitting diode, and the light emitting diode is irradiated from the light emitting diode between the light emitting focusing lens at a predetermined interval from the light emitting means. An exposure apparatus for installing a shutter that passes light in a constant direction. The exposure apparatus according to claim 8, wherein a plurality of straight slits are formed in the shutter, and the image pickup device is a linear image pickup device. According to claim 1 or 2, wherein the alignment portion is fixed to the support, the light emitting diode is installed on the upper portion of the body, and the lower portion of the body corresponding to the light emitting diode is installed Exposure apparatus comprising a four-segmented photodiode. According to claim 1 or 2, wherein the support is composed of a vertical member and a horizontal member, the vertical member is fixed to the base frame, the horizontal member is fixed to the peripheral exposure portion and the alignment portion And an exposure apparatus configured to adjust a length corresponding to the size of the glass panel.