KR0163091B1 - 노광장치 - Google Patents
노광장치 Download PDFInfo
- Publication number
- KR0163091B1 KR0163091B1 KR1019950004993A KR19950004993A KR0163091B1 KR 0163091 B1 KR0163091 B1 KR 0163091B1 KR 1019950004993 A KR1019950004993 A KR 1019950004993A KR 19950004993 A KR19950004993 A KR 19950004993A KR 0163091 B1 KR0163091 B1 KR 0163091B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- glass plate
- exposure
- light source
- peripheral
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
- G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (2)
- 광원으로부터 광을 집속하여 셔터를 통하여 회로 패턴이 형성되어 있는 마스크를 통과하고, 상기 마스크를 통과한 광이 포토레지스터가 도포되어 있는 글라스판을 노광하는 노광장치에 있어서, 광원(1)으로부터 일부의 광을 인출하여 집속하고, 상기 집속되어진 광을 소정의 위치까지 이동시켜 글라스판(11)의 주변부에 결상하는 다수의 주변부 노광수단과, 상기 주변부 노광수단으로 글라스판(11)을 노광하기 위하여 별도의 구동원으로 구동되며 3축 이상으로 이동 가능한 이송수단으로 이루어지며, 상기 주변부 노광수단은 광원(1)으로부터 광을 집속하여 경로를 바꾸어주는 1개이상의 집속부재와, 상기 집속부재를 통과한 광을 모아주는 집광렌즈(25)와, 상기 집광렌즈(26)와 일측이 연결되며 광을 소정의 위치까지 전달하는 광섬유(27)와, 상기 광섬유(27)의 다른 일측에 연결되며 이를 통과한 광을 반사하는 조명계(29)로 이루어지고, 상기 이송수단은 받침대에 고정되며 상, 하 및 회전운동을 하는 엑츄에이터(16)와, 상가 엑츄에이터(18)의 상단에 고정되며 글라스판(11)을 이동하기 위한 핸드(19)로 이루어지는 것을 특징으로 하는 노광장치.
- 제1항에 있어서, 상기 집속부재는 광원의 일측에 설치되며 프리즘(23)으로이루어지는 것을 특징으로 하는 노광장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950004993A KR0163091B1 (ko) | 1995-03-10 | 1995-03-10 | 노광장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950004993A KR0163091B1 (ko) | 1995-03-10 | 1995-03-10 | 노광장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960035762A KR960035762A (ko) | 1996-10-24 |
KR0163091B1 true KR0163091B1 (ko) | 1999-02-01 |
Family
ID=19409595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950004993A KR0163091B1 (ko) | 1995-03-10 | 1995-03-10 | 노광장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0163091B1 (ko) |
-
1995
- 1995-03-10 KR KR1019950004993A patent/KR0163091B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR960035762A (ko) | 1996-10-24 |
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