JPWO2020195324A1 - - Google Patents
Info
- Publication number
- JPWO2020195324A1 JPWO2020195324A1 JP2021508249A JP2021508249A JPWO2020195324A1 JP WO2020195324 A1 JPWO2020195324 A1 JP WO2020195324A1 JP 2021508249 A JP2021508249 A JP 2021508249A JP 2021508249 A JP2021508249 A JP 2021508249A JP WO2020195324 A1 JPWO2020195324 A1 JP WO2020195324A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
- H10F10/165—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
- H10F10/166—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019062652 | 2019-03-28 | ||
JP2019062652 | 2019-03-28 | ||
PCT/JP2020/006029 WO2020195324A1 (en) | 2019-03-28 | 2020-02-17 | Solar cell manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020195324A1 true JPWO2020195324A1 (en) | 2020-10-01 |
JP7190555B2 JP7190555B2 (en) | 2022-12-15 |
Family
ID=72608804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021508249A Active JP7190555B2 (en) | 2019-03-28 | 2020-02-17 | Solar cell manufacturing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7190555B2 (en) |
CN (1) | CN113632241B (en) |
WO (1) | WO2020195324A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7597548B2 (en) * | 2020-10-13 | 2024-12-10 | 株式会社カネカ | Solar Cell |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233484A (en) * | 1998-02-12 | 1999-08-27 | Sanyo Electric Co Ltd | Manufacture of rugged substrate |
JP2006286821A (en) * | 2005-03-31 | 2006-10-19 | Sanyo Electric Co Ltd | Etching method of crystal system semiconductor device |
CN201473591U (en) * | 2009-07-22 | 2010-05-19 | 吴东升 | Etch cleaning tank |
JP2011077064A (en) * | 2009-09-29 | 2011-04-14 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
JP2012178500A (en) * | 2011-02-28 | 2012-09-13 | Mitsubishi Electric Corp | Wet etching method and wet etching apparatus |
JP2014075526A (en) * | 2012-10-05 | 2014-04-24 | Sharp Corp | Photoelectric conversion element and photoelectric conversion element manufacturing method |
CN104037257A (en) * | 2013-03-08 | 2014-09-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Solar energy battery and manufacture method thereof, and single-surface polishing device |
CN203846108U (en) * | 2014-03-26 | 2014-09-24 | 上饶光电高科技有限公司 | Device for solving circular bubbling of etching groove of wet process etching machine |
JP2018163999A (en) * | 2017-03-27 | 2018-10-18 | 国立大学法人福島大学 | Solar cell and method for manufacturing the same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015121636A1 (en) * | 2015-12-11 | 2017-06-14 | Nexwafe Gmbh | Device and method for one-sided etching of a semiconductor layer |
-
2020
- 2020-02-17 WO PCT/JP2020/006029 patent/WO2020195324A1/en active Application Filing
- 2020-02-17 JP JP2021508249A patent/JP7190555B2/en active Active
- 2020-02-17 CN CN202080023700.6A patent/CN113632241B/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233484A (en) * | 1998-02-12 | 1999-08-27 | Sanyo Electric Co Ltd | Manufacture of rugged substrate |
JP2006286821A (en) * | 2005-03-31 | 2006-10-19 | Sanyo Electric Co Ltd | Etching method of crystal system semiconductor device |
CN201473591U (en) * | 2009-07-22 | 2010-05-19 | 吴东升 | Etch cleaning tank |
JP2011077064A (en) * | 2009-09-29 | 2011-04-14 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
JP2012178500A (en) * | 2011-02-28 | 2012-09-13 | Mitsubishi Electric Corp | Wet etching method and wet etching apparatus |
JP2014075526A (en) * | 2012-10-05 | 2014-04-24 | Sharp Corp | Photoelectric conversion element and photoelectric conversion element manufacturing method |
CN104037257A (en) * | 2013-03-08 | 2014-09-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Solar energy battery and manufacture method thereof, and single-surface polishing device |
CN203846108U (en) * | 2014-03-26 | 2014-09-24 | 上饶光电高科技有限公司 | Device for solving circular bubbling of etching groove of wet process etching machine |
JP2018163999A (en) * | 2017-03-27 | 2018-10-18 | 国立大学法人福島大学 | Solar cell and method for manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
CN113632241A (en) | 2021-11-09 |
JP7190555B2 (en) | 2022-12-15 |
CN113632241B (en) | 2024-03-15 |
WO2020195324A1 (en) | 2020-10-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210916 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220531 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220729 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20221115 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221205 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7190555 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |