JPS6491026A - Optical lighting apparatus - Google Patents
Optical lighting apparatusInfo
- Publication number
- JPS6491026A JPS6491026A JP62248523A JP24852387A JPS6491026A JP S6491026 A JPS6491026 A JP S6491026A JP 62248523 A JP62248523 A JP 62248523A JP 24852387 A JP24852387 A JP 24852387A JP S6491026 A JPS6491026 A JP S6491026A
- Authority
- JP
- Japan
- Prior art keywords
- luminous flux
- transmitting
- optical path
- amount
- lighting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
PURPOSE:To ensure attenuation of the amount of lighting luminous flux, by combining first and second transmitting and reflecting members, which take out the lighting luminous flux from a main optical path and return the luminous flux, and constituting an attenuating part for measurement. CONSTITUTION:Luminous flux for exposure LB1 from a light source 2 is taken out of a main optical path to an external optical path with a first transmitting and reflecting member 21A. The amount of the taken-out luminous flux LB1a is attenuated and second attenuated luminous flux LB3 is returned with second transmitting and reflecting members 21B-21D. An attenuating part for measurement 3 is constituted with these parts. In a measuring mode, the transmitting and reflecting members 21A-21D in four stages are provided in the optical path. Thus the amount of light is attenuated to a large extent, and the lighting luminous flux for measurement LB3 can be obtained. The illuminace distribution and the amount of irradiation of the lighting of a wafer 11 can be measured highly accurately.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62248523A JPH07104203B2 (en) | 1987-10-01 | 1987-10-01 | Lighting optics |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62248523A JPH07104203B2 (en) | 1987-10-01 | 1987-10-01 | Lighting optics |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6491026A true JPS6491026A (en) | 1989-04-10 |
JPH07104203B2 JPH07104203B2 (en) | 1995-11-13 |
Family
ID=17179451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62248523A Expired - Fee Related JPH07104203B2 (en) | 1987-10-01 | 1987-10-01 | Lighting optics |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07104203B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008534936A (en) * | 2005-04-01 | 2008-08-28 | トルンプ・ヴェルクツォイクマシーネン・ゲーエム・ベーハー・ウント・コンパニ・カーゲー | Optical element and method for recording beam parameters comprising a temperature sensor provided in the form of a pixel matrix |
JP2012084919A (en) * | 2006-10-17 | 2012-04-26 | Asml Netherlands Bv | Using of interferometer as high speed variable attenuator |
JP2015064525A (en) * | 2013-09-26 | 2015-04-09 | 株式会社Screenホールディングス | Drawing device |
WO2020246200A1 (en) * | 2019-06-07 | 2020-12-10 | インスペック株式会社 | Calibration system and drawing device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3095279B1 (en) * | 2019-04-18 | 2021-05-21 | Commissariat Energie Atomique | REFLECTOR DEVICE |
-
1987
- 1987-10-01 JP JP62248523A patent/JPH07104203B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008534936A (en) * | 2005-04-01 | 2008-08-28 | トルンプ・ヴェルクツォイクマシーネン・ゲーエム・ベーハー・ウント・コンパニ・カーゲー | Optical element and method for recording beam parameters comprising a temperature sensor provided in the form of a pixel matrix |
JP2012084919A (en) * | 2006-10-17 | 2012-04-26 | Asml Netherlands Bv | Using of interferometer as high speed variable attenuator |
JP2015064525A (en) * | 2013-09-26 | 2015-04-09 | 株式会社Screenホールディングス | Drawing device |
WO2020246200A1 (en) * | 2019-06-07 | 2020-12-10 | インスペック株式会社 | Calibration system and drawing device |
CN113906349A (en) * | 2019-06-07 | 2022-01-07 | 英视股份有限公司 | Calibration system and drawing device |
Also Published As
Publication number | Publication date |
---|---|
JPH07104203B2 (en) | 1995-11-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |