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JPS6489328A - Aligner - Google Patents

Aligner

Info

Publication number
JPS6489328A
JPS6489328A JP62245208A JP24520887A JPS6489328A JP S6489328 A JPS6489328 A JP S6489328A JP 62245208 A JP62245208 A JP 62245208A JP 24520887 A JP24520887 A JP 24520887A JP S6489328 A JPS6489328 A JP S6489328A
Authority
JP
Japan
Prior art keywords
aligning
mask
incident
light
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62245208A
Other languages
Japanese (ja)
Inventor
Noboru Nomura
Kazuhiro Yamashita
Keisuke Koga
Masaki Suzuki
Yuichiro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62245208A priority Critical patent/JPS6489328A/en
Publication of JPS6489328A publication Critical patent/JPS6489328A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To disposing an aligning optical system without shielding an exposure optical light and to accurately align an aligning optical system by introducing a luminous flux obliquely to a mask and a substrate and bending an optical path by a reflecting mirror. CONSTITUTION:An X-lay 1 irradiated from the window of an X-ray source is radiated to a mask 5 and a wafer 6, and a region to be irradiated with the X-ray 1 is set by an aligning optical system. The light from the aligning light source 11 of this optical system is incident to a reference mask 13 provided on a reference grating 14, and the incident light beam through the mask 13 is incident through a Fourier transforming lens having a first lens system 15, a space filter 16 and a second lens system 17. The optical path of the radiated light from the system 17 is bent by a reflecting mirror 12, and incident obliquely to an aligning grating 18 on the mask and an aligning grating 19 on a substrate. A pattern on the mask is accurately aligned with a pattern on the substrate, and an aligning signal during exposure is observed by a photodetector 20.
JP62245208A 1987-09-29 1987-09-29 Aligner Pending JPS6489328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62245208A JPS6489328A (en) 1987-09-29 1987-09-29 Aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62245208A JPS6489328A (en) 1987-09-29 1987-09-29 Aligner

Publications (1)

Publication Number Publication Date
JPS6489328A true JPS6489328A (en) 1989-04-03

Family

ID=17130233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62245208A Pending JPS6489328A (en) 1987-09-29 1987-09-29 Aligner

Country Status (1)

Country Link
JP (1) JPS6489328A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028374A1 (en) * 1993-06-01 1994-12-08 Massachusetts Institute Of Technology On-axis interferometric alignment
WO2003094212A1 (en) * 2002-05-01 2003-11-13 Sony Corporation Alignment system, alignment method and production method for semiconductor device
JP2014119446A (en) * 2012-12-17 2014-06-30 Mitsutoyo Corp Optical encoder illumination section

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028374A1 (en) * 1993-06-01 1994-12-08 Massachusetts Institute Of Technology On-axis interferometric alignment
US5414514A (en) * 1993-06-01 1995-05-09 Massachusetts Institute Of Technology On-axis interferometric alignment of plates using the spatial phase of interference patterns
WO2003094212A1 (en) * 2002-05-01 2003-11-13 Sony Corporation Alignment system, alignment method and production method for semiconductor device
JP2014119446A (en) * 2012-12-17 2014-06-30 Mitsutoyo Corp Optical encoder illumination section
JP2014119445A (en) * 2012-12-17 2014-06-30 Mitsutoyo Corp Optical encoder illumination section

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