JPS648674A - Vertical mos-fet - Google Patents
Vertical mos-fetInfo
- Publication number
- JPS648674A JPS648674A JP62164767A JP16476787A JPS648674A JP S648674 A JPS648674 A JP S648674A JP 62164767 A JP62164767 A JP 62164767A JP 16476787 A JP16476787 A JP 16476787A JP S648674 A JPS648674 A JP S648674A
- Authority
- JP
- Japan
- Prior art keywords
- type
- region
- series
- regions
- zener diodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 abstract 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 230000003071 parasitic effect Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
- H10D84/141—VDMOS having built-in components
- H10D84/148—VDMOS having built-in components the built-in components being breakdown diodes, e.g. Zener diodes
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To provide a DMOS FET having a protective diode which does not generate a parasitic thyristor operation by inserting two Zener diodes made of first and second conductivity type regions and connected in anti-series between a gate and a source. CONSTITUTION:A P-type region 40 and a P-type first conductivity type region 80 are formed on an N-type substrate 30 on which an N-type epitaxial layer 20 is laminated on an N<+> type substrate 10. An N<+> type region 50 is formed on the region 40, two N-type second conductivity type regions 82 are similarly formed on the region 80, and a P<++> type region 83 is formed therebetween. The regions 80, 82 and 83 become two Zener diodes connected in anti-series. Since the two Zener diodes connected in anti-series and a drain D are isolated by a P-N junction, when a surge voltage is applied to a gate, a surge energy is absorbed by the breakdown of the diodes, thereby eliminating a thyristor operation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62164767A JPS648674A (en) | 1987-06-30 | 1987-06-30 | Vertical mos-fet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62164767A JPS648674A (en) | 1987-06-30 | 1987-06-30 | Vertical mos-fet |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS648674A true JPS648674A (en) | 1989-01-12 |
Family
ID=15799542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62164767A Pending JPS648674A (en) | 1987-06-30 | 1987-06-30 | Vertical mos-fet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS648674A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03203380A (en) * | 1989-12-29 | 1991-09-05 | Nec Corp | Protecting device for vertical type mos field effect transistor |
JPH03236280A (en) * | 1990-02-14 | 1991-10-22 | Hitachi Ltd | Semiconductor device |
US5144926A (en) * | 1990-08-29 | 1992-09-08 | Zexel Corporation | Fuel injection pump of distribution type |
US20150008450A1 (en) * | 2013-07-04 | 2015-01-08 | Mitsubishi Electric Corporation | Wide band gap semiconductor device |
EP3979331A1 (en) * | 2020-09-30 | 2022-04-06 | Infineon Technologies AG | Silicon carbide device with transistor cell and clamp region |
EP3979330A1 (en) * | 2020-09-30 | 2022-04-06 | Infineon Technologies AG | Silicon carbide device with transistor cell and clamp regions in a well region |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54112179A (en) * | 1978-02-23 | 1979-09-01 | Sony Corp | Semiconductor device |
-
1987
- 1987-06-30 JP JP62164767A patent/JPS648674A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54112179A (en) * | 1978-02-23 | 1979-09-01 | Sony Corp | Semiconductor device |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03203380A (en) * | 1989-12-29 | 1991-09-05 | Nec Corp | Protecting device for vertical type mos field effect transistor |
JPH03236280A (en) * | 1990-02-14 | 1991-10-22 | Hitachi Ltd | Semiconductor device |
US5144926A (en) * | 1990-08-29 | 1992-09-08 | Zexel Corporation | Fuel injection pump of distribution type |
US20150008450A1 (en) * | 2013-07-04 | 2015-01-08 | Mitsubishi Electric Corporation | Wide band gap semiconductor device |
CN104282686A (en) * | 2013-07-04 | 2015-01-14 | 三菱电机株式会社 | Wide band gap semiconductor device |
JP2015015329A (en) * | 2013-07-04 | 2015-01-22 | 三菱電機株式会社 | Wide gap semiconductor device |
US9472543B2 (en) * | 2013-07-04 | 2016-10-18 | Mitsubishi Electric Corporation | Wide band gap semiconductor device |
DE102014211903B4 (en) * | 2013-07-04 | 2017-08-10 | Mitsubishi Electric Corporation | Wide bandgap semiconductor device |
EP3979331A1 (en) * | 2020-09-30 | 2022-04-06 | Infineon Technologies AG | Silicon carbide device with transistor cell and clamp region |
EP3979330A1 (en) * | 2020-09-30 | 2022-04-06 | Infineon Technologies AG | Silicon carbide device with transistor cell and clamp regions in a well region |
US11876133B2 (en) | 2020-09-30 | 2024-01-16 | Infineon Technologies Ag | Silicon carbide device with transistor cell and clamp region |
US12057473B2 (en) | 2020-09-30 | 2024-08-06 | Infineon Technologies Ag | Silicon carbide device with transistor cell and clamp regions in a well region |
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