JPS6483699A - Method for electropolishing inner surface of relatively small vessel with coiled electrode - Google Patents
Method for electropolishing inner surface of relatively small vessel with coiled electrodeInfo
- Publication number
- JPS6483699A JPS6483699A JP24325987A JP24325987A JPS6483699A JP S6483699 A JPS6483699 A JP S6483699A JP 24325987 A JP24325987 A JP 24325987A JP 24325987 A JP24325987 A JP 24325987A JP S6483699 A JPS6483699 A JP S6483699A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- uniformly
- obstacles
- electrode
- coiled electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003792 electrolyte Substances 0.000 abstract 2
- 230000004907 flux Effects 0.000 abstract 2
- 239000003989 dielectric material Substances 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
PURPOSE:To uniformly polish the whole inner surface of a vessel at a time without using a plate electrode even when there are obstacles, gaps, etc., in the vessel by arranging a coiled electrode as a cathode in the small-sized vessel to be used as the anode, filling the vessel with an electrolyte, and supplying an electric current. CONSTITUTION:The coiled electrode 17 consisting of a dielectric material is inserted in the tube 18 made of an electrical insulating material and having plural wetted holes 20. The assembly is inserted as the cathode into a small- sized cylindrical vessel 1 into which the hand is hardly inserted through the nozzle 13 of the vessel 1. An electrolyte is charged in the vessel 1, and an electric current is supplied with the vessel 1 as the anode. A magnetic flux is generated in the direction orthogonal to each cross section of the electrode 17, the magnetic flux is uniformly generated on all parts of the inner surface 3 of the vessel 1, rotary unit 9, steam coil 10, etc., and the ion is uniformly eluted from all parts of the inner surface 3 of the vessel 1 and surface of the obstacles. Accordingly, the inner surface 3 of the vessel 1 and the whole surface of the obstacles can be uniformly polished irrespective of their shapes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24325987A JPS6483699A (en) | 1987-09-28 | 1987-09-28 | Method for electropolishing inner surface of relatively small vessel with coiled electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24325987A JPS6483699A (en) | 1987-09-28 | 1987-09-28 | Method for electropolishing inner surface of relatively small vessel with coiled electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6483699A true JPS6483699A (en) | 1989-03-29 |
| JPH0370000B2 JPH0370000B2 (en) | 1991-11-06 |
Family
ID=17101211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24325987A Granted JPS6483699A (en) | 1987-09-28 | 1987-09-28 | Method for electropolishing inner surface of relatively small vessel with coiled electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6483699A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8358549B2 (en) | 2009-06-04 | 2013-01-22 | Renesas Electronics Corporation | Semiconductor memory device, memory test method and computer program for designing program of semiconductor memory device |
| JP2020055723A (en) * | 2018-10-04 | 2020-04-09 | 株式会社Ｎｓｃ | Graphite refining apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5835660U (en) * | 1981-09-01 | 1983-03-08 | 本田技研工業株式会社 | vaporizer |
| JPS6145171U (en) * | 1984-08-27 | 1986-03-25 | 富士ゼロックス株式会社 | Transfer type thermal recording device |
-
1987
- 1987-09-28 JP JP24325987A patent/JPS6483699A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5835660U (en) * | 1981-09-01 | 1983-03-08 | 本田技研工業株式会社 | vaporizer |
| JPS6145171U (en) * | 1984-08-27 | 1986-03-25 | 富士ゼロックス株式会社 | Transfer type thermal recording device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8358549B2 (en) | 2009-06-04 | 2013-01-22 | Renesas Electronics Corporation | Semiconductor memory device, memory test method and computer program for designing program of semiconductor memory device |
| JP2020055723A (en) * | 2018-10-04 | 2020-04-09 | 株式会社Ｎｓｃ | Graphite refining apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0370000B2 (en) | 1991-11-06 |
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