JPS6474717A - Formation of thin film - Google Patents
Formation of thin filmInfo
- Publication number
- JPS6474717A JPS6474717A JP23281887A JP23281887A JPS6474717A JP S6474717 A JPS6474717 A JP S6474717A JP 23281887 A JP23281887 A JP 23281887A JP 23281887 A JP23281887 A JP 23281887A JP S6474717 A JPS6474717 A JP S6474717A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- window
- reaction chamber
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 9
- 239000010408 film Substances 0.000 abstract 8
- 230000005540 biological transmission Effects 0.000 abstract 3
- 230000005855 radiation Effects 0.000 abstract 1
Abstract
PURPOSE:To prevent coming-off of a film stuck to a window and generation of inferior products so as to reduce time for maintaining a device, by using a window for leading light into a reaction chamber in order to hold temperature of the window unchanged at the time of forming a film and at the time of taking out a substrate after forming the film so as to form a thin film. CONSTITUTION:A substrate 1 for forming a film is placed on a substrate holder 2 so as to control temperature by means of a substrate heater. The substrate 1 and the substrate holder 2 are placed inside a reaction chamber 3. Formation of the film is so performed by emitting ultraviolet rays by an ultraviolet ray lamp for leading light into the reaction chamber 3 through a transmission window 6 as to irradiate gas flowing inside the reaction chamber 3. The film 9 stuck to the surface on the side of the reaction chamber of the ultraviolet ray transmission window 6 changes its temperature in company with switching-on and switching-off of the substrate heater 4 and the ultraviolet-ray lamp 5. In order to check its change, the window 6 is heated with an infrared ray lamp 8 so as to control for always holding fixed temperature. A shutter 7 prevents the substrate 1 from being heated by radiation heat from the ultraviolet ray transmission window 6 at the time of keeping the substrate temperature low. Thereby, several times of film formation and continued carrying-in and carrying- out can be performed without generating coming-off of the film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23281887A JPS6474717A (en) | 1987-09-17 | 1987-09-17 | Formation of thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23281887A JPS6474717A (en) | 1987-09-17 | 1987-09-17 | Formation of thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6474717A true JPS6474717A (en) | 1989-03-20 |
Family
ID=16945258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23281887A Pending JPS6474717A (en) | 1987-09-17 | 1987-09-17 | Formation of thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6474717A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005005258A (en) * | 2003-05-19 | 2005-01-06 | Ushio Inc | Excimer lamp light emitting device |
EP1158574A4 (en) * | 1999-10-07 | 2009-05-27 | Ushio Electric Inc | Ultraviolet radiation producing apparatus |
US8398813B2 (en) | 1999-08-13 | 2013-03-19 | Tokyo Electron Limited | Processing apparatus and processing method |
CN107632501A (en) * | 2017-09-21 | 2018-01-26 | 武汉华星光电技术有限公司 | A kind of apparatus for baking and baking method |
WO2019059062A1 (en) | 2017-09-21 | 2019-03-28 | 株式会社フジクラ | Antenna device |
-
1987
- 1987-09-17 JP JP23281887A patent/JPS6474717A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8398813B2 (en) | 1999-08-13 | 2013-03-19 | Tokyo Electron Limited | Processing apparatus and processing method |
EP1158574A4 (en) * | 1999-10-07 | 2009-05-27 | Ushio Electric Inc | Ultraviolet radiation producing apparatus |
JP2005005258A (en) * | 2003-05-19 | 2005-01-06 | Ushio Inc | Excimer lamp light emitting device |
CN107632501A (en) * | 2017-09-21 | 2018-01-26 | 武汉华星光电技术有限公司 | A kind of apparatus for baking and baking method |
WO2019059062A1 (en) | 2017-09-21 | 2019-03-28 | 株式会社フジクラ | Antenna device |
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