[go: up one dir, main page]

JPS6471047A - Ion beam parallel scanning system - Google Patents

Ion beam parallel scanning system

Info

Publication number
JPS6471047A
JPS6471047A JP62227234A JP22723487A JPS6471047A JP S6471047 A JPS6471047 A JP S6471047A JP 62227234 A JP62227234 A JP 62227234A JP 22723487 A JP22723487 A JP 22723487A JP S6471047 A JPS6471047 A JP S6471047A
Authority
JP
Japan
Prior art keywords
pair
deflecting member
electrodes
ion beams
electromagnets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62227234A
Other languages
Japanese (ja)
Inventor
Hideo Tsuboi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP62227234A priority Critical patent/JPS6471047A/en
Publication of JPS6471047A publication Critical patent/JPS6471047A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make it possible to reduce the length of all the system, by obtaining ion beams parallel to the third direction vertical to the first and the second directions by using the first deflecting member which consists of a pair of first electrodes and a pair of first magnetic poles, and the second deflecting member which consists of a pair of second electrodes and a pair of second magnetic poles. CONSTITUTION:The first deflecting member is composed of a pair of electrodes 21a and 21b, and a pair of electromagnets 22a and 22b, and ion beams (i) are deflected in the (x) direction and the (y) direction at a time. At the lower stream side of the first deflecting member composed in such a way, the second deflecting member composed of a pair of electrodes 23a and 23b, and a pair of electromagnets 24a and 24b furnished contacting to the rear of the electrodes, is arranged. The ion beams (i) are deflected in the (x) direction also by the electrodes 23a and 23b, but at the same angle in the reverse direction to the deflection by the first deflecting member. And the ion beams (i) are deflected in the (y) direction by the magnetic fields of the electromagnets 24a and 24b at the same angle and in the reverse direction to the deflection by the first deflecting member. Consequently, the ion beams (i) led from the second deflecting member are made parallel in the (z) direction, and injected to a wafer 3.
JP62227234A 1987-09-10 1987-09-10 Ion beam parallel scanning system Pending JPS6471047A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62227234A JPS6471047A (en) 1987-09-10 1987-09-10 Ion beam parallel scanning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62227234A JPS6471047A (en) 1987-09-10 1987-09-10 Ion beam parallel scanning system

Publications (1)

Publication Number Publication Date
JPS6471047A true JPS6471047A (en) 1989-03-16

Family

ID=16857614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62227234A Pending JPS6471047A (en) 1987-09-10 1987-09-10 Ion beam parallel scanning system

Country Status (1)

Country Link
JP (1) JPS6471047A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61292843A (en) * 1985-06-20 1986-12-23 Toshiba Corp Ion implanting device
JPS6212041A (en) * 1985-07-09 1987-01-21 Nec Kyushu Ltd Parallel scanner
JPS62276738A (en) * 1986-05-26 1987-12-01 Fuji Electric Co Ltd Ion beam device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61292843A (en) * 1985-06-20 1986-12-23 Toshiba Corp Ion implanting device
JPS6212041A (en) * 1985-07-09 1987-01-21 Nec Kyushu Ltd Parallel scanner
JPS62276738A (en) * 1986-05-26 1987-12-01 Fuji Electric Co Ltd Ion beam device

Similar Documents

Publication Publication Date Title
JPS63226899A (en) superconducting wiggler
DE3786117D1 (en) SPRAYING CATODE ACCORDING TO THE MAGNETRON PRINCIPLE.
ATE227884T1 (en) ION BEAM SCANNING METHOD AND APPARATUS
KR890008899A (en) Electron gun for color water pipe
EP0389398A3 (en) Tri-deflection electron beam system
SE7907010L (en) DEFENDING YOUNG WITH A MAGNET TO REDUCE CONVERGENCE SENSITIVITY
DK508887D0 (en) IMPROVED COLOR DISPLAY SYSTEMS AND CATHODS
ATE81566T1 (en) FAST PARALLEL SCANNING WITH ION BEAM WITH A BIPOLAR MAGNETIC LENS WITH NON-UNIFORM FIELD.
JPS57182956A (en) Ion-implantation device
KR890008897A (en) Color indicator
ATE110188T1 (en) IMAGE DISPLAY ARRANGEMENT.
JPS6471047A (en) Ion beam parallel scanning system
KR890010994A (en) A water gun
WO2002052609A3 (en) Compact beamline and ion implanter system using same
HK63387A (en) Color picture tube having improved electron gun
DE3864482D1 (en) COMPENSATION OF SWIRL CURRENT EFFECTS IN ION BEAM SYSTEMS.
KR920001634A (en) Electron beam deposition
ES8507291A1 (en) Colour display tube
JP2563343B2 (en) Charged particle device
JPS57151153A (en) In-line type color crt electron gun
JPS6489136A (en) Ion implanting apparatus and ion implanting method
ATE81565T1 (en) FIELD EMISSION DEVICE.
JPS57126047A (en) Color cathode-ray tube
EP0399515A3 (en) Flat tube display apparatus
JPS5727026A (en) Ion implantation