[go: up one dir, main page]

JPS6469901A - Interval measuring apparatus - Google Patents

Interval measuring apparatus

Info

Publication number
JPS6469901A
JPS6469901A JP62226641A JP22664187A JPS6469901A JP S6469901 A JPS6469901 A JP S6469901A JP 62226641 A JP62226641 A JP 62226641A JP 22664187 A JP22664187 A JP 22664187A JP S6469901 A JPS6469901 A JP S6469901A
Authority
JP
Japan
Prior art keywords
measured
interval
omega1
omega2
ammeter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62226641A
Other languages
Japanese (ja)
Other versions
JP2518301B2 (en
Inventor
Kenichi Kodama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62226641A priority Critical patent/JP2518301B2/en
Publication of JPS6469901A publication Critical patent/JPS6469901A/en
Application granted granted Critical
Publication of JP2518301B2 publication Critical patent/JP2518301B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To measure an interval by simple constitution regardless of the conductivity of an object to be measured, by applying the first and second high frequency voltages to the electrostatic capacity formed by an interval to be measured and performing an operation on the basis of a measured current value. CONSTITUTION:A flat electrode 10 is arranged in the vicinity of an object 12 to be measured having a dielectric membrane formed to the surface thereof and oscillators OS1, OS2 are connected to apply high frequency electric fields of frequencies omega1, omega2. Measuring devices 14, 20 are connected to the output side of an ammeter AM and respectively measure the amplitudes of the components of frequencies omega1, omega2 in the AC current detected by the ammeter AM. Herein, an operation circuit 22 performs operation on the basis of a predetermined formula and the interval (x) between the electrode 10 and the object 12 can be calculated. Since said predetermined formula contains no resistance value of the object 12, the interval (x) can be accurately measured regardless of the conductivity or material quality of the object 12.
JP62226641A 1987-09-11 1987-09-11 Interval measuring device Expired - Fee Related JP2518301B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62226641A JP2518301B2 (en) 1987-09-11 1987-09-11 Interval measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62226641A JP2518301B2 (en) 1987-09-11 1987-09-11 Interval measuring device

Publications (2)

Publication Number Publication Date
JPS6469901A true JPS6469901A (en) 1989-03-15
JP2518301B2 JP2518301B2 (en) 1996-07-24

Family

ID=16848364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62226641A Expired - Fee Related JP2518301B2 (en) 1987-09-11 1987-09-11 Interval measuring device

Country Status (1)

Country Link
JP (1) JP2518301B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001091204A (en) * 1999-09-24 2001-04-06 Fotonikusu:Kk Distance measuring device
JP2009527764A (en) * 2006-02-21 2009-07-30 サイバーオプティクス セミコンダクタ インコーポレイテッド Capacitance distance detection in semiconductor processing tools
JP2011501167A (en) * 2007-10-25 2011-01-06 エムティーユー エアロ エンジンズ ゲーエムベーハー Turbine machine, clearance measurement system, and method for determining clearance of rotor
JP2013516601A (en) * 2009-12-31 2013-05-13 マッパー・リソグラフィー・アイピー・ビー．ブイ． Capacitive sensing system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54140779U (en) * 1978-03-24 1979-09-29
JPS5643502A (en) * 1979-09-17 1981-04-22 Mitsubishi Heavy Ind Ltd Eddy current system electric displacement meter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54140779U (en) * 1978-03-24 1979-09-29
JPS5643502A (en) * 1979-09-17 1981-04-22 Mitsubishi Heavy Ind Ltd Eddy current system electric displacement meter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001091204A (en) * 1999-09-24 2001-04-06 Fotonikusu:Kk Distance measuring device
JP2009527764A (en) * 2006-02-21 2009-07-30 サイバーオプティクス セミコンダクタ インコーポレイテッド Capacitance distance detection in semiconductor processing tools
JP2011501167A (en) * 2007-10-25 2011-01-06 エムティーユー エアロ エンジンズ ゲーエムベーハー Turbine machine, clearance measurement system, and method for determining clearance of rotor
JP2013516601A (en) * 2009-12-31 2013-05-13 マッパー・リソグラフィー・アイピー・ビー．ブイ． Capacitive sensing system

Also Published As

Publication number Publication date
JP2518301B2 (en) 1996-07-24

Similar Documents

Publication Publication Date Title
ATE346288T1 (en) METHOD FOR DETERMINING THE ELECTRICAL CONDUCTIVITY OF LIQUIDS
SE8701033L (en) METHOD AND APPARATUS FOR ANALYZING ELECTRODIMPEDANCE
CA2018689A1 (en) Surface impedance measurement device
AU2002348544A1 (en) Sensor for measurement on wet and dry fingers
EP0125116A3 (en) Method and instrument for measuring moisture
JPS6450948A (en) Ion activity measuring sensor, manufacture thereof and sensor attachment circuit therefor
ES8601459A1 (en) Apparatus and process for the dynamic contactless measuring of small distances.
FR2572183B1 (en) METHOD AND APPARATUS FOR IMPEDANCE MEASUREMENT OF THE ELECTRIC CONTINUITY OF AN ELECTRICALLY CONDUCTIVE MATERIAL DEVICE
JPS6469901A (en) Interval measuring apparatus
JPS6446641A (en) Monitoring of corrosion ratio of polarization or non-polarization metal
JPS6457163A (en) Method and apparatus for measuring impregnating depth of impregnating material
ES8403305A1 (en) Method and apparatus for determining the condition of part of the skin's surface.
KR880004785A (en) Multi-electrode Bioelectric Impedance Measurement Method
JPS6472079A (en) Electrical characteristic measuring instrument
SU1531031A1 (en) Method of measuring surface density of electret charge
SU1597779A1 (en) Method of determining dielectric permittivity
JPS57108650A (en) Device for detecting mixing ratio of alcohol and water content ratio
JPS56162043A (en) Bipolar ion current probe device
JPS64474A (en) Method for measuring electrical conductivity of high-concentration liquid
JPS55128163A (en) Method for measurement of resistance of conductive cover
SU1179097A1 (en) Electrocontact method of measuring thickness of sheet electroconducting articles
SU1017907A1 (en) Dielectric material thickness meter
JPS5579474A (en) Concentration detecting method of developer
JPS57135373A (en) Power supply device for measuring electric power apparatus
JPS57203973A (en) Measuring device for electrical conductivity

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees