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JPS6465665A - Device for inspecting defect of reticle - Google Patents

Device for inspecting defect of reticle

Info

Publication number
JPS6465665A
JPS6465665A JP22241087A JP22241087A JPS6465665A JP S6465665 A JPS6465665 A JP S6465665A JP 22241087 A JP22241087 A JP 22241087A JP 22241087 A JP22241087 A JP 22241087A JP S6465665 A JPS6465665 A JP S6465665A
Authority
JP
Japan
Prior art keywords
reticle
inspecting
signal
data
inspected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22241087A
Other languages
Japanese (ja)
Inventor
Fuminori Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP22241087A priority Critical patent/JPS6465665A/en
Publication of JPS6465665A publication Critical patent/JPS6465665A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)

Abstract

PURPOSE:To shorten an inspection time and to reduce the quantity of inspecting data by providing the titled device with a reticle scanning means for simultaneously and optically scanning corresponding positions in two areas of a reticle to be inspected, a signal synthesizing means, and so on. CONSTITUTION:A reticle to be inspected A area 7 and a reticle B area 8 of a reticle pattern 6 on a reticle 5 are irradiated with radiation means 9, 10 to be scanning means to scan respective areas 7, 8. Transmitted beams 17, 18 from the reticle 5 are detected by phetodetectors 13, 14 through objective lenses 11, 12, converted into an electric signal and then synthesized by a synthesizer 15 to be a signal synthesizing means and a pattern output signal 16 is outputted. The signal 16 is compared with inspection data 4 formed by an inspecting data synthesizer 20 by using a comparator 19, and when a difference is generated between both the values, a defect is decided and outputted from an output terminal 21. Consequently, the inspecting time can be shortened and the quantity of inspecting data can be also reduced.
JP22241087A 1987-09-04 1987-09-04 Device for inspecting defect of reticle Pending JPS6465665A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22241087A JPS6465665A (en) 1987-09-04 1987-09-04 Device for inspecting defect of reticle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22241087A JPS6465665A (en) 1987-09-04 1987-09-04 Device for inspecting defect of reticle

Publications (1)

Publication Number Publication Date
JPS6465665A true JPS6465665A (en) 1989-03-10

Family

ID=16781944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22241087A Pending JPS6465665A (en) 1987-09-04 1987-09-04 Device for inspecting defect of reticle

Country Status (1)

Country Link
JP (1) JPS6465665A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142754A (en) * 1991-11-21 1993-06-11 Sharp Corp Inspecting method for phase shift mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142754A (en) * 1991-11-21 1993-06-11 Sharp Corp Inspecting method for phase shift mask

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