JPS6465010A - Device for producing high-purity granular metallic silicon - Google Patents
Device for producing high-purity granular metallic siliconInfo
- Publication number
- JPS6465010A JPS6465010A JP22032887A JP22032887A JPS6465010A JP S6465010 A JPS6465010 A JP S6465010A JP 22032887 A JP22032887 A JP 22032887A JP 22032887 A JP22032887 A JP 22032887A JP S6465010 A JPS6465010 A JP S6465010A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- metallic silicon
- grains
- purity
- fluidized bed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 7
- 239000010703 silicon Substances 0.000 title abstract 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 6
- 239000007789 gas Substances 0.000 abstract 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 1
Landscapes
- Silicon Compounds (AREA)
Abstract
PURPOSE:To continuously produce the title high-purity granular metallic silicon with low power consumption by providing a flow straightening device in a reaction vessel to form a fluidized bed, furnishing a heater on the outside of the vessel, and making the vessel and the device from a metallic silicon plate. CONSTITUTION:The flow straightening device 3 made from a high-purity metallic silicon plate is provided in the vicinity of the bottom of the reaction vessel 1 made from a high-purity metallic silicon plate, and the fluidized bed 2 of the high-purity metallic silicon grains packed in the vessel 1 is formed. The heaters 9a and 9b are provided at the upper and lower parts on the outside of the vessel 1 to adjust the internal temp. of the vessel 1 to a temp. appropriate for the reaction. The raw gas and hydrogen are blown into the fluidized bed 2 heated by the heaters 9a and 9b from the lower part, and the silicon in the raw gas is reduced and deposited on the surface of the high-purity metal grains. The grains with the increased diameter are moved to the lower part, and classified by the gas sent from a classifying gaseous hydrogen supply pipe 5. The small-diameter grains are returned to the fluidized bed 2. Only the grains having a sufficiently large diameter are discharged from a discharge pipe.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22032887A JPS6465010A (en) | 1987-09-04 | 1987-09-04 | Device for producing high-purity granular metallic silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22032887A JPS6465010A (en) | 1987-09-04 | 1987-09-04 | Device for producing high-purity granular metallic silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6465010A true JPS6465010A (en) | 1989-03-10 |
Family
ID=16749421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22032887A Pending JPS6465010A (en) | 1987-09-04 | 1987-09-04 | Device for producing high-purity granular metallic silicon |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6465010A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002094714A1 (en) * | 2001-05-22 | 2002-11-28 | Solarworld Aktiengesellschaft | Method for producing highly pure, granular silicon in a fluidised bed |
JP2003002628A (en) * | 2001-06-21 | 2003-01-08 | Tokuyama Corp | Silicon manufacturing apparatus and manufacturing method |
US6704592B1 (en) | 2000-06-02 | 2004-03-09 | Medrad, Inc. | Communication systems for use with magnetic resonance imaging systems |
WO2006007082A3 (en) * | 2004-06-18 | 2006-09-08 | Memc Electronic Materials | Systems and methods for manufacturing granular material, and for measuring and reducing dust in granular material |
JP2009502704A (en) * | 2005-07-19 | 2009-01-29 | アールイーシー シリコン インコーポレイテッド | Silicon jet fluidized bed |
-
1987
- 1987-09-04 JP JP22032887A patent/JPS6465010A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6704592B1 (en) | 2000-06-02 | 2004-03-09 | Medrad, Inc. | Communication systems for use with magnetic resonance imaging systems |
WO2002094714A1 (en) * | 2001-05-22 | 2002-11-28 | Solarworld Aktiengesellschaft | Method for producing highly pure, granular silicon in a fluidised bed |
US7553466B2 (en) | 2001-05-22 | 2009-06-30 | Solarworld Aktiengesellschaft | Method for producing highly pure, granular silicon in a fluidised bed |
JP2003002628A (en) * | 2001-06-21 | 2003-01-08 | Tokuyama Corp | Silicon manufacturing apparatus and manufacturing method |
WO2006007082A3 (en) * | 2004-06-18 | 2006-09-08 | Memc Electronic Materials | Systems and methods for manufacturing granular material, and for measuring and reducing dust in granular material |
US7291222B2 (en) | 2004-06-18 | 2007-11-06 | Memc Electronic Materials, Inc. | Systems and methods for measuring and reducing dust in granular material |
JP2009502704A (en) * | 2005-07-19 | 2009-01-29 | アールイーシー シリコン インコーポレイテッド | Silicon jet fluidized bed |
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