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JPS6465010A - Device for producing high-purity granular metallic silicon - Google Patents

Device for producing high-purity granular metallic silicon

Info

Publication number
JPS6465010A
JPS6465010A JP22032887A JP22032887A JPS6465010A JP S6465010 A JPS6465010 A JP S6465010A JP 22032887 A JP22032887 A JP 22032887A JP 22032887 A JP22032887 A JP 22032887A JP S6465010 A JPS6465010 A JP S6465010A
Authority
JP
Japan
Prior art keywords
vessel
metallic silicon
grains
purity
fluidized bed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22032887A
Other languages
Japanese (ja)
Inventor
Daizo Kunii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Titanium Co Ltd
Original Assignee
Osaka Titanium Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Titanium Co Ltd filed Critical Osaka Titanium Co Ltd
Priority to JP22032887A priority Critical patent/JPS6465010A/en
Publication of JPS6465010A publication Critical patent/JPS6465010A/en
Pending legal-status Critical Current

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  • Silicon Compounds (AREA)

Abstract

PURPOSE:To continuously produce the title high-purity granular metallic silicon with low power consumption by providing a flow straightening device in a reaction vessel to form a fluidized bed, furnishing a heater on the outside of the vessel, and making the vessel and the device from a metallic silicon plate. CONSTITUTION:The flow straightening device 3 made from a high-purity metallic silicon plate is provided in the vicinity of the bottom of the reaction vessel 1 made from a high-purity metallic silicon plate, and the fluidized bed 2 of the high-purity metallic silicon grains packed in the vessel 1 is formed. The heaters 9a and 9b are provided at the upper and lower parts on the outside of the vessel 1 to adjust the internal temp. of the vessel 1 to a temp. appropriate for the reaction. The raw gas and hydrogen are blown into the fluidized bed 2 heated by the heaters 9a and 9b from the lower part, and the silicon in the raw gas is reduced and deposited on the surface of the high-purity metal grains. The grains with the increased diameter are moved to the lower part, and classified by the gas sent from a classifying gaseous hydrogen supply pipe 5. The small-diameter grains are returned to the fluidized bed 2. Only the grains having a sufficiently large diameter are discharged from a discharge pipe.
JP22032887A 1987-09-04 1987-09-04 Device for producing high-purity granular metallic silicon Pending JPS6465010A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22032887A JPS6465010A (en) 1987-09-04 1987-09-04 Device for producing high-purity granular metallic silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22032887A JPS6465010A (en) 1987-09-04 1987-09-04 Device for producing high-purity granular metallic silicon

Publications (1)

Publication Number Publication Date
JPS6465010A true JPS6465010A (en) 1989-03-10

Family

ID=16749421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22032887A Pending JPS6465010A (en) 1987-09-04 1987-09-04 Device for producing high-purity granular metallic silicon

Country Status (1)

Country Link
JP (1) JPS6465010A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002094714A1 (en) * 2001-05-22 2002-11-28 Solarworld Aktiengesellschaft Method for producing highly pure, granular silicon in a fluidised bed
JP2003002628A (en) * 2001-06-21 2003-01-08 Tokuyama Corp Silicon manufacturing apparatus and manufacturing method
US6704592B1 (en) 2000-06-02 2004-03-09 Medrad, Inc. Communication systems for use with magnetic resonance imaging systems
WO2006007082A3 (en) * 2004-06-18 2006-09-08 Memc Electronic Materials Systems and methods for manufacturing granular material, and for measuring and reducing dust in granular material
JP2009502704A (en) * 2005-07-19 2009-01-29 アールイーシー シリコン インコーポレイテッド Silicon jet fluidized bed

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6704592B1 (en) 2000-06-02 2004-03-09 Medrad, Inc. Communication systems for use with magnetic resonance imaging systems
WO2002094714A1 (en) * 2001-05-22 2002-11-28 Solarworld Aktiengesellschaft Method for producing highly pure, granular silicon in a fluidised bed
US7553466B2 (en) 2001-05-22 2009-06-30 Solarworld Aktiengesellschaft Method for producing highly pure, granular silicon in a fluidised bed
JP2003002628A (en) * 2001-06-21 2003-01-08 Tokuyama Corp Silicon manufacturing apparatus and manufacturing method
WO2006007082A3 (en) * 2004-06-18 2006-09-08 Memc Electronic Materials Systems and methods for manufacturing granular material, and for measuring and reducing dust in granular material
US7291222B2 (en) 2004-06-18 2007-11-06 Memc Electronic Materials, Inc. Systems and methods for measuring and reducing dust in granular material
JP2009502704A (en) * 2005-07-19 2009-01-29 アールイーシー シリコン インコーポレイテッド Silicon jet fluidized bed

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