JPS6457673A - Manufacture of thin film transistor - Google Patents
Manufacture of thin film transistorInfo
- Publication number
- JPS6457673A JPS6457673A JP62212753A JP21275387A JPS6457673A JP S6457673 A JPS6457673 A JP S6457673A JP 62212753 A JP62212753 A JP 62212753A JP 21275387 A JP21275387 A JP 21275387A JP S6457673 A JPS6457673 A JP S6457673A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- film
- drain electrode
- mask
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010408 film Substances 0.000 abstract 14
- 239000004065 semiconductor Substances 0.000 abstract 10
- 239000011521 glass Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
Landscapes
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Abstract
PURPOSE:To enable the conventional thin film transistor to be manufactured using a smaller number of masks by a method wherein two semiconductor films are processed using an integrated source.drain electrode pattern as a mask while another semiconductor film with impurity-doped channel part is removed using a transparent electrode pattern as a mask. CONSTITUTION:A semiconductor film 4 and an impurity-doped semiconductor film 5 are processed using an integrated source.drain electrode pattern 5 as a mask and then the semiconductor film 5 with impurity-doped channel part is removed using a transparent electrode 7 as a mask. For example after forming a gate electrode 2 as a glass substrate 1, a gate insulating film 3, a semiconductor film 4 and the semiconductor film 5 doped with impurity are deposited and furthermore the metallic film 6 for source.drain electrode is laminated. Next, the source.drain electrode film 6 comprising integrated source.drain electrode, the doped semiconductor film 5 and the semiconductor film 4 are patterned. Finally, the transparent electrode 7 is formed to remove the source.drain electrode metallic film 6 of channel part and the doped semiconductor film 5 using the transparent electrode 7 as a mask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62212753A JP2574808B2 (en) | 1987-08-28 | 1987-08-28 | Method for manufacturing thin film transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62212753A JP2574808B2 (en) | 1987-08-28 | 1987-08-28 | Method for manufacturing thin film transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6457673A true JPS6457673A (en) | 1989-03-03 |
JP2574808B2 JP2574808B2 (en) | 1997-01-22 |
Family
ID=16627844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62212753A Expired - Fee Related JP2574808B2 (en) | 1987-08-28 | 1987-08-28 | Method for manufacturing thin film transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2574808B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996002867A1 (en) * | 1994-07-14 | 1996-02-01 | Citizen Watch Co., Ltd. | Liquid crystal display and method of manufacturing the same |
US5578028A (en) * | 1993-09-17 | 1996-11-26 | Pall Corporation | Method and system for collecting, processing, and storing blood components |
US6132124A (en) * | 1993-08-31 | 2000-10-17 | Mitsubishi Pencil Kabushiki Kaisha | Ink follower for aqueous ballpoint pen using gel-like material and solid piece |
-
1987
- 1987-08-28 JP JP62212753A patent/JP2574808B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6132124A (en) * | 1993-08-31 | 2000-10-17 | Mitsubishi Pencil Kabushiki Kaisha | Ink follower for aqueous ballpoint pen using gel-like material and solid piece |
US5578028A (en) * | 1993-09-17 | 1996-11-26 | Pall Corporation | Method and system for collecting, processing, and storing blood components |
US5578027A (en) * | 1993-09-17 | 1996-11-26 | Pall Corporation | Method and system for collecting, processing, and storing blood components |
US6045546A (en) * | 1993-09-17 | 2000-04-04 | Pall Corporation | Method and system for collecting, processing, and storing blood components |
WO1996002867A1 (en) * | 1994-07-14 | 1996-02-01 | Citizen Watch Co., Ltd. | Liquid crystal display and method of manufacturing the same |
GB2306747A (en) * | 1994-07-14 | 1997-05-07 | Citizen Watch Co Ltd | Liquid crystal display and method of manufacturing the same |
GB2306747B (en) * | 1994-07-14 | 1998-07-01 | Citizen Watch Co Ltd | Liquid crystal display and method of manufacturing the same |
US5893621A (en) * | 1994-07-14 | 1999-04-13 | Citizen Watch Co., Ltd. | Liquid crystal display and method of manufacturing the same |
US6512556B1 (en) | 1994-07-14 | 2003-01-28 | Citizen Watch Co., Ltd. | Liquid crystal display and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JP2574808B2 (en) | 1997-01-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |