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JPS6457634A - Detection of multilayer patter defect and device therefor - Google Patents

Detection of multilayer patter defect and device therefor

Info

Publication number
JPS6457634A
JPS6457634A JP21273087A JP21273087A JPS6457634A JP S6457634 A JPS6457634 A JP S6457634A JP 21273087 A JP21273087 A JP 21273087A JP 21273087 A JP21273087 A JP 21273087A JP S6457634 A JPS6457634 A JP S6457634A
Authority
JP
Japan
Prior art keywords
image
detected
pattern
threshold value
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21273087A
Other languages
Japanese (ja)
Other versions
JPH0774787B2 (en
Inventor
Shunji Maeda
Hitoshi Kubota
Hiroshi Makihira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP21273087A priority Critical patent/JPH0774787B2/en
Publication of JPS6457634A publication Critical patent/JPS6457634A/en
Publication of JPH0774787B2 publication Critical patent/JPH0774787B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To avoid the error mistaking a grain for a defect, and make it possible to precisely detect defects even if local change of film thickness exists in a wiring pattern, by forming a threshold value image, and constituting a binary-valued difference image between a detected image and a reference image by said threshold value image. CONSTITUTION:For a multilayer pattern, a threshold value image is formed wherein threshold values Vth1, Vth2 and Vthe are set. For a region surrounded by a pattern edge 53, Vth1 and Vth2 are obtained by the highest brightness of grains 50 in a domain for the respective regions. For the pattern edge 53, Vthe is obtained by the brightness of the edge part 53. A difference image between a detected image obtained by sensing the multilayer pattern with an image sensing device, and a reference image is detected. By constituting a binary-valued image for the difference image by applying the above- mentioned threshold value image, defects existing in the multilayer pattern are detected. Defects existing in the region surrounded by the pattern edge can be detected in the manner in which only ones larger than the grain are discriminated. The form defect on the pattern edge can be detected without overlook, even if it is minute.
JP21273087A 1987-08-28 1987-08-28 Multi-layer pattern defect detection method and apparatus Expired - Fee Related JPH0774787B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21273087A JPH0774787B2 (en) 1987-08-28 1987-08-28 Multi-layer pattern defect detection method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21273087A JPH0774787B2 (en) 1987-08-28 1987-08-28 Multi-layer pattern defect detection method and apparatus

Publications (2)

Publication Number Publication Date
JPS6457634A true JPS6457634A (en) 1989-03-03
JPH0774787B2 JPH0774787B2 (en) 1995-08-09

Family

ID=16627482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21273087A Expired - Fee Related JPH0774787B2 (en) 1987-08-28 1987-08-28 Multi-layer pattern defect detection method and apparatus

Country Status (1)

Country Link
JP (1) JPH0774787B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2361816A2 (en) 2010-02-26 2011-08-31 Fujikiko Co., Ltd. Steering column device
JP2012251935A (en) * 2011-06-06 2012-12-20 Fujitsu Semiconductor Ltd Inspection device and inspection method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4699873B2 (en) * 2005-11-10 2011-06-15 株式会社日立ハイテクノロジーズ Defect data processing and review equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2361816A2 (en) 2010-02-26 2011-08-31 Fujikiko Co., Ltd. Steering column device
JP2012251935A (en) * 2011-06-06 2012-12-20 Fujitsu Semiconductor Ltd Inspection device and inspection method

Also Published As

Publication number Publication date
JPH0774787B2 (en) 1995-08-09

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees