JPS6453144A - Method for evaluating thin film by fluorescent x-ray analysis - Google Patents
Method for evaluating thin film by fluorescent x-ray analysisInfo
- Publication number
- JPS6453144A JPS6453144A JP21000187A JP21000187A JPS6453144A JP S6453144 A JPS6453144 A JP S6453144A JP 21000187 A JP21000187 A JP 21000187A JP 21000187 A JP21000187 A JP 21000187A JP S6453144 A JPS6453144 A JP S6453144A
- Authority
- JP
- Japan
- Prior art keywords
- intensities
- fluorescent
- angle
- ray
- elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000002441 X-ray diffraction Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000005259 measurement Methods 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000004451 qualitative analysis Methods 0.000 abstract 1
- 238000004445 quantitative analysis Methods 0.000 abstract 1
- 230000003595 spectral effect Effects 0.000 abstract 1
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To exactly detect the max. value even if a measurement error, etc., exist so that the thin film to be measured can be exactly evaluated by measuring intensities at every slight angle deviated near a predicted set angle and detecting the max. value of fluorescent X-ray intensities. CONSTITUTION:The fluorescent X-rays having the wavelengths intrinsic to elements obtd. by projecting primary X-rays from an X-ray tube 10 to a measurement wafer 12 in a vacuum are guided to a spectral crystal 16 installed to a goniometer 22 rotating at a driving unit 36 while the angle is measured by an angle control unit 40. This X-ray is diffracted at the angles different with each of the wavelengths by which the qualitative analysis to determine the elements contained in the sample is executed. Since the contents of the elements are proportional to the intensities of the generated fluorescent X-rays, the intensities are measured by a detector 20, an amplifier 24, etc., by which the quantitative analysis is executed. There is a need for detecting the max. value of the fluorescent X-ray intensities from the desired elements and the purpose is attained by measuring the intensities while the angle of the goniometer 22 is successively changed at slight angles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21000187A JPS6453144A (en) | 1987-08-24 | 1987-08-24 | Method for evaluating thin film by fluorescent x-ray analysis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21000187A JPS6453144A (en) | 1987-08-24 | 1987-08-24 | Method for evaluating thin film by fluorescent x-ray analysis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6453144A true JPS6453144A (en) | 1989-03-01 |
Family
ID=16582210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21000187A Pending JPS6453144A (en) | 1987-08-24 | 1987-08-24 | Method for evaluating thin film by fluorescent x-ray analysis |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6453144A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02245607A (en) * | 1989-03-17 | 1990-10-01 | Agency Of Ind Science & Technol | Measurement of thickness by x-ray for organic thin film |
| JP2003042978A (en) * | 2001-07-30 | 2003-02-13 | Rigaku Industrial Co | X-ray fluorescence analyzer |
| JP2003506701A (en) * | 1999-08-10 | 2003-02-18 | コラス・アルミニウム・バルツプロドウクテ・ゲーエムベーハー | X-ray fluorescence sensor for measuring thickness of metal sheet |
| JP2018013472A (en) * | 2016-06-10 | 2018-01-25 | ブルーカー アーイクスエス ゲーエムベーハーＢｒｕｋｅｒ ＡＸＳ ＧｍｂＨ | Measuring chamber for compact goniometer of X-ray spectrometer |
-
1987
- 1987-08-24 JP JP21000187A patent/JPS6453144A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02245607A (en) * | 1989-03-17 | 1990-10-01 | Agency Of Ind Science & Technol | Measurement of thickness by x-ray for organic thin film |
| JP2003506701A (en) * | 1999-08-10 | 2003-02-18 | コラス・アルミニウム・バルツプロドウクテ・ゲーエムベーハー | X-ray fluorescence sensor for measuring thickness of metal sheet |
| JP2003042978A (en) * | 2001-07-30 | 2003-02-13 | Rigaku Industrial Co | X-ray fluorescence analyzer |
| JP2018013472A (en) * | 2016-06-10 | 2018-01-25 | ブルーカー アーイクスエス ゲーエムベーハーＢｒｕｋｅｒ ＡＸＳ ＧｍｂＨ | Measuring chamber for compact goniometer of X-ray spectrometer |
| US10094790B2 (en) | 2016-06-10 | 2018-10-09 | Bruker Axs Gmbh | Measurement chamber for a compact goniometer in an x-ray spectrometer |
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