[go: up one dir, main page]

JPS6449035A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6449035A
JPS6449035A JP20527487A JP20527487A JPS6449035A JP S6449035 A JPS6449035 A JP S6449035A JP 20527487 A JP20527487 A JP 20527487A JP 20527487 A JP20527487 A JP 20527487A JP S6449035 A JPS6449035 A JP S6449035A
Authority
JP
Japan
Prior art keywords
compd
copolymer
photosensitive resin
water
compsn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20527487A
Other languages
Japanese (ja)
Inventor
Shinichiro Iwanaga
Tatsuaki Matsunaga
Itsuo Nishiwaki
Koji Nobuyo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP20527487A priority Critical patent/JPS6449035A/en
Publication of JPS6449035A publication Critical patent/JPS6449035A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain a photosensitive resin compsn. being developable with an aq. developing soln., having sufficient resistance to water-base ink, and being usable for flexographic printing, by using a dienic copolymer obtd. by copolymerizing a polyfunctional vinyl compd. and contg. partly crosslinked hydrophilic groups for a base material. CONSTITUTION:The title photosensitive compsn. contains a copolymer contg. 10-85mol.% conjugated dienic compd. A, 5-50mol.% hydrophilic monomer B expressed by the formula I, 0.1-5mol.% polyfunctional vinyl compd. C, and 5-80mol.% monoolefinic unsatd. compd. D, along with a photopolymerizable unsatd. monomer and a photopolymn. initiator. In the formula, each R<1>, R<2>, and R<3> may be same or different to each other, being H or methyl group; n is an integer 1-20. Suitable amt. of the photopolymn. initiator is 0.1-10pts.wt. per 100pts.wt. of the copolymer. By this constitution, a photosensitive resin compsn. having water resistance, rubbery elasticity, transparency, workability, sufficient mechanical characteristics, developability with dil. acid, and developability with water, and being capable of providing a resin plate for flexographic printing, is obtd.
JP20527487A 1987-08-20 1987-08-20 Photosensitive resin composition Pending JPS6449035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20527487A JPS6449035A (en) 1987-08-20 1987-08-20 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20527487A JPS6449035A (en) 1987-08-20 1987-08-20 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS6449035A true JPS6449035A (en) 1989-02-23

Family

ID=16504262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20527487A Pending JPS6449035A (en) 1987-08-20 1987-08-20 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS6449035A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05232698A (en) * 1991-12-26 1993-09-10 Nippon Zeon Co Ltd Production of hydrophilic copolymer containing phosphorus and water developable photosensitive composition using this copolymer
JPH06186741A (en) * 1992-04-04 1994-07-08 Hoechst Ag Photohardening elastomer mixture and recording material, formanufacture of letterpress printing plate, obtained by it
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
JPH05232698A (en) * 1991-12-26 1993-09-10 Nippon Zeon Co Ltd Production of hydrophilic copolymer containing phosphorus and water developable photosensitive composition using this copolymer
JPH06186741A (en) * 1992-04-04 1994-07-08 Hoechst Ag Photohardening elastomer mixture and recording material, formanufacture of letterpress printing plate, obtained by it

Similar Documents

Publication Publication Date Title
ATE103719T1 (en) WATER-DEVELOPABLE PHOTOSENSITIVE PLATE AND METHOD OF MAKING THERE.
ES2015522B3 (en) PHOTOSENSITIVE RECORDING MATERIALS WITH ELASTOMERS AND POLYMERIZED COAGULATE BINDERS, AS RELIEF FORMS
EP0780732A3 (en) Polymer composition and resist material
DE3750971D1 (en) Photosensitive flexographic printing plate.
ATE105638T1 (en) MANUFACTURE OF A RELIEF PRINTING PLATE.
EP0231910A3 (en) Thermosetting fluorocarbon polymer coatings
CA2016919A1 (en) Photosensitive resin compositions
JPS6449035A (en) Photosensitive resin composition
ZA835926B (en) Photosensitive elastomeric polymer composition for flexographic printing plates,processable in semiaqueous basic solution or solvent
JPS6449036A (en) Photosensitive resin composition
JPS5310648A (en) Photosensitive resin compositions
JPS6452139A (en) Photosensitive composition
JPS52134655A (en) Photosensitive resin compositions
JPS5747329A (en) Copolyamide resin
JPS57212217A (en) Photosensitive resin composition
JPS5579438A (en) Photosensitive polyamide resin composition
JPS6477051A (en) Photosensitive composition and photosensitive planographic printing plate
JPS5518456A (en) Elastic sealant
JPS5789752A (en) Photosensitive material
JPS56161538A (en) Photosensitive composition
JPS6456756A (en) Resin composition
JPS55138740A (en) Developer for diazo type photosensitive lithographic plate
JPS5669643A (en) Toner for electrostatic charge image
JPS6454461A (en) Electrostatic charge image developing toner
JPS57133144A (en) Aqueous resin dispersion