JPS6443959A - Scanning type electron beam device - Google Patents
Scanning type electron beam deviceInfo
- Publication number
- JPS6443959A JPS6443959A JP62199043A JP19904387A JPS6443959A JP S6443959 A JPS6443959 A JP S6443959A JP 62199043 A JP62199043 A JP 62199043A JP 19904387 A JP19904387 A JP 19904387A JP S6443959 A JPS6443959 A JP S6443959A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- new
- vision
- range
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 6
- 238000011109 contamination Methods 0.000 abstract 2
- 238000005259 measurement Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Current Or Voltage (AREA)
- Tests Of Electronic Circuits (AREA)
Abstract
PURPOSE:To prevent the generation of a damage and a contamination of the simple by scanning the new electron beams only on the sample part entering newly in the range of vision by the movement of the sample. CONSTITUTION:A new electron beam scanning is carried out only on the sample part entering in the range of vision by the movement of the sample 1 by a new electron beam scanning device 3, the electron signal emitted by the electron beam scanning is detected by a new electron signal detecting device 5, and the detected new electron signal data is written in the area of a storage device 4 by a new data writing device 6 responding to the sample part entering newly in the range of vision by the movement of the sample 1. And by displaying the new vision range area together with the existing data by a new vision range area display device 7, the radiation of electron beams to the same position of the sample numerous times is avoided, the generation a damage and a contamination of the sample is prevented, and the measurement and the like can be carried out accurately.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62199043A JPS6443959A (en) | 1987-08-11 | 1987-08-11 | Scanning type electron beam device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62199043A JPS6443959A (en) | 1987-08-11 | 1987-08-11 | Scanning type electron beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6443959A true JPS6443959A (en) | 1989-02-16 |
Family
ID=16401165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62199043A Pending JPS6443959A (en) | 1987-08-11 | 1987-08-11 | Scanning type electron beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6443959A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5929357A (en) * | 1997-07-03 | 1999-07-27 | Yamaha Corporation | Keyboard assembly having plurality of keys formed integrally with common key support |
CN102439684A (en) * | 2009-05-20 | 2012-05-02 | 卡尔蔡司Nts有限责任公司 | Scan method |
US9123502B2 (en) | 2009-05-20 | 2015-09-01 | Carl Zeiss Microscopy, Llc | Scan method |
-
1987
- 1987-08-11 JP JP62199043A patent/JPS6443959A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5929357A (en) * | 1997-07-03 | 1999-07-27 | Yamaha Corporation | Keyboard assembly having plurality of keys formed integrally with common key support |
CN102439684A (en) * | 2009-05-20 | 2012-05-02 | 卡尔蔡司Nts有限责任公司 | Scan method |
JP2012527729A (en) * | 2009-05-20 | 2012-11-08 | カール ツァイス エヌティーエス エルエルシー | Scanning method |
US9123502B2 (en) | 2009-05-20 | 2015-09-01 | Carl Zeiss Microscopy, Llc | Scan method |
CN102439684B (en) * | 2009-05-20 | 2015-09-16 | 卡尔蔡司显微镜有限责任公司 | Scan method |
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