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JPS6431340A - Focused ion beam exposing device - Google Patents

Focused ion beam exposing device

Info

Publication number
JPS6431340A
JPS6431340A JP62186930A JP18693087A JPS6431340A JP S6431340 A JPS6431340 A JP S6431340A JP 62186930 A JP62186930 A JP 62186930A JP 18693087 A JP18693087 A JP 18693087A JP S6431340 A JPS6431340 A JP S6431340A
Authority
JP
Japan
Prior art keywords
ion source
gas
tube
ion beam
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62186930A
Other languages
Japanese (ja)
Inventor
Toru Itakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62186930A priority Critical patent/JPS6431340A/en
Publication of JPS6431340A publication Critical patent/JPS6431340A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To stabilize the operation of a gas ion source by setting the potential of a container of the gas to be ionized to nearly the same potential as that of an electric field ionization type gas ion source. CONSTITUTION:The gas in a gas container 14 is guided into an electric field ionization type gas ion source 1 via a tube 17 and ionized. The degasification is increased in the tube 17 and the degree of vacuum around the emitter of the gas ion source 1 is lowered, thus the operation of the ion source 1 is made unstable. The gas container 14 is arranged near the bellows 10 and set to nearly the same potential as that of the ion source 1. The length of the tube 17 can be made short, and one made of metal can be used. The degasification in the tube 17 is thus avoided. The ion source 1 can be thereby operated stably.
JP62186930A 1987-07-27 1987-07-27 Focused ion beam exposing device Pending JPS6431340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62186930A JPS6431340A (en) 1987-07-27 1987-07-27 Focused ion beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62186930A JPS6431340A (en) 1987-07-27 1987-07-27 Focused ion beam exposing device

Publications (1)

Publication Number Publication Date
JPS6431340A true JPS6431340A (en) 1989-02-01

Family

ID=16197203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62186930A Pending JPS6431340A (en) 1987-07-27 1987-07-27 Focused ion beam exposing device

Country Status (1)

Country Link
JP (1) JPS6431340A (en)

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