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JPS6418143A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6418143A
JPS6418143A JP17394587A JP17394587A JPS6418143A JP S6418143 A JPS6418143 A JP S6418143A JP 17394587 A JP17394587 A JP 17394587A JP 17394587 A JP17394587 A JP 17394587A JP S6418143 A JPS6418143 A JP S6418143A
Authority
JP
Japan
Prior art keywords
gas
compd
titled
photosensitive resin
high polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17394587A
Other languages
Japanese (ja)
Other versions
JP2582578B2 (en
Inventor
Tsutomu Shirosaki
Takao Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP62173945A priority Critical patent/JP2582578B2/en
Publication of JPS6418143A publication Critical patent/JPS6418143A/en
Application granted granted Critical
Publication of JP2582578B2 publication Critical patent/JP2582578B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain the titled positive type photosensitive resin composition which is not sensitive to heat load, and does not accompany the generation of an unuseful gas such as N2 gas, etc., by incorporating a specified anthracene compd. and an alkaline soluble high polymer in the titled composition. CONSTITUTION:The titled composition contains the anthracene compd. shown by formulas I and/or II, and the alkaline soluble high polymer. In formulas I and II, R is alkyl group. The titled composition remarkably reduces a dissolving speed for a weak alkaline developer before exposing, and remarkably increases said speed after exposing by incorporating the compd. shown by formula I and/or II in the alkaline soluble high polymer. And, at the time of exposing the titled composition, the excellent positive type image having less tendency for generating out of focus and a pinhole is obtd. without generating any gas. Thus, the positive type photosensitive resin which has the excellent stability against heat, and does not generate nay gas caused by photo irradiation, and has the excellent durability against an etching solution, and enables to an alkaline development, is obtd.
JP62173945A 1987-07-14 1987-07-14 Photosensitive resin composition Expired - Lifetime JP2582578B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62173945A JP2582578B2 (en) 1987-07-14 1987-07-14 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62173945A JP2582578B2 (en) 1987-07-14 1987-07-14 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS6418143A true JPS6418143A (en) 1989-01-20
JP2582578B2 JP2582578B2 (en) 1997-02-19

Family

ID=15969978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62173945A Expired - Lifetime JP2582578B2 (en) 1987-07-14 1987-07-14 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JP2582578B2 (en)

Cited By (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5237059A (en) * 1991-03-22 1993-08-17 Fuji Photo Film Co., Ltd. Compounds capable of generating an acid by light irradiation
JPH07134410A (en) * 1993-06-25 1995-05-23 Nec Corp Resist material
US5583900A (en) * 1993-03-18 1996-12-10 Hitachi, Ltd. Structural member having superior resistance to neutron irradiation embrittlement, austenitic steel for use in same, and use thereof
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
WO2000010056A1 (en) * 1998-08-14 2000-02-24 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same
US6541178B2 (en) 1999-12-29 2003-04-01 Samsung Electronics Co., Ltd. Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1619023A2 (en) 2004-07-20 2006-01-25 Fuji Photo Film Co., Ltd. Image forming material
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
EP1700890A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1757635A1 (en) 2005-08-23 2007-02-28 Fuji Photo Film Co., Ltd. Curable modified oxetane compound and ink composition comprising it
EP1762599A1 (en) 2005-09-07 2007-03-14 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate
EP1829684A1 (en) 2006-03-03 2007-09-05 FUJIFILM Corporation Curable composition, ink composition, inkjet-recording method, and planographic printing plate
EP1952982A1 (en) 2007-02-02 2008-08-06 FUJIFILM Corporation Radiation-curable polymerizable composition, ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate
EP1952998A2 (en) 2007-02-01 2008-08-06 FUJIFILM Corporation Ink-jet recording device
EP1955858A1 (en) 2007-02-06 2008-08-13 FUJIFILM Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
EP1955850A2 (en) 2007-02-07 2008-08-13 FUJIFILM Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
EP1964894A2 (en) 2007-02-27 2008-09-03 FUJIFILM Corporation Ink composition, inkjetrecording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP1964893A1 (en) 2007-02-26 2008-09-03 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and ink set
EP1975211A1 (en) 2007-03-30 2008-10-01 FUJIFILM Corporation Ink composition and image recording method and image recorded matter using same
EP1975213A1 (en) 2006-07-03 2008-10-01 FUJIFILM Corporation Ink composition, injet recording method, printed material, and process for producing lithographic printing plate
EP1975160A1 (en) 2007-03-30 2008-10-01 Fujifilm Corporation Polymerizable compound, polymer, ink composition, printed articles and inkjet recording method
EP1975212A2 (en) 2007-03-30 2008-10-01 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate
EP1988136A1 (en) 2007-03-01 2008-11-05 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP2042570A1 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Photo-curable composition including polymerizable compound, polymerization initiator, and dye
EP2042572A1 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and process for producing molded printed material
EP2042243A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Coater and ink-jet recording device using the same
EP2042335A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Inkjet recording method
EP2065449A2 (en) 2007-11-29 2009-06-03 FUJIFILM Corporation Ink composition for inkjet recording, inkjet recording method, and printed material
EP2088176A1 (en) 2008-02-07 2009-08-12 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and molded printed material
EP2093265A1 (en) 2008-02-25 2009-08-26 FUJIFILM Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
EP2100925A2 (en) 2008-03-11 2009-09-16 FUJIFILM Corporation Pigment composition, ink composition, printed article, inkjet recording method and polyallylamine derivative
EP2105478A1 (en) 2008-03-26 2009-09-30 FUJIFILM Corporation Inkjet recording method and inkjet recording system
EP2130881A1 (en) 2008-06-02 2009-12-09 FUJIFILM Corporation Pigment dispersion and ink composition using the same
EP2169022A1 (en) 2008-09-29 2010-03-31 Fujifilm Corporation Ink composition and inkjet recording method
EP2169018A2 (en) 2008-09-26 2010-03-31 Fujifilm Corporation Ink composition and inkjet recording method
EP2169021A1 (en) 2008-09-25 2010-03-31 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
EP2216377A1 (en) 2009-02-09 2010-08-11 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2216378A1 (en) 2009-02-05 2010-08-11 Fujifilm Corporation Nonaqueous ink, image-recording method, image-recording apparatus and recorded article
EP2230285A1 (en) 2009-03-19 2010-09-22 Fujifilm Corporation Ink composition, inkjet recording method, printed material, and process for producing molded printed material
EP2230284A1 (en) 2009-03-17 2010-09-22 Fujifilm Corporation Ink composition and inkjet recording method
EP2236570A2 (en) 2009-03-31 2010-10-06 Fujifilm Corporation Ink composition, ink composition for inkjet recording, inkjet recording method, and printed article obtained by inkjet recording method
EP2298841A1 (en) 2009-09-18 2011-03-23 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2311918A1 (en) 2009-09-29 2011-04-20 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2477073A1 (en) 2002-02-13 2012-07-18 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
EP2644664A1 (en) 2012-03-29 2013-10-02 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
WO2014136923A1 (en) 2013-03-07 2014-09-12 富士フイルム株式会社 Inkjet ink composition, inkjet recording method, printed matter and method of producing formed printed matter
WO2015008777A1 (en) 2013-07-16 2015-01-22 株式会社カネカ Active energy-ray-curable resin composition for coating organic or inorganic substrate
EP2842763A2 (en) 2013-08-30 2015-03-04 Fujifilm Corporation Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613141A (en) * 1984-06-15 1986-01-09 Toshiba Corp Photosensitive composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613141A (en) * 1984-06-15 1986-01-09 Toshiba Corp Photosensitive composition

Cited By (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5237059A (en) * 1991-03-22 1993-08-17 Fuji Photo Film Co., Ltd. Compounds capable of generating an acid by light irradiation
US5583900A (en) * 1993-03-18 1996-12-10 Hitachi, Ltd. Structural member having superior resistance to neutron irradiation embrittlement, austenitic steel for use in same, and use thereof
JPH07134410A (en) * 1993-06-25 1995-05-23 Nec Corp Resist material
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
WO2000010056A1 (en) * 1998-08-14 2000-02-24 Shipley Company, L.L.C. Photoacid generators and photoresists comprising same
US6458506B2 (en) 1998-08-14 2002-10-01 Shipley Company, Llc Photoacid generators and photoresists comprising same
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
US6541178B2 (en) 1999-12-29 2003-04-01 Samsung Electronics Co., Ltd. Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same
EP2477073A1 (en) 2002-02-13 2012-07-18 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1619023A2 (en) 2004-07-20 2006-01-25 Fuji Photo Film Co., Ltd. Image forming material
EP1700890A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1757635A1 (en) 2005-08-23 2007-02-28 Fuji Photo Film Co., Ltd. Curable modified oxetane compound and ink composition comprising it
EP1762599A1 (en) 2005-09-07 2007-03-14 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate
EP1829684A1 (en) 2006-03-03 2007-09-05 FUJIFILM Corporation Curable composition, ink composition, inkjet-recording method, and planographic printing plate
EP1975213A1 (en) 2006-07-03 2008-10-01 FUJIFILM Corporation Ink composition, injet recording method, printed material, and process for producing lithographic printing plate
EP1952998A2 (en) 2007-02-01 2008-08-06 FUJIFILM Corporation Ink-jet recording device
EP1952982A1 (en) 2007-02-02 2008-08-06 FUJIFILM Corporation Radiation-curable polymerizable composition, ink composition, inkjet recording method, printed material, planographic printing plate, and method for forming planographic printing plate
EP1955858A1 (en) 2007-02-06 2008-08-13 FUJIFILM Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
EP1955850A2 (en) 2007-02-07 2008-08-13 FUJIFILM Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
EP1964893A1 (en) 2007-02-26 2008-09-03 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and ink set
EP1964894A2 (en) 2007-02-27 2008-09-03 FUJIFILM Corporation Ink composition, inkjetrecording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP1988136A1 (en) 2007-03-01 2008-11-05 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP1975160A1 (en) 2007-03-30 2008-10-01 Fujifilm Corporation Polymerizable compound, polymer, ink composition, printed articles and inkjet recording method
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EP2065449A2 (en) 2007-11-29 2009-06-03 FUJIFILM Corporation Ink composition for inkjet recording, inkjet recording method, and printed material
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Also Published As

Publication number Publication date
JP2582578B2 (en) 1997-02-19

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