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JPS6411403A - Plasma generation reacting device - Google Patents

Plasma generation reacting device

Info

Publication number
JPS6411403A
JPS6411403A JP62166677A JP16667787A JPS6411403A JP S6411403 A JPS6411403 A JP S6411403A JP 62166677 A JP62166677 A JP 62166677A JP 16667787 A JP16667787 A JP 16667787A JP S6411403 A JPS6411403 A JP S6411403A
Authority
JP
Japan
Prior art keywords
resonator
applicator
substrate
input ports
microwave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62166677A
Other languages
English (en)
Other versions
JP2552140B2 (ja
Inventor
Fumio Takamura
Kohei Otake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP62166677A priority Critical patent/JP2552140B2/ja
Publication of JPS6411403A publication Critical patent/JPS6411403A/ja
Application granted granted Critical
Publication of JP2552140B2 publication Critical patent/JP2552140B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
JP62166677A 1987-07-03 1987-07-03 プラズマ発生反応装置 Expired - Lifetime JP2552140B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62166677A JP2552140B2 (ja) 1987-07-03 1987-07-03 プラズマ発生反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62166677A JP2552140B2 (ja) 1987-07-03 1987-07-03 プラズマ発生反応装置

Publications (2)

Publication Number Publication Date
JPS6411403A true JPS6411403A (en) 1989-01-17
JP2552140B2 JP2552140B2 (ja) 1996-11-06

Family

ID=15835676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62166677A Expired - Lifetime JP2552140B2 (ja) 1987-07-03 1987-07-03 プラズマ発生反応装置

Country Status (1)

Country Link
JP (1) JP2552140B2 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178683A (en) * 1990-03-30 1993-01-12 New Japan Radio Co., Ltd. Microwave plasma cvd apparatus
WO1996003019A1 (fr) * 1994-07-14 1996-02-01 Sumitomo Metal Industries, Ltd. Dispositif de traitement au plasma
US5522343A (en) * 1988-09-14 1996-06-04 Fujitsu Limited Thin film formation apparatus
WO2004068917A1 (ja) * 2003-01-27 2004-08-12 Tokyo Electron Limited プラズマ処理装置およびプラズマ処理方法
JP2006286269A (ja) * 2005-03-31 2006-10-19 Tokyo Electron Ltd プラズマ処理装置
JP2007200687A (ja) * 2006-01-26 2007-08-09 Toppan Printing Co Ltd ２分岐導波管を有するプラズマ処理装置
CN101853768A (zh) * 2010-04-09 2010-10-06 长飞光纤光缆有限公司 一种圆柱型等离子体谐振腔
CN114845455A (zh) * 2022-05-07 2022-08-02 季华实验室 微波等离子体化学气相沉积装置及系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57148797U (ja) * 1981-03-13 1982-09-18
JPS6187869A (ja) * 1984-10-05 1986-05-06 Hitachi Ltd スパツタ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57148797U (ja) * 1981-03-13 1982-09-18
JPS6187869A (ja) * 1984-10-05 1986-05-06 Hitachi Ltd スパツタ装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5522343A (en) * 1988-09-14 1996-06-04 Fujitsu Limited Thin film formation apparatus
US5741364A (en) * 1988-09-14 1998-04-21 Fujitsu Limited Thin film formation apparatus
US5178683A (en) * 1990-03-30 1993-01-12 New Japan Radio Co., Ltd. Microwave plasma cvd apparatus
WO1996003019A1 (fr) * 1994-07-14 1996-02-01 Sumitomo Metal Industries, Ltd. Dispositif de traitement au plasma
WO2004068917A1 (ja) * 2003-01-27 2004-08-12 Tokyo Electron Limited プラズマ処理装置およびプラズマ処理方法
JP2006286269A (ja) * 2005-03-31 2006-10-19 Tokyo Electron Ltd プラズマ処理装置
JP2007200687A (ja) * 2006-01-26 2007-08-09 Toppan Printing Co Ltd ２分岐導波管を有するプラズマ処理装置
CN101853768A (zh) * 2010-04-09 2010-10-06 长飞光纤光缆有限公司 一种圆柱型等离子体谐振腔
WO2011124074A1 (zh) * 2010-04-09 2011-10-13 长飞光纤光缆有限公司 一种圆柱型等离子体谐振腔
CN114845455A (zh) * 2022-05-07 2022-08-02 季华实验室 微波等离子体化学气相沉积装置及系统

Also Published As

Publication number Publication date
JP2552140B2 (ja) 1996-11-06

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