JPS6365437A - Photosensitive material - Google Patents

Abstract

PURPOSE:To obtain the titled material having improve preservable property by incorporating a microcapsule contg. a basic compd. having a m.p. of 70-210 deg.C into a photosensitive layer. CONSTITUTION:The titled material comprises the photosensitive layer contg. silver halide, a reducing agent and a polymerizable compd. on a substrate body. And, the photosensitive layer comprises the microcapsule contg. the basic compd. having the m.p. of 70-210 deg.C. The basic compd. is composed of guanidine derivatives having >=7 pKa. The microcapsule has preferably an outershell composed of a wall material having the m.p. or the softening point of 60-200 deg.C. Thus, the titled material capable of obtaining a clear image after preserving it for long period or even after preserving it at a severe condition is obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a photosensitive material having a photosensitive layer containing silver halide, a reducing agent, and a polymerizable compound on a support.

[Background of the Invention] A photosensitive material having a photosensitive layer containing silver halide, a reducing agent, and a polymerizable compound on a support is used in an image forming method in which a latent image of silver halide is formed and a monopolymerizable compound is polymerized. can be used.

Examples of image forming methods are described in Japanese Patent Publications Nos. 45-11149, 47-20741, 49-10697, and 57-138632 and 58-169143. In these methods, when exposed silver halide is developed using a developer, coexisting polymerizable compounds (eg, vinyl compounds) start polymerizing to form image-like polymeric compounds. Therefore, the above method is
A developing process using a liquid was required, and the process required a relatively long time.

As an improvement on the above method, Japanese Patent Application Laid-Open No. 61-69082 describes a method in which a polymer compound can be formed by dry processing. This method uses a photosensitive silver salt (silver halide), a reducing agent, a crosslinking compound (polymerizable compound)
A latent image of a photosensitive silver salt is formed by exposing a recording material (photosensitive material) consisting of a photosensitive layer consisting of a binder and a binder to light for one image to form a latent image, and then thermally developing it. A polymer compound is formed on the exposed portion.

Regarding the above-mentioned dry image forming method and photosensitive materials used therein, JP-A-61-183640 and JP-A-61-18
There are also descriptions in each publication of No. 8535.

The above image forming method is a method of polymerizing the polymerizable compound in the area where the latent image of silver halide is formed. He invented a method that can polymerize compounds, and a patent application has already been filed for this invention (Japanese Patent Application No. 60-210).
No. 657), this method involves applying a reducing agent to the area where a latent image of silver halide has been formed by heat development to suppress the polymerization of the polymerizable compound and at the same time promote the polymerization of other areas. be.

The polymerization reaction in the development process of the above image forming method proceeds smoothly under alkaline conditions. For this reason,
A base or a base precursor may be included in the photosensitive layer of the photosensitive material. The base or base precursor that can be included in the photosensitive layer of a photosensitive material is described in JP-A-61-73145. However, when a base or a base precursor is added to the photosensitive layer (especially when a base is added), the sensitivity of the photosensitive material tends to decrease or fog occurs during the storage period from manufacture to use. there were. In addition, the above-mentioned Japanese Patent Application Laid-Open No. 61-73145
The base precursor described in the publication did not satisfactorily satisfy the two requirements of stability during storage and rapid decomposition (base generation) during heat development.

[Summary of the Invention] The present inventor has already attempted to solve the above problem by encapsulating a base or a base precursor in microcapsules and including the microcapsules in the photosensitive layer (Japanese Patent Application No. 52992/1989). No. Specification).

An object of the present invention is to provide a photosensitive material that further improves the storage stability of a photosensitive material using the above-mentioned base-containing microcapsules and that can provide clear images during development.

The present invention provides a photosensitive material having a photosensitive layer containing silver halide, a reducing agent, and a polymerizable compound on a support, the photosensitive layer further containing a basic compound having a melting point of 70°C to 210°C. The present invention provides a photosensitive material characterized by containing a capsule.

The above microcapsules have a melting point or softening point of 6.
Preferably, it has an outer shell made of wall material at a temperature of 0°C to 200°C.

[Effects of the Invention] The photosensitive material of the present invention has a photosensitive layer having a melting point of 70°C to 210°C.
It is characterized by containing microcapsules containing a basic compound at ℃.

The inventor's research has shown that when a base is included in microcapsules, the physical stability of the microcapsules during storage of photosensitive materials can be improved by using a base that is in a solid state at room temperature (during storage). It turned out that it can be done. That is, compared to microcapsules containing a liquid substance, microcapsules containing a basic compound with a melting point of 70°C or higher are more susceptible to damage during handling such as manufacturing, storage, transportation, and image forming processing of photosensitive materials. Furthermore, since bases in a solid state generally have lower reactivity than bases in a liquid or solution state, even if the microcapsules are damaged, there is no risk of deterioration of the base itself and other components. In addition to protecting the base using microcapsules, the photosensitive material of the present invention has the following properties:
The physical stability of the microcapsules is improved, and even if the microcapsules are damaged during storage, problems can be minimized.

The photosensitive material of the present invention has the above-mentioned f! By setting the monovalent gold compound point to 210° C. or lower, the microcapsules can be easily destroyed during thermal development, contrary to the effect during storage. Similarly, during thermal development, the base, which is in liquid form, sufficiently diffuses into the photosensitive material and becomes liquid 5B, which increases the reactivity of the base itself, which prevents the polymerization reaction during development. It can proceed smoothly.

As a result of the above, the photosensitive material of the present invention remains stable even after long-term storage or storage under harsh conditions.

Clear images can be obtained.

In addition, when the outer shell of the microcapsule is composed of a wall material with a melting point or softening point of 70° C. to 210° C., both the destruction of the microcapsule and the liquefaction of the basic compound can proceed by heat development treatment. There are advantages. Furthermore, in the microcapsules having the above structure, heat development treatment triggers both the destruction of the microcapsules and the liquefaction of the basic compound, so that the progress of the polymerization reaction in the heat development treatment is started rapidly and critically. Can be done.

[Detailed description of the invention] Regarding the microcapsules containing a basic compound with a melting point of 70°C to 210°C used in the photosensitive material of the present invention, a patent application has been filed as r-base-containing microcapsules A filed on the same day as this application (1). ing.

As for the basic compound in the present invention, various compounds can be used without particular limitation, except that the melting point is 70°C to 210°C.

Examples of preferred basic compounds include aliphatic amines (trialkylamines, hydroxylamines, aliphatic polyamines), aromatic amines (N-alkyl substituted aromatic amines, N-hydroxylalkyl substituted aromatic amines) and bis[p-(dialkylamino)phenyl]
Methanes), heterocyclic amines, amidines, cyclic amidines, guanidines, cyclic guanidines, and other organic base compounds.Among those with a pKa of 0 or more, those with a pKa of 7 or more are particularly preferred. guanidine derivatives) are particularly preferred.

In the light-sensitive material of the present invention, the above-mentioned basic compounds may be used alone or in combination of several kinds.

The above basic compounds can be used in the photographic material of the present invention in a wide range of amounts. That is, it is appropriate to use the basic compound in an amount of 60% by weight or less, more preferably from 0.01% to 4% by weight, based on the weight of the coating film of the photosensitive layer.
A range of 0% by weight is useful.

Next, examples of guanidine derivatives that can be particularly preferably used as basic compounds in the present invention are shown.

R7R8 RIG (II) [
In the above formulas (I) and (■).

R1-R9 and R-th to R14 are hydrogen atoms, alkyl groups having 18 or less carbon atoms, cycloalkyl groups, aryl groups, aralkyl groups, amino groups, alkylamino groups, acylamino groups, carbamoylamino groups, heterocyclic residues; is a monovalent group selected from the group consisting of groups; R10 is a lower alkylene group, a phenylene group,
302,52. S, 0. -NH- or -representing a double bond).

The above aryl group includes a lower alkyl group, an alkoxy group,
It also includes those having a substituent selected from the group consisting of a nitro group, an acylamino group, an alkylamino group, and a halogen atom] Typical specific examples thereof are shown below. NO2 (l 7) CH3 n CH3CH3 ■ (CH2)2 Below margin (CH2)4 NH? -C-NH2 Quantity NH2-C-NH2 NH2-C-NH2 Hogakure NH2-C-NH2 Below margin NH2-C-NH2 NH2-C-NH7 Eye NH2-C-NH2 Below margin below margin Below margin below margin below margin The guanidine derivatives shown in the above formulas can be easily synthesized by known methods or methods similar thereto.

Hereinafter, microcapsules containing the above-mentioned basic compound will be explained.

There are no particular restrictions on the wall material constituting the outer shell of the microcapsules and the manufacturing method thereof, and various known techniques can be applied.

An example of the above-mentioned known technology is US Pat. No. 2,800,457
No. 3,287,154 and British Patent No. 990,443, Japanese Patent Publication No. 38-19574, Same 42-
Interfacial polymerization methods described in US Pat. Nos. 446 and 42-771; US Pat. Nos. 3,418,250 and 36,603
No. 04 Method by precipitation of polymers of each specification 1; Incyanate described in U.S. Pat. No. 3,796,669
Method using polyol wall material; US Pat. No. 39145
A method using the incyanate wall material described in the specification of No. 11; U.S. Pat. Method; US Patent No. 402
Method using wall-forming materials such as melamine-formaldehyde resin and hydroxypropyl cellulose described in No. 5455;
jn 5 by polymerization of seven polymers described in each publication in No. 9079
itu method: British Patent No. 927807 and British Patent No. 965
No. 074 Polymerization dispersion cooling method described in each specification; US Patent No. 3
Examples include the spray drying method described in each specification of No. 111407 and British Patent No. 930422.

The method for producing the microcapsules used in the present invention is not limited to the above, but a particularly preferred method is to emulsify a core material made of oil containing a basic compound and then form a polymer membrane as the outer shell of the microcapsule. Further, as the oil, an organic solvent that is generally used as a solvent for emulsifying and dispersing hydrophobic compounds can be used.

Note that when a low boiling point organic solvent is used as the oil, there is an advantage that the solvent can be removed during or after the production of microcapsules. Therefore, it is particularly preferable to use a low boiling point organic solvent having a boiling point of 100°C or less as the oil. Examples of the low boiling point organic solvent include ethanol, acetone, methyl ethyl ketone, methyl acetate, ethyl acetate, methylene Examples include chloride.

The outer shell of the microcapsules as described above can be collapsed by applying pressure, but as mentioned above, it is preferable that the outer shell is composed of a wall material with a melting point or softening point of 60° C. to 200° C. It is more preferable that the melting point or softening point of the wall material is lower than the melting point of the basic compound used.

Examples of wall materials that have the property of collapsing when heated include 6
Waxes having a melting point or softening point in the range of 0 to 200°C can be mentioned. Natural waxes, petroleum waxes, synthetic waxes, and the like are known as waxes, and any material can be used as the wall material constituting the outer shell of the microcapsules used in the present invention.

Specific examples of waxes that can be particularly preferably used as the wall material constituting the outer shell of the microcapsules used in the photosensitive material of the present invention are listed below.

1) Natural wax Vegetable waxes (e.g. candelilla wax, carnauba wax, rice wax, wood wax), animal waxes (e.g. beeswax, lanolin, spermaceti), mineral waxes (e.g. montan wax, osikerite, etc.) Ceresin) 2) Petroleum wax, paraffin wax, microwax 3) Synthetic wax: Coal-based synthetic wax, polyethylene wax, Fischer-Tropsch wax, oil-based synthetic wax (e.g., hydrogenated castor oil, fatty acid amide).

Ketones, amines, imides, esters) In addition to the above-mentioned waxes, wall materials having a melting point or softening point of 70° C. to 210° C. are particularly preferably wall materials made of polyurea resin and/or polyurethane resin.

As mentioned above, various methods for manufacturing microcapsules using polyurea resin, polyurethane resin, or a mixture thereof as the wall material constituting the outer shell are already known, and any of these methods can be applied to the photosensitive material of the present invention. It can be used for the production of microcapsules.

In the present invention, the expressions polyurea resin and polyurethane resin do not necessarily mean resins having only urea bonds and urethane bond groups, respectively. The resins that seem to be replacing
It is included in polyurethane resins, and the same applies to polyurea resins.

Next, examples of polyisocyanates, polyamines, and polyols that can be preferably used for forming the outer shell of the base-containing microcapsules of the present invention will be described.

Examples of polyisocyanates include m-phenylene diisocyanate, p-phenylene diisocyanate, 2.
6-) Lylene diisocyanate, 2,4-tolylene diisocyanate, naphthalene-1,4-diisocyanate, diphenylmethane-4,4'-diisocyanate, 3
, 3'-dimethoxy-4,4'-biphenyl diisocyanate, 3,3'-dimethyldiphenylmethane-4'4
°-diisocyanate, xylylene-1,4-diisocyanate, xylylene-1,3-diisocyanate), 4
．． 4'-diphenylpropane diisocyanate, trimethylene diisocyanate, hexamethylene diisocyanate, propylene-1,2-diisocyanate, butylene-1,2-diisocyanate, ethyridine diisocyanate, cyclohexylene- 1,2-diisocyanate, cyclohexylene-1,4-diisocyanate, 4.
4',4''-) liphenylmethane triisocyanate,
Triisocyanates such as toluene-2,4,6-triisocyanate, polymethylene polyphenylisocyanate, 4,4°-dimethyldiphenylmethane, 2.2
, tetraisocyanates such as 5,5'-tetraisocyanate, adducts of hexamethylene diisocyanate and hexanetriol, adducts of 2,4-tolylene diisocyanate and Prenz's tecol, tolylene diisocyanate. Examples thereof include polyisocyanate prepolymers such as adducts of tolylene diisocyanate and hexanetriol, adducts of tolylene diisocyanate and trimethylolpropane, and adducts of xylylene diisocyanate and trimethylolpropane.

Examples of polyamines include ethylenediamine, trimethylenediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, p-phenylenediamine, m-phenylenediamine, piperazine, 2-
Methylbiperazine, 2,5-dimethylpiperazine, 2-
Examples include hydroxytrimethylenediamine, diethylenetriamine, triethylenetetraamine, diethylaminopropylamine, tetraethylenepentamine, and amine adducts of epoxy compounds.

Examples of polyols include ethylene glycol, 1,4
-butanediol, catechol, resorcinol, hydroquinone, l,2-dihydroxy-4-methylbenzene, l,3-dihydroxy-5-methylbenzene, 3.
4-dihydroxy-1-methylbenzene, 3,5-dihydroxy-1-methylbenzene, 2,4-dihydroxyethy/l/Hensen, 1,3-naphthalenediol, l
.

Examples include 5-naphthalenediol, 2,7-naphthalenediol, and 2,3-naphthalenediol. Moreover, water may be used in place of the above polyol.

In addition to the base-containing microcapsules as described above, the photosensitive layer of the photosensitive material of the present invention has a polar group and a melting point of 30.
It is preferable to include a heat-fusible compound having a temperature of between 200° C. and 200° C. The above-mentioned heat-melting compound serves as a solvent for the basic compound during thermal development, thereby promoting diffusion of the basic compound into the photosensitive layer. It has an effect. The melting point of the heat-melting compound is preferably 30°C to 200°C, more preferably 50°C to 150°C.

The polar group possessed by the heat-melting compound is not particularly limited as long as it has the function of dissolving the above-mentioned basic compound when heated. Examples of compounds having such a polar group include carboxylic acid amide. Examples include derivatives, sulfonic acid amide derivatives, phosphoric acid amide derivatives, ketone compounds, ester compounds, ether compounds, urea derivatives, urethane compounds, and compounds having a hydroxyl group. Among these, carboxylic acid amide derivatives and urea derivatives have extremely high tFF. Below, typical examples of heat-melting compounds having a melting point of 30°C to 200°C and a polar group will be shown.

(A) Polyhydroxy compounds: sorbitol, dulcitol, pentaerythritol, trimethylolethane, hexanediol, cyclohexanediol, saponin, vanillin, decanediol (B) Amide compounds: acetamide, propionamide, toluenesulfonamide, benzamide (C) Urea compounds: methylurea, 1,3-dimethylurea, n-butylurea,
dimethylolurea, tetramethylurea, phenylurea,
Benzoylurea, 1,1-diethylurea and other compounds (including those classified as A-C above)
are shown as structural formulas in (1) to (38) below.

H2N-3O2-N (03H7)? Margin below n-CI6H330H n-CI8H370H The above-mentioned heat-melting compounds may be used alone or in combination of two or more types. When using the above-mentioned heat-melting compounds, the photosensitive material of the present invention may be used. The photosensitive layer preferably contains a thermofusible compound in an amount of 3 to 30% by weight, more preferably 5 to 20% by weight.

The silver halide, reducing agent, polymerizable compound, and support constituting the photosensitive material of the present invention will be sequentially explained below.

The light-sensitive material of the present invention includes silver chloride, silver chloride,
Any grains of silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver iodobromide, and silver chloroiodobromide can be used.

The halogen composition of silver halide grains may be uniform or non-uniform on the surface and inside.0 For silver halide grains having a multiple structure with different compositions on the surface and inside, Japanese Patent Laid-Open No. 57 -154232, 58-10853
No. 3, No. 59-48755, Publication No. 59-52237, U.S. Patent No. 4433048 and European Patent No. 1
There are descriptions in each specification of No. 00984. In addition, the special request for
Like the photosensitive material described in the specification of No.-25576.

Silver halide grains having a high proportion of silver iodide in the shell portion may also be used.

There is no particular restriction on the crystal habit of the silver halide grains; for example, tabular grains having an aspect ratio of 3 or more may be used as in the light-sensitive material described in Japanese Patent Application No. 81-55509.

The silver halide used in the light-sensitive material of the present invention includes:

Two or more types of silver halide grains different in halogen composition, crystal habit, grain size, etc. can also be used together.

There is no particular restriction on the grain size distribution of silver halide grains. For example, as in the photosensitive material described in Japanese Patent Application No. 61-55508, monodisperse silver halide grains with a substantially uniform grain size distribution are used. May be used.

In the light-sensitive material of the present invention, the average grain size of the silver halide grains is preferably from 0.001 to 57 zm, more preferably from 0.001 to 2 JLm.

The amount of silver halide contained in the photosensitive layer is 0.1 mg to 1 mg in terms of silver, including organic silver salt, which is an optional component described below.
It is preferable to set it in the range of 0 g/nf, and in terms of silver of only silver halide, it is preferable to set it to 0.1 g/nf or less, and it is particularly preferable to set it to 1 mg to 90 mg/ln'.

The reducing agent that can be used in the light-sensitive material of the present invention has a function of reducing silver halide and/or a function of promoting (or suppressing) polymerization of a polymerizable compound. There are various types of reducing agents having the above functions.

The above reducing agents include hydroquinones, catechols, p
-7 Minophenols, p-phenylenediamines, 3
-Pyrazolidones, 3-aminopyrazoles, 4-amino-5-pyrazolones, 5-7 minouracils, 4,5
-dihydroxy-6-7 minopyrimidines, reductones, amyl reductones, 〇- or p-sulfonamidophenols, 0- or p-sulfonamidonaphthols, 2-sulfonamidoindanones, 4-sulfonamide-5 -Pyrazolones, 3-sulfonamide indoles, sulfonamide pyrazolobenzimidazoles, sulfonamide pyrazolotriazoles, α-sulfonamide ketones, hydrazines, and the like. By adjusting the type, amount, etc. of the reducing agent, it is possible to polymerize the polymerizable compound in either the area where the silver halide latent image is formed or the area where no latent image is formed. In addition, in a system in which a polymerizable compound is polymerized in a portion where a silver halide latent image is not formed, l is used as a reducing agent.
It is particularly preferable to use -phenyl-3-pyrazolidones.' Note that various reducing agents having the above-mentioned functions are described in Japanese Patent Application Laid-open No. 183640/1982, Japanese Patent Application No. 188535/1983, and Japanese Patent Application No. 1888-1983. No. 68874, 60-210
No. 657, No. 60-226084, No. 60-2275
No. 27, No. 60-227528, No. 61-42746
Recorded in each statement of the issue! ! (including those described as developing agents or hydrazine derivatives), and the above-mentioned reducing agents are described in "The Theory" by T. James.
of the Photographic Process+
g" 4th edition, pp. 291-334 (1977), Research Disclosure magazine Vol. 1.170. June 1978 No. 17029 (pp. 9-15),
1.176, No. 17643 of December 1978 (22
There is also a description in page 31). Also, patent application 1986-555
As in the photosensitive material described in the specification of No. 05, a reducing agent precursor capable of releasing the reducing agent under heating conditions or in contact with a base may be used in place of the reducing agent8.
In the light-sensitive material of the present invention, the reducing agents and reducing agent precursors described in the above-mentioned specifications and literatures can be effectively used.

Therefore, the r-reducing agent in this specification includes the above-mentioned publications,
Included are reducing agents and reducing agent precursors as described in the specification and literature.

These reducing agents may be used alone, but as described in each of the above specifications, two or more reducing agents may be used in combination. When used together, the interaction of the reducing agent is, firstly, to promote the reduction of silver halide (and/or organic silver salt) by so-called superadditivity, and secondly, to promote the reduction of silver halide (and/or organic silver salt).
The oxidized form of the first reducing agent produced by the reduction of the first reducing agent (and/or organic silver salt) causes the polymerization of the polymerizable compound (or suppresses the polymerization) through a redox reaction with other reducing agents coexisting. ), etc. are possible. However, in actual use, reactions such as those listed in L can occur simultaneously, so it is difficult to specify which effect is occurring.

Specific examples of the reducing agent include pentadecylhydroquinone, 5-t-butylcatechol, p-(N,N-diethylamino)phenol, 1-phenyl-4-methyl-
4-Hydroxymethyl-3-pyrazolidone, l-phenyl-4-methyl-4-heptadecylcarbonyloxymethyl-3-pyrazolidone, 2-phenylsulfonylamine-4-hexadecyloxy-5-t-octylphenol, 2-phenyl Sulfonylamine-4-t-butyl-5-hexadecyloxyphenol, 2-(N-butylcarbamoyl)-4-phenylsulfonylaminenaphthol, 2-(N-methyl-N-octadecylcarbamoyl)-4-sulfonylaminonaphthol , l-acetyl-2-phenylhydrazine, 1-acetyl-2-((
p or 0)-aminophenyl)hydrazine, l-formyl-2-((p or O)-aminophenyl)hydrazine, 1-acetyl-2-((p or 0)-methoxyphenyl)hydrazine, 1-lauroyl- 2-((p or O)-aminophenyl)hydrazine, l-trityl-2-(2,6-dichloro-4-cyanophenyl)hydrazine, 1-trityl-2-phenylhydrazine, 1
-phenyl-2-(2,4,6-)dichlorophenyl)
Hydrazine, 1-(2-(2,5-di-t-pentylphenoxy)butyroyl)-2-((p or O)-aminophenyl)hydrazine, 1-(2-(2,5-di-t- pentylphenoxy)butyroyl) -2-((
p or 0)-aminophenyl)hydrazine pentadecylfluorocaprylate, 3-indazolinone, 1-
(3,5-dichlorobenzoyl)-2-phenylhydrazine, 1-trityl-2-[(2-N-butyl-N-octylsulfamoyl)-4-methanesulfonyl)phenyl]hydrazine, 1-(4- (2,5-di-t-pentylphenoxy)butyroyl) -2-(CP or 0
)-methoxyphenyl)hydrazine, t-(methoxycarbonylbenzohydryl)-2-phenylhydrazine,
1-formyl-2-[4-(2-(2,4-di-t-pentylphenoxy)butyramido)phenyl]hydrazine, 1-7 cetyl-2-[4-(2-(2,4-di-
t-pentylphenoxy)butyramido)phenyl]
Hydrazine, 1-trityl-2-((2,6-dichloro-4-(N.

N-di-2-ethylhexyl)carbamoyl)phenyl]hydrazine, ■-(methoxycarbonylbenzohydryl)2-(2,a-dichlorophenyl)hydrazine, 1-trityl-2-[(2-(N-ethyl-N- octylsulfamoyl)-4-methanesulfonyl)phenyl]hydrazine, 1-benzoyl-2-tritylhydrazine, 1-(4-butoxybenzoyl)-2-tritylhydrazine, 1-(2,4-dimethoxybenzoyl)
Examples include -2-tritylhydrazine, 1-(4-dibutylcarbamoylbenzoyl)-2-)lythylhydrazine, and 1-(1-naphthoyl)-2-tritylhydrazine.

In the light-sensitive material of the present invention, the reducing agent is preferably used in an amount of 0.1 to 1500 mol % based on 1 mol of silver (including the above-mentioned silver halide and optional ammonium salt). .

The polymerizable compound that can be used in the photosensitive material of the present invention is not particularly limited, and known polymerizable compounds can be used.

Note that when heat development treatment is planned as a method of using the photosensitive material, it is preferable to use a compound with a high boiling point (for example, a boiling point of 80° C. or higher) that is difficult to volatilize during heating.
In addition, in an embodiment in which the photosensitive layer contains a color image forming substance as an optional component described later, the color image forming substance is immobilized by polymerization and curing of the polymerizable compound. A crosslinkable compound having a plurality of polymerizable functional groups is preferable, and as will be described later, when forming a transferred image using an image receiving material, Japanese Patent Application No. 1186
It is preferable to use a highly viscous substance as the polymerizable compound, as in the photosensitive material described in No. 1-150079.

Note that polymerizable compounds that can be used in photosensitive materials are described in the application specifications for the series of photosensitive materials described above and below.

Polymerizable compounds used in photosensitive materials generally have addition polymerizability or ring-opening polymerizability. Compounds having addition polymerizability include compounds having an ethylenically unsaturated group, compounds having ring-opening polymerizability include compounds having an epoxy group, and compounds having an ethylenically unsaturated group are particularly preferred.

Compounds having an ethylenically unsaturated group that can be used in the photosensitive material of the present invention include acrylic acid and its salts;
Acrylic esters, acrylamides, methacrylic acid and its salts, methacrylic esters, methacrylamides, maleic anhydride, maleic acid, esters,
Examples include itaconic acid esters, styrenes, vinyl ethers, vinyl esters, N-vinyl heterocycles, allyl ethers, allyl esters, and derivatives thereof.

Specific examples of polymerizable compounds that can be used in the present invention include acrylic esters.

n-butyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate, benzyl acrylate, furfuryl acrylate, ethoxyethoxyethyl acrylate, dicyclohexyloxyethyl acrylate, nonylphenyloxyethyl acrylate, hexanediol diacrylate, butanediol diacrylate, Neopentyl glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, diacrylate of polyoxyethylenated bisphenol A, polyacrylate of hydroxypolyether, polyester acrylate and Examples include polyurethane acrylate.

Other specific examples of methacrylic acid esters include methyl methacrylate, butyl methacrylate, ethylene glycol dimethacrylate, butanediol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, Methacrylate and dimethacrylate of polyoxyalkylenated bisphenol A can be mentioned.

The above-mentioned polymerizable compounds may be used alone or in combination of two or more types. Light-sensitive materials using a combination of two or more types of polymerizable compounds are described in Japanese Patent Application No. 1988-55504. . In addition, substances in which a polymerizable functional group such as a vinyl group or a vinylidene group is introduced into the chemical structure of the color image-forming substance that is the above-mentioned reducing agent or an optional component described below can also be used as the polymerizable compound of the present invention. . As mentioned above, it goes without saying that the use of a reducing agent and a polymerizable compound, or a substance that functions as a color image forming substance and a polymerizable compound is also included in the embodiments of the present invention.

In the light-sensitive material of the present invention, the monopolymerizable compound is preferably used in an amount of 0.05 to 1200% by weight, more preferably 5 to 950% by weight, based on silver halide.

The photosensitive material of the present invention is formed by providing a photosensitive layer containing one or more of the above-mentioned components on a support.

There are no particular restrictions on this support, but if heat development is planned as a method of using the photosensitive material, it is preferable to use a material that can withstand the processing temperature of the development process. Possible materials include glass, paper, and hm paper.

Coated paper, cast coated paper, synthetic paper, metals and their analogues, films such as polyester, acetyl cellulose, cellulose ester, polyvinyl acetal, polystyrene, polycarbonate, polyethylene terephthalate, etc., and paper laminated with resin materials and polymers such as polyethylene. etc. can be mentioned.

In addition, when the support is made of a porous material such as paper, it has a certain level of smoothness according to the method defined by waviness, like the support used in the photosensitive material described in Japanese Patent Application No. 61-52996. In addition, when a paper support is used, it is preferable to have a water absorption It is preferred to use a paper support with a low

Similarly, when using a paper support,
It is preferable to use a paper support having a certain Bekk smoothness, as in the photosensitive material described in the specification of 1 Photosensitive Material 1 of Application (4) filed on August 15, 2015.

In the following margins, various aspects of the photosensitive material of the present invention, optional components that can be included in the photosensitive layer, auxiliary layers that can be optionally provided in the photosensitive material, etc. will be sequentially explained.

The photosensitive material of the present invention preferably has a polymerizable compound dispersed in the photosensitive layer in the form of oil droplets.0 Examples of the photosensitive material in which the polymerizable compound is dispersed in the photosensitive layer in the form of oil droplets include:
This is described in the specification of Japanese Patent Application No. 60-218603. The above-mentioned oil droplets may contain other components in the photosensitive layer such as silver halide, reducing agent, one-color image forming substance, etc. Regarding the photosensitive material containing silver halide in the oil droplets. are described in Japanese Patent Application No. 60-261888 and No. 61-5751, and a photosensitive material further containing a reducing agent in the oil droplets is described in Japanese Patent Application No. 61-25577. In addition, when silver halide is contained in the oil droplet, the number of silver halide particles contained in the oil droplet is set to 5 or more, as described in Japanese Patent Application No. 160592/1983. It is preferable to do so.

It is more preferable that the oil droplets of the polymerizable compound are in the form of microcapsules. Various known techniques can be applied to the microcapsules without any particular limitations. Note that an example of a photosensitive material in which oil droplets of a polymerizable compound are in the form of microcapsules is disclosed in Japanese Patent Application No. 60-11.
It is described in the specification of No. 7089.

There are no particular restrictions on the wall material constituting the outer shell of the microcapsules.For photosensitive materials using microcapsules with outer shells made of polyamide resin and/or polyester resin, see Japanese Patent Application No. 1987-53871. Regarding a photosensitive material using microcapsules having an outer shell made of polyurea resin and/or polyurethane resin, Japanese Patent Application No. 61-53872 describes a method using microcapsules having an outer shell made of amino aldehyde resin. For photosensitive materials, patent application No. 61-538
No. 73 describes a photosensitive material using microcapsules having an outer shell made of gelatin, which is disclosed in Japanese Patent Application No. 538/1986.
Patent Application No. 74 describes a photosensitive material using microcapsules having an outer shell made of epoxy resin.
Regarding photosensitive materials using microcapsules having a composite resin outer shell containing a polyamide resin and a polyurea resin, Japanese Patent Application No. 53877 discloses a composite resin shell containing a polyurethane resin and a polyester resin. Photosensitive materials using microcapsules having shells are described in Japanese Patent Application No. 53878/1983.

In addition, when using aldehyde-based microcapsules, the amount of residual aldehyde is kept at a constant value as in the photosensitive material described in the specification of 1 Photosensitive material 1 in application (1) filed on July 25, 1986 by the present applicant. The following is preferable.

When silver halide is contained in microcapsules, it is preferable that silver halide be present in the wall material constituting the outer shell of the microcapsules.For photosensitive materials containing silver halide in the wall material of the microcapsules, Special request 1986
It is described in the specification of No.-11556.

Furthermore, two or more microcapsules in which at least one component is different among the components accommodated in the microcapsules, such as silver halide, a reducing agent 1 polymerizable compound, and a color image forming substance which is an arbitrary component described later, may be used in combination. In particular, when forming a full-color image, it is preferable to use three or more types of microcapsules containing different color image-forming substances in different color hues.A photosensitive material that uses two or more types of microcapsules in combination. Regarding the patent application 1986-42
It is described in the specification of No. 747.

The average particle size of the microcapsules is preferably 3 to 20 ILm, and the particle size distribution of the microcapsules is preferably uniform over a certain value, as in the photosensitive material described in Japanese Patent Application No. 150080/1983. It is preferable that the distribution is in

In addition, when storing silver halide in microcapsules, the average particle size of the silver halide grains mentioned above is preferably one-fifth or less, and preferably one-tenth or less, of the average size of the microcapsules. By setting the average grain size of the silver halide grains to one-fifth or less of the average size of the microcapsules, which is more preferred, a uniform and smooth image can be obtained.

Optional components that can be included in the photosensitive layer of the photosensitive material of the present invention include one-color image forming substances, sensitizing dyes, organic silver salts, and various image formation accelerators (e.g., oils, surfactants, capricorns, etc.). Compounds with prevention function and/or development acceleration function, compounds with oxygen removal function, etc.), thermal polymerization inhibitors, thermal polymerization initiators, development terminators, fluorescent brighteners, anti-fading agents, halides or Anti-irradiation dyes or pigments, matting agents, anti-smudge agents, plasticizers.

Examples include water release agents, binders, photopolymerization initiators, and solvents for polymerizable compounds.

In the photosensitive material of the present invention, a lipolymer image can be obtained by the above-described structure of the photosensitive layer, but a color image can also be formed by including a color image forming substance as an optional component in the photosensitive layer.

There are no particular restrictions on the color image-forming substance that can be used in the photosensitive material of the present invention, and various types can be used.

i.e. substances that are themselves colored (dyes and pigments)
Also, substances (color formers) that are colorless or pale in themselves but develop color when exposed to external energy (heating, pressure, light irradiation, etc.) or when they come into contact with another component (color developer) can also be used as color image forming substances. included. General photosensitive materials using one-color image forming substances are described in the above-mentioned Japanese Patent Application Laid-open No. 73145/1983. In addition, regarding photosensitive materials using dyes or pigments as color image forming substances, patent application No. 61-299
For photosensitive materials using leuco dyes, see Japanese Patent Application No. 61-53876, and for photosensitive materials using triazene compounds, see Japanese Patent Application No. 61-96339.
For photosensitive materials using yellow color-forming leuco dyes, see Japanese Patent Application No. 133091/1986 and No. 8
No. 1-133092 describes a photographic material using a cyan color-forming leuco dye, published by the present applicant in 1981.
Each of these is described in the specification of R Photosensitive Material 1 filed on August 22, 2008 (1).

In addition to commercially available dyes and pigments, which are substances that color themselves, there are various types of materials such as ML (for example, "Dye Handbook", edited by the Organic Synthetic Chemistry Association, published in 1972, "Latest Pigment Handbook", edited by the Japan Pigment Technology Association). , published in 1972) can be used. These dyes or pigments are used after being dissolved or dispersed.

On the other hand, examples of substances that develop color due to some kind of energy such as heating, pressure, or light irradiation include thermochromic compounds,
Piezochromic compounds, photochromic compounds, and leuco compounds such as triarylmethane dyes, quinone dyes, indigoid dyes, and azine dyes are known. All of these develop color upon heating, pressurization, light irradiation, or air oxidation.

Examples of substances that develop color upon contact with another component include various systems that develop color due to acid-base reactions, redox reactions, coupling reactions, chelate formation reactions, etc. between two or more components. For example, pressure-sensitive copying paper (pages 29-58) and Azography (pages 87-58) described in Hiroyuki Moriga's ``Introductory/Special Paper Chemistry 1 (published in 1975)
95 pages), known coloring systems such as heat-sensitive coloring by chemical changes (pages 118-120), or a preview of the seminar sponsored by the Kinki Chemical Industry Association - Latest Pigment Chemistry - Attractive Uses and New Developments as Functional Dyes - 1 Collection, pp. 26-32, (198
It is possible to use the coloring system described in June 19, 2013).

Specifically, lactones are used in pressure-sensitive paper.

A coloring system consisting of a coloring agent with a partial structure such as lactam or spiropyran, and an acidic substance such as acid clay or phenols (C11 coloring agent): aromatic diazonium salts, diazotates, diazosulfonates, naphthols, anilines, activated methylene Systems that utilize azo coupling reactions such as the following; chelate-forming reactions such as the reaction of hexamethylenetetramine with ferric ions and gallic acid, and the reaction of phenolphthalein-combrecranes with alkaline earth metal ions, nistearin Redox reactions such as the reaction between ferric acid and pyrogallol and the reaction between silver behenate and 4-methoxy-1-naphthol can be used.

In addition, when using two types of substances that cause a color-forming reaction □ when in contact as the color image-forming substances as described above, one of the substances that cause the above-mentioned color-forming reaction and a polymerizable compound are contained in microcapsules. However, a color image can be formed on the photosensitive layer by allowing other substances among the substances that cause the color-forming reaction to exist outside the microcapsules containing the polymerizable compound. A photosensitive material capable of producing a color image without using an image-receiving material as described above is described in Japanese Patent Application No. 53881/1981.

Sensitizing dyes that can be used in the light-sensitive material of the present invention are:
There are no particular limitations, and silver halide sensitizing dyes known in the photographic technology can be used. The sensitizing dyes include methine dyes, cyanine dyes, merocyanine dyes, complex cyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes, hemioxonol dyes, and the like. These sensitizing dyes may be used alone or in combination, especially supersensitization [1
When aiming at the target, it is common to use a combination of sensitizing dyes. In addition, along with the sensitizing dye, a dye that itself does not have a spectral sensitizing effect, or a substance that does not substantially absorb visible light but exhibits supersensitization may be used in combination.The amount of the sensitizing dye added is as follows: Generally 10-8 per mole of silver halide
The amount is about 10-2 mol.

The above-mentioned sensitizing dye is preferably added at the stage of preparing a silver halide emulsion, which will be described later.For light-sensitive materials obtained by adding the sensitizing dye at the stage of forming silver halide grains, Japanese Patent Application No. 139746, and the photographic materials obtained by adding a sensitizing dye in the preparation stage of the silver halide emulsion after forming silver halide grains are described in Japanese Patent Application No. 61-55510. There is. Further, specific examples of sensitizing dyes that can be used in light-sensitive materials are also described in the above-mentioned Japanese Patent Application No. 139746/1982 and Japanese Patent Application No. 55510/1981.

Further, as in the photosensitive material described in the specification of R Photosensitive Material J filed by the present applicant on September 3, 1986, an infrared light-sensitive sensitizing dye may be used in combination.

In the light-sensitive material of the present invention, an organic silver salt is added.

It is particularly effective in heat development processing. Namely.

When heated to a temperature of 80° C. or higher, the organic silver salt is considered to participate in an oxidation-reduction reaction catalyzed by a latent image of silver halide. In this case, it is preferable that the silver halide and the organic silver salt are in contact or in close proximity.
Examples of the organic compound constituting the organic silver salt include aliphatic or aromatic carboxylic acids, thiocarbonyl group-containing compounds having a mercapto group or α-hydrogen, and imino group-containing compounds. Among them, -benzotriazole is particularly preferred.The above organic silver salt is generally 0.01 to 10% per mole of silver halide.
The amount used is mol, preferably 0.01 to 1 mol. In addition,
Yes af! A similar effect can be obtained by adding a constituting organic compound (eg, benzotriazole) to the photosensitive layer instead of the salt. A photosensitive material using an organic silver salt is described in Japanese Patent Application No. 141799/1982.

In the light-sensitive material of the present invention, various image formation accelerators can be used. The image formation accelerator includes a redox reaction between silver halide (and/or organic silver salt) and a reducing agent. promotion of photosensitive material to image-receiving material or image-receiving layer (
From the physicochemical point of view, image forming accelerators have functions such as promoting the transfer of image forming substances to (these will be described later), oils, surfactants, antifogging functions and/or Alternatively, they are further classified into compounds having a development accelerating function, compounds having an oxygen removing function, and the like. however,
These groups of substances generally have multiple functions and usually combine some of the above-mentioned promoting effects. Therefore, the above classification is for convenience, and in reality, one compound often has multiple functions.

Examples of the image formation accelerator include oils, surfactants, compounds having an antifogging function and/or development accelerating function, thermal solvents, and compounds having an oxygen removing function.

As the oil, a high boiling point organic solvent used as a solvent for emulsifying and dispersing hydrophobic compounds can be used.

Examples of the surfactant include pyridinium salts, ammonium salts, and phosphonium salts described in JP-A-59-74547, and polyalkylene oxides described in JP-A-59-57231.

A compound having an antifogging function and/or a development accelerator part can be used for the purpose of obtaining a clear image (an image with a high S/N ratio) having a high maximum density and a low minimum density. For photosensitive materials using an antifoggant as a compound having an antifogging function and/or a development accelerating function, see Japanese Patent Application No. 60-294337, and for photosensitive materials using a compound having a cyclic amide structure. Japanese Patent Application No. 60-294338 describes a photographic material using a thioether compound.
No. 0-294339 describes a photosensitive material using a polyethylene glycol derivative in Japanese Patent Application No. 60-294.
340, Japanese Patent Application No. 60-294341 for photosensitive materials using thiol derivatives, and Japanese Patent Application No. 61-2 for photosensitive materials using acetylene compounds.
No. 0438 and Japanese Patent Application No. 1982-25578 describe photosensitive materials using sulfonamide derivatives.

A compound having an oxygen removing function can be used for the purpose of eliminating the influence of oxygen (oxygen has a polymerization inhibiting effect) during development. Examples of compounds having an oxygen removing function include compounds having two or more mercapto groups. Note that a photosensitive material using a compound having two or more mercapto groups is described in Japanese Patent Application No. 53880/1980.

The thermal polymerization initiator that can be used in the photosensitive material of the present invention is generally a compound that thermally decomposes under heating to generate polymerization initiating species (particularly radicals), and is usually used as an initiator for radical polymerization. be. Regarding thermal polymerization initiators, please refer to “Addition Polymerization and
"Ring-Opening Polymerization" (1983, Yame Publishing), pages 6 to 18, etc. Specific examples of thermal polymerization initiators include:
Azobisisobutyronitrile, l, 1゛-azobis(l
-cyclohexanecarbonitrile), dimethyl-2,2
°-azobisisobutyrate, 2.2-azobis(2-
methylbutyronitrile), azo compounds such as azobisdimethylvaleronitrile, organic peroxides such as benzoyl peroxide, di-t-peroxide, dicumyl peroxide, t-butyl hydroperoxide, cumene hydroperoxide, Inorganic peroxides such as hydrogen peroxide, potassium persulfate, and ammonium persulfate.

p-) Sodium luenesulfinate and the like can be mentioned. The thermal polymerization initiator is 0.1 per polymerizable compound.
It is preferable to use it in the range of 120% by weight.
It is more preferable to use it in a range of 10% by weight.
In addition, in a system in which a polymerizable compound is polymerized in areas where a silver halide latent image is not formed, it is preferable to add a thermal polymerization initiator to the photosensitive layer. is described in Japanese Patent Application No. 60-210657.

The development stopper that can be used in the photosensitive material of the present invention is a compound that neutralizes the base immediately after proper development or reacts with 11 groups to lower the base concentration in the film and stop the development, or silver and silver. A compound that interacts with salt to inhibit development. Specific examples include acid precursors that release acids when heated, electrophilic compounds that cause a substitution reaction with a coexisting base when heated, nitrogen-containing heterocyclic compounds, mercapto compounds, and the like. Examples of acid precursors include JP-A-60-108837 and JP-A-60-192939.
Oxime esters described in the published publication, JP-A-60-23
Examples include compounds that release an acid through Rossen rearrangement as described in Japanese Patent No. 0133. Examples of electrophilic compounds that undergo a substitution reaction with a base upon heating include compounds described in JP-A-60-230134.

A dye or pigment may be added to the photosensitive layer of the photosensitive material of the present invention for the purpose of preventing halation or irradiation. In addition, a white pigment may be added to the photosensitive layer for the purpose of preventing halation or irradiation. Regarding the added photosensitive materials, the applicant's July 2, 1986
There is a description in the specification of 1 Photosensitive Material J filed on the 3rd.

The anti-smudge agent used in the photosensitive material of the present invention is preferably a particulate material that is solid at room temperature. Specific examples include starch particles described in British Patent No. 12322347;
Polymer fine powder described in U.S. Patent No. 3,625,736, etc., microcapsule particles containing no color former as described in British Patent No. 1,235,991, etc., U.S. Pat. No. 2,711
Cellulose fine powder, talc, kaolin, bentonite, waxite, zinc oxide, titanium oxide, described in No. 375 specification,
Examples include inorganic particles such as alumina. The average particle size of the particles is preferably in the range of 3 to 50 pm in volume average diameter, more preferably in the range of 5 to 40 gm.As mentioned above, when the oil droplets of the polymerizable compound are in the state of microcapsules, , it is more effective for the particles to be larger than microcapsules.

The binders that can be used in the photosensitive material of the present invention or the image-receiving material described below can be contained alone or in combination in the photosensitive layer or image-receiving layer (described later). It is preferable to use a mainly hydrophilic binder. Typical hydrophilic binders are transparent or translucent wood-philic binders, such as gelatin, gelatin derivatives, cellulose derivatives, starch, gum arabic, etc. Other synthetic polymeric substances, including natural substances such as and synthetic polymeric substances such as water-soluble polyvinyl compounds such as polyvinyl alcohol, polyvinylpyrrolidone, acrylamide polymers, etc., in the form of latex, especially in the dimensions of photographic materials. There are dispersed vinyl compounds that increase stability. In addition,
Regarding photosensitive materials using binders, JP-A-61-
There is a description in Publication No. 69062. Further, a photosensitive material using a binder together with a micro-packel is described in Japanese Patent Application No. 1983-52994.

A photopolymerization initiator may be added to the photosensitive layer of the photosensitive material of the present invention for the purpose of polymerizing unpolymerized polymerizable compounds after image transfer. , e Condylar No. 61-3025.

When a solvent for a polymerizable compound is used in the photosensitive material of the present invention, it is preferable to encapsulate the solvent in a microcapsule separate from the microcapsule containing one polymerizable compound. Regarding photosensitive materials using organic solvents that are miscible with compounds, patent application No. 1986-
It is described in the specification of No. 52993.

In addition to those mentioned above, examples of optional components that can be included in the photosensitive layer and how they are used can also be found in the above-mentioned application specifications related to the series of 1-light materials and Research Fist Disclosure Magazine Vol.

No. 17029, June 1978 (pages 9-15).

Layers that can be optionally provided in the photosensitive material of the present invention include an image receiving layer, a heat generating layer, and an antistatic layer.

Examples include an anti-curl layer, a release layer, a cover sheet or a protective layer.

Instead of using the image-receiving material described later as a method of using the photosensitive material, the image-receiving layer described above may be provided on the photo-sensitive material and an image may be formed on this layer. It can be configured similarly to. Details of the image receiving layer will be described later.

For photosensitive materials using a heating layer, a patent application filed in 1986
Patent application No. 135.568 describes the photosensitive material provided with a cover sheet or protective layer in Japanese Patent Application No. 61-55507.
They are described in the specification of each issue. Further, examples of other auxiliary layers and their usage are also described in the application specifications related to the above-mentioned series of photosensitive materials.

The method for manufacturing the photosensitive material of the present invention will be described below.

Various methods can be used to manufacture photosensitive materials, but the general manufacturing method is to prepare a coating solution by dissolving, emulsifying, or dispersing the components of the photosensitive layer in an appropriate solvent, and then coating. This process consists of applying a liquid onto a support as described above and drying it to obtain a photosensitive material.

Generally, each of the above-mentioned coating liquids is prepared by preparing a liquid composition containing each component and then mixing the respective liquid compositions. The liquid composition may be prepared separately for each component.

Further, some of the constituent components of the photosensitive layer, which may be prepared to contain a plurality of components, may be added during or after the preparation of the liquid composition or coating liquid. Additionally, as described below, the oil-based (or aqueous) composition containing the ingredients on the tool may be further added to the aqueous (or oil-based) composition.
A method of preparing a secondary composition by emulsifying it in a solvent can also be used.

Regarding the main components contained in the photosensitive layer, methods for preparing a liquid composition and a coating solution are shown below.

In the production of the light-sensitive material of the present invention, silver halide is preferably prepared as a silver halide emulsion. There are various methods for preparing silver halide emulsions known in photographic technology, etc., but the light-sensitive material of the present invention There are no particular restrictions on the production of the silver halide emulsion, and the silver halide emulsion can be prepared using any of the acid method, neutral method, and ammonia method. The reaction method for soluble silver salt and soluble halide salt may be one-side mixing method, simultaneous mixing method, or a combination thereof. Back mixing method in which zero particles are mixed under conditions of excess silver ion, and Chondral method in which pAg is kept constant. -Double jet method can also be adopted.

In addition, silver halide emulsions may be mainly formed with internal latent image type emulsions, which may be surface latent image type where a latent image is formed on the grain surface or internal latent image type where a latent image is formed inside one grain. Direct inversion emulsions in combination with nucleating agents can also be used.

In preparing the silver halide emulsion used in the production of the light-sensitive material of the present invention, it is preferable to use a woody colloid (for example, gelatin) as a protective colloid. By preparing an emulsion, the sensitivity of the light-sensitive material of the present invention produced using this emulsion is improved. In the silver halide emulsion, ammonia, an organic thioether derivative (Japanese Patent Publication No. 47-386
(see Japanese Patent Application Publication No. 1983-144) and sulfur-containing compounds (Japanese Patent Application Laid-open No.
319) etc. can be used. In addition, in the process of particle formation or physical ripening, cadmium salts, zinc salts, lead salts, thallium salts, etc. may coexist.Furthermore, for the purpose of improving high illuminance failure and low illuminance failure, iridium chloride ( ), water-soluble iridium salts such as ammonium hexachloroiridium salt, or water-soluble rhodium salts such as rhodium chloride can be used.

Soluble salts may be removed from the silver halide emulsion after precipitation or physical ripening. In this case, this can be carried out according to the Tardel water washing method or the precipitation method. Although the silver halide emulsion may be used without post-ripening, it is usually used after being chemically sensitized.

In emulsions for conventional sensitive materials, known sulfur sensitization methods, reduction sensitization methods, noble metal sensitization methods, etc. can be used alone or in combination.

In addition, when adding a sensitizing dye to a silver halide emulsion,
Patent Application No. 139746/1986 and 61-5 mentioned above
It is preferable to add the above-mentioned antifogging function and/or development acceleration a1 in the preparation stage of the silver halide emulsion as in the light-sensitive material described in No. 5510.
When adding a nitrogen-containing heterocyclic compound as a compound having @, it is preferable to add the nitrogen-containing heterocyclic compound at the stage of forming or ripening silver halide grains in the preparation of a silver halide emulsion. A method for producing a photosensitive material in which particles are added at the particle formation stage or ripening stage is described in Japanese Patent Application No. 81-3024.

When the organic silver salt described above is included in the photosensitive layer, the organic silver salt emulsion can be prepared by a method similar to the method for preparing the silver halide emulsion described above.

In the production of the photosensitive material of the present invention, the polymerizable compound can be used as a medium in preparing the composition of other components in the photosensitive layer. For example, silver halide (including silver halide emulsions), reducing agent.

A color image-forming substance or the like can be dissolved, emulsified or dispersed in a polymerizable compound and used in the production of a photosensitive material.

In particular, when adding a color image-forming substance, it is preferable to include it in a single polymerizable compound.As will be described later, when microcapsulating oil droplets of a polymerizable compound, microencapsulation The polymerizable compound may contain components such as wall materials necessary for this purpose.

A photosensitive composition containing silver halide in a polymerizable compound can be prepared using a silver halide emulsion. In addition to the silver halide emulsion, silver halide powder prepared by freeze-drying or the like can also be used to prepare the photosensitive composition.

Photosensitive compositions containing these silver halides can be obtained by stirring with a homogenizer, blender, mixer, or other commonly used stirrers.

In addition, it is preferable that a copolymer consisting of a hydrophilic repeating unit and a hydrophobic repeating unit is dissolved in the polymerizable compound used for preparing the photosensitive composition.For photosensitive compositions containing the above-mentioned copolymer, , special application 1986-
It is described in the specification of No. 261887.

Alternatively, instead of using the above copolymer, a photosensitive composition may be prepared by dispersing microcapsules having a silver halide emulsion as a core material in a polymerizable compound. A photosensitive composition containing microcapsules is described in Japanese Patent Application No. 5750/1983.

It is preferable to use the polymerizable compound (including those containing other constituent components like the above-mentioned photosensitive composition) as an emulsion in an aqueous solvent.
When oil droplets of a polymerizable compound are microencapsulated, as in the photosensitive material of the specification of No. 117089, a wall material necessary for microencapsulation is added to the emulsion, and the outside of the microcapsules is A shell-forming treatment can also be carried out at this emulsion stage. Further, a reducing agent or other optional components may be added at the stage of the emulsion.

Examples of the above-mentioned microencapsulation method include a method using coacervation of a tree-friendly wall-forming material in US Pat. No. 2,800,457 and US Pat. No. 2,800,458; US Pat. No. 1 and Specifications 1 and Special Publication No. 38-1957
4, 42-446, and 42-771; US Pat. Nos. 3,418,250 and 3,660,304. Method by polymer precipitation described in each specification 1: US Pat. No. 3,796,669 A method using the incyanate-polyol wall material described in U.S. Pat. No. 3,914,511; U.S. Pat. No. 4,001,140;
A method using the urea-formaldehyde-based or urea-formaldehyde-resircinol-based wall-forming material of each specification 1 of No. 087376 and No. 4089802;
A method using wall forming materials such as melamine-formaldehyde resin and hydroxypropyl cell piece described in U.S. Pat. No. 4,025,455; In 5 situ method by polymerization; British Patent No. 927807 and British Patent No. 965074 Polymerization dispersion cooling method described in each specification; US Patent No. 3111407 and British Patent No. 93
Methods for microcapsulating oil droplets of polymerizable compounds include, but are not limited to, the spray drying method described in each specification of No. 0422, but after emulsifying the core material, A method of forming a polymer film is particularly preferred.

Regarding photosensitive microcapsules that can be used in the production of photosensitive materials, Japanese Patent Application No. 61-11556,
No. 61-11557, No. 61-53871, No. 61
-53872, 61-53873, 61-53
No. 874, No. 61-53875, No. 61-53877
No. 61-53878.

Among the above-mentioned emulsions of polymerizable compounds (including microcapsule liquids subjected to microencapsulation treatment), if the polymerizable compound is a photosensitive composition containing silver halide, it can be directly used as a coating solution for photosensitive materials. It can be used as Emulsions other than those mentioned above can be mixed with a composition of other components such as a silver halide emulsion and optionally an organic silver salt emulsion to prepare a coating solution. It is also possible to add other components at the stage of this coating solution in the same manner as in the case of the E-pored material.

The base-containing microcapsules used in the photosensitive material of the present invention can be added at any stage of the manufacturing process of the coating solution for the photosensitive layer as described above.

The photosensitive material of the present invention is produced by coating the entire body of the kite embroidery container on the 11LLAI+UIP package and drying it. The coating liquid can be easily applied to the support according to known techniques.

Margin below A method of using the photosensitive material of the present invention will be described below.

The light-sensitive material of the present invention is used after being subjected to development treatment simultaneously with imagewise exposure or after imagewise exposure.

Although various exposure means can be used as the above-mentioned exposure method, a latent image of silver halide is generally obtained by imagewise exposure to radiation including visible light. The type of light source and amount of exposure
Sensitive wavelength of silver halide (if dye sensitization is performed,
It can be selected depending on the sensitized wavelength) and sensitivity. Further, the original image may be a black and white image or a color image.

The light-sensitive material of the present invention is subjected to a development treatment simultaneously with the above imagewise exposure or after the imagewise exposure. You may do so.

In addition, as mentioned above, the method of JP-A-61-2003, which performs heat development processing,
Since the method described in Publication No. 69062 is a dry process,
It has the advantage of being easy to operate and can be processed in a short time. Therefore, the development treatment for the photosensitive material of the present invention is as follows:
The latter is especially good.

As the heating method in the above heat development treatment, various conventionally known methods can be used. Furthermore, as in the photosensitive material described in Japanese Patent Application No. 60-135568, a heat generating layer may be provided on the photosensitive material and used as a heating means. As in the image forming method described above, heat development may be carried out while suppressing the amount of oxygen present in the photosensitive layer, and the heating temperature is generally 80°C to 200°C, preferably 100°C to 100°C.
The temperature is 60°C. The heating time is generally 1 second to 5 minutes.
Preferably it is 5 seconds to 1 minute.

The photosensitive material of the present invention can be thermally developed as described above to polymerize the polymerizable compound in the area where the silver halide latent image is formed or the area where the silver halide latent image is not formed. can. In the photosensitive material of the present invention, the polymerizable compound in the area where the latent image of silver halide is generally polymerized in the heat development process, but the photosensitive material described in the above-mentioned Japanese Patent Application No. 60-210657 By adjusting the type, amount, etc. of the reducing agent like the material, it is also possible to polymerize the polymerizable compound in the area where the silver halide latent image is not formed.

As described above, the photosensitive material of the present invention allows a polymer image to be obtained on the photosensitive layer. It is also possible to obtain dye images by fixing dyes or pigments to the polymer.

The photosensitive material of the present invention is disclosed in the above-mentioned Japanese Patent Application No. 61-53881.
When the photosensitive material is structured like the one described in the specification, the developed photosensitive material is pressurized to destroy the microcapsules and bring two types of substances that cause a coloring reaction into contact with each other. Color images can be formed thereon.

The image-receiving material can also be used to form an image on the image-receiving material.

The image-receiving material will be explained below in the margins. The general image forming method using an image-receiving material or an image-receiving layer is described in Japanese Patent Application No. 121284/1984.

As a support for the image-receiving material, baryta paper can be used in addition to the supports that can be used for the photosensitive materials mentioned above. In addition, when using a porous material such as paper as a support for the image-receiving material, Japanese Patent Application No. 61-52990
It is preferable that the image-receiving material has a certain level of smoothness, as in the image-receiving material described in the specification of the Japanese Patent Application No. 61-52991. .

Image-receiving materials generally have an image-receiving layer provided on a support.

The image-receiving layer can be constructed in any desired form using various compounds according to the coloring system of the color image-forming substance described above. Incidentally, when a polymer image is formed on the image-receiving material, when a dye or a pigment is used as a color image-forming substance, the image-receiving material may be composed only of the above-mentioned support.

For example, when using a coloring system consisting of a color former and a color developer, the image receiving layer can contain the color developer. Further, the image-receiving layer can also be configured as a layer containing at least one mordant. The mordant can be selected from compounds known in the photographic technology, taking into consideration conditions such as the type of color image forming substance, and used. Note that, if necessary, two or more image-receiving layers may be constructed using a plurality of mordants having different mordant powers.

The image-receiving layer preferably contains a polymer as a binder. As the binder, binders that can be used in the photosensitive layer of the photosensitive material described above can be used. Further, as in the image-receiving material described in Japanese Patent Application No. 61-53879, a polymer with low oxygen permeability may be used as the binder.

The image-receiving layer may contain a thermoplastic compound. When the image-receiving layer contains a thermoplastic compound, the image-receiving layer itself is preferably constructed as an aggregate of fine particles of the thermoplastic compound. has the advantage that it is easy to form a transferred image, and that a glossy image can be obtained by heating after image formation. The above thermoplastic compound is not particularly limited and can be arbitrarily selected from known plastic resins (plastics), waxes, and the like. However, the glass transition point of the thermoplastic resin and the melting point of the wax are preferably 200°C or lower.For an image receiving material having an image receiving layer containing thermoplastic compound fine particles as described above, Japanese Patent Application No. 1249
No. 52, 61-124953.

The image-receiving layer may contain a photopolymerization initiator or a thermal polymerization initiator. In image formation using the image-receiving material of the present invention, the color image-forming substance is an unpolymerized polymerizable material as described below. transcribed along with the compound. Therefore, a photopolymerization initiator or a thermal polymerization initiator can be added to the image-receiving layer for the purpose of smoothly proceeding with the curing process (fixing process) of the unpolymerized polymerizable compound. Further, regarding an image receiving material having an image receiving layer containing a photopolymerization initiator, see Japanese Patent Application No. 61-3025, and regarding an image receiving material having an image receiving layer containing a thermal polymerization initiator, see Japanese Patent Application No. 61-55502. There are descriptions for each.

A dye or pigment can be included in the image-receiving layer for the purpose of writing characters, symbols, frames, etc. on the image-receiving layer, or for the purpose of making the background of an image a specific color. Further, for the purpose of easily distinguishing between the front and back sides of the image-receiving material, a dye or a pigment may be included in the image-receiving layer. Various substances known in the art may be used, but if the dye or pigment may impair the image formed in the image-receiving layer, the dyeing density of the dye or pigment may be reduced (e.g. one reflective layer). It is preferable to use a dye or pigment with a degree of 1 or less (δ), or a dye or pigment that has the property of being decolored by heating or light irradiation.
An image-receiving material having an image-receiving layer containing a dye or pigment which has the property of being decolored by heating or light irradiation is described in Japanese Patent Application No. 81-96339.

Furthermore, when a white pigment such as titanium dioxide or barium sulfate is added to the image-receiving layer, the image-receiving layer can function as a white reflective layer. When the image-receiving layer functions as a white reflective layer, the amount of white pigment is 10 g per 1 g of the thermoplastic compound.
It is preferable to use the amount in the range of 100 g to 100 g.

When the dye or pigment mentioned above is contained in the image-receiving layer, it may be contained uniformly or unevenly distributed in some areas.For example, the support described below may be made of a light-transmitting material. However, by including an oriented color pigment in a part of the image-receiving layer, a part of one reflected image can be made into a projected image.

By doing so, image information that is unnecessary in the projected image can also be written as a reflected image in the image-receiving layer portion containing the white pigment.

The image-receiving layer may be composed of layers on the tool according to the functions described above.1. The thickness of the image-receiving layer is preferably 1 to 1100p, and 1 to 20 gm. is even more preferable.

Note that 1. A protective layer may further be provided, or a layer made of aggregates of fine particles of a thermoplastic compound may be further provided on the image-receiving layer. An image-receiving material in which a layer made of an aggregate of fine particles of a thermoplastic compound is further provided on the image-receiving layer is described in the e-condylar specification No. 61-55503.

Furthermore, an adhesive or a layer containing an adhesive and a release paper may be sequentially laminated on the surface of the support opposite to the side on which the image-receiving layer is provided, the sticker-like image-receiving material having the above structure. Regarding this, patent application No. 61-16926 filed by the present applicant
No. 469264 is written.

The following margin The photosensitive material of the present invention is developed as described above,
By pressing the above image-receiving materials in a stacked state,
The unpolymerized polymerizable compound can be transferred to an image-receiving material to obtain a polymer image on the image-receiving material. Regarding the above-mentioned pressurizing means, various conventionally known methods can be used.

Further, in an embodiment in which the photosensitive layer contains a color image forming substance,
By performing a similar development treatment, the polymerizable compound is polymerized and cured, thereby immobilizing the color image forming substance in the cured portion. Then, by pressing the photosensitive material and the image-receiving material in a superimposed state, the uncured portion of the color image-forming substance is transferred to the image-receiving material, and a color image can be obtained on the image-receiving material.

After forming an image on the image-receiving material as described above, the image-receiving material may be heated as in the image forming method described in Japanese Patent Application No. 61-55501. There is also the advantage that unpolymerized polymerizable compounds transferred to the image are polymerized and the storage stability of the obtained image is improved.

The photosensitive material of the present invention is a photosensitive material for black and white or color photography and printing, a printing photosensitive material, a printing plate, an X-ray photosensitive material, a medical photosensitive material (for example, a CRT photosensitive material for an ultrasound diagnostic machine), a computer graphic hard copy. It has many uses such as photosensitive materials and photosensitive materials for copying machines.

The present invention will be explained in more detail with reference to the following examples, but the present invention is not limited thereto.

The following margin [Example 1] Creation of base-containing microcapsules After dissolving 3 g of tricyclohexylguanidine in 8 g of methylene chloride, 3 g of an adduct of xylylene diisocyanate and trimethylolpropane was added, and polyvinyl alcohol (PVA-205; Kuraray ■ The mixture was mixed into a 5% aqueous solution of A. Using a homogenizer, this liquid is
The mixture was stirred for 1 minute at 9000 r/p for an emulsified state. The average particle size of the emulsion was approximately 2 gm. This emulsion was heated and stirred at 40° C. for 2 hours to obtain a dispersion of base-containing microcapsules.

Preparation of silver halide emulsion Dissolve 40g of gelatin and potassium bromide in 3ml of water,
Heat to 0℃ and add 34g of silver nitrate to 22g of water while continuing to stir.
00 mJ1 was added over 10 minutes. Thereafter, 3.3 g of potassium iodide dissolved in 100 mJ1 of water was added over 2 minutes. After adjusting the pH of the silver iodobromide emulsion thus obtained and removing excess salt by sedimentation,
The pH was adjusted to 6.0, and 1,400 g of a silver iodobromide emulsion was obtained.

Preparation of benzotriazole silver emulsion 28 g of gelatin and 13.2 g of benzotriazole are mixed with 3 parts of water.
It was dissolved in 000mi. This solution was stirred while being maintained at 40°C, and a solution of 17 g of silver nitrate dissolved in 100 m of water was added over 2 minutes.

Excess salt was precipitated and removed by adjusting pi of the obtained emulsion.The pH was then adjusted to 6.30 to obtain a benzotriazole silver emulsion.The yield of the emulsion was 400 g.

Preparation of photosensitive composition 100 g of trimethylolpropane triacrylate, 0.40 g of the following copolymer, Pergus Script Red 1-6-B (manufactured by Ciba Geigy)6. OOg was dissolved. To 18°00 g of the above solution, add 1.8 g of the following hydrazine derivative (reducing agent) and 1 of the following developer (reducing agent).
．． A solution of 22 g dissolved in 4.0 g of methylene chloride was added. Furthermore, silver halide emulsion 4 prepared as above
．． 0.6 g, benzotriazole silver emulsion 0.11 g, and Emarex NP-8 (manufactured by Nippon Emulsion ■) were added, and the mixture was heated at 15,000 revolutions per minute using a homogenizer.
The mixture was stirred for a minute to obtain a photosensitive composition.

(copolymer) ? )13 One+cH2−C’j−? .

■ GO2CsHq (hydrazine derivative) (developer) 18.6% aqueous solution of isopane (manufactured by Kuraray ■) 10.51
g was added to 48.56 g of a 2.89% aqueous solution of pectin to obtain an aqueous solution whose pH was adjusted to 4.0 using 10% sulfuric acid, the photosensitive composition was added to this aqueous solution, and a homogenizer was added. Stir for 2 minutes at 7000 rpm using
The above photosensitive composition was emulsified in an aqueous solvent.

To 72.5 g of this aqueous emulsion, 8.32 g of urea 40% aqueous solution was added.
g, resorcinol 11.3% aqueous solution 2°82g, formalin 37% aqueous solution 8.56g, ammonium sulfate 8.7g
Add 2.74 g of a 6% aqueous solution one after another and heat to 60°C while stirring.
Heating was continued for 2 hours. Thereafter, the pH was adjusted to 7.0 using a 10% aqueous sodium hydroxide solution, and 3. s2g was added to prepare a dispersion of photosensitive microcapsules.

The pH of the base-containing microcapsule dispersion prepared as described above was adjusted to 5.0. Then, 10 g of this base-containing microcapsule dispersion, 10 g of the photosensitive microcapsule dispersion prepared as above, 10 g of a 4% aqueous solution of sorbitol, and Emarex NP-
After mixing and stirring 1 g of a 10% aqueous solution of 8 (manufactured by Nippon Emulsion ■), the mixture was coated onto 1100 IL thick polyethylene terephthalate using a #40 coating rod, and dried at room temperature for 2 hours to obtain a photosensitive material according to the present invention. Created.

[Example 2] In the preparation of the photosensitive material of Example 1, 4 of sorbitol
Example 1 except that 10 g of % aqueous solution was not added.
A photosensitive material according to the present invention was prepared in the same manner as described above.

[Comparative Example 1] In the preparation of the photosensitive material of Example 1, 10 g of the base-containing microcapsule dispersion and 10 g of a 4% aqueous solution of sorbitol were replaced with 10% guanidine trichloroacetate.
A comparative photosensitive material was prepared in the same manner as in Example 1, except that 3.5 g of the solution (water/ethanol = 50150 volume ratio) was added.

[Comparative Example 2] In the preparation of the photosensitive material of Example 1, 10 g of the dispersion of base-containing microcapsules and 10 g of a 4% aqueous solution of sorbitol were replaced with 1 l of tricyclohexylguanidine.
A comparative light-sensitive material was prepared in the same manner as in Example 1, except that 10 g of the O% solid dispersion in water was added.

11 g of 40% sodium hexametaphosphate aqueous solution was added to 150 g of water, and further mixed with 34 g of zinc 3,5-di-α-methylbenzylsalicylate and 82 g of 55% calcium carbonate slurry, and coarsely dispersed with a mixer. did. The liquid was dispersed using a Dynamyl disperser, and 6 g of 50% SBR latex and 55 g of 8% polyvinyl alcohol were added to 200 g of the obtained liquid and mixed uniformly. This mixed solution was uniformly applied onto art paper weighing 43 g/m' to a wet film thickness of 30 pm, and then dried to prepare an image-receiving material.

Each photosensitive material obtained in Image Formation Example 1.2 and Comparative Example 1.2 was imagewise exposed for 1 second at 2000 lux using a tungsten bulb, and then heated for 40 seconds on a hot plate heated to 125°C. Then, each photosensitive material was layered with the above-mentioned image-receiving material and passed through a pressure roller of 350 kg/cm'.

Evaluation of Photosensitive Materials When each of the photosensitive materials described above was stored in the dark under dry conditions at 250°C and subjected to the image forming process as described above, the photosensitive materials of Comparative Examples 1 and 2 showed sufficient performance after storage for 2 days. However, almost no change was observed in the transferred images for the photosensitive material of Example 1 until 5 days after the transfer, and for the photosensitive material of Example 2 until 3 days after transfer.

Claims (1)

[Scope of Claims] 1. A photosensitive material having a photosensitive layer containing silver halide, a reducing agent, and a polymerizable compound on a support, the photosensitive layer further comprising a base having a melting point of 70°C to 210°C. A photosensitive material characterized by containing microcapsules containing a compound. 2. The photosensitive material according to claim 1, wherein the basic compound is a guanidine derivative. 3. The photosensitive material according to claim 2, wherein the basic compound is a guanidine derivative having a pKa of 7 or more. 4. The photosensitive material according to claim 2, wherein the basic compound is a guanidine derivative represented by the following formula (I) or (II); ▲Includes mathematical formulas, chemical formulas, tables, etc.▼( I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) [In the above formulas (I) and (II), R^1 to R^9 and R^1^1 to R^1^4 are hydrogen atom, an alkyl group having 18 or less carbon atoms, a cycloalkyl group, an aryl group, an aralkyl group, an amino group, an alkylamino group, an acylamino group, a carbamoylamino group,
It is a monovalent group selected from the group consisting of heterocyclic residues; R^1^0 is a lower alkylene group, a phenylene group, a naphthylene group, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
There are tables, etc. ▼ (In the formula, X is a lower alkylene group, SO
_2, S_2, S, O, -NH- or a single bond); and the aryl group is a lower alkyl group, an alkoxy group, a nitro group, an acylamino group, It can have a substituent selected from the group consisting of an alkylamino group and a halogen atom]. 5. The above microcapsules have a melting point or softening point of 60
The photosensitive material according to claim 1, characterized in that it has an outer shell composed of a wall material having a temperature of 200°C to 200°C. 6. The above microcapsules are made of polyurea resin and/or
The photosensitive material according to claim 1, further comprising an outer shell made of a wall material made of a polyurethane resin. 7. The photosensitive material according to claim 1, wherein the photosensitive layer contains the basic compound in an amount of 0.01 to 60% by weight. 8. The photosensitive layer further has a polar group and has a melting point of 30°C to 2.
The photosensitive material according to claim 1, characterized in that it contains a heat-fusible compound having a temperature of 00°C. 9. The melting point of the heat-melting compound is 50°C to 150°C.
The photosensitive material according to claim 8, characterized in that: 10. The photosensitive material according to claim 8, wherein the photosensitive layer contains the heat-melting compound in an amount of 3 to 30% by weight. 11. The photosensitive material according to claim 1, wherein the photosensitive layer further contains a color image forming substance. 12. A patent claim characterized in that the silver halide, the polymerizable compound, and the color image forming substance are contained in the photosensitive layer in a state in which they are housed in microcapsules different from the microcapsules containing the basic compound. The photosensitive material according to item 11. 13. The photosensitive material according to claim 1, which is used for thermal development.