JPS6354157A - Magnet material for root - Google Patents
Magnet material for rootInfo
- Publication number
- JPS6354157A JPS6354157A JP61198128A JP19812886A JPS6354157A JP S6354157 A JPS6354157 A JP S6354157A JP 61198128 A JP61198128 A JP 61198128A JP 19812886 A JP19812886 A JP 19812886A JP S6354157 A JPS6354157 A JP S6354157A
- Authority
- JP
- Japan
- Prior art keywords
- magnet material
- gas
- magnet
- reaction tube
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims description 31
- 238000005260 corrosion Methods 0.000 claims description 8
- 230000007797 corrosion Effects 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 description 18
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 13
- 239000000696 magnetic material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910003074 TiCl4 Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 206010011224 Cough Diseases 0.000 description 1
- -1 T1Cl Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000001055 chewing effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- QUCZBHXJAUTYHE-UHFFFAOYSA-N gold Chemical compound [Au].[Au] QUCZBHXJAUTYHE-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Hard Magnetic Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は歯根用磁石材料に関し、特に、歯根用として
耐摩耗性及び耐蝕性を向上させた磁石材料に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic material for tooth roots, and particularly to a magnetic material for tooth roots with improved wear resistance and corrosion resistance.
（従来の技術）
口内に残留した歯根に磁石材料（例えば、Ｓｍ−ｃｏ磁
石）を埋設し、これに磁性材料を吸着させて義歯とする
ものは知られている。従来、この歯根用磁石材料にＡｕ
（金）やＣｒ（クロム）メッキを施し、口内の酸に対し
て耐蝕性を持たせるように試みられている。(Prior Art) It is known to embed a magnetic material (for example, an Sm-co magnet) in the root of a tooth remaining in the mouth, and to make a magnetic material stick to the denture to form a denture. Conventionally, Au was used as the tooth root magnet material.
Attempts have been made to provide corrosion resistance against oral acid by applying gold (gold) or chromium (Cr) plating.
（発明が解決しようとする問題点）
しかしながら、このような歯根用磁石材料を実際に口内
の歯根に埋め込んで使用する場合、食物の咀明時に埋込
んだ磁石材料とこれに吸着させる義歯が擦れ合って歯根
側の磁石材料のメッキ層が摩耗し、メッキ層下の磁石材
料が短期間（例えば、２〜３ケ月）に腐食されてしまう
という問題があつた・
本発明は斯かる問題点を解決するためになされたもので
、耐摩耗性及び耐蝕性に優れた歯根用磁石材料を提供す
ることを目的とする。(Problems to be Solved by the Invention) However, when such a tooth root magnet material is actually used by being embedded in the tooth root in the mouth, the embedded magnetic material and the denture attached to it may rub when chewing food. There was a problem that the plating layer of the magnet material on the tooth root side was worn out, and the magnet material under the plating layer was corroded in a short period of time (for example, 2 to 3 months).The present invention solves this problem. The object of the invention is to provide a tooth root magnet material with excellent wear resistance and corrosion resistance.
（問題点を解決するための手段及びその作用）上述の問
題点を解決するために、本発明の歯根用磁石材料は、Ｔ
ｉＮを被覆し、耐摩耗性及び耐蝕性を具備せしめたこと
を特徴とする。(Means for solving the problems and their effects) In order to solve the above-mentioned problems, the tooth root magnet material of the present invention uses T.
It is characterized by being coated with iN to provide wear resistance and corrosion resistance.
磁石材料としては種々の材料が適用でき、Ｓｍ−Ｃｏ系
磁石、Ｎｂ−Ｆｅ−Ｂ系磁石等が好適に適用できる。Various materials can be used as the magnet material, and Sm--Co magnets, Nb--Fe--B magnets, etc. can be suitably used.
又、これらの磁石材料の表面にＴｉＮ （チタンナイト
ライド）を被覆する方法としてはＣＶＤ法（Ｃｈｅｍｉ
ｃａｌ Ｖａｐｏｒ Ｄｅｐｏｓｉｔｉｏｎ）でもよく
、ドライブレーティングとしてのスパッタリング、イオ
ンブレーティング等による所謂ＰＶＤ法（Ｐｈｙｓｉｃ
ａｌＶａｐｏｒ Ｄｅｐｏｓｉｔｉｏｎ）でもよい、い
ずれの方法であっても、歯根に埋め込む磁石材料の保磁
力に悪影響を与えないように、磁石材料を６００ ℃以
下に加熱して被覆処理できる方法が望ましい。In addition, as a method for coating the surface of these magnet materials with TiN (titanium nitride), the CVD method (Chemical
Cal Vapor Deposition) may be used, and the so-called PVD method (Physic
Regardless of which method is used, it is desirable that the magnetic material be coated by heating it to 600° C. or below so as not to adversely affect the coercive force of the magnetic material to be implanted in the tooth root.
第１図は、ＣＶＤ法により磁石材料表面にＴ ｉ Ｎ層
を被覆・形成するためのプラズマＣＶＤ装置を示し、図
中符号１は窒素ガスが充填されたＮ２ガスボンベ、符号
２は水素ガスが充填されたＮ２ガスボンベを示し、Ｎ、
ガスボンベ１には配管５１及び８１が接続され、Ｎ２ガ
スボンベ２には配管９１が接続され、これらの配管５１
．８１，９］は反応管７に連通している。配管５１の途
中にはＮＺガスボンへ１側から流量調整弁５ａ付流量計
５及びＴｉＣｌ４発生器６がこの順に配設されおり、配
管８１及び９１には夫々流量３ｆｆＪ整弁４ａ付流量計
４及び流量調整弁９ａ付流量計９が配設されている。Figure 1 shows a plasma CVD apparatus for coating and forming a TiN layer on the surface of a magnet material by the CVD method, in which reference numeral 1 is an N2 gas cylinder filled with nitrogen gas, and reference numeral 2 is an N2 gas cylinder filled with hydrogen gas. indicates a N2 gas cylinder, N,
Piping 51 and 81 are connected to the gas cylinder 1, piping 91 is connected to the N2 gas cylinder 2, and these piping 51
．． 81, 9] are connected to the reaction tube 7. A flow meter 5 with a flow rate regulating valve 5a and a TiCl4 generator 6 are disposed in this order from the NZ gas cylinder 1 side in the middle of the pipe 51, and a flow meter 4 with a flow rate 3ffJ valve 4a and a TiCl4 generator 6 are disposed in this order in the pipes 81 and 91, respectively. A flow meter 9 with a flow rate regulating valve 9a is provided.
前記反応管７の外周壁には高周波コイル＋５３が巻装さ
れ、咳高周波コイル１５ａは高周波発振器１５に接続さ
れている。反応管７の内部には黒鉛製のサセプタ１６に
取り付けられた被コーテイング磁石材料１７が収容され
る。反応管７には更に配管１３の一端が接続され、この
配管１３には反応管７側から水銀真空計１０及び液体窒
素トラップ１２が配設され、配管１３の他端には真空ポ
ンプ１４が接続されている。尚、図中符号工１及び２１
は圧力計である。A high frequency coil +53 is wound around the outer peripheral wall of the reaction tube 7, and the cough high frequency coil 15a is connected to the high frequency oscillator 15. A magnet material 17 to be coated attached to a susceptor 16 made of graphite is housed inside the reaction tube 7 . One end of a piping 13 is further connected to the reaction tube 7, a mercury vacuum gauge 10 and a liquid nitrogen trap 12 are arranged from the reaction tube 7 side to this piping 13, and a vacuum pump 14 is connected to the other end of the piping 13. has been done. In addition, symbols 1 and 21 in the figure
is a pressure gauge.
先ず、所望の形状に成形されたＳｍ−Ｃｏ Ｋ磁石等の
磁石材料を洗剤、パークレン、トリクレン等で良く洗浄
した後乾燥して前記サセプタ１６に取り付は反応管７内
に収容する。そして、反応管７内を前記真空ポンプ１４
により所定圧力（例えば、１〜２０ｔｏｒｒ）に減圧す
る。First, a magnet material such as an Sm-Co K magnet formed into a desired shape is thoroughly washed with a detergent, perchlorene, trichlorene, etc., and then dried, attached to the susceptor 16, and housed in the reaction tube 7. Then, the vacuum pump 14
The pressure is reduced to a predetermined pressure (for example, 1 to 20 torr).
ＴｉＣＩｎ発生器６には常温では液状の４塩化チタン（
ＴｉＣＩｎ ’）が充填されており、このＴｉＣｌ４発
生器６に配管５１を介してキャリアガスであるＮ２ガス
を導くと、Ｎ２ガス中にＴｉＣ１＝が気化する。The TiCIn generator 6 contains titanium tetrachloride (which is liquid at room temperature).
When N2 gas, which is a carrier gas, is introduced into the TiCl4 generator 6 through a pipe 51, TiC1= is vaporized in the N2 gas.
そして、このＮ２ガスとＴ１Ｃｌ、ガスのγ見合ガスを
反応管７に供給する。一方、配管８１及び９１からは純
Ｎ２ガス及び純Ｈ２ガスを夫々反応管７に供給する。こ
のとき、前記各配管に配設された流量計の流量調整弁４
ａ、５ａ、９ａにより所定の混合割合に調整された混合
ガスが反応管７に供給される。Then, the γ matching gas of this N2 gas, T1Cl, and gas is supplied to the reaction tube 7. On the other hand, pure N2 gas and pure H2 gas are supplied to the reaction tube 7 from pipes 81 and 91, respectively. At this time, the flow rate regulating valve 4 of the flow meter disposed in each of the pipes is
The mixed gas adjusted to a predetermined mixing ratio by a, 5a, and 9a is supplied to the reaction tube 7.
反応管７内の磁石材料１７は出力１００〜６００ワツト
、周波数１３．５６ＭＮ２の高周波により加熱されると
共に、磁石材料１７近傍でプラズマ励起による下記の反
応式に示す反応が生しる。The magnet material 17 in the reaction tube 7 is heated by high frequency waves with an output of 100 to 600 watts and a frequency of 13.56 MN2, and a reaction shown by the following reaction formula occurs near the magnet material 17 due to plasma excitation.
２ＴｉＣＩ４＋ Ｎ２ ＋ ４ Ｎ２−２ＴｉＮ ＋
ｌＮｌＣｌ即ち、プラズマ状態でＴｉＣｌ４からＣ１が
遊離し、この遊離Ｃ１がＨと化合してＩＩｃＩが生成す
ると共に、ＴｉとＮとが化合し、磁石材料表面にＴｉＮ
が析出する。2TiCI4+ N2 + 4 N2-2TiN +
In other words, C1 is liberated from TiCl4 in a plasma state, and this liberated C1 combines with H to produce IIcI, and Ti and N combine to form TiN on the surface of the magnet material.
is precipitated.
通常のＣＶＤ法では被コーテイング材を８００℃以上に
加熱して反応を促進させる必要があるが、プラズマ励起
ＣＶＤ法によると被コーテイング材を高温に加熱する代
わりに被コーテイング材近傍の反応ガスをプラズマ状態
して反応を促進するものである。従って、プラズマ励起
ＣＶＤ法は磁石材料を５００℃前後の温度に加熱する程
度でよく、磁石材料の保磁力等の磁気特性に悪影響を与
えることなく、磁石材料表面に密着性のよい均一なＴｉ
Ｎ薄膜を析出させることが出来る。 ＴｉＮ薄膜は耐摩
耗性及び耐蝕性に優れ歯根用磁石材料の腐食の防止、長
寿命化を可能にする。In the normal CVD method, it is necessary to heat the material to be coated to 800°C or higher to accelerate the reaction, but in the plasma-enhanced CVD method, instead of heating the material to be coated to a high temperature, a reactive gas near the material to be coated is heated to a high temperature. condition and promote the reaction. Therefore, the plasma-enhanced CVD method only requires heating the magnet material to a temperature of around 500 degrees Celsius, and without adversely affecting the magnetic properties such as coercive force of the magnet material, a uniform Ti layer with good adhesion can be formed on the surface of the magnet material.
A thin N film can be deposited. The TiN thin film has excellent wear resistance and corrosion resistance, making it possible to prevent corrosion of the tooth root magnet material and extend its life.
（実施例）
第１図に示すプラズマＣＶＤ装置を用いて着磁前のＳｍ
−Ｇｏ磁石（４φＸ２１１１１１１）にプラズマ励起Ｃ
ＶＤ法によるＴｉＮの被覆処理を行った。(Example) Using the plasma CVD apparatus shown in FIG.
-Plasma excitation C in Go magnet (4φX2111111)
TiN coating treatment was performed using the VD method.
先ず、供試磁石材料を洗剤で洗浄後、水洗し、トリクレ
ンで脱脂して乾燥させ、これを黒鉛のサセプタに固定し
て反応管７に収容した。反応ガスの流量をＮ２ガス：
７５ ｍ ｅ ／ｍｉｎ、 ＮＺガス：１５＋ｎｆ／ｗ
ｉｎ ％ ＴｉＣ１ａ：０．１３ ｎ＋７！／＋ｗｉｎ
に夫々設定し、反応管７内圧力を５ ｔｏｒｒに、高周
波出力を５００Ｗ、１３．５６Ｍ Ｈｚに、供試磁石材
＃４温度を５００℃に夫々設定し、斯く設定した反応条
件を３時間保持してＴｉＮを供試磁石材料表面に析出さ
せた。First, the test magnet material was washed with a detergent, then water, degreased with trichlorene, dried, fixed to a graphite susceptor, and housed in the reaction tube 7. Reaction gas flow rate: N2 gas:
75 m e /min, NZ gas: 15+nf/w
in % TiC1a: 0.13 n+7! /+win
The pressure inside the reaction tube 7 was set to 5 torr, the high frequency output was set to 500 W, 13.56 MHz, and the temperature of test magnet #4 was set to 500°C, and the reaction conditions thus set were maintained for 3 hours. TiN was deposited on the surface of the test magnet material.
得られたＴｉＮコーティング層の硬さはマイクロビッカ
ース硬麿で１５０（ＩＫｇ／ａｍ”以上であり、従来の
、例えばＡｕメフキを施した磁石材料のメッキ層硬さの
２５ｋｇ／ｍｍ”に比較して十分に硬く、又、６Ｎの）
ＩＣＩ溶液中に１７時間放置したがＴｉＮコーティング
層の変化は無かった。The hardness of the obtained TiN coating layer is 150 (I kg/am) or more in terms of micro Vickers hardness, compared to the hardness of the plating layer of conventional magnet materials coated with Au, for example, 25 kg/mm. (sufficiently hard and 6N)
Although it was left in the ICI solution for 17 hours, there was no change in the TiN coating layer.
（発明の効果）
以上詳述したように、本発明の歯根用磁石材料に依れば
、磁石材料表面にＴｉＮを？ｔｉ覆するようにしたので
、被覆したＴｉＮは耐蝕性及び耐摩耗性に優れ、従って
、ＴｉＮ被覆下の磁石材料も口内の酸に腐食され難く、
且つ、長寿命化が図れるという優れた効果を奏する。(Effects of the Invention) As detailed above, according to the tooth root magnet material of the present invention, TiN can be added to the surface of the magnet material. Since the coated TiN is coated with TiN, it has excellent corrosion resistance and wear resistance, and therefore, the magnet material under the TiN coating is also less likely to be corroded by acid in the mouth.
Moreover, it has an excellent effect of increasing the lifespan.
４、図面のＦＪｊＪＬを説明
第１図は、本発明に係る歯根用磁石材料を製造する装置
の一例を示し、プラズマＣＶＤ装置の構成図である。4. Explanation of FJjJL in the drawings FIG. 1 shows an example of an apparatus for manufacturing a tooth root magnet material according to the present invention, and is a configuration diagram of a plasma CVD apparatus.
１・・・窒素ガスボンへ、２・・・水素ガスボンベ、６
・・・ＴｉＣ１ｎガス発生器、７・・・反応管、１４・
・・真空ポンプ、１５・・・高周波発振器、１５ａ・・
・高周波コイル。1... To nitrogen gas cylinder, 2... Hydrogen gas cylinder, 6
... TiC1n gas generator, 7 ... reaction tube, 14.
...Vacuum pump, 15...High frequency oscillator, 15a...
・High frequency coil.
Claims (1)
とを特徴とする歯根用磁石材料。A tooth root magnet material characterized by being coated with TiN and having wear resistance and corrosion resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61198128A JPS6354157A (en) | 1986-08-26 | 1986-08-26 | Magnet material for root |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61198128A JPS6354157A (en) | 1986-08-26 | 1986-08-26 | Magnet material for root |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6354157A true JPS6354157A (en) | 1988-03-08 |
Family
ID=16385915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61198128A Pending JPS6354157A (en) | 1986-08-26 | 1986-08-26 | Magnet material for root |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6354157A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01279116A (en) * | 1988-03-12 | 1989-11-09 | Kernforschungsanlage Juelich Gmbh | Magnetic bearing to which permanent magnet receiving holding power in axial direction is mounted |
| WO1996002206A1 (en) * | 1994-07-15 | 1996-02-01 | Hitachi Metals, Ltd. | Artificial tooth stabilizing permanent magnet structure, artificial tooth stabilizing keeper, and artificial tooth stabilizing magnetic attachment |
| EP1254643A1 (en) * | 2001-05-01 | 2002-11-06 | Aichi Steel Corporation | Dental magnetic attachement |
-
1986
- 1986-08-26 JP JP61198128A patent/JPS6354157A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01279116A (en) * | 1988-03-12 | 1989-11-09 | Kernforschungsanlage Juelich Gmbh | Magnetic bearing to which permanent magnet receiving holding power in axial direction is mounted |
| WO1996002206A1 (en) * | 1994-07-15 | 1996-02-01 | Hitachi Metals, Ltd. | Artificial tooth stabilizing permanent magnet structure, artificial tooth stabilizing keeper, and artificial tooth stabilizing magnetic attachment |
| US5788493A (en) * | 1994-07-15 | 1998-08-04 | Hitachi Metals, Ltd. | Permanent magnet assembly, keeper and magnetic attachment for denture supporting |
| EP1254643A1 (en) * | 2001-05-01 | 2002-11-06 | Aichi Steel Corporation | Dental magnetic attachement |
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