JPS63285938A - Cleaning device - Google Patents

Abstract

PURPOSE:To improve the efficiency of cleaning work, to hold a basket in a freely crocking manner in a cleaning tank and to prevent an etching spot by mounting a vertically movable hanger section to the upper section of a plurality of cleaning tanks arranged and installing a movable transfer mechanism. CONSTITUTION:A plurality of cleaning tanks are disposed, several sliders transferring along the cleaning tanks are installed to an upper section, and silicon lumps are shifted rapidly among the cleaning tanks continuously by the sliders. A basket 13 housing the silicon lumps 30 is transferred to the cleaning tank 10 by a feeder 17 for a belt conveyor. The sliders 20a...20d are transferred to the transfer side by a cylinder 15 for moving, a hook 12c for the slider 20a is engaged with a basket connecting section 13a, and the basket 13 is hung up to the upper section of the cleaning tank by a vertically movable cylinder 12a. The slider 20a is shifted in the transfer direction, and the basket 13 is hung down into the first cleaning tank 10, and dipped in an etchant. The basket 13 is moved vertically several times in the tank 10 at that time, and the inclination of the basket is repeated along an inclined plane 16 and the etching spots of the silicon lumps 30 are prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a cleaning device suitable for cleaning polycrystalline silicon and the like.

<Prior Art and Problems> In the production of high-purity polycrystalline silicon, silicon is grown into rod shapes, which are then cut into appropriate lengths and cleaned. Cleaning of the polycrystalline silicon is usually carried out using a water process.

The surface layer and oxide film are removed by etching with an etching solution containing hydrofluoric acid and nitric acid as main components, and then the etching solution is washed away with pure water, followed by vacuum dehydration. The vacuum dehydration removes moisture remaining in the gaps between the polycrystalline silicon. After vacuum dehydration and vacuum drying, the product is sent to the next step.

Conventionally, such cleaning of polycrystalline silicon has been carried out using a batch method. For example, a block of polycrystalline silicon that has been cut to an appropriate length or crushed is stored in a basket and sequentially introduced into each solution bath or etching solution. However, in the above-mentioned conventional cleaning method, in which the silicon blocks housed in the basket come into contact with each other, there are problems such as etching spots occurring at the contact areas. Furthermore, in order to improve the cleaning effect, when transferring the baskets containing the silicon lumps to multiple cleaning tanks, or when rinsing the baskets inside each cleaning tank, this is done manually, which improves work efficiency. There are also problems such as poor performance.

Means for Solving the Problem> The present invention provides a vertically movable hanger section above a plurality of arrayed cleaning tanks and a movable conveyance mechanism, so that baskets containing silicon lumps can be etched in a predetermined manner. The solution is quickly and continuously transferred to the cleaning tank where it is stored, greatly increasing the efficiency of cleaning work, and the basket is held swingably inside the cleaning tank to prevent etching spots and improve the cleaning effect. This has improved the performance and solved the problems of the previous model.

<Structure of the Invention> According to the present invention, a plurality of cleaning tanks are arranged, a moving rail is arranged above the washing tanks along the arrangement of the washing tanks,
The present invention is characterized by comprising a slider that is movably attached to the rail and has a hanger section that is movable up and down, a rotating hook mechanism provided on the hanger section of the slider, and a basket that is engaged with the hook. A cleaning device is provided.

In a preferred embodiment, there is provided a cleaning device in which the slider includes a vertically movable cylinder, the lower end of the rod of the cylinder forms the hanger part, and the bottom of the cleaning tank has an inclined surface on which a basket is placed. A cleaning device is provided in which a cleaning device is formed.

The cleaning effect is good for cleaning the silicon lumps mentioned above.
It is also necessary to have good work efficiency.

The present invention arranges a plurality of cleaning tanks, and installs several sliders above the cleaning tanks that move along the arranged cleaning tanks, and uses the sliders to quickly and continuously transfer silicon lumps between the cleaning tanks. Do it on purpose.

In order to move the sliders on the rails, a moving cylinder is provided, and a plurality of sliders are simultaneously moved at a predetermined interval through rods connected to each slider. Of course, the mechanism for moving the slider is not limited to this. A plurality of cleaning tanks are arranged in rows depending on the type of cleaning liquid (etching liquid) and the cleaning order. Of course, they may be installed in parallel if necessary. The silicon lump is immersed in a cleaning tank while being housed in a basket, and then transferred. The slider has a mechanism for suspending the basket and moving it up and down, for example, it has a cylinder mechanism, and the lower end of the rod of the cylinder forms a hanger part for suspending the basket. The hanger section is provided with a rotatable hook for engaging the basket, and the basket is suspended and transported by the hook while the basket passes through the cleaning process. A predetermined etching solution is stored in the cleaning tank. For example, an etching solution containing hydrofluoric acid and nitric acid as main components is stored in the first cleaning tank and the second cleaning tank, and the third cleaning tank is the first cleaning tank. Pure water is stored in the cleaning tank. Of course, the etching solution is not limited to these. Conventionally, the basket inside the cleaning tank is manually swung to improve the cleaning effect, but in this cleaning device, an inclined surface is formed at the bottom of each cleaning tank, so that when the basket is placed in each cleaning tank, the basket is rotated manually. By tilting the basket and moving the hanger up and down, the basket is tilted repeatedly within the same cleaning tank, and the basket is automatically rocked to eliminate etching spots on the silicon lump inside the basket.

1 and 2, a slider 20 is slidably mounted via a guide roll 14 of a cleaning device according to the present invention.
a to 20d. The cleaning tank 10 is the first cleaning tank 10. A second cleaning tank 10a and a third cleaning tank 10b are provided, and each cleaning tank contains, in order, an etching solution (1) with a fast etching rate and an etching solution (1) with a slow etching rate, which mainly contains fluoride-1 nitric acid. ), and pure water is stored. The moving rails are the cleaning tanks 10, 10a, 10b.
is provided along and above the array. It is slidably mounted on the rail 11.

The slider 12 to be attached is provided with a supply device connected to the cleaning tank,
A plurality of sliders are arranged at predetermined intervals so that one slider corresponds to the upper part and each cleaning tank.

In the embodiment shown in FIG. 1, four sliders 20a, 20b, 20c, and 20d are provided, respectively, arranged above the first to third cleaning tanks 10b and the supply device. Each slider 20a...20d is provided with a cylinder 12a whose rod tip moves up and down.

The tip of the rod forms a hanger portion 12b for suspending the basket 13, and a rotatable hook 12c is pivotally attached to the hanger portion 12b. The hook 12c shown in FIG. 1 is formed by connecting the tips of a pair of arms 12d rotatably to the hanger portion with a rod. On the other hand, the basket 13 has an engaging portion 13.
a protrudes upward, and the tip of the engaging portion 13a is bent laterally so as to engage with the rotating hook 12c. Of course, the hook 12c and the engaging portion 13a of the basket
The shape of is not limited to that shown in the figure. For example, the hook 12d and the engaging portion 13a shown in FIG.
2c is bent to form a hook shape, while the engaging portion 13a of the basket 13 is a simple rod-shaped member and is attached across the upper opening of the basket, so that the tip of the hook engages with the rod-shaped member. configured to match.

Next, a cylinder 15 for moving the sliders 20a...20b is provided at the end of the rail 11.

The rod 15a of the cylinder 15 is connected to the rail 11.
The plurality of sliders 20a...20d are connected to the rod 15a at a predetermined interval, and the sliders 20a...20d are arranged to move reciprocatingly along the rail 11 at the same time by the reciprocating movement of the rod 15a. will be moved to

On the other hand, an inclined surface 16 is formed at the bottom of each cleaning tank so that when the basket 13 is placed in the cleaning tank, the basket placed on the bottom is inclined.

If the inclined surfaces 16 are formed in opposite directions in each washing tank, the basket can be tilted in opposite directions and rocked,
This is preferable for equalizing etching or for complete cleaning.

A basket supply device 17 is installed in series on the carry-in side of the arrayed cleaning tanks 10, 10a, and 10b, and a carry-out device 18 is installed on the carry-out side thereof. For example, a belt conveyor can be used as the carrying-in loading W17 and the carrying-out device 18.

In the above device configuration, the basket 13 containing the silicon lumps 30 is conveyed to the cleaning tank 1o by the belt conveyor supply device 17. On the other hand, the moving cylinder 15
The sliders 20a, 20b, 20c, and 20d are moved to the transport side, and the slider 20a on the transport side is stopped above the basket 13 of the supply device 17.

Next, the hook 12c of the slider 20a rotates downward and engages with the engaging portion 13a of the basket 13, and the vertical motion cylinder 12a is operated, and its rod rises to lift the basket 13 above the cleaning tank. The slider 20a is moved in the transport direction by the moving cylinder 15 and stopped above the first cleaning tank 10. Subsequently, the vertical movement cylinder 12a is operated to lower the basket 13 into the first cleaning tank 10 and immerse it in the etching solution. In this case, the basket 13 is moved up and down several times inside the cleaning tank 10 and the basket is tilted repeatedly along the inclined surface 16 to prevent etching spots on the silicon lump 30 housed in the basket 13. After the basket 13 has finished swinging, the hook 12c rotates and the engaging part 13a of the basket 13 is disengaged, the hanger part 12b is pulled up above the cleaning tank, and then the moving cylinder 15 is activated and the slider 20a is moved again. It is moved to the carry-in side and returned above the supply device 17. At the same time, the slider 20b is moved from the adjacent cleaning tank 10a to above the cleaning tank 10, and the hanger portion 12b of the slider 20b is lowered so that the hook 12
c rotates toward the engaging portion 13a of the basket 13,
engage. The vertical movement cylinder 12a continues to operate,
Lift hanger I3. Simultaneously with the series of operations described above, the vertical movement cylinders 12a of the adjacent sliders 20c and 20d operate to lift the hangers 13 on the supply device or on the cleaning tanks 10, 10a and 10b, respectively. Subsequently, the moving cylinder 15 is operated to move these sliders 20a, 20b, 20c together to the discharge side, and the above-mentioned operation is repeated to perform continuous cleaning.

Although the above embodiment shows a configuration in which the slider is connected to the individual sliders of the polycrystalline silicon cleaning apparatus and moved together, other mechanisms may be used to move the slider.

<Effects of the Invention> In the cleaning device of the present invention, a plurality of sliders move continuously and the baskets are sequentially transferred to each cleaning tank for cleaning, making the cleaning work more efficient than conventional manual cleaning work. Much better. Furthermore, since the basket is mechanically swung inside each cleaning tank, the cleaning effect is excellent and no etching spots occur. Furthermore, since the movement cylinder of the slider is automatically operated, continuous automatic cleaning can be performed.

[Brief explanation of the drawing]

1 and 2 relate to the cleaning device of the present invention, with FIG. 1 being a schematic diagram showing one embodiment thereof, and FIG. 2 being a schematic diagram showing another example of a rotary hook and a basket. In the drawing, 10...Cleaning tank, 11...Movement rail,
12... Slider, 12a... Vertical movement cylinder, 12b... Hanger part, 12c... Rotating hook,
13...basket, 13a...engaging portion, 15...
- Moving cylinder, 16... inclined surface, 17... feeding device, 18... carrying out device.

Claims (1)

[Claims] 1. A plurality of cleaning tanks arranged in an array, a moving rail disposed above the cleaning tanks along the arrangement, and a movable rail movably mounted on the rail and movable up and down. A cleaning device comprising: a slider having a hanger portion; a rotary hook mechanism provided on the hanger portion of the slider; and a basket engaged with the hook. 2. The cleaning device according to claim 1, wherein the slider includes a vertically movable cylinder, and a lower end of the rod of the cylinder forms the hanger portion. 3. The cleaning device according to claim 1, wherein the bottom of the cleaning tank is formed with an inclined surface on which a basket is placed.